Patent application number | Description | Published |
20120205654 | SILICON LAYERS FORMED FROM POLYMER-MODIFIED LIQUID SILANE FORMULATIONS - The invention relates to a formulation which contains at least one silane and at least one carbon polymer in a solvent, and to the production of a silicon layer on a substrate which is coated with such a formulation. | 08-16-2012 |
20120214005 | METHOD FOR PRODUCING HYDRIDOSILANES - The invention relates to a method for producing hydridosilanes from halosilanes by a) reacting i) at least one halosilane of the generic formula Si | 08-23-2012 |
20120273805 | METHOD FOR PRODUCING SILICON LAYERS - The invention relates to a liquid-phase method for the thermal production of silicon layers on a substrate, wherein at least one higher silicon that can be produced from at least one hydridosilane of the generic formula Si | 11-01-2012 |
20120291665 | METHOD FOR OLIGOMERIZING HYDRIDOSILANES, THE OLIGOMERS THAT CAN BE PRODUCED BY MEANS OF THE METHOD, AND THE USE THEREOF - The present invention relates to a method for oligomerizing hydridosilanes, wherein a composition comprising substantially at least one non-cyclic hydridosilane having a maximum of 20 silicon atoms as the hydridosilane is thermally converted at temperatures below 235° C. in the absence of a catalyst, the oligomers that can be produced according to the method, and the use thereof. | 11-22-2012 |
20130168824 | P-DOPED SILICON LAYERS - The invention relates to a process for producing p-doped silicon layers, especially those silicon layers which are produced from liquid silane-containing formulations. The invention further relates to a substrate coated with a p-doped silicon layer. The invention additionally relates to the use of particular dopants based on boron compounds for p-doping of a silicon layer. | 07-04-2013 |
20130183223 | METHOD FOR PRODUCING HIGHER HYDRIDOSILANE COMPOUNDS - The present invention relates to a rapid and metal-free process for preparing high order hydridosilane compounds from low order hydridosilane compounds, wherein at least one low order hydridosilane compound (I) is thermally reacted in the presence of at least one hydridosilane compound (II) having a weight average molecular weight of at least 500 g/mol, to the hydridosilane compounds obtainable by the process and to their use. | 07-18-2013 |
20130240892 | METHOD FOR CONVERTING SEMICONDUCTOR LAYERS - The present invention relates to a process for conversion of semiconductor layers, especially for conversion of amorphous to crystalline silicon layers, in which the conversion is effected by treating the semiconductor layer with a plasma which is generated by a plasma source equipped with a plasma nozzle ( | 09-19-2013 |
20130259790 | PROCESS FOR PREPARING HIGHER HALOSILANES AND HYDRIDOSILANES - The invention relates to a process for preparing higher halosilanes by disproportionation of lower halosilanes. The invention further relates to a process for preparing higher hydridosilanes from the higher halosilanes prepared by disproportionation. The invention further relates to mixtures containing at least one higher halosilane or at least one higher hydridosilane prepared by the process described. Finally, the invention relates to the use of such a mixture containing at least one higher hydridosilane for producing electronic or optoelectronic component layers or for producing silicon-containing layers. | 10-03-2013 |
20130328175 | METHOD FOR THE HYDROGEN PASSIVATION OF SEMICONDUCTOR LAYERS - The present invention relates to a method for the hydrogen passivation of semiconductor layers, wherein the passivation is effected by using an arc plasma source, to the passivated semiconductor layers produced according to the method, and to the use thereof. | 12-12-2013 |
Patent application number | Description | Published |
20100022091 | METHOD FOR PLASMA ETCHING POROUS LOW-K DIELECTRIC LAYERS - Described herein are methods and apparatuses for etching low-k dielectric layers to form various interconnect structures. In one embodiment, the method includes forming an opening in a resist layer. The method further includes etching a porous low-k dielectric layer with a process gas mixture that includes a fluorocarbon gas and a carbon dioxide (CO | 01-28-2010 |
20100043821 | METHOD OF PHOTORESIST REMOVAL IN THE PRESENCE OF A LOW-K DIELECTRIC LAYER - Described herein are methods and apparatus for removing photoresist in the presence of low-k dielectric layers. In one embodiment, the method includes exciting a first mixture of gases having a ratio of a flow rate of reducing process gas to a flow rate of an oxygen-containing process gas that is between 1:1 and 100:1 to generate a first reactive gas mixture. Next, the method includes exposing the photoresist layer that overlays the low-k dielectric layer on a substrate to the first reactive gas mixture to selectively remove the photoresist layer from the dielectric layer. Next, the method includes exposing the photoresist layer to a second reactive gas mixture to selectively remove the photoresist layer from the dielectric layer. The first and second reactive gas mixtures contain substantially no ions when the substrate is exposed to these mixtures in order to minimize damage to the low-k dielectric layer. | 02-25-2010 |
20110253670 | METHODS FOR ETCHING SILICON-BASED ANTIREFLECTIVE LAYERS - Methods for etching silicon-based antireflective layers are provided herein. In some embodiments, a method of etching a silicon-based antireflective layer may include providing to a process chamber a substrate having a multiple-layer resist thereon, the multiple-layer resist comprising a patterned photoresist layer defining features to be etched into the substrate disposed above a silicon-based antireflective coating; and etching the silicon-based antireflective layer through the patterned photoresist layer using a plasma formed from a process gas having a primary reactive agent comprising a chlorine-containing gas. In some embodiments, the chlorine-containing gas is chlorine (Cl | 10-20-2011 |
Patent application number | Description | Published |
20100158810 | Enhanced 13C NMR By Thermal Mixing With Hyperpolarized 129XE - A method of preparing a hydrogen-containing | 06-24-2010 |
20130281830 | System and Method for Improved Lung Fourier Decomposition Magnetic Resonance Imaging - A system and method for producing a more accurate ventilation image, as compared to existing lung Fourier decomposition methods, and an image of ventilation dependent blood volume are provided. A time series of images depicting a subject's lungs during free-breathing are acquired and co-registered to a reference image. From the registration process, geometric information indicative proton density changes due to inhalation and exhalation of gas is obtained. This geometric information is used to correct the proton density values in the time series of image frames. These corrected proton density values are Fourier transformed to produce a Fourier spectrum, from which a signal peak occurring at the breathing frequency is extracted and Fourier transformed to produce a more accurate ventilation image. This more accurate ventilation image can be subtracted from a breathing frequency image produced by conventional lung Fourier decomposition methods to produce a ventilation dependent blood volume image. | 10-24-2013 |
20140155732 | SYSTEMS AND METHODS FOR PORTABLE MAGNETIC RESONANCE MEASUREMENTS OF LUNG PROPERTIES - A portable magnetic resonance (MR) system for quantitatively measuring properties of a subject's lungs, such as regional ventilation and lung density, is provided. The portable MR system includes a magnet, radio frequency (RF) coil assembly, and spectrometer system. The magnet can be positioned near the subject's chest. The magnetic field of the magnet substantially homogeneous in a region-of-interest located at a distance from the surface of the magnet that localizes the region-of-interest in the subject's lung. The RF coil assembly includes one or more RF coils that are sized to be positioned near the subject's chest, and receives MR signals from the region-of-interest. The spectrometer system controls the RF coil assembly and computes from the acquired MR signals, a quantitative metric indicative of a characteristic of the subject's lung in the region-of-interest. An active noise cancellation system is provided so RF shielding of the portable MR system is not required. | 06-05-2014 |
Patent application number | Description | Published |
20110110565 | METHOD AND SYSTEM FOR CHECKING THE DIAGNOSTIC QUALITY OF A MEDICAL SYSTEM - A system and a method are provided that may be used to determine the suitability of a client for use in medical diagnosis. Multimedia content may be presented on the client and used to elicit responses from a user indicative of the suitability of the client for use in medical diagnosis. The elicited responses may be used to determine the suitability of the client for medical diagnosis. | 05-12-2011 |
20120291097 | SYSTEM AND METHOD FOR MULTI-TASKING OF A MEDICAL IMAGING SYSTEM - A medical imaging system capable of acquiring medical imaging data of a patient includes a console coupled to the system, the console comprising a computer programmed to enable a first user to perform a first task on the system via the console, and enable a second user to perform a second task simultaneously with the first task via a remote device. | 11-15-2012 |
20120324397 | SYSTEM AND METHOD FOR WIRELESS INTERACTION WITH MEDICAL IMAGE DATA - A system and method includes transmission of a request over a wireless network for a first image having a first resolution from a server coupled to a medical image database, display of the first image on a GUI of a personal device, receipt of a command to modify the first image, and transmission of a request over the network to the server to generate a transient image responsive to the command, the transient image having a second resolution lower than the first resolution. The system also includes display of the transient image on the GUI and comparison of an inactive period with a threshold. If the inactive period exceeds the threshold, the system includes transmission of a request over the network to the server to generate a second image and display the second image on the GUI, the second image corresponding to the transient image and having the first resolution. | 12-20-2012 |
20140098931 | DUAL DISPLAY CT SCANNER USER INTERFACE - A user interface for a CT imaging system is disclosed. The user interface includes a first display configured to enable an operator to perform set-up and scanning tasks associated with performing a CT exam on one or more patients, with the set-up and scanning tasks including acquiring and verifying scan image data. The user interface also includes a second display configured to enable the operator to perform image post-processing tasks associated with the CT exams on the one or more patients, with the image post-processing tasks including performing image reconstructions and reformats. Each of the first display and the second display are operable independent from one another to provide for parallel workflows between the first display and second display and between the patient set-up and scanning tasks and the post-processing tasks. | 04-10-2014 |
20140098932 | DUAL DISPLAY CT SCANNER USER INTERFACE - A CT user interface includes first and second displays that selectively display distinct display zones thereon. The first display includes a zone enabling the operator to create a record for each of a plurality of patients and an exam set-up and a protocol selection zone enabling the operator to select a scan protocol for performing a CT scan on a selected patient. A task list zone on the first display displays all steps and sub-steps of a CT scan for a selected patient based on the selected scan protocol, and a settings zone and a scanning zone on the first display displays and enables operator selection of a plurality of scan parameters related to the selected scan protocol. Any general user interface elements not needed for the selected scan protocol are not displayed on the first and second displays, so as to simplify the user interface for the operator. | 04-10-2014 |
20140098933 | DUAL DISPLAY CT SCANNER USER INTERFACE - A CT user interface includes first and second displays that enable an operator to perform set-up and scanning tasks associated with performing CT scans and enable the operator to perform image post-processing tasks associated with the CT scans. A plurality of distinct display zones are selectively displayed on the first and second displays, with the first display displaying a zone enabling the operator to create a record for each of a plurality of patients, a task list zone displaying all steps and sub-steps of a CT scan to be performed for a selected patient based on a selected scan protocol, a settings zone and a scanning zone displaying and enabling operator selection of scan parameters related to the selected scan protocol for the selected patient, and a dose area zone displaying a relationship between the selected scan parameters and a radiation dosage experienced by the patient based thereon. | 04-10-2014 |