Patent application number | Description | Published |
20080229804 | GAS SENSOR - A gas sensor has a sensor element, a housing, an atmosphere-side cover, lead wirings, an elastic member, and a filter assembly. The elastic member has a vertical-hole and lead-wiring holes. The vertical-hole penetrates the elastic member in an axial direction of the gas sensor. The lead wirings are disposed in the lead-wiring holes. The filter assembly composed of a support member and an air filter is fitted to the vertical-hole of the elastic member. The air filter covers at least an end-side opening part and an outer periphery surface connected to the opening part of the support member. The atmosphere-side cover has fastening parts fastening the elastic member. A part of the air filter covering the outer periphery surface of the support member is fastened between the elastic member and the support member. A part of the air filter is disposed at the inside of the support member. | 09-25-2008 |
20080295576 | GAS SENSOR HAVING INSULATOR ASSEMBLY FOR SUPPORTING HEATER - There is provided a gas sensor that includes a sensor element, a heater that comprises an electrode, a housing that holds the sensor element therein, an insulator assembly that surrounds a part of the heater and is constituted of a plurality of insulators, an electric terminal member that is located between the one of the plurality of the insulators and the electrode of the heater, a cover that covers the insulator assembly, a holder for holding the insulator assembly, and an elastic member that is located between the holder and the cover to generate elastic force which is applied at least to the one of the plurality of the insulators to pinch the heater between the one and another one of the plurality of the insulators via the holder so as to bring the electric terminal member into constant electric contact with the electrode of the heater. | 12-04-2008 |
20080314748 | GAS SENSOR - A gas sensor has a sensor element of a cup shape and an insulation electrical heater for heating the sensor element. The insulation electrical heater is placed in an inside of a hollow part of the sensor element. An insulation length extension area is formed on an outer peripheral surface of the insulation electrical heater between electrodes of the insulation electrical heater and a reference electrode metal member tightly bonded onto the sensor element. The insulation length extension area is composed of a plurality of flanges, a rectangle flange part formed in one body, a taper shaped flange part, or a bended flange part. | 12-25-2008 |
20090071825 | GAS SENSOR DESIGNED TO ENSURE STABILITY OF WATERPROOFING OF AIR FLOW PATH - A gas sensor equipped with an elastic member which is disposed hermetically in an open end of an air cover joined to a housing. The elastic member has a vertical hole, an air flow path, and lead-retaining holes through which leads pass to establish electric connections between a sensing device and an external device. The air flow path extends from the vertical hole to an outer peripheral surface of the elastic member to direct air having entered at air inlets to the vertical hole. An assembly of an air-permeable filter and a support is fit elastically in the vertical hole of the elastic member, thereby asserting the stability of adhesion between the vertical hole and the filter even if the filter is thermally deteriorated to ensure the waterproofing of the gas sensor. | 03-19-2009 |
20090101504 | GAS SENSOR - The gas sensor includes a sensor element, a heater for heating the sensor element, the heater having a roughly cylindrical shape, a housing into which the sensor element is inserted to be held therein, and a terminal unit disposed so as to cover a rear end portion of the heater on a rear end side of the housing. The terminal unit includes a pair of insulators, a pair of metal terminals each of which is located Inside a corresponding one of the pair of the insulators and in contact with a corresponding one of a pair of electrode pads provided on a surface of the rear end portion of the heater, and a pressing member pressing the pair of the insulators in a direction that the pair of the insulators approach each other. The pair of the insulators are located out of contact with each other. The rear end portion of the heater is contact-supported at at least three contact points by the terminal unit. | 04-23-2009 |
20090314059 | CERAMIC HEATER - A ceramic heater is incorporated in a gas sensor capable of detecting the concentration of a specific gas contained in a target gas. The ceramic heater is composed of a heater base member made of ceramic, a heat generating member embedded in the heater base member, and electrode pads electrically connected to contact metal members. The contact metal members are electrically connected to external leads in the gas sensor. In the ceramic heater the electrode pads are formed on a contact area of the outer peripheral surface of the heater base member. The contact area includes a rear end part of the heater base member. On assembling the ceramic heater into the gas sensor, the contact metal members slid on the electrode pads formed in the contact area without directly contacting onto the outer peripheral surface of the heater base member. | 12-24-2009 |
Patent application number | Description | Published |
20090273102 | Semiconductor Substrate and Method for Manufacturing the Same - A semiconductor substrate is provided in which an alignment mark is formed that can be used for an aligment even after the formation of an impurity diffused layer by the planarization of an epitaxial film. | 11-05-2009 |
20110076830 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE - A semiconductor substrate is provided in which an alignment mark is formed that can be used for an aligment even after the formation of an impurity diffused layer by the planarization of an epitaxial film. A trench is formed in an alignment region of an N | 03-31-2011 |
20140342525 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE - A semiconductor substrate is provided in which an alignment mark is formed that can be used for an alignment even after the formation of an impurity diffused layer by the planarization of an epitaxial film. A trench is formed in an alignment region of an N | 11-20-2014 |
20140342526 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE - A semiconductor substrate is provided in which an alignment mark is formed that can be used for an alignment even after the formation of an impurity diffused layer by the planarization of an epitaxial film. A trench is formed in an alignment region of an N | 11-20-2014 |
20140342535 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE - A semiconductor substrate preventing a void from being generated in an epitaxial film buried in a trench. An N-type first epitaxial film and first trenches are formed on an N | 11-20-2014 |