Patent application number | Description | Published |
20100290090 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND PROGRAM - In order to eliminate image deterioration based on the characteristics of an output device upon execution of edge emphasis processing, an image processing apparatus includes a setting unit which sets a print characteristic on the print medium, a region setting unit which sets a region, a brightness value derivation unit which derives brightness values, a first derivative derivation which derives first derivatives of the brightness values, an edge direction determination unit which determines an edge direction of brightness, an emphasis level determination unit which determines an emphasis level of a pixel value based on the first derivatives, and a replacement unit which calculates second derivatives of brightness values and replaces a pixel value of a pixel of interest based on the sign of the second derivative. | 11-18-2010 |
20100302599 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND PROGRAM - In order to provide an edge emphasis technique that can eliminate image deterioration of a digital image, an image processing apparatus includes a region setting unit which sets a region including a pixel of interest, a brightness value derivation unit which derives brightness values of the pixels, a first derivative derivation unit which derives first derivatives of the brightness values derived by the brightness value derivation unit, an edge direction determination unit which determines an edge direction of brightness at a position of the pixel of interest based on the results of the first derivatives, a range determination unit which determines a range, and a replacement unit which replaces the pixel value of the pixel of interest. | 12-02-2010 |
20110135201 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND IMAGE PROCESSING PROGRAM - There is provided an image processing apparatus for applying an adjusting process to an image including multicolor image signals. An image area including a pixel to be processed is extracted, and one representative signal value is generated from signal values corresponding to a plurality of colors of pixels included in the image area (S | 06-09-2011 |
20120268759 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND PROGRAM - In order to eliminate image deterioration based on the characteristics of an output device upon execution of edge emphasis processing, an image processing apparatus includes a setting unit which sets a print characteristic on the print medium, a region setting unit which sets a region, a brightness value derivation unit which derives brightness values, a first derivative derivation which derives first derivatives of the brightness values, an edge direction determination unit which determines an edge direction of brightness, an emphasis level determination unit which determines an emphasis level of a pixel value based on the first derivatives, and a replacement unit which calculates second derivatives of brightness values and replaces a pixel value of a pixel of interest based on the sign of the second derivative. | 10-25-2012 |
Patent application number | Description | Published |
20090316218 | IMAGE PROCESSING APPARATUS AND IMAGE PROCESSING METHOD - An image obtained by reading an original using a reading device is input in units of band images, the input band image is analyzed, and an area corresponding to the original within the band image is detected. A partial image containing the detected area within the band image is stored in a memory, and an image corresponding to the original is cut out from the stored partial image. | 12-24-2009 |
20130022292 | INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND STORAGE MEDIUM STORING PROGRAM - Size information indicating sizes of a plurality of images is acquired from at least one server. Based on the sizes of the plurality of images indicated by the acquired size information, an image having a size corresponding to an output performance of an output device used to output the plurality of images is selected as an image to be output to the output device. | 01-24-2013 |
20140368863 | COMMUNICATION APPARATUS, COMMUNICATION METHOD, AND STORAGE MEDIUM - A communication apparatus is capable of wirelessly communicating with a communication partner apparatus in a peer-to-peer mode. A state of supplying electric power to the communication apparatus is determined, and a group owner intent value indicating the degree of intent to operate as an access point in wireless communication is changed from a default value to a value depending on the state of the supplying electric power. | 12-18-2014 |
20140368874 | COMMUNICATION APPARATUS, COMMUNICATION METHOD AND STORAGE MEDIUM - According to an aspect of the present invention, a communication resource may be saved for wireless communication in peer-to-peer mode. A communication apparatus acquires information regarding a protocol from another communication apparatus and invalidates protocols not to be used based on the information. | 12-18-2014 |
Patent application number | Description | Published |
20110143444 | METHOD OF EVALUATING FEMALE GENITAL CANCER - According to the method of evaluating female genital cancer of the present invention, amino acid concentration data on concentration values of amino acids in blood collected from a subject to be evaluated is measured, and the state of female genital cancer including at least one of cervical cancer, endometrial cancer, and ovarian cancer in the subject is evaluated based on the concentration value of at least one of Thr, Ser, Asn, Gln, Pro, Gly, Ala, Cit, Val, Met, Ile, Leu, Tyr, Phe, His, Trp, Orn, Lys, and Arg contained in the measured amino acid concentration data of the subject. | 06-16-2011 |
Patent application number | Description | Published |
20110164360 | OPTICAL DISC REPRODUCTION APPARATUS - An optical disc reproduction apparatus includes a main body, a display unit, a two-axis hinge, and a battery pack. The two-axis hinge has a joint member to connect the two-axis hinge to the main body. The main body has not only a hinge mounting-housing portion to attach and house the joint member of the two-axis hinge but also a housing recess to house a battery housing of the battery pack on right and left sides of the hinge mounting-housing portion on a back end. The battery pack has a U-shaped recess in a center. The recess is located in a position corresponding to the hinge mounting-housing portion in the main body and has a width larger than that of the hinge mounting-housing portion in a rightward-leftward direction. | 07-07-2011 |
20110164369 | ELECTRONIC APPARATUS - An optical disc reproduction apparatus as an electronic apparatus comprises a display unit mounted on a main body unit via a hinge unit. The main body unit comprises a main body case and a hinge connecting portion provided in a hinge housing portion formed in the main body unit. The hinge housing portion is recessed downward from its periphery in the main body case, and has an opening facing outward from the main body case. A main body-side joint member of the hinge unit is introduced into the hinge housing portion from outside the main body case in a state where upper and lower cases of the main body case are connected to each other (state where the main body unit is already assembled). The main body-side joint member, while housed in the hinge housing portion, is connected to the hinge connecting portion. | 07-07-2011 |
20110209163 | ELECTRONIC APPARATUS - An optical disc reproduction apparatus as an electronic apparatus comprises a display unit which is mounted on a main body unit via a hinge unit, and electrically connected to the main body by electrical wirings. The main body unit comprises a main body case, a hinge connecting portion and a control board which has connectors provided thereon. The hinge connecting portion and the connectors are placed in a housing portion formed in the main body unit, while the housing portion is open facing outward from the main body case. In a state where the main body unit is already assembled, the main body-side joint member of the hinge unit and the electrical wirings are housed into the housing portion to connect the main body-side joint member to the hinge connecting portion, and to connect the electrical wirings to the connectors. This structure increases assembling efficiency of the electronic apparatus. | 08-25-2011 |
20110249542 | Electronic Apparatus - An optical disc reproduction apparatus as electronic apparatus has a display unit mounted via a hinge unit on a main body unit which has a main body case having lower and upper cases for housing a control board and a hinge connecting portion connected to a main body-side joint member of the hinge unit. The hinge connecting portion is formed of a part of the main body case, and has upper and lower connecting members formed of a part of the upper case and a part of the lower case, respectively. The lower connecting member is overlaid on a lower surface of the upper connecting member. The main body-side joint member is attached to the upper connecting member, and connected to both the upper and lower connecting members with hinge mounting screws so as to be connected to the hinge connecting portion. | 10-13-2011 |
20120039031 | Electronic Apparatus - An optical disc reproduction apparatus as electronic apparatus comprises a lock lever for keeping a battery pack attached to a case. The lock lever comprises a lever body and a tongue portion extending from the lever body in a length direction of the lever body. A tongue portion of the lock lever is inserted into the case through an operation opening of the case. The tongue portion is allowed to temporarily escape to a tongue portion escape section of the case, and the entire lever body is housed in the case through the operation opening, so as to assemble the lock lever to the case. This prevents ends of the lever body from being exposed to the operation opening in any position of the lock lever assembled to the case, making it possible to easily assemble the lock lever, and preventing the assembled lock lever from easily falling off. | 02-16-2012 |
Patent application number | Description | Published |
20130210231 | METHOD OF FORMING CONTACT HOLE PATTERN - A method of forming a contact hole pattern, including: a block copolymer layer forming step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate having on a surface thereof a thin film with a hole pattern formed, so as to cover the thin film; a phase separation step in which the layer containing the block copolymer is subjected to phase separation; a selective removing step in which phase of at least one block of the plurality of blocks constituting the block copolymer is removed, wherein hole diameter of the hole pattern formed on the thin film is 0.8 to 3.1 times period of the block copolymer, and in the layer forming step, thickness between upper face of the thin film and surface of the layer containing the block copolymer is 70% or less of thickness of the thin film. | 08-15-2013 |
20130240481 | BLOCK COPOLYMER-CONTAINING COMPOSITION AND METHOD OF REDUCING PATTERN - The present invention relates to a composition including: a component (A) being a block copolymer including a block P | 09-19-2013 |
20130243958 | UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER CONTAINING BLOCK COPOLYMER - An undercoat agent which is used for phase separating a layer including a block copolymer having a plurality of blocks bonded formed on a substrate, wherein the undercoat agent contains a resin component, the resin component includes a structural unit having an aromatic ring and a structural unit having no aromatic ring, and the resin component includes a group which can interact with the substrate and does not include a 3 to 7-membered, ether-containing cyclic group; and a method of forming a pattern of a layer containing a block copolymer, including: a step (1) in which the undercoat agent is applied to a substrate to form a layer containing the undercoat agent; a step (2) in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a surface of the layer containing the undercoat agent, followed by a phase separation of the layer containing the block copolymer; and a step (3) in which a phase containing at least one block of the plurality of blocks constituting the block copolymer is selectively removed. | 09-19-2013 |
20130252179 | UNDERCOAT AGENT AND METHOD OF FORMING PATTERN OF LAYER COMPRISING BLOCK COPOLYMER - A undercoat agent used for performing phase separation of a layer formed on a substrate and containing a block copolymer having a plurality of blocks bonded, wherein the undercoat agent contains a resin component, the resin component is formed from a structural unit having an aromatic ring and a structural unit not having an aromatic ring, and the resin component has a group that can interact with the substrate, and also has a 3 to 7-membered, ether-containing cyclic group. | 09-26-2013 |
20130313223 | METHOD FOR PRODUCING SUBSTRATE HAVING SURFACE NANOSTRUCTURE - A method for producing a substrate having a surface nanostructure, including a forming, on a substrate, a layer containing a block copolymer having a plurality of blocks bonded together, and subsequently heating this layer to cause phase separation of the layer; a decomposing at least a portion of the phase including at least one block of the plurality of blocks that constitute the block copolymer of this layer; and immersing the layer in a developing solution and selectively removing the phase containing the decomposed block(s), the developing solution containing, as the main component, an organic solvent having an SP value of 7.5 to 11.5 (cal/cm | 11-28-2013 |
20140030652 | PRIMER AND PATTERN FORMING METHOD FOR LAYER INCLUDING BLOCK COPOLYMER - An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate ( | 01-30-2014 |
20140054265 | METHOD OF FORMING FINE PATTERN, AND DEVELOPER - A method of forming a fine pattern, including: a phase separation step in which a layer containing a block copolymer having a plurality of blocks bonded is formed on a substrate, and then the layer is heated for phase separation of the layer; a decomposition step in which at least a portion of a phase of at least one block of the plurality of blocks constituting the block copolymer is decomposed; a selective removal step in which the layer is immersed in a developing solution to selectively remove a phase containing decomposed blocks to form a nano structure; and an etching step in which the substrate is subjected to etching by using the nano structure as a mask; and a main component of the developing solution is an organic solvent having an SP value of 7.5 to 11.5 (cal/cm | 02-27-2014 |
20140113236 | SOLVENT DEVELOPABLE NEGATIVE RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND METHOD FOR FORMING PATTERN OF LAYER INCLUDING BLOCK COPOLYMER - A solvent developing negative-tone resist composition containing a base component (A) which exhibits increased polarity and reduced solubility in an organic solvent under action of an acid and an acid generator component (B) which generates an acid upon exposure, the component (A) including a resin component (A1) containing: a structural unit (a2) derived from an acrylate ester containing a 4- to 12-membered lactone-containing cyclic group, a 3- to 7-membered ether-containing cyclic group or a 5- to 7-membered carbonate-containing cyclic group; and a structural unit (a1) derived from an acrylate ester containing an acid decomposable group which exhibited increased polarity by the action of acid, and the acid generator component (B) including an acid generator (B1) containing a compound which generates a sulfonic acid upon exposure. | 04-24-2014 |
20140127626 | RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT WHICH IS USED FOR FORMATION OF GUIDE PATTERN, GUIDE PATTERN FORMATION METHOD, AND METHOD FOR FORMING PATTERN ON LAYER CONTAINING BLOCK COPOLYMER - A negative tone-development resist composition for forming a guide pattern, including a base component (A) and an acid generator component (B), the base component (A) including a resin component (A1) having a structural unit (a1) derived from an acrylate ester containing an acid dissociable group, and at least one of the following structural units (a2): a structural unit derived from an acrylic acid ester containing a lactone-containing cyclic group, a structural unit derived from an acrylic acid ester containing an ether-containing cyclic group and a structural unit derived from an acrylic acid ester containing a carbonate-containing cyclic group, and a constituent unit (a1) derived from an acrylic acid ester containing an acid-labile group, the acid generator component (B) including an acid generator (B1) including at least one compound represented by general formula (b1) or (b2) shown below | 05-08-2014 |
20140238954 | METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN, AND TOP COAT MATERIAL - A method of producing a structure containing a phase-separated structure, including forming, on a substrate, a layer containing a block copolymer having a block of a polyhedral oligomeric silsesquioxane structure-containing structural unit; forming a top coat film by applying, to the layer containing the block copolymer, a top coat material which undergoes a change in polarity upon heating, and controls a surface energy of the layer containing the block copolymer; and subjecting the layer containing the block copolymer on which the top coat film is formed to phase separation by thermal annealing. | 08-28-2014 |
20150034593 | METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, METHOD OF FORMING PATTERN AND METHOD OF FORMING FINE PATTERN - A method of producing a structure containing a phase-separated structure, including: forming a layer including a neutralization film on a substrate; forming a layer containing a block copolymer on the layer including the neutralization film, the P | 02-05-2015 |
20150034595 | METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATION STRUCTURE, METHOD OF FORMING PATTERN, AND METHOD OF FORMING FINE PATTERN - A method of forming a structure containing a phase-separated structure, the method including: a step of forming a layer containing a block copolymer having a plurality of blocks bonded and a purity of 98% or more, and a step of phase-separating the layer containing the block copolymer. | 02-05-2015 |
20150044371 | METHOD OF PRODUCING STRUCTURE CONTAINING PHASE-SEPARATED STRUCTURE, PHASE SEPARATED STRUCTURE, AND BLOCK COPOLYMER COMPOSITION - A method of producing a structure containing a phase-separated structure, including applying a neutralization film to a substrate to form a layer of a neutralization film; applying a block copolymer having a plurality of polymers bonded thereto, and a weight average molecular weight of 150,000 or more to the layer of the neutralization film, so as to form a layer containing the block copolymer and having a coating film thickness of 23 nm or less; and phase-separating the layer containing the block copolymer. | 02-12-2015 |
Patent application number | Description | Published |
20130078381 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus comprising a substrate holding rotating mechanism, a process liquid supply mechanism having a nozzle for dispensing a process liquid toward a principal face of the substrate, a processing liquid reservoir for holding sufficient process liquid to form a liquid film covering the whole principal face of the substrate, a liquid film forming unit for forming the liquid film by supplying the process liquid onto the principal face of the substrate in a single burst, and a control unit for controlling the liquid film forming unit and the process liquid supply mechanism such that the process liquid is dispensed from the process liquid nozzle toward the principal face of the substrate after formation of the liquid film covering the whole area of the principal face of the substrate by the liquid film forming unit. | 03-28-2013 |
20130260570 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - In a substrate processing apparatus, with an internal space of a chamber brought into a pressurized atmosphere, an etching process is performed by continuously supplying a first processing liquid onto an upper surface of a substrate while rotating the substrate. | 10-03-2013 |
20130260574 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - In a substrate processing apparatus, with an internal space of a chamber brought into a reduced pressure atmosphere, a first processing liquid is supplied onto an upper surface of a substrate while the substrate is rotated, and the first processing liquid is thereby quickly spread from a center portion toward a peripheral portion on the upper surface of the substrate. It is thereby possible to coat the upper surface of the substrate with the first processing liquid in a shorter time as compared with under normal pressure. Further, by sucking the first processing liquid from the vicinity of an edge of the substrate, it is possible to coat the upper surface of the substrate with the first processing liquid in a still shorter time. As a result, it is possible to shorten the time required for the processing of the substrate. | 10-03-2013 |
20140202496 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - In a substrate processing apparatus, a temperature of an anti-static liquid having electrical resistivity which gradually decreases as a liquid temperature increases is adjusted by a temperature adjustment part and the electrical resistivity of the anti-static liquid is higher than the electrical resistivity of a processing liquid (SPM liquid). After that, a plurality of substrates are immersed in the anti-static liquid inside the anti-static liquid storage part and both main surfaces of each substrate entirely conic into contact with the anti-static liquid. This gradually removes static electricity from the substrate. Then, the SPM liquid is supplied onto an upper surface of the substrate to thereby perform an SPM process. In the SPM process, it is thereby possible to prevent a large amount of electric charges from sharply moving from the substrate to the SPM liquid and prevent any damage to the substrate. | 07-24-2014 |
Patent application number | Description | Published |
20090050175 | SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD - At a vibration applying position, ultrasonic vibration is applied upon a liquid film which is on a surface of a substrate. Concurrently with this, at a drop arrival position which is different from the vibration applying position, drops of a cleaning liquid are supplied to the liquid film, whereby wave-generating vibration which is different from the ultrasonic vibration is applied upon the liquid film. This dramatically improves removal of particles adhering to the surface of the substrate as compared with mere application of ultrasonic vibration. Hence, even when the output, the frequency and the like of the ultrasonic vibration are set to such an extent not damaging the substrate, it is possible to effectively remove particles with the wave-generating vibration and favorably clean the surface of the substrate. | 02-26-2009 |
20120090649 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus includes a substrate holding unit that horizontally holds a substrate in non-contact with a major surface of the substrate, a processing liquid supply unit that supplies a processing liquid to the major surface of the substrate held by the substrate holding unit, and a hydrophilic surface placing unit that places an annular hydrophilic surface along a peripheral portion of the major surface of the substrate held by the substrate holding unit such that the hydrophilic surface comes into contact with a liquid film of the processing liquid held on the major surface of the substrate. | 04-19-2012 |
20130084709 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - In a substrate processing apparatus, an anti-static liquid supply part supplies the anti-static liquid having electrical resistivity higher than that of an SPM liquid onto a substrate to puddle an entire upper surface of the substrate with the anti-static liquid, to thereby gradually remove static electricity from the substrate. Then, the processing liquid supply part supplies the SPM liquid onto the substrate to thereby perform an SPM process. In the SPM process, it is thereby possible to prevent a large amount of electric charges from rapidly moving from the substrate to the SPM liquid and prevent any damage to the substrate. Further, by maintaining the electrical resistivity of the anti-static liquid at the target electrical resistivity, it is possible to increase the static elimination efficiency of the substrate and shorten the time required for the static elimination process within the limits of causing no damage to the substrate. | 04-04-2013 |
20130084710 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus comprises a single-substrate processing apparatus for processing substrates one by one, and an anti-static liquid storage part for storing an anti-static liquid having electrical resistivity maintained at target electrical resistivity higher than the electrical resistivity of an SPM liquid. A plurality of substrates held in a cartridge are immersed in the anti-static liquid inside the anti-static liquid storage part and both main surfaces of the substrate entirely come into contact with the anti-static liquid. From the substrates, static electricity is relatively gently removed. Then, after the static elimination process are finished, a processing liquid supply part supplies the SPM liquid onto an upper surface of the substrate and an SPM process is thereby performed. It is thereby possible to prevent a large amount of electric charges from rapidly moving from the substrate to the SPM liquid and also possible to prevent any damage to the substrate. | 04-04-2013 |
20140352742 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus has a cup part for receiving processing liquid such as pure water which is splashed from a substrate. The cup part is formed of electrical insulation material or semiconductor material. Hydrophilic treatment may be performed on an outer annular surface of the cup part and water may be held on the outer annular surface of the cup part while processing the substrate. With the disclosed apparatus, charged potential of the cup part generated by splashing of pure water can be suppressed, without greatly increasing the manufacturing cost of the substrate processing apparatus. As a result, it is possible to prevent electric discharge from occurring on the substrate due to induction charging of the substrate, in application of the processing liquid onto the substrate. | 12-04-2014 |
20150059645 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus comprising a substrate holding rotating mechanism, a process liquid supply mechanism having a nozzle for dispensing a process liquid toward a principal face of the substrate, a processing liquid reservoir for holding sufficient process liquid to form a liquid film covering the whole principal face of the substrate, a liquid film forming unit for forming the liquid film by supplying the process liquid onto the principal face of the substrate in a single burst, and a control unit for controlling the liquid film forming unit and the process liquid supply mechanism such that the process liquid is dispensed from the process liquid nozzle toward the principal face of the substrate after formation of the liquid film covering the whole area of the principal face of the substrate by the liquid film forming unit. | 03-05-2015 |
Patent application number | Description | Published |
20110210335 | Display Device and Method for Manufacturing the Same - An object of the present invention is to decrease substantial resistance of an electrode such as a transparent electrode or a wiring, and furthermore, to provide a display device for which is possible to apply same voltage to light-emitting elements. In the invention, a auxiliary wiring that is formed in one layer in which a conductive film of a semiconductor element such as an electrode, wiring, a signal line, a scanning line, or a power supply line is connected to an electrode typified by a second electrode, and a wiring. It is preferable that the auxiliary wiring is formed into a conductive film to include low resistive material, especially, formed to include lower resistive material than the resistance of an electrode and a wiring that is required to reduce the resistance. | 09-01-2011 |
20120045959 | DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - It is an object of the present invention to provide a display device that has a structure of an electrode where a residue of a transparent conductive film is not generated when a weak acid solution is used in etching, which is particularly appropriate for an electrode of a light-emitting element. | 02-23-2012 |
20140293207 | DISPLAY DEVICE AND METHOD FOR MANUFACTURING THE SAME - An object of the present invention is to decrease substantial resistance of an electrode such as a transparent electrode or a wiring, and furthermore, to provide a display device for which is possible to apply same voltage to light-emitting elements. In the invention, a auxiliary wiring that is formed in one layer in which a conductive film of a semiconductor element such as an electrode, wiring, a signal line, a scanning line, or a power supply line is connected to an electrode typified by a second electrode, and a wiring. It is preferable that the auxiliary wiring is formed into a conductive film to include low resistive material, especially, formed to include lower resistive material than the resistance of an electrode and a wiring that is required to reduce the resistance. | 10-02-2014 |
Patent application number | Description | Published |
20090147313 | Image processing apparatus, image processing system, and image processing method - An information acquiring unit acquires information indicating whether a color material used at least for image formation is saved. An image-information generating unit creates, when the information acquiring unit acquires the information for saving the color material, image information using the color material of which consumption is saved. | 06-11-2009 |
20090180164 | Image processing device, image processing method, image forming apparatus, and storage medium - A device for converting a color image including multiple character images into a monochrome image is disclosed. The device includes a color conversion unit configured to reduce the image density of black character images included in the color image to a level lower than the image density of specific color character images included in the color image and having a specific color other than black during the conversion of the color image into the monochrome image. | 07-16-2009 |
20090213429 | APPARATUS, METHOD, AND COMPUTER-READABLE RECORDING MEDIUM FOR PERFORMING COLOR MATERIAL SAVING PROCESS - An apparatus includes an obtaining part for obtaining image data of a document and a processing part for performing a color material saving process on the image data. The image data includes an edge part and a non-edge part. The apparatus includes a determining part configured to determine whether the document includes a low line-screen ruling area. When the document is determined not to include the low line-screen ruling area, the processing part is configured to perform a first process so that an amount of color material reduced for forming the non-edge part is greater than an amount of color material reduced for forming the edge part. When the document is determined to include the low line-screen ruling area, the processing part is configured to perform a second process so that the amounts of color material reduced for forming the edge part and the non-edge parts are uniform. | 08-27-2009 |
20100027038 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, AND COMPUTER PROGRAM PRODUCT - A determining unit determines a color of a character. A color converting unit converts a chromatic color having a predetermined hue into the predetermined color and a chromatic color having a hue other than the predetermined hue and an achromatic color into a black color. A processing unit processes either one of a color character and a black character determined by the determining unit such that the color character having the chromatic color converted into the black color is relatively noticeable to the black character. | 02-04-2010 |
20100157112 | Image processing apparatus, image processing method, and computer program product - An image processing apparatus includes a gamma transforming unit that performs gamma transformation on an image signal based on a luminance component of the image signal and so as to maintain an RGB ratio of the image signal; a correction-target-value calculating unit that calculates a correction target value as a target value for performing tone correction on the luminance component of the image signal, based on a structure of RGB components contained in an image signal obtained by the gamma transforming unit through the gamma transformation; and a tone correcting unit that performs tone correction on a value of the image signal based on the luminance component of the image signal and the correction target value. | 06-24-2010 |
20110222870 | Image forming apparatus, image forming method, and program - An image forming apparatus includes: a patch-image generating unit that generates a patch image for measuring a color reproduction characteristic and correcting color, the patch image in which mixed-color patch sets each including a plurality of patches each formed by overlaying a plurality of color materials are arranged so that patches having the same color and the same tone value included in the mixed-color patch sets are arranged to be kept at a distance in a circumferential direction of a photosensitive element and a distance between same tone patches, which are two patches having the same color and the same tone value, is close to (N+½) times the length of a period of uneven density which periodically occurs in the circumferential direction of the photosensitive element (N is an integer of 0 or greater); and an image forming unit that forms the generated patch image on a recording medium. | 09-15-2011 |
20110292417 | Imaging processing apparatus, image processing method, and computer program product - An image processing apparatus includes a patch forming unit that forms a plurality of mixed-color patches by superposing single color patches of a plurality of colors with different gradation ratios according to gradation values; a color measuring unit that performs color measurement of the mixed-color patches; an estimating unit that estimates color values of single colors present in the mixed-color patches based on color measurement values obtained by performing color measurement; and a correction table setting unit that sets a correction table in order to correct the estimated color values of the single colors to target color values. | 12-01-2011 |
Patent application number | Description | Published |
20100081097 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block and an interface block. These blocks are arranged in the substrate processing apparatus in the above order. An exposure device is arranged adjacent to the interface block of the substrate processing apparatus. A hydrophobic processing unit is arranged in the resist cover film processing block and applies hydrophobic processing to the substrate before exposure processing. | 04-01-2010 |
20100239986 | SUBSTRATE PROCESSING APPARATUS - The transporting process from cleaning and drying processing of a substrate in a cleaning/drying processing unit in a cleaning/drying processing group to post-exposure bake (PEB) of the substrate in a thermal processing group for post-exposure bake in a cleaning/drying processing block is described below. First, after the substrate after exposure processing is subjected to the cleaning and drying processing in the cleaning/drying processing group, a sixth central robot takes out the substrate from the cleaning/drying processing group and carries that substrate into the thermal processing group for post-exposure bake in the cleaning/drying processing block. | 09-23-2010 |
20100285225 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus comprises an interface block. An exposure device is arranged adjacent to the interface block. The interface block includes first and second cleaning/drying processing units. A substrate W is subjected to cleaning and drying processing before exposure processing in the first cleaning/drying processing unit, while being subjected to cleaning and drying processing after the exposure processing in the second cleaning/drying processing unit. | 11-11-2010 |
Patent application number | Description | Published |
20120006361 | SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE - A substrate rotates, and a liquid nozzle of a gas/liquid supply nozzle moves to a position above the center of the rotating substrate. In this state, a rinse liquid is discharged from the liquid nozzle onto the rotating substrate. The gas/liquid supply nozzle moves toward a position outside the substrate. A gas nozzle reaches the position above the center of the rotating substrate, so that the gas/liquid supply nozzle temporarily stops. With the gas/liquid supply nozzle stopping, an inert gas is discharged onto the center of the rotating substrate for a given period of time. After that, the gas/liquid supply nozzle again moves toward the position outside the substrate. | 01-12-2012 |
20140022521 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - An underlayer is formed to cover the upper surface of a substrate and a guide pattern is formed on the underlayer. A DSA film constituted by two types of polymers is formed in a region on the underlayer where the guide pattern is not formed. Thermal processing is performed while a solvent is supplied to the DSA film on the substrate. Thus, a microphase separation of the DSA film occurs. As a result, patterns made of the one polymer and patterns made of another polymer are formed. Exposure processing and development processing are performed in this order on the DSA film after the microphase separation such that the patterns made of another polymer are removed. | 01-23-2014 |
20140199638 | NEGATIVE DEVELOPING METHOD AND NEGATIVE DEVELOPING APPARATUS - After a developing step, a substrate is spun at high speeds without supplying a cleaning liquid to a surface of the substrate. This causes a large centrifugal force to act on a developer on a resist film. Consequently, the developer can be removed rapidly from the surface of the substrate. As a result, development can be stopped at an expected timing. Moreover, a circuit pattern having an expected dimension can be obtained. At this time, a dissolved product is also removable with the developer from the substrate. This can avoid failure in development caused by the dissolved product. Consequently, suitably maintained quality of negative development can be achieved with a reduced usage amount of the cleaning liquid. | 07-17-2014 |
Patent application number | Description | Published |
20080226830 | Method and system for removal of films from peripheral portions of a substrate - A substrate processing apparatus includes an anti-reflection film processing block, a resist film processing block, and a resist cover film processing block. In the processing blocks, an anti-reflection film, a resist film, and a resist cover film are formed on a substrate, respectively. Additionally, a film formed at a peripheral edge of the substrate is removed. The film formed at the peripheral edge of the substrate is removed by supplying a removal liquid capable of dissolving and removing the film to the peripheral edge of the substrate during rotation. When the peripheral edge of the film is removed, the position of the substrate is corrected such that the center of the substrate coincides with the center of a rotation shaft. | 09-18-2008 |
20120037593 | METHOD AND SYSTEM FOR REMOVAL OF FILMS FROM PERIPHERAL PORTIONS OF A SUBSTRATE - A substrate processing apparatus includes an anti-reflection film processing block, a resist film processing block, and a resist cover film processing block. In the processing blocks, an anti-reflection film, a resist film, and a resist cover film are formed on a substrate, respectively. Additionally, a film formed at a peripheral edge of the substrate is removed. The film formed at the peripheral edge of the substrate is removed by supplying a removal liquid capable of dissolving and removing the film to the peripheral edge of the substrate during rotation. When the peripheral edge of the film is removed, the position of the substrate is corrected such that the center of the substrate coincides with the center of a rotation shaft. | 02-16-2012 |
Patent application number | Description | Published |
20090211470 | STENCIL PRINTING APPARATUS - A stencil printing apparatus which is capable of reducing difficult cleaning work even when two-sided printing is performed continuously and is capable of improving printing efficiency comprises a printing portion, a paper discharge portion, paper re-feeding means for re-feeding paper to the printing portion, and a displaceable switching member which selectively occupies a first position in which the paper that has passed through the printing portion is guided to the paper discharge portion and a second position in which the paper is guided to the paper re-feeding means. A reverse side printing step is performed in which the paper is re-fed to the printing portion by the paper re-feeding means after a surface printing step is performed, and the switching member comprises, on a face thereof opposite the paper when the switching member occupies the first position, a contact area reduction member for reducing the area of contact with the paper. | 08-27-2009 |
20100091056 | IMAGE FORMING APPARATUS - An image forming apparatus includes a recording head including heads containing arranged nozzles to discharge a droplet, the heads are arranged in a zigzag form along a nozzle array direction; a conveyer belt with suction holes to convey a printing medium in a direction intersecting a head array direction; and a control unit to control an blank discharging; wherein suction hole arrays including the suction holes arranged in the head array direction, are arranged at a predetermined interval; wherein one of the suction hole arrays is a reference suction hole array including the suction hole to pass a position facing the nozzle of a nozzle array end and the nozzle in an overlapping part of two heads in the nozzle array direction; and wherein the control unit makes each nozzle discharge a blank discharging droplet to the suction holes, using the reference suction hole array as a standard. | 04-15-2010 |
20100149242 | IMAGE FORMING APPARATUS - An image forming apparatus includes an ink discharge unit including nozzles to discharge ink and to form an image on a recording medium; a conveyer belt to convey the recording medium so that the recording medium passes through an area facing the ink discharge unit, the conveyor belt including blank discharge holes to let the ink for a blank discharge through; a control unit to control an ink discharge operation of the ink discharge unit; a blank discharge receiver to receive the ink for the blank discharge, provided at a position facing the ink discharge unit across the conveyor belt; and a belt position detection unit to detect a position in a direction perpendicular to a belt moving direction of the conveyor belt, wherein the control unit controls the blank discharge operation of the ink discharge unit based on a detection result detected by the belt position detection unit. | 06-17-2010 |
20100231676 | Inkjet Recording Apparatus And Image Forming Apparatus - An inkjet recording apparatus to print onto a surface of a recording medium includes an endless rotation conveyance member with a plurality of through-holes; a suction unit to suction the recording medium on the surface of the endless rotation conveyance member; an ink discharge head including ink discharge nozzles; a blank discharge ink receiver to receive ink through the through-holes; a control unit to make the ink discharge nozzles discharge ink at a predetermined timing; and a fixed plate along an inner surface of the endless rotation conveyance member, the fixed plate including an opening formed in a position corresponding to the ink discharge nozzles and a through-hole. The blank discharge ink receiver is disposed corresponding to the opening of the fixed plate and in close contact with the fixed plate so that an inside space of the blank discharge receiver becomes a substantially closed space. | 09-16-2010 |
Patent application number | Description | Published |
20110311023 | X-RAY COMPUTED TOMOGRAPHY APPARATUS - An X-ray CT apparatus includes an X-ray source configured to generate an X-ray; a scintillator configured to convert the X-ray into a fluorescent; a substrate including a plurality of photosensitive elements configured to convert the fluorescent into an electric charge; a temperature sensor formed on the surface of the substrate; a heat element formed on the surface of the substrate; and a controller configured to control a temperature of the photodiode by adjusting an electric current of the heat element. | 12-22-2011 |
20110316387 | ULTRASONIC TRANSDUCER AND FABRICATING THE SAME - An aspect of one embodiment, there is provided an ultrasonic transducer including a plurality of oscillators, each of the oscillator having a convex portion, a printed wiring board provided to be opposed to the convex portion, an adhesive material including at least a portion of the convex portion, the adhesive material joining the oscillator and the printed wiring board, and a resin provided between the oscillator and the printed wiring board, the resin covering the convex portion and the adhesive material. | 12-29-2011 |
20140103782 | ULTRASONIC TRANSDUCER AND FABRICATING THE SAME - An aspect of one embodiment, there is provided an ultrasonic transducer including a plurality of oscillators, each of the oscillator having a convex portion, a printed wiring board provided to be opposed to the convex portion and electrically connected to the convex portion, a resin provided between the oscillator and the printed wiring board, the resin covering at least the convex portion and a portion of the printed wiring board. | 04-17-2014 |
20150069540 | STRAIN SENSOR AND METHOD FOR MANUFACTURING THE SAME - According to one embodiment, a strain sensor includes a substrate, a lid, a frame, and a sensing unit. The substrate has a first surface. The lid is provided on the first surface. The frame is provided between the substrate and the lid. The frame is nonconductive and includes a magnetic body. The sensing unit is provided inside the frame between the substrate and the lid, and includes a magnetoresistance effect element. | 03-12-2015 |
Patent application number | Description | Published |
20080211076 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device capable of elevating a yield rate of products to improve the productivity and also ensuring high reliability in production and a manufacturing method of the semiconductor device are provided. The semiconductor device includes a semiconductor substrate | 09-04-2008 |
20080294054 | ULTRASOUND PROBE AND DIAGNOSTIC ULTRASOUND SYSTEM - An ultrasound probe is provided with a piezoelectric sensor module, which includes a plurality of piezoelectric elements arranged two-dimensionally and configured to generate an ultrasound beam so that the beam is reflected by a subject's body and to capture a resulting reflection signal, and a control circuit board that is electrically connected to the piezoelectric sensor module through a flexible substrate and transmits or receives a signal to or from the piezoelectric sensor module. The control circuit board is composed of a transmit-only circuit board, a receive-only circuit board, and a relay flexible substrate that electrically connects the transmit-only and receive-only circuit boards. | 11-27-2008 |
20080297992 | HOLLOW SEALING STRUCTURE AND MANUFACTURING METHOD FOR HOLLOW SEALING STRUCTURE - A hollow sealing structure includes, a substrate, a functional element portion disposed on a principal surface of the substrate, and a covering portion disposed over the principal surface of the substrate to form a hollow portion in which the covering portion covers the functional element portion, the covering portion including a first covering structure portion having a plurality of openings, second covering structure portions disposed individually on imaginary straight lines which connect the functional element portion and the openings, and a sealing structure portion which seals gaps defined between the first covering structure portion and the second covering structure portions. | 12-04-2008 |
20090101383 | MICROMECHANICAL DEVICE AND METHOD OF MANUFACTURING MICROMECHANICAL DEVICE - A micromechanical device according to an aspect of the present invention includes, a substrate, a micromachine which is mounted on the substrate, is provided with a mechanism deformed by a function of an electric field, and changes the electrical characteristics concomitantly with the deformation, an inner inorganic sealing film which contains an inorganic material, is provided on a principal surface of the substrate, covers the micromachine through a hollow section containing a gaseous body therein, and is provided with opening shape sections allowing the hollow section to communicate with the outside, an organic sealing film which contains an organic material, is formed on the inner inorganic sealing film, and blocks up the opening shape sections, and an outer inorganic sealing film which contains an inorganic material with lower moisture permeability than the organic material, is formed on the organic sealing film, and covers the organic sealing film. | 04-23-2009 |
20090236114 | MICROMECHANICAL DEVICE AND METHOD OF MANUFACTURING MICROMECHANICAL DEVICE - An example of the present invention is a micromechanical device including, a substrate in which a signal line is provided, a micromachine which is mounted on the substrate, is formed of a conductive material into a beam-like shape, is elastically deformed by a function of an electric field in such a manner that the beam-like part moves closer to or apart from the signal line, and changes the electric characteristics concomitantly with the deformation, a deformation restraint section constituted of a material having a higher viscosity coefficient than the conductive material, provided on the opposite side of the micromachine to the signal line, for restraining deformation of the micromachine in a direction in which the micromachine is separated from the signal line, and a sealing body provided on the principal surface of the substrate, for covering the micromachine with a hollow section located therebetween. | 09-24-2009 |
20100140640 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - Provided is an optical semiconductor device includes: a light-emitting layer having a first main surface, a second main surface opposed to the first main surface, a first electrode and a second electrode which are formed on the second main surface; a fluorescent layer provided on the first main surface; a light-transmissive layer provided on the fluorescent layer and made of a light-transmissive inorganic material; a first metal post provided on the first electrode; a second metal post provided on the second electrode; a sealing layer provided on the second main surface so as to seal in the first and second metal posts with one ends of the respective first and second metal posts exposed; a first metal layer provided on the exposed end of the first metal post; and a second metal layer provided on the exposed end of the second metal post. | 06-10-2010 |
20110215427 | SEMICONDUCTOR DEVICE - According to one embodiment, a semiconductor device includes: a substrate; an organic insulating film provided on the substrate; an inorganic insulating film formed thinner than the organic insulating film on the organic insulating film; a hollow sealing structure that is formed on the inorganic insulating film, and seals a MEMS element in an inside while ensuring a space between the hollow sealing structure itself and the MEMS element; a through hole formed so as to penetrate the organic insulating film and the inorganic insulating film; and a conductive member that is filled into the through hole, and electrically connects the MEMS element and an electrode formed by being filled into the through hole. | 09-08-2011 |
20110222649 | X-RAY CT APPARATUS AND CONTROL METHOD FOR X-RAY CT APPARATUS - An X-ray CT apparatus has an X-ray source, an X-ray detector, a temperature sensor, a data acquisition unit and a controller. The X-ray source generates an X-ray. The X-ray detector detects the X-ray. The temperature sensor detects a temperature of the X-ray detector. The data acquisition unit acquires data from the X-ray detector. The controller controls a temperature of the X-ray detector through adjustment of a workload of the data acquisition unit during a non-scanning time. | 09-15-2011 |
20110237952 | TWO-DIMENSIONAL-ARRAY ULTRASONIC PROBE AND ULTRASONIC DIAGNOSTIC APPARATUS - According to one embodiment, an ultrasonic probe comprises piezoelectric elements arranged in the form of a two-dimensional array, a processing IC configured to process signal information obtained from the piezoelectric elements, and a flexible wiring substrate disposed between the piezoelectric elements and the processing IC, with the piezoelectric elements mounted on a front surface, and the processing IC mounted on a rear surface. | 09-29-2011 |
20120245470 | ULTRASONIC PROBE AND METHOD FOR MANUFACTURING ULTRASONIC PROBE - An ultrasonic probe includes, a transducer, a substrate includes electrodes formed on a front surface and a back surface and electronic components, first flexible wire substrates connected in such a manner that a first end is connected to the transducer and a second end is connected to a electrode at a side of the front surface of the substrate, second flexible wire substrates connected in such a manner that a first end is connected to the transducer and a second end is connected to a electrode at a side of the back surface of the substrate, and a dummy materials including the same rigidity and thickness as those of the first flexible wire substrate is arranged at a space, adjacent to a electrode at the side of the front surface of the substrate, corresponding to the second end of the second flexible wire substrate. | 09-27-2012 |
20140008688 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME - Provided is an optical semiconductor device includes: a light-emitting layer having a first main surface, a second main surface opposed to the first main surface, a first electrode and a second electrode which are formed on the second main surface; a fluorescent layer provided on the first main surface; a light-transmissive layer provided on the fluorescent layer and made of a light-transmissive inorganic material; a first metal post provided on the first electrode; a second metal post provided on the second electrode; a sealing layer provided on the second main surface so as to seal in the first and second metal posts with one ends of the respective first and second metal posts exposed; a first metal layer provided on the exposed end of the first metal post; and a second metal layer provided on the exposed end of the second metal post. | 01-09-2014 |
Patent application number | Description | Published |
20110138889 | Method of evaluating prostatic disease - According to the method of evaluating prostatic disease of the present invention, amino acid concentration data on concentration values of amino acids in blood collected from a subject to be evaluated is measured, and the state of prostatic disease including at least one of prostatic cancer and prostatic hypertrophy in the subject is evaluated based on the concentration value of at least one of Tau, Thr, Ser, Asn, Glu, Pro, Gly, Ala, Cit, ABA, Val, Met, Ile, Leu, Phe, His, Trp, Orn, Lys, and Cys2 contained in the measured amino acid concentration data of the subject. | 06-16-2011 |
20130314526 | CELL ANALYSIS DEVICE - Provided is a cell concentration/purification device having a function of successively locating cells in a specific area of a microchannel, and a function of sequentially capturing cell images by use of light from a plurality of monochromatic light sources on an image basis, and performing comparative analysis of the cell images to recognize individual cells based on information on the shape of the cells and an absorption spectral distribution of the cells or inside of the cells, thereby selectively separating/purifying the cells. | 11-28-2013 |
Patent application number | Description | Published |
20080197869 | ELECTRICAL CONNECTING APPARATUS - To restrain misregistration of tips due to change in temperature, an electrical connecting apparatus is used for connection of a tester, and electrical connection terminals of a device under test to undergo electrical test by the tester. The electrical connecting apparatus comprises a probe board having a plurality of probe lands on its underside; and a plurality of contacts having tip portions to be brought into contact with a base end portion fixed at the respective probe lands and the connection terminals of the device under test. The measure from the tip of each contact and the probe land ranges from 1.1 to 1.3 mm, and the coefficient of thermal expansion of the probe board is greater than the coefficient of thermal expansion of the device under test within the range from 1 to 2 ppm/° C. | 08-21-2008 |
20080280542 | CLEANING APPARATUS FOR A PROBE - The present invention provides a cleaning apparatus capable of removing foreign matters attached to a tip of a probe effectively without impairing the durability of the probe. The cleaning apparatus for the probe comprises a base plate having a rough surface and a surface layer formed to conform to and cover the rough surface for the purpose of providing a polishing surface for the probe and having lower hardness than hardness of the probe tip of the probe. | 11-13-2008 |
20090009201 | Probe for Electrical Test and Probe Assembly - A probe for electrical test provided with positioning marks parallel to a plane where tips are provided and at a height position lower than the plane on a plane directed in the same direction as the plane, the positioning marks are in a predetermined positional relation to said tips. The positioning marks contain information indicating an existing direction of the tips when the positioning marks are observed from the projecting direction of the tips. | 01-08-2009 |
20090058440 | PROBE ASSEMBLY, METHOD OF PRODUCING IT AND ELECTRICAL CONNECTING APPARATUS - A probe assembly for use in electrical measurement of a device under test. The probe assembly comprises a plate-like probe base plate with bending deformation produced in a free state without load, and a plurality of probes formed on one face of the probe base plate to project from the face. All the tips of the probes are positioned on the same plane parallel to an imaginary reference plane of the probe base plate. | 03-05-2009 |
20100219854 | PROBE AND ELECTRICAL CONNECTING APPARATUS USING IT - A probe having an alignment mark that is hardly influenced by scraps of an electrode scraped by a probe tip is provided. A probe according to the present invention comprises a base portion having an attaching end and extending in a direction distanced from the attaching end, an arm portion extending from the base portion laterally with a space in the extending direction of the base portion from the attaching end, a probe tip portion protruded from the arm portion and having a probe tip formed on its protruding end, and an alignment mark for alignment of the probe tip. The arm portion has a flat surface area on the opposite side of a side where the attaching end of the base portion is located when seen along the extending direction of the arm portion. The probe tip portion is formed to be protruded from the flat surface area, and the alignment mark is constituted by at least a part of the flat surface area. | 09-02-2010 |