Masayasu Suzuki
Masayasu Suzuki, Tokyo JP
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20110049797 | SHEET STACKING APPARATUS - A banknote stacking apparatus includes a banknote stacking plate | 03-03-2011 |
Masayasu Suzuki, Kyoto-Shi JP
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20110000529 | Cathode Electrode for Plasma CVD and Plasma CVD Apparatus - An arrangement of a cathode electrode for plasma CVD forms a radio frequency capacity coupled plasma by applying radio frequency radiation, in which the cathode electrode is disposed so as to face an anode electrode. The facing surface which faces the anode electrode is formed to have a concavo-convex shape comprising concaves constituted by a bottom surface and convexes constituted by a plurality of protrusions protruding toward the anode electrode from the bottom surface constituting the concaves. At least one of the protrusions forming the convexes has at least one reactive gas ejection nozzle on a side surface, which is capable of ejecting a reactive gas. An ejection direction of the reactive gas from the reactive gas ejection nozzle is substantially parallel to the bottom surface constituting the concaves. The optimization of the cathode electrode allows generation of dense plasma. | 01-06-2011 |
Masayasu Suzuki, Kyoto JP
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20090232715 | SURFACE WAVE EXCITATION PLASMA PROCESSING SYSTEM - To sustain uniform generation of plasma constantly over a large area. In the surface wave excitation plasma processing device, a plasma source includes: a microwave generator, a microwave waveguide and a dielectric block; and a plasma source also includes: a microwave generator, a microwave waveguide and a dielectric block. The lid of a chamber is fixed onto the microwave waveguides in parallel, and the dielectric blocks disposed in the chamber. A reflecting plate is disposed between the dielectric blocks so that electromagnetic waves propagating through the dielectric blocks are prevented from advancing into the counterpart dielectric blocks as reflected waves. Consequently, the plasma sources are controlled independently. Furthermore, a side reflector is disposed at outer circumference of each of the dielectric blocks so that a standing waves of the electromagnetic waves propagating through the dielectric blocks is formed thus forming a large area standing wave mode of surface waves uniformly. | 09-17-2009 |
20100285629 | METHOD FOR PLASMA DEPOSITION AND PLASMA CVD SYSTEM - In a film-forming process with a capacitively-coupled plasma (CCP) chemical vapor deposition (CVD) device, pulse control is performed on a low-frequency radio-frequency power source. During the pulse control, an ON time and an OFF time form one period. Furthermore, in the pulse control, a time interval between a time period from the moment that the electric power supply is stopped till the electron density decreases to a residual plasma threshold capable of causing an arc discharge and a time period from the moment that the electric power supply is stopped till the density of high-temperature electrons decreases to a specific plasma state serves as the OFF time; a saturation time during the rising process of the density of the high-temperature electrons in the plasma after the electric power supply is started serves as an upper limit of the ON time; and electric power is intermittently supplied under the above conditions. | 11-11-2010 |
Masayasu Suzuki, Kanagawa JP
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20100228426 | PARKING ASSISTANT AND PARKING ASSISTING METHOD - A parking assistant includes: shooting part shooting surroundings; parking target position setter setting parking target position in surroundings image by shooting part; rearward movement starting position calculator calculating rearward movement starting position based on: target position by position setter, and vehicle's movable area, rearward movement starting position denoting position stopping vehicle and starting rearward movement of vehicle, to park vehicle in target position; movement calculator sensing movement direction and movement amount of vehicle; and image generator superposing an information image on surroundings image based on movement direction and amount which are sensed with movement calculator. Information image denotes rearward movement starting position for allowing vehicle to be parked in target position. According to vehicle's movement, image generator generates, with different displays, following sub-positions of rearward movement starting position: first sub-position allowing vehicle to move to target position, and second sub-position failing to allow vehicle to be parked in target position. | 09-09-2010 |
20100238051 | PARKING ASSISTANT AND PARKING ASSISTING METHOD - When a parking assistant assists a driver in carrying out a parking operation, the parking assistant takes an image of vehicle surroundings to generate vehicle surroundings images, converts coordinates of the vehicle surroundings images to generate an overhead view image, and sets a parking target area in the overhead view image. On the overhead view image, the parking assistant superposes a parking target area image which denotes the parking target area. Thereby, the parking assistant generates the parking target area image denoting a partial area in the parking target area, where a solid object is not present in the partial area even when another vehicle included in the overhead view image falls in the set parking target area image. Then, the parking assistant displays the overhead view image and the parking target area image. | 09-23-2010 |
Masayasu Suzuki, Toyama JP
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20100123273 | MICROPRODUCT, MEDICAL MICROPRODUCT, MMICROWELL ARRAY CHIP, MICROWELL POSITION DETECTION PLATE, AND MICRO RESIN PIPETTE TIP USING THE MICROPRODUCT - A method of producing a microproduct comprises: providing a resin composition including 30 to 90 wt % of a polypropylene-based resin and 10 to 70 wt % of a hydrogenated derivative of a block copolymer shown by “X-Y” (X represents a polymer block immiscible with the polypropylene-based resin, Y represents an elastomeric polymer block of a conjugated diene that's miscible with the polypropylene-based resin after hydrogenation); attaching a silicon stamper to a mold cavity of an injection molding machine, the silicon stamper having micromachined features formed by etching the surface of a silicon plate; and precisely transferring the micromachined features of the silicon stamper to the resin composition by injecting the resin composition into the mold cavity, a resulting molded surface having recesses and/or protrusions that are 0.3 to 200 μm deep or tall and 0.3 to 100 μm wide. | 05-20-2010 |
Masayasu Suzuki, Kawasaki-Shi, Kanagawa-Ken JP
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20090257659 | VEHICLE CIRCUMFERENTIAL IMAGE PROVIDING DEVICE AND VEHICLE CIRCUMFERENTIAL IMAGE PROVIDING METHOD - In a vehicle circumferential image providing device | 10-15-2009 |
Masayasu Suzuki, Toyama-Shi JP
Masayasu Suzuki, Hadano-Shi JP
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20090004887 | APPARATUS AND METHOD FOR DEPOSITION OF PROTECTIVE FILM FOR ORGANIC ELECTROLUMINESCENCE - In a film deposition apparatus which deposition a film through SWP-CVD, a substrate holder on which a substrate is to be placed is provided with cooling means, thereby inhibiting occurrence of an increase in the temperature of the substrate, which would otherwise be caused during deposition of a film. A coolant passage is formed in the substrate holder, and coolant delivered from a chiller is circulated through the coolant passage, thereby cooling the substrate holder. Further, grooves are formed in the surface of a cooling holder where a substrate is to be placed, and the substrate is cooled by a helium gas by causing the helium gas to flow through the grooves. | 01-01-2009 |
Masayasu Suzuki, Kanagawa-Pref JP
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20110262679 | GAS BARRIER FILM AND ORGANNIC DEVICE USING THE SAME - A SiNx film as a barrier film is provided. The film is formed at a low process temperature, has a high water vapor barrier performance and a high light transmittance, and is useful for sealing of a substrate formed by a flexible organic material, such as a plastic substrate. A barrier film is formed by silicon nitride (SiNx) having an atom ratio [N/(Si+N)] indicating a ratio of nitrogen N to silicon Si in the range of 0.60 to 0.65, by using a surface wave plasma chemical vapor deposition (CVD) device. | 10-27-2011 |
Masayasu Suzuki, Atsugi-Shi JP
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20120064260 | SURFACE WAVE PLASMA CVD APPARATUS AND FILM FORMING METHOD - A surface wave plasma CVD apparatus includes a waveguide connected to a microwave source with slot antennae; a dielectric member that introduces microwaves from slot antennae into a plasma processing chamber to generate surface wave plasma; a moving device that reciprocatory moves a subject of film formation such that the subject passes a film formation processing region facing the dielectric member; a control device that controls the reciprocatory movement of the subject of film formation by the moving device depending on film forming conditions to perform film formation on the subject; and gas ejection parts provided in parallel in a direction at right angles to a direction along which the subject is moved at predetermined positions between the subject that passes through the film formation processing region and the dielectric member. Each of the gas ejection parts has a slit extending parallel to the dielectric member. | 03-15-2012 |
20120067281 | SURFACE WAVE PLASMA CVD APPARATUS AND FILM FORMING METHOD - A surface wave plasma CVD apparatus includes a waveguide that is connected to a microwave source and formed of a plurality of slot antennae; a dielectric member that introduces microwaves emitted from the plurality of slot antennae into a plasma processing chamber to generate surface wave plasma; a moving device that reciprocatory moves a substrate-like subject of film formation such that the subject of film formation passes a film formation processing region that faces the dielectric member; and a control device that controls the reciprocatory movement of the subject of film formation by the moving device depending on film forming conditions to perform film formation on the subject of film formation. | 03-22-2012 |
20120148763 | SURFACE WAVE PLASMA CVD APPARATUS AND LAYER FORMATION METHOD - A surface wave plasma CVD apparatus, includes: a waveguide ( | 06-14-2012 |