Patent application number | Description | Published |
20100026876 | MULTISPECTRAL IMAGE CAPTURING APPARATUS - A multispectral image capturing apparatus has different spectral sensitivity characteristics of at least four bands. Three primary bands of the at least four bands have spectral sensitivity characteristics of standard RGB. At least one auxiliary band of the rest of the at least four bands excluding the three primary bands has a spectral sensitivity characteristic of a narrower bandwidth than bandwidths of the RGB. | 02-04-2010 |
20100033595 | WHITE BALANCE ADJUSTMENT APPARATUS AND WHITE BALANCE COEFFICIENT CALCULATION METHOD - A white balance adjustment apparatus which is input image data acquired by an imager element to adjust a balance among color signals of the image data of a present frame includes an evaluation acquisition unit configured to acquire a plurality of groups of color signal data at each pixel position, as evaluation values, from the image data of the present frame and image data of at least one previous frame which is acquired before the present frame. The evaluation value acquisition unit includes an overlap area detection unit configured to detect image areas overlapping with each other between the image data of the at least one previous frame and the image data of the present frame. The evaluation values to be acquired from the image data of the at least one previous frame are selectively acquired in response to a detection result from the overlap area detection unit. | 02-11-2010 |
20100245618 | WHITE BALANCE CONTROL APPARATUS AND METHOD - An apparatus includes an evaluation acquisition unit, a chromaticity value calculation unit, a weight coefficient calculation unit, a histogram analysis unit, an appearance at a light source calculation unit, a white balance coefficient calculation unit, and a white balance operating unit. the evaluation acquisition unit acquires color signal values from image data. The chromaticity value calculation unit calculates chromaticity values from the color signal values. The weight coefficient calculation unit extracts a signal value as a lightness value, and calculates a weight coefficient determined by the lightness value. The histogram analysis unit calculates the center position of a histogram, a histogram multiplication value and a histogram dispersion value. The appearance at a light source calculation unit calculates an appearance at a light source for each color temperature. The white balance operating unit executes a white balance operation with respect to the image data using a white balance coefficient. | 09-30-2010 |
20110074992 | MULTISPECTRAL IMAGE CAPTURING APPARATUS - A multispectral image capturing apparatus has different spectral sensitivity characteristics of at least four bands. Three primary bands of the at least four bands have spectral sensitivity characteristics of standard RGB. At least one auxiliary band of the rest of the at least four bands excluding the three primary bands has a spectral sensitivity characteristic of a narrower bandwidth than bandwidths of the RGB. | 03-31-2011 |
20140192239 | IMAGE APPARATUS AND IMAGING METHOD - An imaging apparatus includes an imaging element, a correction value calculating unit, and a correction unit. The imaging element images an object through a photographing lens to generate an image signal. The correction value calculating unit calculates correction values for a plurality of frequency components of the image signal, the correction values corresponding to an aperture value acquired when the object is imaged through the photographing lens. The correction unit corrects frequency characteristics of the plurality of frequency components in accordance with the correction values calculated. | 07-10-2014 |
Patent application number | Description | Published |
20080254279 | Multilayer Structure and Process for Producing the Same - A multilayer structure having a layer of an adhesive resin composition (A) and a layer of another resin (B), wherein the adhesive resin composition (A) includes a thermoplastic resin (a1) containing functional groups of at least one kind selected from the group consisting of a boronic acid group and boron-containing groups capable of being converted into a boronic acid group in the presence of water, and a polyolefin (a2) which does not contain the functional groups, the blending weight ratio (a1/a2) of the thermoplastic resin (a1) to the polyolefin (a2) is 1/99 to 15/85, and particles of the thermoplastic resin (a1) are dispersed with an average particle diameter of 0.1 to 1.2 μm in a matrix of the polyolefin (a2). Consequently, a multilayer structures having satisfactory interlayer adhesion strength can be provided even if the content of the resin having a special functional group in the adhesive resin composition layer is reduced. | 10-16-2008 |
20100119746 | RESIN COMPOSITION AND MULTILAYER STRUCTURE - An object of the present invention is to provide a resin composition suitable for adhering a layer of a base material, such as polyolefins, and a layer of a barrier resin, such as ethylene-vinyl alcohol copolymers. The object is achieved by a resin composition (A) including: a thermoplastic resin (a1) having functional groups of at least one kind selected from the group consisting of a boronic acid group and boron-containing groups capable of being converted into a boronic acid group in the presence of water, a polyolefin (a2) not having the functional groups, and a thermoplastic elastomer (a3) not having the functional groups, wherein the thermoplastic resin (a1) is contained 1 to 20 parts by mass and the thermoplastic elastomer (a3) is contained 3 to 50 parts by mass in terms of 100 parts by mass of the polyolefin (a2). | 05-13-2010 |
20100119856 | ADHESIVE RESIN COMPOSITION, AND LAMINATE USING THE SAME - This invention provides an adhesive resin having sufficient adhesion with a polar resin in any applications at normal temperature and applications for boiling and retort processing, a resin composition comprising the adhesive resin, and further a laminate with polyolefin/polar resin including the resin composition as an intermediate layer. An adhesive resin composition (A) for a polar resin is produced by mixing a resin having a carboxylic acid anhydride or derivative thereof component (a1) with a ring-opening polymer or condensation polymer component (a2) having a hydroxyl group or an amino group at both ends or at one end; or graft-reacting the (a2) component with the (a1) component, and wherein an amount of the (a1) component is such that an acid value of the adhesive resin composition (A) is from 0.1 to 50 mg KOH/g with a potassium hydroxide/ethanol solution, and an amount of the (a | 05-13-2010 |
20110045314 | MULTILAYER STRUCTURE AND METHOD FOR MANUFACTURING THE SAME - A multilayer structure having a layer of a polypropylene (A) and a layer of an ethylene-vinyl alcohol copolymer (B) laminated to each other via a layer of an adhesive resin composition (C), wherein the adhesive resin composition (C) contains a thermoplastic resin (c1), having functional groups of at least one kind selected from the group consisting of a boronic acid group and boron-containing groups capable of being converted into a boronic acid group in the presence of water, and an ethylene-α-olefin copolymer (c2), having a density of 0.925 g/cm | 02-24-2011 |
Patent application number | Description | Published |
20120196970 | COMPATIBILIZER AND METHOD FOR PRODUCING SAME - A compatibilizer contains a polymer (A) obtained by reacting a modified olefin-based polymer (a-1) with a polymer (a-2) containing a terminal functional group, wherein the modified olefin-based polymer (a-1) is a polymer modified with from 0.01 to 2 mass % of unsaturated carboxylic acid or a derivative thereof, and the polymer (a-2) is a ring opening polymer or condensation polymer containing a terminal functional group, capable of reacting with the modified olefin-based polymer (a-1), at both ends or one end thereof and has a number average molecular weight from 1,500 to 100,000. This provides an excellent compatibilizer. Particularly, upon melt processing a recovery of a multilayer structure including an EVOH layer and a thermoplastic resin layer, a recycling agent is provided that gives sufficient improvement effects to any of the adhesion of a degraded resin to a screw of a molding machine, the generation of die build-up, the generation of fish eyes, and the decrease in transparency. | 08-02-2012 |
20130022768 | MULTILAYER STRUCTURE AND METHOD FOR PRODUCING SAME - Provided is a multilayer structure, comprising: a layer of a resin composition (A); a layer of a saponified ethylene-vinyl acetate copolymer (B) having an ethylene content of from 20 to 65 mol % and having a degree of saponification of vinyl acetate units of 96% or more; and a layer of polyolefin (C) arranged on one side or both sides of those layers, wherein the resin composition (A) contains polyolefin (D), a saponified ethylene-vinyl acetate copolymer (E) having an ethylene content of from 20 to 65 mol % and having a degree of saponification of vinyl acetate units of 96% or more, and a saponified ethylene-vinyl acetate copolymer (F1) having an ethylene content of from 68 to 98 mol % and having a degree of saponification of vinyl acetate units of 20% or more and/or an acid-modified ethylene-vinyl acetate copolymer (F2) having an ethylene content of from 68 to 98 mol %, the saponified ethylene-vinyl acetate copolymer (E) has a mass ratio [E/(F1+F2)] of from 0.05 to 30 to a total amount of the saponified ethylene-vinyl acetate copolymer (F1) and the acid-modified ethylene-vinyl acetate copolymer (F2), the polyolefin (D) has the saponified ethylene-vinyl acetate copolymer (E) having an average particle diameter of from 0.1 to 1.8 μm dispersed in a matrix thereof, the layer of the resin composition (A) has a thickness of from 50 to 1000 μm, and the layer of the polyolefin (C) has a thickness of from 25 to 1000 μm. This enables to provide a multilayer structure having good gas barrier properties after retort processing and a good appearance. | 01-24-2013 |
20130037980 | PROCESS FOR PRODUCTION OF MULTILAYERED STRUCTURE - Provided is a method of producing a multilayered structure, comprising the steps of: obtaining a regrind (C) by grinding a multilayered structure (B) having a layer of a resin composition (A), followed by sieving; and obtaining a multilayered structure (F) having a layer of a resin composition (E) made by melt kneading the regrind (C) and a polyolefin (D), wherein the resin composition (A) contains a polyolefin (G), a saponified ethylene-vinyl acetate copolymer (H) having an ethylene content of from 20 to 65 mol % and having a degree of saponification of vinyl acetate units of 96% or more, a saponified ethylene-vinyl acetate copolymer (I) having an ethylene content of from 68 to 98 mol % and having a degree of saponification of vinyl acetate units of 20% or more, and an antistatic agent (J), and a mass ratio (H/I) is from 0.1 to 10. According to this, using a regrind of a multilayered structure having a resin composition layer containing a polyolefin and an EVOH enables to provide a method of producing a multilayered structure that is suppressed in generation and worsening of uneven cloudiness. | 02-14-2013 |
20130040157 | RESIN COMPOSITION AND MULTILAYERED STRUCTURE USING SAME - A resin composition, containing: (A) polyolefin; (B) a saponified ethylene-vinyl acetate copolymer having an ethylene content of from 20 to 65 mol % and a degree of saponification of vinyl acetate units of 96% or more; (C) a saponified ethylene-vinyl acetate copolymer having an ethylene content of from 68 to 98 mol % and a degree of saponification of vinyl acetate units of 20% or more; and a pigment (E), wherein a mass ratio (A/B) is from 3 to 99.5, a mass ratio (B/C) is from 1 to 100, a mass ratio (E/C) is from 0.04 to 50, and a content of (C) is from 0.01 to 2.4 parts by mass based on 100 parts by mass of (A) and (B). A molded product, in particular a multilayered structure, obtained by melt molding the resin composition has good dispersibility of the pigment, and improved uneven coloration. | 02-14-2013 |
20130225756 | RESIN MIXTURE AND MULTILAYER STRUCTURE - Provided is a resin mixture, comprising: polyolefin (A); a saponified ethylene-vinyl acetate copolymer (B); and an acid modified olefin-vinyl carboxylate copolymer (C), wherein the acid modified olefin-vinyl carboxylate copolymer (C) has an olefin content of from 50 to 95 mol %, and a difference between an ethylene content of the saponified ethylene-vinyl acetate copolymer (B) and the olefin content of the acid modified olefin-vinyl carboxylate copolymer (C) is within a range of from 20 to 70 mol %. This enables to provide a resin mixture that contains polyolefin and an EVOH, and even in continuous melt molding over a long period of time, has a less amount of screw buildup of a degraded material and also is reduced in generation of fish-eyes, cords, and streaks in a molded product obtained therefrom. | 08-29-2013 |
20130244048 | RESIN COMPOSITION AND MULTILAYERED STRUCTURE USING SAME - A resin composition, containing: (A) polyolefin; (B) a saponified ethylene-vinyl acetate copolymer having an ethylene content of from 20 to 65 mol % and a degree of saponification of vinyl acetate units of 96% or more; (C) a saponified ethylene-vinyl acetate copolymer having an ethylene content of from 68 to 98 mol % and a degree of saponification of vinyl acetate units of 20% or more; and a pigment (E), wherein a mass ratio (A/B) is from 3 to 99.5, a mass ratio (B/C) is from 1 to 100, a mass ratio (E/C) is from 0.04 to 50, and a content of (C) is from 0.01 to 2.4 parts by mass based on 100 parts by mass of (A) and (B). A molded product, in particular a multilayered structure, obtained by melt molding the resin composition has good dispersibility of the pigment, and improved uneven coloration. | 09-19-2013 |
Patent application number | Description | Published |
20120306950 | IMAGE FORMING APPARATUS - An image forming apparatus includes: a print head; a head tank; a carriage; a main tank; a pump; a displaceable member or feeler; a first sensor; a second sensor; a controller to supply an amount of liquid ink corresponding to the displacement difference amount of the feeler to the head tank; and an environmental condition detector. The controller stores the environmental condition when the displacement difference amount is stored; corrects the stored displacement difference amount when a change in a current environmental condition relative to the stored environmental condition is more than a previously set first threshold amount and below a previously set second threshold amount being larger than the first threshold amount; and detects and stores the displacement difference amount again when the change in the current environmental condition relative to the stored environmental condition exceeds the second threshold amount. | 12-06-2012 |
20130044148 | IMAGE FORMING APPARATUS - A disclosed image forming apparatus includes an apparatus main body, a recording head, a sub tank, a carriage, a main tank, and a fluid feeding unit supplying fluid from the main tank to the sub tank, in which the sub tank includes a displacement member displaced depending on a remaining amount, the carriage includes a first detecting unit detecting the displacement member, the apparatus main body includes a second detecting unit detecting the displacement member,the image forming apparatus detects and stores a differential supply amount corresponding to a displacement amount of the displacement member between positions detected by the first detecting unit and the second detecting unit, respectively, and the differential supply amount of liquid is supplied to the sub tank after the first detecting unit detects the displacement member when liquid is supplied without using the second detecting unit. | 02-21-2013 |
20130057604 | IMAGE FORMING APPARATUS INCLUDING RECORDING HEAD FOR EJECTING LIQUID DROPLETS - An image forming apparatus includes a body, a recording head, a sub tank, a carriage, a main tank, a liquid feed unit, a displacement member, first and second detectors, first to third calculation units, a determination unit, and a supply control unit. When the first detector detects the displacement member, the determination unit determines a main scanning position of the carriage at which consumption amount of the liquid is equal to an amount corresponding to a difference calculated by the second unit, based on a relation calculated by the third unit. The control unit causes the feed unit to start supply of the liquid from the main tank to the sub tank when the carriage arrives at the main scanning position, and stop the supply when the liquid is supplied at an amount corresponding to a difference detected by the first unit after the first detector detects the displacement member. | 03-07-2013 |
20130127937 | IMAGE FORMING APPARATUS INCLUDING RECORDING HEAD FOR EJECTING LIQUID DROPLETS - An image forming apparatus includes an apparatus body, a recording head, a sub tank, a carriage, a main tank, a liquid feed device, a displacement member, a first detector, a second detector, a detection retainer, a liquid consumption amount measuring device, and a supply controller. The measuring device measures a consumption amount of liquid in the sub tank when the displacement member displaces from a first position in a direction in which the consumption amount of liquid in the sub tank decreases. When a detection output of the first detector continues to be, for a predetermined time or number of times, in a detection state in which the first detector detects the displacement member and shifts from the detection state to a non detection state in which the first detector does not detect the displacement member, the measuring device starts measuring the consumption amount of liquid in the sub tank. | 05-23-2013 |
20130135368 | IMAGE FORMING APPARATUS - In an image forming apparatus, a first detection part and a second detection part, each for detecting a position of a displacement member that changes its position according to a remaining amount of liquid in a sub-tank, are provided to a carriage carrying the sub-tank and a recording head, and a body of the image forming apparatus, respectively. A first position is a position of the displacement member detected by the first detection part such that the remaining amount of liquid in the sub-tank is smaller than that at a second position detected by the second detection part. The liquid is supplied to the sub-tank of a differential supply amount, corresponding to a displacement amount of the displacement member between a position detected by the first detection part and a position detected by the second detection part, after the first detection part detects the displacement member. | 05-30-2013 |
20130135401 | IMAGE FORMING APPARATUS - In an image forming apparatus, a liquid supply control processor controls to detect and store a difference amount corresponding to a displacement amount of a displacing member between a position detected by a first sensor and another position detected by a second sensor: measure a consumed liquid amount; start the liquid supply upon the consumed liquid amount reaching a predetermined threshold so as to supply the difference amount after the first sensor has detected the displacing member; and stop the liquid supply when the first sensor does not detect the displacing member before a preset predetermined time has passed. The control processor controls the image forming apparatus such that, when the liquid supply is performed without using the second sensor, using a first and second predetermined threshold times and the first threshold time is set longer than the second threshold time. | 05-30-2013 |
20130147867 | IMAGE FORMING APPARATUS INCLUDING RECORDING HEAD AND HEAD TANK - An image forming apparatus includes an apparatus body, a recording head, a head tank, a carriage, a main tank, a liquid feed device, a supply controller, a displacement member, a first detector, and a second detector. When a consumption amount of liquid in the head tank reaches a threshold value, the controller controls the feed device to start supplying the liquid from the main tank to the head tank. When printing operation is not performed and the displacement member is at a position at which a remaining amount of the liquid in the head tank is smaller than when the displacement member is at a first position, the controller controls the feed device to supply the liquid until the displacement member is placed at the first position or a position at which the remaining amount of the liquid is greater than when the displacement member is at the first position. | 06-13-2013 |
20150158308 | IMAGE FORMING APPARATUS - An image forming apparatus includes an apparatus body; a printhead to discharge droplets; a sub tank to hold a liquid to be supplied to the printhead for discharge as droplets; a movable carriage for scanning, including the printhead and the sub tank; a main tank to contain the liquid to be supplied to the sub tank; a liquid supply pump, disposed on the carriage, to supply the liquid from the main tank to the sub tank; a first liquid supply tube that connects the main tank to the liquid supply pump; and a second liquid supply tube that connects the liquid supply pump to the sub tank. A fluid resistance of the first liquid supply tube is greater than a fluid resistance of the second liquid supply tube. The liquid supply pump includes a deformable portion that shrinks and expands in a carriage scanning direction, by scanning movement of the carriage, to take the liquid in and pump the liquid out, and the volume of liquid supplied to the sub tank being greater than the volume of liquid supplied to the main tank when the liquid supply pump supplies the liquid to the sub tank. | 06-11-2015 |
Patent application number | Description | Published |
20100076165 | EQUIPMENT AND METHOD FOR PRODUCING POLYHYDROXYCARBOXYLIC ACID - This invention provides an equipment and a method for producing polyhydroxycarboxylic acid whereby the yield of a starting material in the process can be improved. | 03-25-2010 |
20110160447 | METHOD FOR SYNTHESIZING ACROLEIN - An object of the present invention is to provide a method for commercially manufacturing acrolein in a large flow rate by making supercritical water and an acid interact with glycerin, wherein by efficiently mixing high-concentration glycerin and supercritical water with each other, the method is made capable of making the synthesis stably proceed with a high yield while the occlusion and abrasion of the pipes and devices due to the generation of by-products are being suppressed. The method for synthesizing acrolein of the present invention is a method for synthesizing acrolein by making supercritical water and an acid interact with glycerin, the method using a reaction apparatus including: a cylindrical mixing flow path for mixing a fluid including glycerin and a fluid including supercritical water with each other; a first inlet flow path, disposed offset from the central axis of the mixing flow path, for making the fluid including glycerin flow into the mixing flow path; and a second inlet flow path, disposed offset from the central axis of the mixing flow path, for making the fluid including supercritical water flow into the mixing flow path, wherein the first inlet flow path and the second inlet flow path are each provided in a plurality of numbers in such a way that the first inlet flow paths and the second inlet flow paths are alternately arranged so as to encircle the central axis of the mixing flow path. | 06-30-2011 |
20110171082 | REACTOR AND REACTION PLANT - In order to provide, when a plurality of fluids each containing a different kind of substance are mixed and reacted, a reactor having a mixing channel capable of forming a multi-layered flow in a radial direction in the cylindrically-shaped mixing channel; improving mixing performance by synergizing swirling effects of mixture of turbulent flows and a swirling flow; and producing a reaction product with a high yield as well as high efficiency, a mixing channel | 07-14-2011 |
20110269934 | PRODUCTION METHOD AND APPARATUS FOR POLYTRIMETHYLENE TEREPHTHALATE - An object of the present invention is to provide a reasonable polycondensation step by which an appropriate molecular weight can be obtained and material decomposition associated with thermolysis can be suppressed, so as to contribute to production technology for PTT polymers. The production method for polytrimethylene terephthalate comprises an esterification step and a polycondensation step, wherein the polycondensation step is divided into multiple stages, polycondensation is performed using a polymerization vessel having a twin-shaft agitator in the final stage of the polycondensation step, and the polymerization temperature during the subsequent stage of the polycondensation step is less than the polymerization temperature during the former stage of the polycondensation step. | 11-03-2011 |
20110319667 | REACTION PROCESS UTILIZING CRITICAL - In order to perform organic synthesis process through action with supercritical water and acid stably while suppressing a trouble caused by a by-product, a method and an apparatus are provided, including the following steps. Water is supplied to high-pressure pumps ( | 12-29-2011 |
20120095269 | METHOD AND DEVICE FOR SYNTHESIZING ACROLEIN - An object of the present invention is to provide an industrially applicable method for producing acrolein via treatment with supercritical water from glycerin obtained as a by-product during the process of biodiesel fuel production from waste animal/plant fat or oil with the use of an alkali catalyst. | 04-19-2012 |
20120116100 | SYSTEM AND METHOD FOR PRODUCING POLYHYDROXYCARBOXYLIC ACID - An object of the present invention is to provide a method and a system by which hydroxycarboxylic acid cyclic dimers are efficiently generated, allowing high yields of high-quality polyhydroxycarboxylic acid to be obtained. The method for synthesizing polyhydroxycarboxylic acid comprises a depolymerization step for depolymerizing hydroxycarboxylic acid oligomers to produce hydroxycarboxylic acid cyclic dimers, wherein, in the depolymerization step, a reaction solution is heated via heat transfer from a heat medium passage under reduced pressure while the reaction solution is being flowing through a horizontally provided reaction solution passage. | 05-10-2012 |
20120202962 | DEVICE AND METHOD FOR PRODUCING POLYBUTYLENE SUCCINATE - A device and a method for producing high-quality polybutylene succinate are provided. The method for producing polybutylene succinate comprises the steps of: preparing a raw-material slurry by mixing succinic acid or a derivative thereof with 1,4-butanediol in a raw-material slurry preparation tank; storing the raw-material slurry in a raw-material slurry storage tank while maintaining flowability; carrying out an esterification reaction of the raw-material slurry in an esterification reactor; and synthesizing polybutylene succinate with a polycondensation reaction of the ester in a polycondensation reactor, in which the polycondensation reactor is divided, from the upstream side, into at least an initial polycondensation reactor, an intermediate polycondensation reactor, and a final polycondensation reactor, a catalyst is added in an amount from 1000 ppm to 3000 ppm in relation to succinic acid or a derivative thereof, the reaction time in the intermediate polycondensation reactor ranges from 0.25 hours to 0.75 hours, and the reaction temperature in the final polycondensation reactor ranges from 245° C. to 255° C. | 08-09-2012 |
20120215012 | PROCESS AND SYSTEM FOR PURIFICATION OF TETRAHYDROFURAN - A method for purifying tetrahydrofuran from a liquid containing tetrahydrofuran and as impurities at least water, 2,5-dihydrofuran and butanol, the method comprising: a first distillation step in which the liquid is subjected to distillation using a distillation column to separate into a first bottoms product containing water as a major component and a first distillate containing tetrahydrofuran, 2,5-dihydrofuran and butanol as major components, a second distillation step in which the first distillate is subjected to distillation using a distillation column to separate into a second bottoms product containing tetrahydrofuran and butanol as major components and a second distillate containing 2,5-dihydrofuran as a major component, a third distillation step in which the second bottoms product is subjected to distillation using a distillation column to separate into a third bottoms product containing butanol as a major component and a third distillate containing tetrahydrofuran as a major component, and further comprising a recirculation step in which a part of the second top liquid is recirculated into the first distillation step as a recirculation liquid and the remaining part is discharged into the outside of the system. | 08-23-2012 |
20120255852 | REACTION PROCESS USING SUPERCRITICAL WATER - When obtaining a target substance by gradually cooling the reaction liquid by cooling in a plurality of stages divided in series, and then distilling the cooled reaction liquid by distillation in a plurality of stages divided in series, this method and this apparatus include: circulating a heating medium to be used for cooling in the plurality of the stages by way of; sequentially passing the heating medium toward the most upstream cooling stage from the most downstream cooling stage of the reaction liquid; cooling the heating medium which has been discharged from the most upstream cooling stage by using the heating medium for keeping or raising the temperature of the liquid which has been discharged from the distillation in the plurality of the stages; and returning the cooled heating medium back to the most downstream cooling stage of the reaction liquid. | 10-11-2012 |
20120310016 | PROCESS FOR SYNTHESIS OF ACROLEIN - An object of the present invention is to provide a technology which can suppress the blockage and abrasion of pipes and devices caused by the production of by-products and stably synthesize acrolein at a high yield, under a condition in which energy efficiency is improved by an elevated concentration of glycerol in a reaction liquid, in a process for synthesis of acrolein by reacting supercritical water and an acid with glycerol. An embodiment of the present invention includes: setting a concentration of glycerol in the reaction liquid at 30% by weight or lower; also cooling the reaction liquid to a temperature between a temperature (300° C. or lower) at which the reaction stops and a temperature (100° C. or higher) at which tar contained in the reaction liquid can keep a state in which its viscosity is sufficiently low; then separating and removing carbon particles from the reaction liquid; subsequently cooling the reaction liquid to a temperature which is a boiling point of water or lower and at which the tar component in the reaction liquid does not adhere to devices; and then decompressing the cooled reaction liquid. | 12-06-2012 |
20130338382 | REACTION APPARATUS AND METHOD USING SUPERCRITICAL WATER OR SUBCRITICAL WATER - In a method and apparatus for producing a useful substance by allowing a fluid containing a biomass raw material to act on a supercritical water and/or subcritical water, the fluid containing a biomass raw material in a high concentration is efficiently mixed with the supercritical water and/or subcritical water, whereby the amount of tar and carbon particles produced as by-products is decreased and blockage and abrasion of a pipe and an equipment is suppressed, or it is possible to easily remove the by-products. | 12-19-2013 |
Patent application number | Description | Published |
20080239275 | Substrate holding apparatus, exposure apparatus, exposing method, and device fabricating method - The some aspects of the present invention provides a substrate holding apparatus that comprises: a base part; a support part that is formed on the base part and supports a rear surface of the substrate; a first circumferential wall that: is formed on the base part; has a first upper surface that opposes the rear surface of the substrate, which is supported by the support part; and surrounds a first space that is between the substrate, which is supported by the support part, and the base part; a second circumferential wall that: is formed on the base part; has a second upper surface that opposes the rear surface of the substrate, which is supported by the support part, with a gap interposed therebetween; and surrounds the first circumferential wall; a third circumferential wall that: is formed on the base part; has a third upper sure that opposes the rear surface of the substrate, which is supported by the support part; and surrounds the support part and the second circumferential wall; a fluid flow port that is capable of supplying gas to a second space that is between the first circumferential wall and the second circumferential wall; and a first suction port that suctions fluid from a third space that is between the second circumferential wall and the third circumferential wall. | 10-02-2008 |
20080246931 | Substrate processing method, exposure apparatus, and method for producing device - An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate. | 10-09-2008 |
20090109413 | Maintenance method, exposure method and apparatus, and device manufacturing method - A maintenance method for performing maintenance of an exposure apparatus including a liquid immersion space-forming member which forms a liquid-immersion area by supplying liquid in a space between an optical member and a substrate; a liquid supply mechanism which supplies the liquid to the liquid-immersion space; a substrate stage which moves the substrate; and a measuring stage on which a reference mark is formed. To clean the liquid-immersion space-forming member, a cleaning liquid is supplied to a space between the measuring stage and the liquid-immersion space-forming member. The exposure apparatus is provided with various types of cleaning mechanisms for cleaning the liquid-immersion space-forming member. The liquid-immersion exposure can be performed while efficiently performing maintenance of the exposure apparatus. | 04-30-2009 |
20110222037 | Exposure apparatus, exposure method, and device manufacturing method - An exposure apparatus comprises a liquid immersion system, a first mover, and a prescribed member. The exposure apparatus exposes a substrate via an optical member and a liquid. The liquid immersion system performs supply and recovery of the liquid. The first mover can move in a first area, and can hold the liquid between itself and the optical member. The prescribed member is removed from the first mover when the first mover withdraws from a position opposing the optical member, and can hold the liquid between itself and the optical member. | 09-15-2011 |
20120008112 | Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid - An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate. | 01-12-2012 |
20140111783 | EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR PRODUCING DEVICE - An exposure apparatus includes a nozzle member which has at least one of a supply port for supplying a liquid and a recovery port for recovering the liquid, and a nozzle adjusting mechanism which adjusts at least one of a position and a posture of the nozzle member depending on a position or a posture of a substrate. The exposure apparatus forms an immersion area of the liquid on the substrate, and performs exposure for the substrate through the liquid in the immersion area. Accordingly, the liquid is satisfactorily retained between the projection optical system and the substrate, thereby making it possible to realize the exposure highly accurately. | 04-24-2014 |
Patent application number | Description | Published |
20110057600 | STEPPING MOTOR DRIVING APPARATUS - A motor driving apparatus for constant-current control of a current of a coil of a motor, including: a detector detecting the current; and a controller for controlling every first cycle to feed the coil until the current reaches a target value, and to decay the current after the current reaches the target value, wherein the controller selects, every second cycle shorter than the first cycle, between decaying the current in a first mode, and decaying the current in a second mode of which a decay rate is lower than the first mode, and wherein the controller decays the current in the first mode when the current is equal to or higher than a predetermined threshold, and decays the current in the second mode when the current is lower than the predetermined threshold. | 03-10-2011 |
20110116823 | POWER SUPPLY DEVICE, HEATING UNIT USING SAME, AND IMAGE FORMING APPARATUS USING SAID HEATING UNIT - The invention reduces loss produced when a power supply device supplies power to a fixing unit of a copier, thereby contributing to a reduction in size, a saving in terms of energy and lower cost. To achieve this, it is arranged so that it is possible to vary the capacitance of a resonant capacitor C | 05-19-2011 |
20120085744 | HEATING DEVICE CAPABLE OF ACCURATELY DETERMINING CHANGE IN STATE, AND IMAGE FORMING APPARATUS - A heating device capable of accurately determining a change in the state of a to-be-heated member, caused in a narrow area. An induction heating coil generates magnetic flux by flow of electric current therethrough. The fixing belt generates heat by the action of the magnetic flux generated by the induction heating coil. A first antenna is disposed at a location where the magnetic flux generated by the induction heating coil can be detected assuming that there is no fixing belt. A second antenna is disposed such that at least some area of the second antenna overlaps the first antenna. A control circuit determines whether or not a state of the fixing belt has changed, based on a result of detection by the first antenna and a result of detection by the second antenna. | 04-12-2012 |
20120087681 | HEATING DEVICE HAVING HIGH DEGREE OF FREEDOM IN DESIGN, AND IMAGE FORMING APPARATUS - A heating device and an image forming apparatus which make it possible to improve the degree of freedom in design to enhance the accuracy of detecting the state of a to-be-heated member, and easily reduce cost. An induction heating coil generates magnetic flux by flow of electric current therethrough. Ferrite cores formed of a magnetic material form magnetic paths. The fixing belt generates heat by the action of the magnetic flux generated by the induction heating coil | 04-12-2012 |
20130017006 | IMAGE FORMING APPARATUS THAT APPLIES NECESSARY AMOUNT OF LUBRICANT TO IMAGE BEARING MEMBERAANM Suda; TakeyukiAACI Toride-shiAACO JPAAGP Suda; Takeyuki Toride-shi JP - An image forming apparatus configured to apply a necessary amount of a lubricant to an image bearing member while preventing the lubricant from being excessively consumed. An intermediate transfer belt drive motor controlled by a PID controller drives an intermediate transfer belt. A brush rotation controller for controlling an application brush drive motor detects fluctuation in a frictional force between a cleaning blade and the intermediate transfer belt, and controls the application brush drive motor such that an amount of lubricant to be applied is an amount corresponding to the detected fluctuation in the frictional force. | 01-17-2013 |
20130187329 | IMAGE FORMING APPARATUS - To simplify control of a sheet feeing/conveying system while preventing a step-out phenomenon, saving power, and reducing cost, provided is an image forming apparatus which detects a load angle of a motor (M | 07-25-2013 |
20130187332 | IMAGE FORMING APPARATUS - To simplify control of a sheet feeding/conveying system while preventing a step-out phenomenon and saving power, provided is an image forming apparatus which detects a load angle of a first motor (M | 07-25-2013 |
Patent application number | Description | Published |
20090095013 | Ejector cycle system - An ejector cycle system with a refrigerant cycle through which refrigerant flows includes an ejector disposed downstream of a radiator, a first evaporator located to evaporate refrigerant flowing out of the ejector, a branch passage branched from a branch portion between the radiator and a nozzle portion of the ejector and coupled to a refrigerant suction port of the ejector, a throttling unit located in the branch passage, and a second evaporator located downstream of the throttling unit to evaporate refrigerant. In the ejector cycle system, a variable throttling device is located in a refrigerant passage between a refrigerant outlet of the radiator and the branch portion to decompress the refrigerant flowing out of the radiator. | 04-16-2009 |
20100319393 | Ejector cycle system - An ejector cycle system with a refrigerant cycle through which refrigerant flows includes an ejector disposed downstream of a radiator, a first evaporator that evaporates refrigerant flowing out of the ejector, a throttling unit located in a branch passage and depressurizes refrigerant to adjust a flow rate of refrigerant, and a second evaporator located downstream of the throttling unit. In the ejector cycle system, a flow ratio adjusting means adjusts a flow ratio between a first refrigerant flow amount depressurized and expanded in a nozzle portion of the ejector and a second refrigerant flow amount drawn into a refrigerant suction port of the ejector, based on a physical quantity related to at least one of a state of refrigerant in the refrigerant cycle, a temperature of a space to be cooled by the first and second evaporators, and an ambient temperature of the space. | 12-23-2010 |
Patent application number | Description | Published |
20120258388 | SURFACE TREATMENT METHOD FOR A MASK BLANK, METHOD OF MANUFACTURING A MASK BLANK, AND METHOD OF MANUFACTURING A MASK - Provided is a mask blank surface treatment method for surface-treating, using a treatment liquid, a surface of a thin film, to be formed into a transfer pattern, of a mask blank having the thin film on a substrate. The thin film is made of a material that can be etched by ion-based dry etching. The concentration of an etching inhibitor contained in the treatment liquid is 0.3 ppb or less. | 10-11-2012 |
20120276474 | METHOD OF CLEANING SUBSTRATE - The present invention is a method of cleaning a substrate, comprising cleaning at least one surface of a substrate located in a liquid by injecting pressurized cleaning liquid containing bubbles or cleaning particles from a injection nozzle to at least one surface of the substrate. | 11-01-2012 |
20130177841 | MASK BLANK, METHOD OF MANUFACTURING THE SAME, AND TRANSFER MASK - Provided is a mask blank that is improved in adhesion of a thin film for forming a transfer pattern to a resist, thus capable of suppressing the occurrence of collapse, chipping, or the like of a formed resist pattern. The mask blank has, on a transparent substrate | 07-11-2013 |
20140230848 | METHOD OF CLEANING SUBSTRATE - The present invention is a method of cleaning a substrate, comprising cleaning at least one surface of a substrate located in a liquid by injecting pressurized cleaning liquid containing bubbles or cleaning particles from a injection nozzle to at least one surface of the substrate. | 08-21-2014 |
Patent application number | Description | Published |
20090155698 | PHOTOMASK BLANK AND PRODUCTION METHOD THEREOF, AND PHOTOMASK PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE PRODUCTION METHOD - There are provided a photomask blank which is capable of preventing static buildup caused by electron beam pattern drawing for forming a resist pattern, a photomask blank which provides a good pattern accuracy through optimization of the dry etching rate along the depth direction of the shielding film, and a photomask blank which is capable of reducing the dry etching time by increasing the dry etching rate of the shielding film. | 06-18-2009 |
20090233182 | PHOTOMASK BLANK AND METHOD OF PRODUCING THE SAME, METHOD OF PRODUCING PHOTOMASK, AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE - It is provided a photomask blank that has good flatness when a light-shielding film is patterned and hence can provide a good mask pattern accuracy and a good pattern transfer accuracy, and a method of producing a photomask. | 09-17-2009 |
20120129084 | PHOTOMASK BLANK AND PRODUCTION METHOD THEREOF, AND PHOTOMASK PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE PRODUCTION METHOD - A photomask blank which is capable of preventing static buildup caused by electron beam pattern drawing for forming a resist pattern. The photomask blank provides a good pattern accuracy through optimization of the dry etching rate along the depth direction of the shielding film, and is capable of reducing the dry etching time by increasing the dry etching rate of the shielding film. The photomask blank includes a translucent substrate having thereon a shielding film composed mainly of chromium and the shielding film contains hydrogen. The shielding film is formed in such a manner that the film formation rate of the layer at the surface side is lower than the film formation rate of the layer at the translucent substrate side of the shielding film. The dry etching rate of the shielding film is lower at the translucent substrate side than at the surface side. | 05-24-2012 |
20150079502 | MASK BLANK AND METHOD OF MANUFACTURING A TRANSFER MASK - Provided is a mask blank having a structure including a thin film on a substrate, wherein the thin film is made of a material containing one or more elements selected from tantalum, tungsten, zirconium, hafnium, vanadium, niobium, nickel, titanium, palladium, molybdenum, and silicon, and wherein the normalized secondary ion intensity of at least one or more ions selected from a calcium ion, a magnesium ion, and an aluminum ion is 1.0×10 | 03-19-2015 |
20150111134 | MASK BLANK AND METHOD OF MANUFACTURING A TRANSFER MASK - Provided is a mask blank having a structure including a thin film on a substrate, wherein the thin film is made of a material containing one or more elements selected from tantalum, tungsten, zirconium, hafnium, vanadium, niobium, nickel, titanium, palladium, molybdenum, and silicon, and wherein the normalized secondary ion intensity of at least one or more ions selected from a calcium fluoride ion, a magnesium fluoride ion, an aluminum fluoride ion, a calcium chloride ion, and a magnesium chloride ion is 2.0×10 | 04-23-2015 |
Patent application number | Description | Published |
20110129141 | CIRCUIT PATTERN EXAMINING APPARATUS AND CIRCUIT PATTERN EXAMINING METHOD - Provided is an examination technique to detect defects with high sensitivity at an outer-most repeative portion of a memory mat of a semiconductor device and even in a peripheral circuit having no repetitiveness. | 06-02-2011 |
20110298915 | PATTERN INSPECTING APPARATUS AND PATTERN INSPECTING METHOD - In conventional methods, efficient analyses with respect to detected defects were not given consideration. A detected image is matched against pre-obtained partial images of a normal part and a defect part to determine a defect in the detected image. Then, the partial images and the detected image are synthesized to generate a review image in which the identifiability of the detected image is improved. Thus, the operator is able to readily make a determination with respect to the detected defect. | 12-08-2011 |
20120045115 | DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD - Although there is a method for optimizing a threshold for each of regions to be inspected of an acquired detected image, only a single threshold is applied to a single detected image. Thus, when being included in a single image, an insignificant defect is detected at the same sensitivity level as that for a significant defect. The invention proposes a mechanism in which multiple sensitivity regions are set in a single inspection region, and thereby a defect only in a region where a DOI (Defect of interesting) is present in the single inspection region can be detected while being discriminated from the other ones. Specifically, the multiple sensitivity regions are set based on features of an image in the inspection region, and set sensitivities for the respective sensitivity regions are applied to a detected image, a difference image or a determination threshold for a defect determination unit. | 02-23-2012 |