Patent application number | Description | Published |
20080264509 | SPIRAL-WOUND DIAPHRAGM BELLOWS, AND METHOD OF MAKING SUCH A DIAPHRAGM BELLOWS - A diaphragm bellows includes a spiral-wound, pre-profiled metal strip having neighboring turns which are connected by a continuous welding seam in an area of an outer diameter or inner diameter of the metal strip. Neighboring flanks of the metal strip enter a region of the welding seam at an angle of less than 60°. | 10-30-2008 |
20100007138 | HOSE CONNECTOR WITH TORSIONAL DECOUPLING - A hose connector, in particular for exhaust pipes of motor vehicles includes a flexible line element, for example a metal bellows which is supported at one end face in the support member of an attachment carrier with torsional degree of freedom. A tension element is provided by which the line element can be maintained under pretension against the support member of the attachment carrier. | 01-14-2010 |
20110209790 | DAMPING ELEMENT FOR DECOUPLING ELEMENTS, IN PARTICULAR FOR MEMBRANE BELLOWS - A decoupling element for a conduit includes an interior hose made of metal and a corrugated exterior hose surrounding the interior hose, with a hollow-cylindrical gap formed between the corrugated exterior hose and the interior hose. At least one damping element is arranged in the gap, with the damping element(s) constructed of a woven fabric made of a high-temperature-resistant material and having an outside surface with at least one bulge, wherein the bulge positively engages with a corrugation of the exterior hose. The exterior hose may be a membrane bellows. The woven fabric may be a metallic material. The at least one damping element covers, along the rotation axis, preferably a proportional length of at least 20% of the hollow-cylindrical gap and has preferably a static stiffness in the radial direction of less than 100 N/mm. | 09-01-2011 |
20110232796 | STRETCHABLE STRIPWOUND HOSE - A stripwound hose expandable from a compressed state to a stretched state includes at least two spiral-wound strips having at least three telescoping portions in a direction of a longitudinal axis. The telescoping portions are arranged in axially overlapping relation, when the stripwound hose assumes the compressed state; and extend in axial side-by-side relation, when the stripwound hose assumes the stretched state. The telescoping portions are hooked to one another when being axially stretched. | 09-29-2011 |
20120125192 | DIAPHRAGM BELLOWS PRODUCED FROM PROFILED METAL STRIP - A profiled metal strip for a diaphragm bellows is made from a strip material having at least one border which is subjected to reverse bending. Such a metal strip is wound to produce a diaphragm bellows, with abutting borders of neighboring turns being connected with one another by a material joint, such as a welding seam. | 05-24-2012 |
Patent application number | Description | Published |
20080285615 | Method for Determining at Least One State Variable of an Electric Arc Furnace, and Electric Arc Furnace - In a method for determining a state variable of an electric arc furnace, especially for determining the level of the foamed slag ( | 11-20-2008 |
20100315098 | METHOD FOR DETERMINING AT LEAST ONE STATE VARIABLE OF AN ELECTRIC ARC FURNACE, AND ELECTRIC ARC FURNACE - In a method for determining a state variable of an electric arc furnace, especially for determining the level of the foamed slag ( | 12-16-2010 |
20110062464 | LED ARRANGEMENT - An LED arrangement (light emitting diode) has a plurality of adjacent radiating LEDs that are nearly identically aligned for forming an extended area light source. The LEDs are attached to a metallic multi-film support having sandwich-like insulating intermediate layers and having at least a step-like structure with at least one step. At least one LED chip is placed on each step on a metal film and the metal layer directly above is formed of a corresponding shortening or recess for mounting an LED. | 03-17-2011 |
20140233040 | Methods and Devices for Measuring Homogeneously Reflective Surfaces - A focal point generated by a confocal sensor system is moved along a visual axis, orthogonal to the x, y-plane of an x, y, z-coordinate system, to a target z-coordinate of a point to be measured on a surface of an object. A light intensity of light reflected by the surface is dependent on a distance of the focal point along the z-axis to the point to be measured, and is detected and used in determining the actual z-coordinate of the point to be measured by an evaluation device. | 08-21-2014 |
Patent application number | Description | Published |
20090081118 | Unknown - A storage medium for storing hydrogen as well as a process for storing hydrogen are described. | 03-26-2009 |
20110218130 | SALTS OF THIOPHOSPHORIC ACIDS AND USE THEREOF IN LUBRICANTS - Salts of the anion of di-, tri- or tetrathiophosphoric acid of the formula I | 09-08-2011 |
20110265476 | OPERATIONAL FLUID FOR A VAPOUR CIRCUIT PROCESSING DEVICE AND A METHOD FOR OPERATING SAME - The invention relates to an operating fluid for a steam cycle process apparatus comprising a steam generator, an expander, a condenser and a reservoir for the operating fluid, comprising a working medium that evaporates by supplying heat in the steam generator, performs mechanical work in the vapour phase by expanding in the expander and condenses in the condenser and an ionic liquid which forms a mixture with the working medium, wherein the melting point of the mixture lies below −5° C. | 11-03-2011 |
20120021957 | IONIC LIQUIDS HAVING A CONTENT OF IONIC POLYMERS - Method of adjusting the viscosity of a salt having a melting point of less than 100° C. at atmospheric pressure (referred to as ionic liquid for short), wherein an oligomeric or polymeric compound which has a content of at least 0.01 mol of covalently bound acid groups/100 g of compound with at least 1% of the acid groups being present as a salt with an organic cation comprising at least one heteroatom selected from among nitrogen, oxygen, sulfur and phosphorus is added to the ionic liquid. | 01-26-2012 |
20120083630 | PREPARATION OF HOMOALLYL ALCOHOLS IN THE PRESENCE OF NONCOVALENTLY SUPPORTED IONIC LIQUID PHASE CATALYSTS UNDER GAS-PHASE REACTION CONDITIONS - Process for preparing homoallyl alcohols by catalyzed reaction of alkenes with aldehydes or ketones, wherein the reaction is carried out in the gas phase in the presence of noncovalently supported ionic liquid phase catalysts. | 04-05-2012 |
20120106139 | ELECTRO-OPTICALLY SWITCHABLE SYSTEM - An electro-optically switchable system that includes an optically active element and a momentary switch, a container that includes such an electro-optically switchable system and use of such an electro-optically switchable system for providing containers that allow increased light to pass through into the interior thereof only for the duration of a control intervention. | 05-03-2012 |
20120157360 | IONIC LIQUIDS HAVING HIGHER VISCOSITY - Method of adjusting the viscosity of a salt having a melting point of less than 100° C. at atmospheric pressure (referred to as ionic liquid for short), wherein a compound which has a content of at least 0.1 mol of functional groups/100 g of compound and in which the functional groups are selected from among acid, acid amide, amino, ammonium and hydroxyl groups is added to the ionic liquid. | 06-21-2012 |
20130099156 | USE OF LIQUID COMPOSITIONS COMPRISING IMIDAZOLIUM SALTS AS OPERATING MATERIALS - Use of a composition comprising | 04-25-2013 |
20130296159 | ZEOLITIC MATERIALS AND METHODS FOR THEIR PREPARATION USING ALKENYLTRIALKYLAMMONIUM COMPOUNDS - The present invention relates to a process for the preparation of a zeolitic material comprising the steps of:
| 11-07-2013 |
Patent application number | Description | Published |
20090273268 | LAMP FOR A LIGHT SYSTEM - The invention relates to a lamp for a light system, which lamp comprises at least: a lamp envelope ( | 11-05-2009 |
20100053989 | HIGH PRESSURE DISCHARGE LAMP - A high pressure discharge lamp ( | 03-04-2010 |
20100142217 | LAMP | 06-10-2010 |
20110032723 | LIGHTING DEVICE FOR A VEHICLE - A lighting device ( | 02-10-2011 |
20110037374 | LAMP AND METHOD OF MANUFACTURING A LAMP | 02-17-2011 |
20110037553 | HIGH VOLTAGE TRANSFORMER WITH SPACE-SAVING PRIMARY WINDINGS - A high voltage transformer is described with an elongate core ( | 02-17-2011 |
20120206041 | APPARATUS FOR FASTENING THE BURNER OF A DISCHARGE LAMP - The invention relates to a method and apparatus for fastening the burner of a discharge lamp to a housing or plug portion, comprising a sleeve to be clamped around the outer bulb of the burner and an annular base which can be fastened to the housing or plug portion of the electronic ballast unit and which has at least three tabs that are orientated in the direction of the center point of the annular base and may be biased against the sleeve. Furthermore the invention relates to a discharge lamp including a burner, the outer bulb of which is provided with a sleeve, via which the outer bulb is fastened to a housing or plug portion of an electronic ballast unit by means of an annular base, with tabs integrally moulded onto the base being spring-biased against the sleeve and being welded onto the same. | 08-16-2012 |
20120293066 | BURNER WITH REDUCED HEIGHT AND METHOD OF MANUFACTURING A BURNER - It is provided a burner ( | 11-22-2012 |
Patent application number | Description | Published |
20090021715 | MICROLITHOGRAPHIC ILLUMINATION SYSTEM - A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of optical raster elements can generates a raster array of secondary light sources. A device with an additional optical effect can be disposed spatially adjacent to the two raster arrays. The device can be configured as an illumination angle variation device. The device can influence the intensity and/or the phase and/or the beam direction of the illumination light. The influence can be such that an intensity contribution of raster elements to the total illumination intensity can vary across the illumination field. This can enable the illumination intensity to be influenced across the illumination field in a defined manner with respect to the total illumination intensity and/or with respect to the intensity contributions from different directions of illumination. | 01-22-2009 |
20090021839 | OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems. | 01-22-2009 |
20090201481 | OPTICAL ELEMENT AND ILLUMINATION OPTICS FOR MICROLITHOGRAPHY - The disclosure relates to an optical element and illumination optics for microlithography. The optical element can be configured to influence a nominal beam angle, preset over a beam cross-section, of a radiation beam hitting the optical element. Moreover, the disclosure relates to an illumination optics for the microlithography with at least one such optical element and an illumination system for the microlithography with such an illumination optics. | 08-13-2009 |
20110083542 | OPTICAL INTEGRATOR FOR AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems. | 04-14-2011 |
20120019796 | ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY - An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (Δ | 01-26-2012 |
20120249988 | OPTICAL BEAM DEFLECTING ELEMENT, ILLUMINATION SYSTEM INCLUDING SAME, AND RELATED METHOD - An optical beam deflecting element may be used effectively as an energy distribution manipulator in an illumination system to vary the energy distribution within a given spatial intensity distribution in a pupil plane of the illumination system substantially without changing the shape and size and position of illuminated areas in the pupil plane. | 10-04-2012 |
20130120863 | SUBSTRATES FOR MIRRORS FOR EUV LITHOGRAPHY AND THEIR PRODUCTION - For the production of mirrors for EUV lithography, substrates are suggested having a mean relative thermal longitudinal expansion of no more than 10 ppb across a temperature difference ΔT of 15° C. and a zero-crossing temperature in the range between 20° C. and 40° C. For this purpose, at least one first and one second material having low thermal expansion coefficients and opposite gradients of the relative thermal expansion as a function of temperature are selected and a substrate is produced by mixing and bonding these materials. | 05-16-2013 |
20130188162 | Method for Operating a Projection Exposure Tool and Control Apparatus - A method for operating a projection exposure tool for microlithography is provided. The projection exposure tool includes an optical system which includes a number of optical elements which, during an imaging process, convey electromagnetic radiation. All of the surfaces of the optical elements interact with the electromagnetic radiation during the imaging process to form an overall optical surface of the optical system. The method includes: determining respective individual thermal expansion coefficients at at least two different locations of the overall optical surface; calculating a change to an optical property of the optical system brought about by heat emission of the electromagnetic radiation (during the imaging process upon the basis of the thermal expansion coefficients; and imaging mask structures into an image plane via the projection exposure tool with adaptation of the imaging characteristics of the projection exposure tool so that the calculated change to the optical property is at least partially compensated. | 07-25-2013 |
20140176930 | MICROLITHOGRAPHIC ILLUMINATION SYSTEM - A microlithographic illumination system can include a light distribution device that can generate a two-dimensional intensity distribution in a first illumination plane. A first raster array of optical raster elements can generates a raster array of secondary light sources. A device with an additional optical effect can be disposed spatially adjacent to the two raster arrays. The device can be configured as an illumination angle variation device. The device can influence the intensity and/or the phase and/or the beam direction of the illumination light. The influence can be such that an intensity contribution of raster elements to the total illumination intensity can vary across the illumination field. This can enable the illumination intensity to be influenced across the illumination field in a defined manner with respect to the total illumination intensity and/or with respect to the intensity contributions from different directions of illumination. | 06-26-2014 |
20150022798 | ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY - A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system. | 01-22-2015 |
20160025554 | METHOD FOR DETERMINING THE PHASE ANGLE AND/OR THE THICKNESS OF A CONTAMINATION LAYER AT AN OPTICAL ELEMENT AND EUV LITHOGRAPHY APPARATUS - A method and associated EUV lithography apparatus for determining the phase angle at a free interface ( | 01-28-2016 |