Schreel
Koenraad Remi André Maria Schreel, Veldhoven NL
Patent application number | Description | Published |
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20100233599 | Lithographic Apparatus and Device Manufacturing Method - A lithographic system includes a monitored lithographic projection apparatus arranged to project a patterned beam onto a substrate. A scatterometer measures a plurality of parameters of the pattern transferred to the substrate including at least one CD-profile parameter and at least one further parameter of the pattern transferred to the substrate which is indicative of a machine setting of the monitored lithographic projection apparatus. A matching system includes a database storing information representative of reference CD values and reference values for the further feature. A comparison arrangement compares the measured values with the corresponding stored values, a lithographic parameter calculation means calculating a corrected set of machine settings for the monitored lithographic apparatus dependent on the differences between the measured and reference values. | 09-16-2010 |
20120300182 | Lithographic Apparatus and Device Manufacturing Method - A lithographic system includes a monitored lithographic projection apparatus arranged to project a patterned beam onto a substrate. A scatterometer measures a plurality of parameters of the pattern transferred to the substrate including at least one CD-profile parameter and at least one further parameter of the pattern transferred to the substrate which is indicative of a machine setting of the monitored lithographic projection apparatus. A matching system includes a database storing information representative of reference CD values and reference values for the further feature. A comparison arrangement compares the measured values with the corresponding stored values, a lithographic parameter calculation means calculating a corrected set of machine settings for the monitored lithographic apparatus dependent on the differences between the measured and reference values. | 11-29-2012 |
Koenraad Remi André Maria Schreel, Veldhoven NL
Patent application number | Description | Published |
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20100233599 | Lithographic Apparatus and Device Manufacturing Method - A lithographic system includes a monitored lithographic projection apparatus arranged to project a patterned beam onto a substrate. A scatterometer measures a plurality of parameters of the pattern transferred to the substrate including at least one CD-profile parameter and at least one further parameter of the pattern transferred to the substrate which is indicative of a machine setting of the monitored lithographic projection apparatus. A matching system includes a database storing information representative of reference CD values and reference values for the further feature. A comparison arrangement compares the measured values with the corresponding stored values, a lithographic parameter calculation means calculating a corrected set of machine settings for the monitored lithographic apparatus dependent on the differences between the measured and reference values. | 09-16-2010 |
20120300182 | Lithographic Apparatus and Device Manufacturing Method - A lithographic system includes a monitored lithographic projection apparatus arranged to project a patterned beam onto a substrate. A scatterometer measures a plurality of parameters of the pattern transferred to the substrate including at least one CD-profile parameter and at least one further parameter of the pattern transferred to the substrate which is indicative of a machine setting of the monitored lithographic projection apparatus. A matching system includes a database storing information representative of reference CD values and reference values for the further feature. A comparison arrangement compares the measured values with the corresponding stored values, a lithographic parameter calculation means calculating a corrected set of machine settings for the monitored lithographic apparatus dependent on the differences between the measured and reference values. | 11-29-2012 |
Ludo Valere Maurice Schreel, Maldegem-Donk BE
Patent application number | Description | Published |
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20090261756 | METHOD OF SHUTTING DOWN A HIGH PRESSURE DISCHARGE LAMP AND DRIVING UNIT FOR DRIVING A HIGH PRESSURE DISCHARGE LAMP - The invention describes a method of shutting down a high pressure discharge lamp ( | 10-22-2009 |
20130194553 | METHOD OF COOLING A LAMP - The invention describes a method of cooling a lamp ( | 08-01-2013 |
Ludo Valère Maurice Schreel, Maldegem-Donk BE
Patent application number | Description | Published |
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20130194553 | METHOD OF COOLING A LAMP - The invention describes a method of cooling a lamp ( | 08-01-2013 |