Patent application number | Description | Published |
20090232178 | TWO-WAVELENGTH SEMICONDUCTOR LASER DEVICE - A semiconductor laser device has a first light emitting portion and a second light emitting portion having a longer emission wavelength than that of the first light emitting portion. Each of the first light emitting portion and the second light emitting portion has a stripe-shaped ridge structure used for carrier injection. The ridge structure in the first light emitting portion includes a first front end region having a width Wf | 09-17-2009 |
20090285254 | SEMICONDUCTOR LASER DEVICE - A semiconductor laser device has a red laser element and an infrared laser element on a substrate. The red laser element has a double hetero structure in which an InGaP-based or AlGaInP-based active layer is interposed between a first conductivity type cladding layer and a second conductivity type cladding layer having a ridge. The infrared laser element has a double hetero structure in which a GaAs-based or AlGaAs-based active layer is interposed between a first conductivity type cladding layer and a second conductivity type cladding layer having a ridge. Provided that a first electrode formed over the second conductivity type cladding layer has a width W | 11-19-2009 |
20090296765 | SEMICONDUCTOR LASER DEVICE - A semiconductor laser device includes an n-type clad layer, an active layer, and a p-type clad layer having a ridge and wing regions. The wing regions are provided with a first trench present on one side of the ridge and a second trench provided on the other side thereof being interposed therebetween. A reflectivity Rf at a front end face of a resonator, a reflectivity Rr at a rear end face of the resonator, a minimum value W | 12-03-2009 |
20100124244 | SEMICONDUCTOR LASER DEVICE - A semiconductor laser device includes a semiconductor layer including an active layer. The active layer includes: a gain region; an end face window region formed in a region of the active layer including an end face of the semiconductor layer, and having a larger band gap energy than the gain region; and a transition region formed between the gain region and the end face window region. The band gap energy of the transition region continuously changes from the band gap energy of the gain region to that of the end face window region. The gain region and a portion of the transition region located near the gain region form a current injection portion into which current is injected. The end face window region and a portion of the transition region located near the end face window region form a current non-injection portion into which current is prevented from being injected. | 05-20-2010 |
20100290496 | NITRIDE SEMICONDUCTOR LASER DEVICE - A nitride semiconductor laser device includes: an active layer made of a nitride formed on a semiconductor substrate; a stripe-shaped ridge waveguide including a cladding layer having a ridge structure in its upper portion, formed on the active layer; a first current blocking layer transparent to light generated from the active layer, formed at least on a side face of the ridge waveguide; a second current blocking layer having light absorbency, formed on a flat portion of the cladding layer on each side of the ridge waveguide at a position spaced from the side face of the waveguide; and a third current blocking layer formed on the first and second current blocking layers, wherein ηg>η1, ηg>η2, and ηg<η3 are satisfied where η1, η2, η3, and ηg are respectively the heat expansion coefficients of the first, second, and third current blocking layers and gallium nitride. | 11-18-2010 |
20100296542 | SEMICONDUCTOR LASER APPARATUS - A semiconductor laser apparatus includes, on a substrate, a first-conductivity type layer, an active layer, a second-conductivity type layer having a ridge extending along an optical waveguide direction, and a current blocking layer formed on sides of the ridge. The ridge is disposed to separate the substrate into a first region having a first width, and a second region having a second width greater than the first width, in a direction perpendicular to the optical waveguide direction. The second-conductivity type layer has a shock attenuating portion having a height greater than or equal to that of the ridge, on sides of the ridge. In the second region, a trench extending from an upper surface of the shock attenuating portion, penetrating at least the active layer, and reaching the first-conductivity type layer, is formed along the optical waveguide direction. | 11-25-2010 |
20100309941 | SEMICONDUCTOR LASER DEVICE - A semiconductor laser device includes a first semiconductor laser element and a second semiconductor laser element different in oscillation wavelength from the first semiconductor laser element, both formed on a substrate. The first and second semiconductor laser elements have a cavity length of 1500 μm or more, and each have an n-type cladding layer made of In | 12-09-2010 |
20110176568 | NITRIDE SEMICONDUCTOR LASER DIODE - A nitride semiconductor laser diode includes a second conductive cladding layer formed on an active layer, and including a ridge portion having a raised cross-sectional shape, and flat portions located on both sides of the ridge portion; a light-absorbing layer formed on each of the flat portions, and having an optical absorption coefficient larger than the second conductive cladding layer. The light-absorbing layer includes a first region provided at a side of a light-emitting facet, and having a distance Di1 from a line-symmetric axis in a longitudinal direction of the ridge portion to a side surface of the light-absorbing layer; and a second region provided at a side opposite to the light-emitting facet, and having a distance Di2 from the line-symmetric axis to the side surface of the light-absorbing layer. A relationship between the Di1 and the Di2 is represented by Di107-21-2011 | |
20110222568 | SEMICONDUCTOR LIGHT EMITTING DEVICE - A semiconductor light emitting device includes a first cladding layer | 09-15-2011 |
20110272667 | SEMICONDUCTOR LIGHT EMITTING DEVICE - A semiconductor light emitting device includes: a first cladding layer made of a first conductivity type group III nitride semiconductor; an active layer formed on the first cladding layer; a quantum well electron barrier layer which is formed on the active layer, and includes electron trapping barrier layers made of Al | 11-10-2011 |
20110286487 | SEMICONDUCTOR LASER DEVICE - A semiconductor laser device includes, on an n-type GaAs substrate, an n-type GaAs contact layer, an n-type first quantum well heterobarrier layer, an n-type AlGaInP cladding layer, a strained quantum well active layer (a first guide layer, GaInP well layers, AlGaInP barrier layers, and a second guide layer), a p-type AlGaInP cladding layer, a p-type GaInP intermediate layer, and a p-type GaAs contact layer, which are formed in this stated order. The semiconductor laser device can perform high-temperature and high-power operation at a lower operating voltage. | 11-24-2011 |