Lubben
Bernd Lübben, Korschenbroich DE
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20120206257 | ALARM SYSTEM - An alarm system control center has subscribers connected to it by a two-wire line. The subscribers receive via the two-wire line both a power supply voltage and communication messages in the form of pulse trains impressed on the power supply voltage as voltage modulation. Each subscriber includes a constant current circuit which is connected to the two-wire line and which is used to charge a storage capacitor with a voltage regulator coupled to it. In order to reduce communication errors, a transformer is provided to reduce power supply voltage to an internal value which is lower than the than the power supply voltage at least by the voltage swing of the pulses of the communication messages on the two-wire line. | 08-16-2012 |
Daniel C. Lubben, San Jose, CA US
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20090159428 | PREDICTION AND COMPENSATION OF EROSION IN A MAGNETRON SPUTTERING TARGET - When a magnetron is scanned about the back of a target in a selected complex path having radial components, the erosion profile has a form depending upon the selection of paths. A radial erosion rate profile for a given magnetron is measured. Periodically during scanning, an erosion profile is calculated from the measured erosion rate profile, the time the magnetron spends at different radii, and the target power. The calculated erosion profile may be used to indicate when erosion has become excessive at any location prompting target replacement or to adjust the height of the magnetron above the target for repeated scans. In another aspect of the invention, the magnetron height is dynamically adjusted during a scan to compensate for erosion. The compensation may be based on the calculated erosion profile or on feedback control of the present value of the target voltage for a constant-power target supply. | 06-25-2009 |
20090233438 | SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESPUTTERING - A magnetron sputter reactor for sputtering deposition materials such as tantalum, tantalum nitride and copper, for example, and its method of use, in which self-ionized plasma (SIP) sputtering and inductively coupled plasma (ICP) sputtering are promoted, either together or alternately, in the same or different chambers. Also, bottom coverage may be thinned or eliminated by ICP resputtering in one chamber and SIP in another. SIP is promoted by a small magnetron having poles of unequal magnetic strength and a high power applied to the target during sputtering. ICP is provided by one or more RF coils which inductively couple RF energy into a plasma. The combined SIP-ICP layers can act as a liner or barrier or seed or nucleation layer for hole. In addition, an RF coil may be sputtered to provide protective material during ICP resputtering. In another chamber an array of auxiliary magnets positioned along sidewalls of a magnetron sputter reactor on a side towards the wafer from the target. The magnetron preferably is a small, strong one having a stronger outer pole of a first magnetic polarity surrounding a weaker outer pole of a second magnetic polarity and rotates about the central axis of the chamber. The auxiliary magnets preferably have the first magnetic polarity to draw the unbalanced magnetic field component toward the wafer. The auxiliary magnets may be either permanent magnets or electromagnets. | 09-17-2009 |
20090308732 | APPARATUS AND METHOD FOR UNIFORM DEPOSITION - Embodiments of the present invention generally relate to an apparatus and method for uniform sputter depositing of materials into the bottom and sidewalls of high aspect ratio features on a substrate. In one embodiment, a sputter deposition system includes a collimator that has apertures having aspect ratios that decrease from a central region of the collimator to a peripheral region of the collimator. In one embodiment, the collimator is coupled to a grounded shield via a bracket member that includes a combination of internally and externally threaded fasteners. In another embodiment, the collimator is integrally attached to a grounded shield. In one embodiment, a method of sputter depositing material includes pulsing the bias on the substrate support between high and low values. | 12-17-2009 |
20120132518 | Method for Predicting and Compensating Erosion in a Magnetron Sputtering Target - When a magnetron is scanned about the back of a target in a selected complex path having radial components, the erosion profile has a form depending upon the selection of paths. A radial erosion rate profile for a given magnetron is measured. Periodically during scanning, an erosion profile is calculated from the measured erosion rate profile, the time the magnetron spends at different radii, and the target power. The calculated erosion profile may be used to indicate when erosion has become excessive at any location prompting target replacement or to adjust the height of the magnetron above the target for repeated scans. In another aspect of the invention, the magnetron height is dynamically adjusted during a scan to compensate for erosion. The compensation may be based on the calculated erosion profile or on feedback control of the present value of the target voltage for a constant-power target supply. | 05-31-2012 |
20130313107 | Prediction and compensation of erosion in a magnetron sputtering target - When a magnetron is scanned about the back of a target in a selected complex path having radial components, the erosion profile has a form depending upon the selection of paths. A radial erosion rate profile for a given magnetron is measured. Periodically during scanning, an erosion profile is calculated from the measured erosion rate profile, the time the magnetron spends at different radii, and the target power. The calculated erosion profile may be used to indicate when erosion has become excessive at any location prompting target replacement or to adjust the height of the magnetron above the target for repeated scans. In another aspect of the invention, the magnetron height is dynamically adjusted during a scan to compensate for erosion. The compensation may be based on the calculated erosion profile or on feedback control of the present value of the target voltage for a constant-power target supply. | 11-28-2013 |
20140305802 | SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESPUTTERING - A magnetron sputter reactor for sputtering deposition materials such as tantalum, tantalum nitride and copper, for example, and its method of use, in which self-ionized plasma (SIP) sputtering and inductively coupled plasma (ICP) sputtering are promoted, either together or alternately, in the same or different chambers. Also, bottom coverage may be thinned or eliminated by ICP resputtering in one chamber and SIP in another. SIP is promoted by a small magnetron having poles of unequal magnetic strength and a high power applied to the target during sputtering. ICP is provided by one or more RF coils which inductively couple RF energy into a plasma. The combined SIP-ICP layers can act as a liner or barrier or seed or nucleation layer for hole. In addition, an RF coil may be sputtered to provide protective material during ICP resputtering. In another chamber an array of auxiliary magnets positioned along sidewalls of a magnetron sputter reactor on a side towards the wafer from the target. The magnetron preferably is a small, strong one having a stronger outer pole of a first magnetic polarity surrounding a weaker outer pole of a second magnetic polarity and rotates about the central axis of the chamber. The auxiliary magnets preferably have the first magnetic polarity to draw the unbalanced magnetic field component toward the wafer. The auxiliary magnets may be either permanent magnets or electromagnets. | 10-16-2014 |
Edzard Lübben, Erlangen DE
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20120216703 | Overlong Coach Body for Railway Vehicles and Train Set Composed of Such Coach Bodies - A coach body for a multiple-unit railway vehicle is provided. The coach body includes two bogies at each end. The coach body has a length of at least 27.5 m and side walls of the coach body are designed such that, a maximum outside width in the longitudinal center of the coach being 2.86 m at the height of seat rests, an inside width of at least 2.6 m is achieved for the greatest part of the coach length. | 08-30-2012 |
20130207409 | BOGIE SHAFT FOR A RAILWAY VEHICLE HAVING A STONE GUARD AND METHOD FOR PRODUCING SAME - A bogie shaft for railway vehicles has a cladding which contains a metal component. The metal component is preferably electrochemically less refined, but no greater than exactly as refined, as a material of the bogie shaft. Corrosion on the bogie shaft can thereby be advantageously prevented. The metal material of the cladding is also able to effectively protect the bogie shaft against stone impact. The cladding can be advantageously applied by cold gas spraying, or a sleeve can be bent around the bogie shaft for forming the cladding. The cladding can advantageously contain particles that can make it more resistant to stone impact. The particles can be made, for example, of hard materials, of particularly ductile particles, or of particles made of a memory shape alloy. | 08-15-2013 |
Edzard Lübben, Erlangen DE
Patent application number | Description | Published |
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20130207409 | BOGIE SHAFT FOR A RAILWAY VEHICLE HAVING A STONE GUARD AND METHOD FOR PRODUCING SAME - A bogie shaft for railway vehicles has a cladding which contains a metal component. The metal component is preferably electrochemically less refined, but no greater than exactly as refined, as a material of the bogie shaft. Corrosion on the bogie shaft can thereby be advantageously prevented. The metal material of the cladding is also able to effectively protect the bogie shaft against stone impact. The cladding can be advantageously applied by cold gas spraying, or a sleeve can be bent around the bogie shaft for forming the cladding. The cladding can advantageously contain particles that can make it more resistant to stone impact. The particles can be made, for example, of hard materials, of particularly ductile particles, or of particles made of a memory shape alloy. | 08-15-2013 |
Gary L. Lubben, Independence, MN US
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20090240194 | ENERGY BALANCE THERAPY FOR OBESITY MANAGEMENT - Techniques are described that allow an implantable device to sense gastric data and activity data from a patient, and estimate the patient's amount of energy consumed and energy expended based on the sensed data. A system provides feedback to the patient, a family member, or a doctor about the patient's energy consumed, energy expended, and net energy. The data may be provided in table or graphical format, and may show daily or weekly energy balance data or may show a trend of the daily or weekly energy data. The patient may receive feedback by an implanted alert module that provides and audio alert or a vibration alert. In addition, data acquired by the system may be used to adjust the patient's stimulation therapy parameters. | 09-24-2009 |
Hauke Lubben, Radolfzell DE
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20090218751 | Method and Apparatus for Separating Objects - A method for separating objects from a stack in a stream of objects, in which the objects are removed from the stack with a removal device, and overlapping objects are separated from one another with a separating device. To achieve reliable separation with a low double removal rate, a plurality of traction devices grip both sides of the removed object and are driven in the transport direction at different forward driving speeds. | 09-03-2009 |
Jeff Lubben, Hudson, IA US
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20090105031 | Differential assembly and method for manufacturing same - A differential assembly and method of manufacturing such an assembly are provided. A method for manufacturing a differential assembly includes forming a first portion of a differential carrier; forming a second portion of the differential carrier; securing the first portion to the second portion to form the differential carrier; forming a differential housing; and securing the differential carrier to the differential housing to form a differential assembly. A sintering process may be used to form the first portion and second portion of the differential carrier, and the first and second portions may be secured together by a brazing process. The forming of the first and second portions of the differential carrier and the securing of the first and second portions to form a differential carrier may be achieved by a sinter-brazing process. | 04-23-2009 |
20150104127 | LUBRICATION OF POWER TRANSFER COMPONENTS - An apparatus for lubricating power transfer components is described. The apparatus includes a first shaft enclosed by a housing with a main cavity, and an inboard bearing and an outboard bearing supporting the first shaft. An inboard bearing cavity and an outboard bearing cavity surround, respectively, the inboard and outboard bearings. Lubrication fluid flows from an entrance port in the housing, through a flow passage within a wall of the housing to the inboard bearing cavity, through a flow passage within the first shaft from the inboard bearing cavity to the outboard bearing cavity, and through an overflow port in a wall of the outboard bearing cavity. A second shaft provides rotational power to the first shaft (e.g., via an idler gear). A lubrication deflector, such as a frustoconical deflector, surrounds a portion of a second shaft and extends into the main cavity of the housing. | 04-16-2015 |
Jeffrey Loren Lubben, Hudson, IA US
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20160114634 | VARIABLE TREAD AXLE ASSEMBLY FOR TIRE INFLATION SYSTEM - An axle assembly is provided for a tire inflation system and supports a wheel which is movably mountable on the axle. The axle assembly includes an axle housing, an axle rotatably supported by the axle housing and an end plate sealingly engaging an end of the axle. A supply passage and a pilot conduit extend axially along a central axis of the axle, and communicate supply and pilot inlets to supply and pilot outlets in the end plate. Flexible supply and pilot hoses are coiled around an outer surface of the axle and connect the outlets to an inflation control valve mounted to a hub of the wheel. The supply passage and pilot conduit are coaxial and the pilot conduit extends through the supply passage. | 04-28-2016 |