Patent application number | Description | Published |
20090027607 | LIQUID CRYSTAL DISPLAY AND METHOD OF PRODUCING SAME - A method of producing a liquid crystal display includes forming a plurality of black matrices on an insulating substrate to define first, second and third pixel regions, forming a color filter layer on the black matrices and on an exposed portion of the insulating substrate on which the black matrices are not formed, forming an organic layer for forming an upper spacer on the color filter layer, and forming a first color filter pattern on a first pixel region, lower spacers on the black matrices, and upper spacers on the lower spacers by at least substantially simultaneously patterning the color filter layer and the organic layer for forming an upper spacer. | 01-29-2009 |
20090239733 | Methods of heat-treating soda-lime glass substrates and heat-treated soda-lime glass substrates formed using the same - A soda-lime glass substrate formed through a heat-treatment method has an absorption coefficient ranging from about 0.15 λ,W/m·K to about 0.54 λ,W/m·K, and a free path length ranging from about 0.12 cm to about 0.24 cm. The heat-treated soda-lime glass substrate is formed by heating for a selected time at a pre-specified maximum temperature of about 270° C. to about 330° C. so as to remove thermally induced residual deformations from the substrate and then the substrate is slowly cooled so as to substantially avoid reintroducing thermally induced residual deformations into the cooling substrate. Thus, the soda-lime glass substrate is transformed to one at or close to its contraction saturation point. This allows the heat-treated soda-lime glass substrate to serve in a practical way as a substrate of a flat display panel. | 09-24-2009 |
20090278132 | ARRAY SUBSTRATE OF LIQUID CRYSTAL DISPLAY DEVICE HAVING THIN FILM TRANSISTOR ON COLOR FILTER AND METHOD OF FABRICATING THE SAME - An array substrate of a liquid crystal display device having a color filter on a gate metal layer, and a data metal layer formed on the color filter. First a gate insulating layer is formed on the gate metal layer to protect and a second gate insulating layer is formed on the color filter layer. Gate lines and gate electrodes are formed in direct contact with the substrate, and color filters are formed on the gate electrodes. To protect gate lines in the patterning process of color filters, a first gate insulating layer is formed on the gate lines and electrodes. Therefore, a high aperture ratio may be enhanced, and the manufacturing yield may be increased. | 11-12-2009 |
20090303422 | DISPLAY SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND DISPLAY PANEL HAVING THE SAME - Embodiments of the present disclosure provide a display substrate, a method of manufacturing the same and a display panel having the same. In an embodiment, a switching element is formed near a crossing area of a gate line and a data line to connect with the gate and data lines. A color filter layer includes a light-blocking partition pattern defining a light-transmitting area and a color filter disposed on the light-transmitting area. A light-blocking partition pattern includes an insulation pattern which covers the switching element, the gate line and the data line along a normal line direction of a base substrate and a light-blocking layer pattern formed from substantially the same pattern as an insulation layer pattern on an upper surface of the insulation layer pattern. A pixel electrode layer is disposed on the color filter to be connected to the switching element. An alignment margin between an upper substrate and a lower substrate may be removed, so that the aperture ratio of a pixel of the display panel may be increased. | 12-10-2009 |
20100033657 | LIGHT ABSORPTION LAYER FOR A DISPLAY DEVICE - A liquid crystal display is presented. The liquid crystal display includes: a first substrate; a pixel electrode formed on the first substrate; a first alignment layer formed on the pixel electrode; a second substrate facing the first substrate; a common electrode formed on the second substrate; a second alignment layer formed on the common electrode; a liquid crystal layer formed between the first alignment layer and the second alignment layer; and a light absorption layer formed between the first substrate and the first alignment layer, or the second substrate and the second alignment layer, wherein the light absorption layer absorbs light having a UV wavelength between about 280 nm and about 450 nm. | 02-11-2010 |
20100065850 | ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - An array substrate includes a substrate including a display area and a peripheral area surrounding the display area, a transistor layer formed in the display area of the substrate and electrically connected to a gate line and a data line, a color filter formed in a pixel region on the transistor layer, a first light blocking member disposed between adjacent color filters, a first transparent member formed on the first light blocking member to cover the first light blocking member, a first color pattern formed in a peripheral area of the substrate and including substantially the same material as the color filter, and a second transparent member including substantially the same material as the first transparent member. The second transparent member is disposed in the peripheral area of the substrate to cover the first color pattern. | 03-18-2010 |
20100085508 | DISPLAY PANEL AND LIQUID CRYSTAL DISPLAY HAVING THE SAME - A display panel includes; a first substrate including glass and having at least one unpolished surface, a second substrate disposed substantially opposite to the first substrate, a liquid crystal layer interposed between the first substrate and the second substrate, a first polarizing plate disposed on an outer surface of the first substrate and including a diffusion layer, and a second polarizing plate disposed on an outer surface of the second substrate. | 04-08-2010 |
20100133540 | GLASS SUBSTRATE, DISPLAY DEVICE HAVING THE SAME, AND METHOD OF MANUFACTURING THE DISPLAY DEVICE - A glass substrate includes at least one surface including an uneven surface having a difference of less than about 0.003 micrometers between a highest point and a lowest point in a section of the glass substrate, the section having a width of about 10 millimeters to about 30 millimeters, and the uneven surfaces being defined by continuously supplying molten glass onto molten metal and cooling the molten glass which floats on the molten metal. | 06-03-2010 |
20110181816 | METHOD OF MAKING LIQUID CRYSTAL DISPLAY AND LIQUID CRYSTAL DISPLAY THEREOF - A liquid crystal display includes a first insulating substrate, a data insulating layer disposed on a data wire of the first insulating substrate, and a color filter layer, an organic film layer, and a light shielding layer disposed on the data insulating layer. The organic film layer is positioned on the color filter layer, and the light shielding layer is positioned on the organic film layer in the screen display area. The color filter layer and the light shielding layer contact each other in the peripheral area. | 07-28-2011 |
20110304804 | DISPLAY DEVICE - A display device includes a light emitting unit and a display panel including a first color filter. The light emitting unit includes a light source generating a blue light, and a light-converting part converting the blue light into a white light and emitting the white light to an exterior. The first color filter, through which the white light passes, includes a first coloring agent that absorbs about 95% to about 100% of light having wavelength of about 420 nm to about 470 nm in the white light. Thus, a color reproducibility of the display device may be improved. | 12-15-2011 |
20120138934 | DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - The present invention relates to a display device and a method of manufacturing the display device. The display device includes an insulation substrate, a gate conductor including a gate line and a gate electrode, an organic layer on the insulation substrate and the gate line, and a data conductor including a data line, a drain electrode, and a source electrode. The data line crosses the gate line. The gate electrode, the drain electrode, and the source electrode form a transistor, and a thickness of the gate electrode may be larger than a thickness of the gate line. | 06-07-2012 |
20120156594 | PHOTOMASK INCLUDING SUPER LENS AND MANUFACTURING METHOD THEREOF - A photomask includes a substrate, a mask pattern layer and a super lens. The substrate includes a pattern which includes protruding portions, and open portions between the protruding portions. The mask pattern layer is in the open portions of the pattern and fills the open portions of the pattern. The super lens is on the substrate and the mask pattern layer. | 06-21-2012 |
20120161131 | THIN-FILM TRANSISTOR SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A thin-film transistor (“TFT”) substrate includes a metal wiring including copper or a copper alloy on a substrate, an inorganic layer on an upper surface and side surfaces of the metal wiring to surround the metal wiring, the inorganic layer in direct contact with the metal wiring, and a planarization layer on the inorganic layer and in direct contact with the inorganic layer. | 06-28-2012 |
20120244471 | PHOTORESIST RESIN COMPOSITION AND METHOD OF FORMING PATTERNS BY USING THE SAME - A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound. | 09-27-2012 |
20120248480 | DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME - Provided are a display device and a method of manufacturing of the display device. The display device includes a substrate subjected to a primary preprocess; a conductor formed on the substrate and subjected to a secondary preprocess; and an insulating layer formed on the substrate and the conductor, in which the primary preprocess is performed for a surface energy of the first substrate higher than a first reference value and the secondary preprocess is performed for a surface energy of the conductor lower than a second reference value. | 10-04-2012 |
20130017637 | METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING DISPLAY DEVICE BY USING THE SAMEAANM JEON; Woo-SeokAACI SeoulAACO KRAAGP JEON; Woo-Seok Seoul KRAANM LEE; Jong KwangAACI DaejeonAACO KRAAGP LEE; Jong Kwang Daejeon KRAANM JU; Jin HoAACI SeoulAACO KRAAGP JU; Jin Ho Seoul KRAANM KANG; MinAACI SeoulAACO KRAAGP KANG; Min Seoul KRAANM KANG; HoonAACI Suwon-siAACO KRAAGP KANG; Hoon Suwon-si KRAANM SHIM; Seung BoAACI Asan-siAACO KRAAGP SHIM; Seung Bo Asan-si KRAANM PARK; Gwui-HyunAACI Osan-siAACO KRAAGP PARK; Gwui-Hyun Osan-si KRAANM KIM; Bong-YeonAACI SeoulAACO KRAAGP KIM; Bong-Yeon Seoul KR - A method for forming a fine exposure pattern where a width and an interval of the pattern are each 1CD, by first exposing a photoresist by using an exposure mask where an interval ratio of a light shielding part and a light transmission part is 2CD:1CD to 4CD:1CD, and then second exposing the photoresist after the exposure mask is shifted at a predetermined interval, or second exposing the photoresist by using an exposure mask formed at a position where a light transmission part is shifted at a predetermined interval, and developing the photoresist, such that it is possible to form a display device having a pixel electrode including a plurality of fine branch electrodes having a smaller width and interval than a resolution of an exposure apparatus. | 01-17-2013 |
20130037829 | DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME - A display substrate includes a base substrate; a first metal pattern disposed on the base substrate and comprising a first signal line and a first electrode electrically connected to the first signal line; and a buffer pattern disposed at a corner between a sidewall surface of the first metal pattern and the base substrate. | 02-14-2013 |
20130048604 | PHOTORESIST COMPOSITION AND METHOD OF FORMING A FINE PATTERN USING THE SAME - A photoresist composition includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and the remainder includes an organic solvent. Also provided is a method of forming a fine pattern including forming a thin film on a substrate; forming a photoresist pattern by using a photoresist composition that includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and a remainder comprising an organic solvent; and patterning the thin film by using the photoresist pattern as an etch-stop layer to form a fine pattern. | 02-28-2013 |
20130106313 | COLOR FILTER AND COLOR FILTER ARRAY PANEL | 05-02-2013 |
20130122403 | MASK FOR EXPOSURE AND METHOD OF FABRICATING SUBSTRATE USING SAID MASK - Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially light absorbing phase shift layer and uses a complex wavelength light source. | 05-16-2013 |
20130122428 | EXPOSURE SYSTEM, METHOD OF FORMING PATTERN USING THE SAME AND METHOD OF MANUFACTURING DISPLAY SUBSTRATE USING THE SAME - An exposure system includes an exposure apparatus and a phase shift mask. The exposure apparatus emits a multi-wavelength light including a plurality of wavelengths different from each other. The phase shift mask includes a transparent substrate and a light blocking layer. The transparent substrate includes a first surface, and a second surface opposite to the first surface. The multi-wavelength light is incident into the first surface. The transparent substrate further includes a recess which extends from the second surface toward the first surface. The light blocking layer includes a first opening which exposes the second surface of the transparent substrate, and a second opening which is spaced apart from the first opening and exposes the recess of the transparent substrate. | 05-16-2013 |
20130143149 | MASK FOR USE IN PHOTOLITHOGRAPHY, MANUFACTURING METHOD THEREOF AND MANUFACTURING METHOD OF DEVICES BY USING THE MASK - Provided are a photomask, including: a substrate; an opaque pattern formed on the substrate and made of a material which does not penetrate light; a first dielectric layer formed on the substrate and the opaque pattern; and a negative refractive-index meta material layer formed on the first dielectric layer, in which a dispersion mode used in the photomask uses a Quasi bound mode, a manufacturing method of the photomask, and a manufacturing method of a substrate using the photomask. | 06-06-2013 |
20130316270 | MASK HAVING ASSIST PATTERN - A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area. | 11-28-2013 |
20140065523 | PATTERN MASK AND METHOD OF MANUFACTURING THIN FILM PATTERN USING PATTERN MASK - A pattern mask for patterning a thin film includes a transparent or translucent substrate with a plurality of grooves formed thereon having a pitch of about 4.6 μm to about 10.8 μm. | 03-06-2014 |
20140076847 | PHOTORESIST COMPOSITION AND METHOD OF FORMING A METAL PATTERN USING THE SAME - A method of forming a metal pattern is disclosed. In the method, a metal layer is formed on a base substrate. A photoresist composition is coated on the metal layer to form a coating layer. The photoresist composition includes a binder resin, a photo-sensitizer, a mercaptopropionic acid compound and a solvent. The coating layer is exposed to a light. The coating layer is partially removed to form a photoresist pattern. The metal layer is patterned by using the photoresist pattern as a mask. | 03-20-2014 |
20140122337 | PAYMENT METHOD THROUGH A PAYMENT INSTRUMENT AND SERVER AND MOBILE TERMINAL PERFORMING THE SAME - A payment method is performed through a payment server connectable to at least one mobile terminal and a payment terminal. The payment method includes: receiving payment information including a payment identification code and a payment location code from the payment terminal; estimating a payment location based on the payment location code; determining the at least one mobile terminal associated with the payment identification code; transmitting the estimated payment location to the at least one mobile terminal; and receiving a location-based approval or a payment rejection from a particular mobile terminal, the approval/rejection determined based on the estimated payment location and a location of a particular mobile terminal belonging to the at least one mobile terminal. | 05-01-2014 |
20140127612 | PHOTOMASK FOR EXPOSURE AND METHOD OF MANUFACTURING PATTERN USING THE SAME - A photomask for exposure includes: a transparent substrate; a light blocking pattern layer positioned on the transparent substrate; a first dielectric layer positioned on the light blocking pattern layer and including a dielectric material; and a negative refractive index layer positioned on the first dielectric layer and including a metal. A surface plasmon quasi-bound mode of the photomask for exposure overlaps a wavelength range of the light source of the light exposer which irradiates light to the photomask for exposure. | 05-08-2014 |
20140162177 | OPTICAL MASK FOR FORMING PATTERN - An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 μm, and a transmission ratio of the halftone layer may range from about 10% to about 50%. | 06-12-2014 |
20140215563 | METHOD OF AUTHENTICATING USER, SERVER AND MOBILE TERMINAL PERFORMING THE SAME - A user authenticating method is performed by a user authenticating server connectable to at least one mobile terminal and a user terminal. The user authenticating method includes: receiving access information of a network including an access identification code and an access location code from the user terminal; estimating an access location of a network based on the access location code; determining at least one mobile terminal associated with the access identification code; transmitting the estimated access location of a network to the at least one mobile terminal; and receiving a location-based access approval or access rejection determined based on the access location of a network and a location of a particular mobile terminal belonging to the at least one mobile terminal from the particular mobile terminal. | 07-31-2014 |
20150064857 | MASK FOR EXPOSURE, METHOD OF FABRICATING THE SAME, AND METHOD OF FABRICATING DISPLAY PANEL USING THE MASK - A mask for etching a target layer includes a mask substrate. A phase inversion layer is disposed to correspond to a non-etched area of a pattern target layer. The phase inversion layer is configured to generate inverted light by inverting a phase of incident light and to transmit the inverted light to the non-etched area of a pattern target layer. An inversion offset part is disposed in a center part of the phase inversion layer. The inversion offset part is configured to generate offset light causing destructive interference with the inverted light in the non-etched area and to provide the offset light to the non-etched area. | 03-05-2015 |