Patent application number | Description | Published |
20080255197 | CXCR4 CHEMOKINE RECEPTOR BINDING COMPOUNDS - The present invention relates to compounds that bind to chemokine receptors, and having the formula | 10-16-2008 |
20090281308 | CHEMOKINE RECEPTOR BINDING HETEROCYCLIC COMPOUNDS WITH ENHANCED EFFICACY - Compounds that interact with the CXCR4 receptor are described. These compounds are useful in treating, for Example, HIV infection and inflammatory conditions such as rheumatoid arthritis, as well as asthma or cancer, and are useful in methods to elevate progenitor and stem cell counts as well as methods to elevate white blood cell counts. | 11-12-2009 |
20120301427 | CHEMOKINE RECEPTOR BINDING HETEROCYCLIC COMPOUNDS WITH ENHANCED EFFICACY - The invention relates to heterocyclic compounds consisting of a core nitrogen atom surrounded by three pendant groups, wherein two of the three pendant groups are preferably benzimidazolyl methyl and tetrahydroquinolyl, and the third pendant group contains N and optionally contains additional rings. The compounds bind to chemokine receptors, including CXCR4 and CCR5, and demonstrate protective effects against infection of target cells by a human immunodeficiency virus (HW). | 11-29-2012 |
20150038509 | Chemokine Receptor Binding Heterocyclic Compounds With Enhanced Efficacy - The invention relates to heterocyclic compounds consisting of a core nitrogen atom surrounded by three pendant groups, wherein two of the three pendant groups are preferably benzimidazolyl methyl and tetrahydroquinolyl, and the third pendant group contains N and optionally contains additional rings. The compounds bind to chemokine receptors, including CXCR4 and CCR5, and demonstrate protective effects against infection of target cells by a human immunodeficiency virus (HIV). | 02-05-2015 |
Patent application number | Description | Published |
20080225247 | OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES - An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space. | 09-18-2008 |
20090115986 | Microlithography projection objective - Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives. | 05-07-2009 |
20090237636 | PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE SYSTEM THEREFOR - In a projection exposure method, primary radiation having a center wavelength λ is generated and guided through an illumination system along an illumination path and through a projection system along a projection path. The center wavelength is varied within a wavelength variation range Δλ having a lower limit λ | 09-24-2009 |
20110058147 | CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE - A cleaning module for an EUV lithography device with a supply ( | 03-10-2011 |
20120105958 | LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT - Disclosed is a lens module, especially a projection lens for semiconductor lithography, comprising at least one replaceable optical element that is disposed in a lens housing. At least one gas exchange device is positioned in an area of the replaceable optical element in such a way that a receiving zone for the replaceable optical element can be flushed when the optical element is replaced. | 05-03-2012 |
20130120863 | SUBSTRATES FOR MIRRORS FOR EUV LITHOGRAPHY AND THEIR PRODUCTION - For the production of mirrors for EUV lithography, substrates are suggested having a mean relative thermal longitudinal expansion of no more than 10 ppb across a temperature difference ΔT of 15° C. and a zero-crossing temperature in the range between 20° C. and 40° C. For this purpose, at least one first and one second material having low thermal expansion coefficients and opposite gradients of the relative thermal expansion as a function of temperature are selected and a substrate is produced by mixing and bonding these materials. | 05-16-2013 |
20130155509 | LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT - An optical system has a housing with a mount and an opening to a receiving region, the receiving region being located within the housing and including the mount. At least one optical element is inserted into and removed from the receiving region through the opening, and at least one gas supply device provides a flow of gas in the receiving region. Alternatively or in addition, the optical system has a gas lock that receives the optical element. The opening interconnects the gas lock and the receiving region of the housing, and accommodates passage of the optical element between the gas lock and the receiving region. | 06-20-2013 |
20140293256 | MICROLITHOGRAPHY PROJECTION OBJECTIVE - Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives. | 10-02-2014 |
20140333913 | MICROLITHOGRAPHY PROJECTION OBJECTIVE - Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives. | 11-13-2014 |
20150138521 | LENS MODULE COMPRISING AT LEAST ONE EXCHANGEABLE OPTICAL ELEMENT - An optical system has a housing with a mount and an opening to a receiving region, the receiving region being located within the housing and including the mount. At least one optical element is inserted into and removed from the receiving region through the opening, and at least one gas supply device provides a flow of gas in the receiving region. An associated method of inserting or removing an optical element into or from a receiving region in a housing is also disclosed. | 05-21-2015 |