Patent application number | Description | Published |
20090266296 | ATOMIC LAYER GROWING APPARATUS - An atomic layer growing apparatus includes a film forming chamber ( | 10-29-2009 |
20090291232 | METHOD AND APPARATUS FOR GROWING PLASMA ATOMIC LAYER - Oxygen gas, for example, is introduced into a film forming chamber, and high-frequency power is supplied to a plurality of monopole antennas arranged above a silicon substrate ( | 11-26-2009 |
20110008550 | ATOMIC LAYER GROWING APPARATUS AND THIN FILM FORMING METHOD - An atomic layer growing apparatus includes a deposition container, a gas supply unit, and an exhaust unit. In the deposition container, an antenna array and a substrate stage are provided. The antenna array is formed by disposing a plurality of antenna elements in parallel, each of the antenna elements being configured by coating a rod-shaped antenna body with a dielectric material. The antenna array generates plasma using one of an oxidizing gas and a nitriding gas. The substrate is placed on the substrate stage. The gas supply unit alternately supplies the source gas and the oxidizing gas toward the substrate stage from a supply hole made in a sidewall of the deposition container when a film is formed on the substrate. The exhaust unit exhausts the source gas and one of the oxidizing gas and the nitriding gas, which are alternately supplied into the deposition container. | 01-13-2011 |
20110017135 | TOMIC LAYER FILM FORMING APPARATUS - An atomic layer film forming apparatus includes a plurality of gas supply pipes ( | 01-27-2011 |
20110293853 | THIN FILM FORMING APPARATUS AND THIN FILM FORMING METHOD - A thin film forming apparatus controls pressures of a first internal space in a deposition vessel and a second internal space provided in the first internal space according to determined pressure conditions, respectively. The apparatus causes a source gas to flow onto a substrate in the second internal space and supplies a high-frequency power to a plasma source provided in the first internal space according to the pressure conditions, thereby generating plasma in the second internal space to form a thin film on the substrate. | 12-01-2011 |
20110303147 | ATOMIC LAYER DEPOSITION APPARATUS - An atomic layer deposition apparatus for forming a thin film on a substrate, including a first container that defines a first inner space, a second container provided inside the first container to define a second inner space, the second container being canister-shaped and including a first opening at one end thereof, a source gas that forms the thin film on the substrate flowing to the second inner space through the first opening, and a pressing member including a gas supply port for supplying the source gas to the second inner space through the first opening, the pressing member being configured to press the second container in a longitudinal direction of the second container so that the second inner space be separated from the first inner space. | 12-15-2011 |
20110305836 | ATOMIC LAYER DEPOSITION APPARATUS AND THIN FILM FORMING METHOD - An atomic layer deposition apparatus, which forms a thin film on a substrate, includes a first container that defines a first inner space and includes a substrate carrying-in and carrying-out port and a gas introduction port in different positions, the substrate being carried in and out through the substrate carrying-in and carrying-out port, gas being introduced through the gas introduction port to form the thin film on the substrate, a second container that is provided in the first container to define a second inner space separated from the first inner space, the second container including a first opening, a first moving mechanism that moves the second container in a predetermined direction, and a controller that controls the first moving mechanism such that the second container is moved to a first position where the substrate carrying-in and carrying-out port and the first opening are located opposite each other when the substrate is carried in and out, the controller controlling the first moving mechanism such that the second container is moved to a second position where the gas introduction port and the first opening are located opposite each other when the thin film is formed on the substrate. | 12-15-2011 |
Patent application number | Description | Published |
20080254279 | Multilayer Structure and Process for Producing the Same - A multilayer structure having a layer of an adhesive resin composition (A) and a layer of another resin (B), wherein the adhesive resin composition (A) includes a thermoplastic resin (a1) containing functional groups of at least one kind selected from the group consisting of a boronic acid group and boron-containing groups capable of being converted into a boronic acid group in the presence of water, and a polyolefin (a2) which does not contain the functional groups, the blending weight ratio (a1/a2) of the thermoplastic resin (a1) to the polyolefin (a2) is 1/99 to 15/85, and particles of the thermoplastic resin (a1) are dispersed with an average particle diameter of 0.1 to 1.2 μm in a matrix of the polyolefin (a2). Consequently, a multilayer structures having satisfactory interlayer adhesion strength can be provided even if the content of the resin having a special functional group in the adhesive resin composition layer is reduced. | 10-16-2008 |
20100119746 | RESIN COMPOSITION AND MULTILAYER STRUCTURE - An object of the present invention is to provide a resin composition suitable for adhering a layer of a base material, such as polyolefins, and a layer of a barrier resin, such as ethylene-vinyl alcohol copolymers. The object is achieved by a resin composition (A) including: a thermoplastic resin (a1) having functional groups of at least one kind selected from the group consisting of a boronic acid group and boron-containing groups capable of being converted into a boronic acid group in the presence of water, a polyolefin (a2) not having the functional groups, and a thermoplastic elastomer (a3) not having the functional groups, wherein the thermoplastic resin (a1) is contained 1 to 20 parts by mass and the thermoplastic elastomer (a3) is contained 3 to 50 parts by mass in terms of 100 parts by mass of the polyolefin (a2). | 05-13-2010 |
20110045314 | MULTILAYER STRUCTURE AND METHOD FOR MANUFACTURING THE SAME - A multilayer structure having a layer of a polypropylene (A) and a layer of an ethylene-vinyl alcohol copolymer (B) laminated to each other via a layer of an adhesive resin composition (C), wherein the adhesive resin composition (C) contains a thermoplastic resin (c1), having functional groups of at least one kind selected from the group consisting of a boronic acid group and boron-containing groups capable of being converted into a boronic acid group in the presence of water, and an ethylene-α-olefin copolymer (c2), having a density of 0.925 g/cm | 02-24-2011 |