Patent application number | Description | Published |
20080310035 | Retractable lens camera - A retractable lens camera includes: a lens barrel; three or more lens groups provided in the lens barrel; a retracting unit that retracts the lens barrel and the lens groups into a camera body; and a displacing unit that displaces at least two lens groups to an escaping space out of an optical axis. | 12-18-2008 |
20090278959 | Camera - A camera includes an imaging unit that generates image data, an inserting-image setting unit that sets an inserting image to be inserted into an image of the image data, a first detecting unit that detects a main subject area in a subject image, a second detecting unit that detects a background area in the subject image based on the main subject area, an inserting-area selecting unit that selects an inserting area into which an inserting image is inserted from the background area, and a magnification determining unit that determines a magnification for enlargement or reduction of the inserting image in accordance with a size of the inserting area and a size of the inserting image, and thereby inserts an inserting image of an appropriate size. | 11-12-2009 |
20100194962 | Digital camera - A digital camera includes: an image processing unit that creates first display image data and second display image data; a display device that displays a first screen image and a second screen image so as to allow a user to observe the first screen image when viewed along a first direction with respect to a display face and so as to allow the user to observe the second screen image when viewed along a second direction that differs from the first direction; and a control unit that instructs the display device to display the first display image data as the first screen image, and the second display image data as the second screen image. | 08-05-2010 |
Patent application number | Description | Published |
20090213389 | WAVEFRONT ABERRATION MEASURING METHOD, MASK, WAVEFRONT ABERRATION MEASURING DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A wavefront aberration measuring device includes a mask placed in an object plane of a to-be-tested optical system and having a pattern including a pinhole producing a spherical wave and adjoining diffraction gratings each ruled with lines oriented in a direction different from the other; an illumination optical system that illuminates an area of the mask with light emitted from a light source; a light splitter that splits the light from the pattern transmitted through the to-be-tested optical system; an image pickup unit that takes an image of interference fringes produced by the split light, the image being used in measuring wavefront aberration of the to-be-tested optical system; a detector that detects respective light quantities of respective diffracted beams from the respective illuminated diffraction gratings; and a control unit that controls alignment of the illuminated area of the mask and the pattern in accordance with a detection result. | 08-27-2009 |
20090268188 | EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD - An exposure apparatus includes an illumination optical system. The illumination optical system includes a first member configured to define an illuminated region of a reflective mask having a pattern to be projected onto a substrate; a second member configured to define an illuminated region in which a measurement pattern used in measuring wavefront aberration of a projection optical system is illuminated, the second member being able to be inserted into and removed from an optical path of the illumination optical system; and a condensing mirror configured to condense light from the first member on the pattern to be projected onto the substrate and light from the second member on the measurement pattern. The illuminated region defined by the second member is smaller than the illuminated region defined by the first member. | 10-29-2009 |
20090290136 | MEASURING APPARATUS, EXPOSURE APPARATUS AND METHOD, AND DEVICE MANUFACTURING METHOD - A measuring apparatus includes a pinhole mask, located at an object plane of an optical system to be measured, and having a plurality of pinholes for generating a spherical wave from a measuring light beam, and a diffraction grating for splitting the measuring light beam that has passed the pinhole mask and the optical system, wherein Lg=m·Pg | 11-26-2009 |
20100165355 | REFRACTIVE INDEX DISTRIBUTION MEASUREMENT METHOD AND REFRACTIVE INDEX DISTRIBUTION MEASUREMENT APPARATUS - A refractive index distribution measurement method includes the steps of measuring a first transmission wavefront of a test object by introducing reference light to the test object immersed in a first medium having a first refractive index lower than that of the test object by 0.01 or more, measuring a second transmission wavefront of the test object by introducing the reference light to the test object immersed in a second medium having a second refractive index lower than that of the test object by 0.01 or more and different from the first refractive index, and obtaining a refractive index distribution of the test object based on a measurement result of the first transmission wavefront and a measurement result of the second transmission wavefront. | 07-01-2010 |
20100190115 | MEASUREMENT APPARATUS, EXPOSURE APPARATUS HAVING THE SAME, AND DEVICE MANUFACTURING METHOD - A measurement apparatus includes a first mask that is arranged on an object plane of a target optical system, and has a window that transmits measurement light, a second mask that has a reflection surface for reducing coherence of the measurement light, and a diffraction grating configured to split the measurement light that has been reflected on the second mask, has passed the first mask and the target optical system, wherein a distance Lg between the diffraction grating and an image plane of the target optical system satisfies Lg=m·Pg | 07-29-2010 |
20100245842 | TRANSMITTED WAVEFRONT MEASURING METHOD, REFRACTIVE-INDEX DISTRIBUTION MEASURING METHOD, METHOD OF MANUFACTURING OPTICAL ELEMENT, AND TRANSMITTED WAVEFRONT MEASURING APPARATUS - A transmitted wavefront measuring method comprises the steps of emitting light | 09-30-2010 |
20100271636 | TALBOT INTERFEROMETER, ITS ADJUSTMENT METHOD, AND MEASUREMENT METHOD - A Talbot interferometer includes a diffraction grating, an image pickup device, a moving unit configured to move at least one of the diffraction grating and the image pickup device in an optical axis direction of the test object, and a computer configured to adjust a position of the at least one of the diffraction grating and the image pickup device using the moving unit so that a Talbot condition can be met, based on a spatial frequency spectrum obtained from a plurality of interference fringes captured by the image pickup device while moving the at least one of the diffraction grating and the image pickup device using the moving unit. | 10-28-2010 |
20110134438 | REFRACTIVE INDEX DISTRIBUTION MEASURING METHOD AND REFRACTIVE INDEX DISTRIBUTION MEASURING APPARATUS - The measuring method includes a step of causing reference light to enter an object placed in a first medium to measure a first transmitted wavefront, a step of causing the reference light to enter the object placed in a second medium to measure a second transmitted wavefront, a step of measuring first and second placement positions where the object is placed in the first and second media, and a calculating step of calculating an internal refractive index distribution of the object by using measurement results of the first and second transmitted wavefronts. The calculating step calculates the internal refractive index distribution from which a shape component of the object is removed by using the measurement results of the first and second transmitted wavefronts, and first and second reference transmitted wavefronts of a reference object to be placed at positions identical to the first and second placement positions. | 06-09-2011 |
20110292379 | REFRACTIVE INDEX DISTRIBUTION MEASURING METHOD AND REFRACTIVE INDEX DISTRIBUTION MEASURING APPARATUS - A method includes the steps of measuring a first transmitted wavefront in a first medium having a first refractive index and a second transmitted wavefront in a second medium having a second refractive index different from the first refractive index, and obtaining a refractive index distribution projected value of the object in each orientation by removing a shape component of the object utilizing measurement results of the first transmitted wavefront and the second transmitted wavefront and each transmitted wavefront of a reference object that has the same shape as that of the object and a specific refractive index distribution and is located in one of the first medium and the second medium with the same orientation as that of the object, and calculating a three-dimensional refractive index distribution of the object based on a plurality of refractive index distribution projected values corresponding to the plurality of orientations. | 12-01-2011 |
20120139136 | REFRACTIVE INDEX DISTRIBUTION MEASURING METHOD, REFRACTIVE INDEX DISTRIBUTION MEASURING APPARATUS AND METHOD OF PRODUCING OPTICAL ELEMENT - The method measures first transmitted wavefronts and second transmitted wavefronts by respectively causing reference light to enter an object placed in plural placement states in a first medium and a second medium, calculates an aberration sensitivity with respect to changes of the placement state of the object, and calculates an alignment error of the object in each placement state by using the aberration sensitivity and the first and second transmitted wavefronts measured in each placement state. The method further calculates first and second reference transmitted wavefronts respectively acquirable when causing the reference light to enter the reference object placed in placement states including the alignment errors in the first medium and the second medium, and calculates a refractive index distribution of the object which a shape component thereof is removed, by using the first and second transmitted wavefronts and the first and second reference transmitted wavefronts. | 06-07-2012 |
20140293275 | WAVEFRONT ABERRATION MEASURING METHOD, WAVEFRONT ABERRATION MEASURING APPARATUS AND OPTICAL ELEMENT MANUFACTURING METHOD - The wavefront aberration measuring method includes measuring an intensity distribution of a measuring light transmitted through or reflected by an object to be measured, by using a light-receiving sensor, calculating a first differential wavefront which is a differential wavefront of the measuring light on the light-receiving sensor, and calculating a second differential wavefront by performing a correction process on the first differential wavefront depending on an incident angle of the measuring light to the light-receiving sensor. The method further includes calculating a wavefront aberration of the object by using the second differential wavefront. | 10-02-2014 |
Patent application number | Description | Published |
20100260493 | IMAGE SHAKE CORRECTION APPARATUS AND IMAGE PICKUP APPARATUS - A third group barrel | 10-14-2010 |
20110026137 | LENS APPARATUS CAPABLE OF PERFORMING EXTENSION/RETRACTION OPERATION WITH RESPECT TO IMAGE PICKUP APPARATUS BODY AND IMAGE PICKUP APPARATUS HAVING THE SAME - A lens apparatus of the present invention includes a cam ring | 02-03-2011 |
20110032616 | OPTICAL UNIT AND OPTICAL APPARATUS - The optical unit includes a base member, a shift member configured to hold an image stabilizing lens and to be movable with respect to the base member in a plane orthogonal to an optical axis to reduce image blur, and an image stabilizing actuator configured to shift the shift member. The optical unit further includes a light controlling member disposed further inside than the image stabilizing actuator in a direction orthogonal to the optical axis and in an area where the image stabilizing actuator is disposed in a direction parallel to the optical axis. | 02-10-2011 |
20110069397 | IMAGE PICKUP APPARATUS HAVING LENS BARREL - An image pickup apparatus includes a lens barrel. The lens barrel is configured to move first and second optical units in an optical axis direction for zooming. The lens barrel includes a linear movement cylinder that includes a key configured to guide the first optical unit, a rotation cylinder that includes an outer circumferential cam and an inner circumferential cam, the rotation cylinder being configured to rotate around an optical axis so as to move the first optical unit in the optical axis direction through the outer circumferential cam and so as to move the second optical unit in the optical axis direction through the inner circumferential cam, and a guide bar held by the linear movement cylinder and configured to guide the second optical unit in the optical axis direction. | 03-24-2011 |
20110141580 | IMAGE PICKUP APPARATUS HAVING LENS BARREL - An image pickup apparatus includes a lens barrel. The lens barrel is configured to move first and second optical units in an optical axis direction for zooming. The lens barrel includes a linear movement cylinder that includes a key configured to guide the first optical unit, a rotation cylinder that includes an outer circumferential cam and an inner circumferential cam, the rotation cylinder being configured to rotate around an optical axis so as to move the first optical unit in the optical axis direction through the outer circumferential cam and so as to move the second optical unit in the optical axis direction through the inner circumferential cam, and a guide bar held by the linear movement cylinder and configured to guide the second optical unit in the optical axis direction. | 06-16-2011 |