Patent application number | Description | Published |
20120227870 | ALUMINUM-ALLOY SHEET AND METHOD FOR PRODUCING THE SAME - An aluminum-alloy sheet includes 0.10 to 0.40 mass % of Si, 0.35 to 0.80 mass % of Fe, 0.10 to 0.35 mass % of Cu, 0.20 to 0.80 mass % of Mn, and 1.5 to 2.5 mass % of Mg, the balance being Al and unavoidable impurities, wherein a content ratio (Si/Fe) of the Si to the Fe is 0.75 or less, the solute Mn content is 0.12 to 0.20 mass %, and the aluminum-alloy sheet has a proof stress of 225 N/mm | 09-13-2012 |
20120227871 | ALUMINUM-ALLOY SHEET AND METHOD FOR PRODUCING THE SAME - An aluminum-alloy sheet includes 0.10 to 0.40 mass % of Si, 0.35 to 0.80 mass % of Fe, 0.10 to 0.35 mass % of Cu, 0.20 to 0.80 mass % of Mn, and 1.5 to 2.5 mass % of Mg, the balance being Al and unavoidable impurities, wherein a content ratio (Si/Fe) of the Si to the Fe is 0.75 or less, the area fraction of Mg | 09-13-2012 |
Patent application number | Description | Published |
20080302454 | Cold-Rolled Aluminum Alloy Sheet for Bottle Can with Excellent Neck Part Formability and Process for Producing the Cold-Rolled Aluminum Alloy Sheet - A cold-rolled aluminum alloy sheet has a composition containing 0.7 to 1.5% by mass Mn, 0.8 to 1.7% by mass Mg, 0.1 to 0.7% by mass Fe, 0.05 to 0.5% by mass Si, 0.1 to 0.6% by mass Cu, and Al and inevitable impurities as other elements. In the structure of the cold-rolled aluminum alloy sheet, 50 to 400 particles of particle sizes in the range of 0.05 to 1 μm are dispersed in an area of 300 μm | 12-11-2008 |
20090053099 | ALUMINUM ALLOY SHEET WITH EXCELLENT HIGH-TEMPERATURE PROPERTY FOR BOTTLE CAN - An aluminum alloy sheet for bottle cans superior in high-temperature properties and capable of preventing thermal deformation thereof in coating and heat treatment and securing can strength after the heat treatment. The aluminum alloy sheet has the following composition: Mn 0.7-1.5%, Mg 0.8-1.7%, Fe 0.1-0.7%, Si 0.05-0.5%, Cu 0.1-0.6%, with the remainder being Al and inevitable impurities, and has a crystal structure elongated in a rolling direction and with an aspect ratio of crystal grains of 3 or more as determined through an examination from above of a part located at the center in the through-thickness direction. In the sheet, the amount of solute Cu is 0.05-0.3%, which means the amount of Cu in a solution separated from a precipitate exceeding 0.2 m in particle size by the extracted residue method using hot phenol, and the amount of solute Mg is 0.75-1.6%, which means the amount of solute Mg separated from a precipitate exceeding 0.2 m in particle size by the extracted residue method using hot phenol. The aluminum alloy sheet can have improved high-temperature properties without impairing its formability. | 02-26-2009 |
Patent application number | Description | Published |
20080317689 | Transdermal Preparation for External Use Containing Antiinflammatory/Analgesic Agent - A transdermal preparation for external use which contains a photosensitive NSAID and a UV blocker having a high ability to migrate into the skin. Thus, it becomes possible to ensure, in a transdermal preparation for external use containing a NSAID, the inhibition of the onset of light-induced non-immunological or immunological skin symptoms by the above-described component. | 12-25-2008 |
20090149794 | Adhesive Preparation - An adhesive preparation comprising a stretchable support and an adhesive layer laminated on at least one side of the support, wherein
| 06-11-2009 |
20100240758 | EXTERNAL PREPARATION FOR PERCUTANEOUS ADMINISTRATION CONTAINING NONSTEROIDAL ANTI-INFLAMMATORY ANALGESIC - An external preparation for percutaneous administration which contains a light-sensitive nonsteroidal anti-inflammatory analgesic and a UVA-shielding agent which inhibits the analgesic to cause light toxicity and a light allergy. This external preparation for percutaneous administration, which contains a nonsteroidal anti-inflammatory analgesic, can be prevented, with higher certainty, from causing the hypersensitivity to light attributable to light toxicity and a light allergy. | 09-23-2010 |
20100311700 | Transdermal preparation for external use containing nonsterioidal antiinflammatory/analgesic agent - A transdermal preparation for external use which contains a photosensitive NSAID and a UV blocker having a high ability to migrate into the skin. Thus, it becomes possible to ensure, in a transdermal preparation for external use containing a NSAID, the inhibition of the onset of light-induced non-immunological or immunological skin symptoms by the above-described component. | 12-09-2010 |
Patent application number | Description | Published |
20080292670 | Adhesive and plaster - An adhesive comprising a base with tackiness, an oil and ketoprofen, wherein the adhesive contains no L-menthol, the base is composed at least of a tacky composition comprising an elastomer and a tackifier and/or a tacky polymer containing an unsaturated monomer with a total of 5 or more carbon atoms as the monomer unit, the oil is an oil that is compatible with the tacky composition and the tacky polymer, and the oil content is 150-175 parts by weight with respect to 100 parts by weight as the total of the tacky composition and the tacky polymer. | 11-27-2008 |
20100047328 | Adhesive preparation - An adhesive preparation comprising a stretchable support and an adhesive layer laminated on at least one side of the support, wherein
| 02-25-2010 |
20100249236 | ADHESIVE AND PLASTER - An adhesive comprising a base with tackiness, an oil and ketoprofen, wherein the adhesive contains no L-menthol, the base is composed at least of a tacky composition comprising an elastomer and a tackifier and/or a tacky polymer containing an unsaturated monomer with a total of 5 or more carbon atoms as the monomer unit, the oil is an oil that is compatible with the tacky composition and the tacky polymer, and the oil content is 150-175 parts by weight with respect to 100 parts by weight as the total of the tacky composition and the tacky polymer. | 09-30-2010 |
20140371693 | ADHESIVE PREPARATION - An adhesive preparation comprising a stretchable support and an adhesive layer laminated on at least one side of the support, wherein
| 12-18-2014 |
Patent application number | Description | Published |
20100291490 | Resist pattern slimming treatment method - A resist pattern slimming treatment method includes: a slimming treatment step of performing a slimming treatment on a resist pattern by applying a solution containing an acid onto a substrate having the resist pattern formed thereon, then performing a heat treatment, and then performing a developing treatment. A database storing kinds of resist material for the resist pattern, concentrations of acid contained in a solution to be applied onto the substrate having the resist pattern formed thereon, and line widths of the resist pattern corresponding to the kinds of resist material and the concentrations of acid is prepared in advance. The concentration of the acid contained in the solution used in the slimming treatment step is based on a concentration of the acid obtained from the database, using, as search keys, the kind of resist material and a target value of the line width of the resist pattern. | 11-18-2010 |
20100291491 | Resist pattern slimming treatment method - A resist pattern slimming treatment method of performing a slimming treatment on a resist pattern formed on a substrate includes: a slimming treatment step of performing a slimming treatment on the resist pattern by applying a reactant solubilizing the resist pattern onto the resist pattern, then performing a heat treatment on the resist pattern under a heat treatment condition determined in advance, and then performing a developing treatment on the resist pattern; and a first line width measurement step of measuring a line width of the resist pattern before the slimming treatment step. The heat treatment condition is determined based on a measurement value of the line width measured in the first line width measurement step. | 11-18-2010 |
20150375170 | TREATMENT SOLUTION SUPPLY METHOD, TREATMENT SOLUTION SUPPLY APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM - A treatment solution supply method of supplying a treatment solution to a substrate, the method includes the steps of: applying a DC voltage to the treatment solution; detecting a potential difference between two points in the treatment solution in a state where the DC voltage is applied to the treatment solution; and increasing the DC voltage when the detected potential difference is less than a predetermined reference value. | 12-31-2015 |
Patent application number | Description | Published |
20090029046 | SUBSTRATE PROCESSING APPARATUS, METHOD FOR PROCESSING SUBSTRATE, AND STORAGE MEDIUM - Processing gas is supplied from the central upper part of a processing chamber to a wafer on a mounting board, while the processing chamber is exhausted from processing gas exhaust passages at areas outside of the wafer. In addition, purge gas is supplied from purge gas supply passages to a buffer chamber formed between the peripheral part or a container main body and that of a cover body. The supplied flow-rate of the processing gas is made less than the exhaust flow-rate in the processing gas exhaust passages. Accordingly, the purge gas in the buffer chamber is drawn into the processing chamber via a purge gas supply hole formed of a gap between the container main body and the cover body due to a negative pressure inside the processing chamber caused by a difference between the flow rates. | 01-29-2009 |
20110308464 | SUBSTRATE PROCESSING APPARATUS, METHOD FOR PROCESSING SUBSTRATE, AND STORAGE MEDIUM - Processing gas is supplied from the central upper part of a processing chamber to a wafer on a mounting board, while the processing chamber is exhausted from processing gas exhaust passages at areas outside of the wafer. In addition, purge gas is supplied from purge gas supply passages to a buffer chamber formed between the peripheral part of a container main body and that of a cover body. The supplied flow-rate of the processing gas is made less than the exhaust flow-rate in the processing gas exhaust passages. Accordingly, the purge gas in the buffer chamber is drawn into the processing chamber via a purge gas supply hole formed of a gap between the container main body and the cover body due to a negative pressure inside the processing chamber caused by a difference between the flow rates. | 12-22-2011 |
20120301832 | SUBSTRATE WARPAGE REMOVAL APPARATUS, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE WARPAGE REMOVAL METHOD, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM - There is provided a substrate warpage removal apparatus and method which can remove warpage of a substrate which has a patterned surface having a film with a pattern, and a non-patterned surface having a film without a pattern. The substrate warpage removal apparatus includes: a holding plate configured to hold a substrate; a processing liquid supply pipe, provided on the side of the non-patterned surface of the substrate, configured to supply an etching liquid to the surface to remove a surface film; and a first laser displacement meter and a second laser displacement meter configured to detect warpage of the substrate. When the controller, based on signals from the first laser displacement meter and the second laser displacement meter, determines that warpage of the substrate has been eliminated, the controller stops the supply of an etching liquid from the processing liquid supply pipe. | 11-29-2012 |