Hisai, JP
Akihiro Hisai, Kyoto JP
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20090103960 | DEVELOPING APPARATUS - A developing apparatus disclosed includes a spin chuck for spinnably holding a substrate, a developer nozzle having a plurality of exhaust ports arranged in a row for discharging a developer, the developer nozzle causing the developer discharged from the exhaust ports to impinge in separate streams on the substrate, a horizontal movement mechanism for moving the developer nozzle in one direction extending to the center of the substrate in plan view while maintaining a direction of arrangement of the exhaust ports in the one direction, thereby to move the developer nozzle between substantially the center and an edge of the substrate in plan view, and a controller for controlling the spin chuck and horizontal movement mechanism to cause the separate streams of the developer discharged from the exhaust ports to impinge spirally on the substrate, thereby to develop the substrate. | 04-23-2009 |
20100159142 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit. | 06-24-2010 |
20100190116 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to an interface block. The interface block comprises a drying processing group including two drying processing units and an interface transport mechanism. After a substrate is subjected to exposure processing by the exposure device, the substrate is transported to the drying processing units in the drying processing group by the interface transport mechanism, where the substrate is subjected to cleaning and drying processings. | 07-29-2010 |
20120122038 | DEVELOPING APPARATUS - A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other. | 05-17-2012 |
Akihiro Hisai, Shimogyo-Ku JP
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20080203058 | SUBSTRATE DEVELOPING METHOD AND DEVELOPING APPARATUS - A method for developing a substrate includes a developing step for supplying a developer to the substrate, and a neutralizing and removing step for supplying a treating solution containing a neutralizing material to the substrate to neutralize the developer, and neutralizing the developer and removing the developer from the substrate. In the neutralizing and removing step, the developer is neutralized by the treating solution. This neutralization reaction forms a product (salt) which easily melts into the treating solution and does not precipitate. Thus, the product is removable from the substrate along with the treating solution. Therefore, the developer is inhibited from remaining on the substrate. As a result, it is possible to prevent post-develop defects due to “residues of the developer” or the developer remaining on the substrate. | 08-28-2008 |
Akihiro Hisai, Kyoto-Shi JP
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20110135820 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - After a solvent is discharged onto a substrate in a period from a time point t | 06-09-2011 |
Kenji Hisai, Tochigi-Ken JP
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20090211694 | VIBRATION WELDING METHOD AND VIBRATION WELDING APPARATUS - In a vibration welding method and a vibration welding apparatus, a base plate and a vibrating plate which can be vibrated relatively to each other clamp an instrument panel, a storage box, and a duct as layers therebetween, which are joined to each other under pressure with vibration. A protective member of urethane is disposed on a workpiece rest for placing the base plate thereon. The storage box is made of a material having a relatively low melting point, and the duct is made of a material having a relatively high melting point. The thickness of the protective member is different depending on the location where the protective member supports the resin base, and the storage box or the duct. | 08-27-2009 |
Kenji Hisai, Hagagun JP
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20100036646 | ANALYTICAL MODEL PREPARATION METHOD, AND SIMULATION SYSTEM METHOD FOR PREDICTING MOLDING FAILURE - There is provided a method for preparing an analytical model for analyzing a shape of a molded part. The method includes: (a) measuring the shape of the molded part three-dimensionally to obtain shape data; (b) dividing the shape data into two surfaces which define a thickness of the molded part; (c) calculating a deviation between the divided two surfaces, as thickness data; (d) relating the thickness data with the shape data; (e) preparing a shape model of the molded part from CAD data related to the molded part; (f) associating the shape model with the shape data; and (g) imparting, to shape model, the thickness data related with the shape data in accordance with the association in step (f), thereby preparing the analytical model. | 02-11-2010 |
Shigeyuki Hisai, Hyogo JP
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20080281549 | Test Apparatus for Control Unit, Pattern Signal Creating Apparatus, and Test Program Generating Apparatus - An apparatus for assisting the creation of a test program, to be run on a simulator that automatically tests an electronic unit, to thereby reduce the number of preparatory steps and enhance the reliability of the automatic testing. The apparatus is a test apparatus including: a simulating unit for simulating a target to be controlled by a control unit; and a testing unit for testing the operation of the control unit based on a relationship between a pattern signal input to the control unit and an output signal output from the simulating unit in response to the pattern signal, wherein the testing unit tests the operation of the control unit at predetermined timing and, if a decision is not obtained that the control unit is operating properly, retries the decision a predetermined number of times. | 11-13-2008 |
Yoshirou Hisai, Osaka JP
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20100175432 | WASHING AND DRYING APPARATUS AND METHOD OF CONTROLLING THE SAME - A washer-dryer apparatus has a blower for sucking air from a water tank and blowing the air into a washing and dewatering tub. At an inlet of the blower is provided a filter, which is cleaned by a cleaning device ( | 07-15-2010 |