Patent application number | Description | Published |
20080227420 | Multipoint Voltage and Current Probe System - A metrology system monitors radio frequency (RF) power at a plurality of locations in a circuit. The system includes a plurality of RF sensors that generate respective analog signals based on electrical properties of the RF power, a multiplexing module that generates an output signal based on the analog signals, and an analysis module that generates messages based on the output signal. The messages contain information regarding the electrical properties that are sensed by the plurality of RF sensors. | 09-18-2008 |
20090206822 | Application Of Wideband Sampling For Arc Detection With A Probabilistic Model For Quantitatively Measuring Arc Events - An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc. | 08-20-2009 |
20090207537 | Application Of Wideband Sampling For Arc Detection With A Probabilistic Model For Quantitatively Measuring Arc Events - An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc. | 08-20-2009 |
20090256580 | ORTHOGONAL RADIO FREQUENCY VOLTAGE/CURRENT SENSOR WITH HIGH DYNAMIC RANGE - A radio frequency (RF) sensor that measures RF current includes a substrate that has an inner perimeter that defines an aperture. A conductor extends through the aperture. Sensor pads are arranged on the aperture and are connected to form two sensor loops. The loops generate an electrical signal that represents RF current flow through the center conductor. Additionally, a plurality of circular conductive rings may be included in the RF sensor to generate a signal representing the voltage of the conductor. | 10-15-2009 |
20090315463 | Phase And Frequency Control Of A Radio Frequency Generator From An External Source - Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator. | 12-24-2009 |
20100194195 | Radio Frequency Power Control System - A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1. | 08-05-2010 |
20100201370 | Arc Detection - An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc. | 08-12-2010 |
20120013253 | Phase And Frequency Control Of A Radio Frequency Generator From An External Source - Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator. | 01-19-2012 |
20120013352 | Multipoint Voltage And Current Probe System - A metrology system monitors radio frequency (RF) power at a plurality of locations in a circuit. The system includes a plurality of RF sensors that generate respective analog signals based on electrical properties of the RF power, a multiplexing module that generates an output signal based on the analog signals, and an analysis module that generates messages based on the output signal. The messages contain information regarding the electrical properties that are sensed by the plurality of RF sensors. | 01-19-2012 |
20120099684 | Frequency Interference Detection And Correction - A system for detecting and correcting for spurious frequencies that may coincide in a bandwidth of interest in an RF metrology system. The system can (1) utilize a deterministic scheme to detect an interference by a spurious frequency and correct the distortion effect or (2) utilize a mixed signal processing architecture to avoid the occurrence of spurious frequency contamination. A detection scheme identifies the event of distortion and triggers either (a) a shift in the analog to digital convert sample rate or (b) a mathematical vector manipulation. The shift of the analog to digital convert sample rate moves an aliased image of the spurious frequency outside of the frequency of interest. The mathematical vector correction removes the distortion and restores the signal of interest. | 04-26-2012 |
20130073241 | Application Of Wideband Sampling For Arc Detection With A Probabilistic Model For Quantitatively Measuring Arc Events - An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc. | 03-21-2013 |
20130169359 | Power Distortion-Based Servo Control Systems For Frequency Tuning RF Power Sources - A radio frequency system includes a power amplifier that outputs a radio frequency signal to a matching network via a transmission line between the power amplifier and the matching network. A sensor monitors the radio frequency signal and generates first sensor signals based on the radio frequency signal. A distortion module determines a first distortion value according to at least one of (i) a sinusoidal function of the first sensor signals and (ii) a cross-correlation function of the first sensor signals. A first correction circuit (i) generates a first impedance tuning value based on the first distortion value and a first predetermined value, and (ii) provides feedforward control of impedance matching performed within the matching network including outputting the first impedance tuning value to one of the power amplifier and the matching network. | 07-04-2013 |
20130222055 | Feedback Control And Coherency Of Multiple Power Supplies In Radio Frequency Power Delivery Systems For Pulsed Mode Schemes in Thin Film Processing - A RF power supply system for delivering periodic RF power to a load. A power amplifier outputs a RF signal to the load. A sensor measures the RF signal provided to the load and outputs signals that vary in accordance with the RF signal. A first feedback loop enables control the RF signal based upon power determined in accordance with output from the sensor. A second feedback loop enables control the RF signal based upon energy measured in accordance with signals output from the sensor. Energy amplitude and duration provide control values for varying the RF signal. The control system and techniques are applicable to both pulsed RF power supplies and in various instances to continuous wave power supplies. | 08-29-2013 |
20140028389 | Power Distortion-Based Servo Control Systems for Frequency Tuning RF Power Sources - A radio frequency system includes a power amplifier that outputs a radio frequency signal to a matching network via a transmission line between the power amplifier and the matching network. A sensor monitors the radio frequency signal and generates first sensor signals based on the radio frequency signal. A distortion module determines a first distortion value according to at least one of (i) a sinusoidal function of the first sensor signals and (ii) a cross-correlation function of the first sensor signals. A first correction circuit (i) generates a first impedance tuning value based on the first distortion value and a first predetermined value, and (ii) provides feedforward control of impedance matching performed within the matching network including outputting the first impedance tuning value to one of the power amplifier and the matching network. | 01-30-2014 |
20140049250 | On The Enhancements of Planar Based RF Sensor Technology - A radio frequency sensor system includes a printed circuit board (PCB). The PCB includes a first exterior layer, a second exterior layer, a first interior layer, a second interior layer, and an inner perimeter that defines an aperture through the PCB. The PCB also includes a first loop. The first loop includes a first plurality of sensor pads coupled to a first plurality of vias by a first plurality of traces. The first plurality of sensor pads is arranged on the inner perimeter. The PCB also includes a second loop. The second loop includes a second plurality of sensor pads coupled to a second plurality of vias by a second plurality of traces. The second plurality of sensor pads is arranged on the inner perimeter. A core ring is embedded within the first interior layer proximal to the first plurality of sensor pads, the first plurality of vias, and the first plurality of traces. A center conductor, for carrying RF current, extends through the aperture. The first and second loops generate an electrical signal based on the first and second plurality of sensor pads, the first and second plurality of vias, the first and second plurality of traces, and the core ring. | 02-20-2014 |
20140055034 | Phase And Frequency Control Of A Radio Frequency Generator From An External Source - Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator. | 02-27-2014 |
20140218076 | Synchronization of RF Pulsing With RF Metrology, Processing, and Control - A radio frequency (RF) system is disclosed. The RF system includes an RF sensor, an analog to digital converter (ADC) module, a processing module, and a synchronization module. The RF sensor measures a parameter of an RF output and generates an RF signal based on the parameter. The ADC module converts samples of the RF signal into digital values. The processing module generates processed values based on the digital values. The synchronization module outputs one of the processed values in response to a transition in the RF output. | 08-07-2014 |
20140220913 | Distortion Correction Based Feedforward Control Systems and Methods For Radio Frequency Power Sources - A distortion module includes a first module, at least one module and a correction module. The first module is configured to (i) receive radio frequency signals from radio frequency sensors of a power amplifier, and (ii) generate a distortion signal indicating distortion values for the radio frequency signals. The radio frequency signals are indicative of radio frequency power out of the power amplifier and received by a transmission line. At least one module is configured to estimate a phase of the distortion signal. The phase of the distortion signal is indicative of a phase of the transmission line. The correction module is configured to generate a distortion correction signal based on the phase to correct at least one of the distortion values of the radio frequency signals. | 08-07-2014 |
20140263199 | Pulse Synchronization By Monitoring Power In Another Frequency Band - A radio frequency (RF) power delivery system includes a first RF generator and a second RF generator. The first RF generator operates as a master RF generator, and the second RF generator operates as a slave RF generator. The slave RF generator includes a detector for sensing an electrical characteristic of the RF signal of the slave RF generator. The slave RF generator also includes a detector for sensing an electrical characteristic of the RF signal from the master RF generator. Operation of the slave RF generator is controlled by a host or controller. The host or controller operates the slave RF generator in accordance with electrical properties determined by the second detector. | 09-18-2014 |
20140306754 | Feedback Control And Coherency Of Multiple Power Supplies In Radio Frequency Power Delivery Systems For Pulsed Mode Schemes In Thin Film Processing - A RF power supply system for delivering periodic RF power to a load. A power amplifier outputs a RF signal to the load. A sensor measures the RF signal provided to the load and outputs signals that vary in accordance with the RF signal. A first feedback loop enables control the RF signal based upon power determined in accordance with output from the sensor. A second feedback loop enables control the RF signal based upon energy measured in accordance with signals output from the sensor. Energy amplitude and duration provide control values for varying the RF signal. The control system and techniques are applicable to both pulsed RF power supplies and in various instances to continuous wave power supplies. | 10-16-2014 |
20140320013 | Multiple Radio Frequency Power Supply Control of Frequency and Phase - A system has a first RF generator and a second RF generator. The first RF generator controls the frequency of the second RF generator. The first RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit scales the frequency of the first RF generator to control the frequency of the second RF generator. | 10-30-2014 |