Patent application number | Description | Published |
20090202557 | Compositions and methods for crystallizing antibody fragments - The invention provides methods of crystallizing antibodies and fragments thereof as well as crystals produced thereby. More particularly, the invention provides methods of crystallizing human and non-human Fab fragments of antibodies, either alone or as co-crystals with their target ligand. For example, a crystal comprising a murine Fab fragment of the antibody 125-2H or a human Fab fragment of the antibody ABT-325, which bind to IL-18, are provided as well as a co-crystal of a murine Fab fragment bound to IL-18. ABT-325 and 125-2H differ significantly in combining site character and architecture, thus explaining their ability to bind IL-18 simultaneously at distinct epitopes. | 08-13-2009 |
20090215992 | Dual variable domain immunoglobulin and uses thereof - The present invention relates to engineered multivalent and multispecific binding proteins, methods of making, and specifically to their uses in the prevention and/or treatment of acute and chronic inflammatory and other diseases. | 08-27-2009 |
20090311253 | Dual Variable Domain Immunoglobulins and Uses Thereof - The present invention relates to engineered multivalent and multispecific binding proteins, methods of making, and specifically to their uses in the prevention, diagnosis, and/or treatment of disease. | 12-17-2009 |
20100047239 | Dual variable domain immunoglobulin and uses thereof - The present invention relates to engineered multivalent and multispecific binding proteins, methods of making, and specifically to their uses in the prevention and/or treatment of acute and chronic inflammatory and other diseases. | 02-25-2010 |
20100221179 | IL-1 Binding Proteins - The present invention encompasses IL-1α binding proteins. Specifically, the invention relates to antibodies that are chimeric, CDR grafted and humanized antibodies. Antibodies of the invention have high affinity for IL-1α and neutralize IL-1α activity. An antibody of the invention can be a full-length antibody or an antigen-binding portion thereof. Method of making and method of using the antibodies of the invention are also provided. The antibodies, or antibody portions, of the invention are useful for detecting IL-1α and for inhibiting IL-1α activity, e.g., in a human subject suffering from a disorder in which IL-1α activity is detrimental. | 09-02-2010 |
20100233079 | Dual Variable Domain Immunoglobulins and Uses Thereof - The present invention relates to engineered multivalent and multispecific binding proteins, methods of making, and specifically to their uses in the prevention, diagnosis, and/or treatment of disease. | 09-16-2010 |
20110165066 | INTERLEUKIN-13 BINDING PROTEINS - The present invention encompasses IL-13 binding proteins. Specifically, the invention relates to antibodies that are chimeric, CDR grafted and humanized antibodies. Preferred antibodies have high affinity for hIL-13 and neutralize hIL-13 activity in vitro and in vivo. An antibody of the invention can be a full-length antibody or an antigen-binding portion thereof. Method of making and method of using the antibodies of the invention are also provided. The antibodies, or antibody portions, of the invention are useful for detecting hIL-13 and for inhibiting hIL-13 activity, e.g., in a human subject suffering from a disorder in which hIL-13 activity is detrimental. | 07-07-2011 |
20130280253 | IL-1 BINDING PROTEINS - The present invention encompasses IL-1α binding proteins. Specifically, the invention relates to antibodies that are chimeric, CDR grafted and humanized antibodies. Antibodies of the invention have high affinity for IL-1α and neutralize IL-1α activity. An antibody of the invention can be a full-length antibody or an antigen-binding portion thereof. Method of making and method of using the antibodies of the invention are also provided. The antibodies, or antibody portions, of the invention are useful for detecting IL-1α and for inhibiting IL-1α activity, e.g., in a human subject suffering from a disorder in which IL-1α activity is detrimental. | 10-24-2013 |
20140335014 | IL-1 ALPHA DUAL VARIABLE DOMAIN IMMUNOGLOBULINS AND USES THEREOF - The present invention relates to engineered multivalent and multispecific binding proteins, methods of making, and specifically to their uses in the prevention, diagnosis, and/or treatment of disease. | 11-13-2014 |
Patent application number | Description | Published |
20090139873 | Leveler compounds - Plating baths containing a mixture of leveling agents, where the mixture includes a first level agent having a first diffusion coefficient and a second leveling agent having a second diffusion coefficient, are provided. Such plating baths deposit a metal layer, particularly a copper layer, that is substantially planar across a range of electrolyte concentrations. Methods of depositing metal layers using such plating baths are also disclosed. These baths and methods are useful for providing a planar layer of copper on a substrate having small apertures, such as an electronic device. | 06-04-2009 |
20100183976 | Compositions and processes for photolithography - Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing. | 07-22-2010 |
20100183977 | Compositions and processes for photolithography - Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing. | 07-22-2010 |
20100297550 | Compositions comprising sulfonamide material and processes for photolithography - New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sulfonamide substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing. | 11-25-2010 |
20100304290 | Compositions and processes for photolithography - New photoresist compositions are provided that are useful for immersion lithography. In one preferred aspect, photoresist composition are provided that comprise: (i) one or more resins that comprise photoacid-labile groups, (ii) a photoactive component, and (iii) one or more materials that comprise photoacid labile groups and that are distinct from the one or more resins; wherein the deprotection activation energy of photoacid-labile groups of the one or more materials is about the same as or lower than the deprotection activation energy of photoacid-labile groups of the one or more resins. In another preferred aspect, photoresist compositions are provided that comprise (i) one or more resins, (ii) a photoactive component, and (iii) one or more materials that comprise a sufficient amount of acidic groups to provide a dark field dissolution rate of at least one angstrom per second. | 12-02-2010 |
20110223535 | PHOTORESIST COMPRISING NITROGEN-CONTAINING COMPOUND - New nitrogen-containing compounds are provided that comprise multiple hydroxyl moieties and photoresist compositions that comprise such nitrogen-containing compounds. Preferred nitrogen-containing compounds comprise 1) multiple hydroxyl substituents (i.e. 2 or more) and 2) one or more photoacid-labile groups. | 09-15-2011 |
20120077120 | PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT - New photoresist compositions are provided that comprise a component that comprises two or more amide groups. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and a multi-amide component that can function to decrease undesired photogenrated-acid diffusion out of unexposed regions of a photoresist coating layer | 03-29-2012 |
20120156595 | COMPOSITIONS COMPRISING SUGAR COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY - New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sugar substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing. | 06-21-2012 |
20120171626 | COMPOSITIONS COMPRISING BASE-REACTIVE COMPONENT AND PROCESSES FOR PHOTOLITHOGRAPHY - New photoresist compositions are provided that comprise one or more materials that have base-reactive groups and are particularly useful for dry lithography. Particularly preferred photoresists of the invention can exhibit reduced defects following development of a coating layer of the resist. | 07-05-2012 |
20120225384 | COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY - Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing. | 09-06-2012 |
20120301823 | POLYMER COMPOSITION AND PHOTORESIST COMPRISING THE POLYMER - A copolymer comprises the polymerized product of a base-soluble monomer of formula (I): | 11-29-2012 |
20130017487 | COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY - Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing. | 01-17-2013 |
20130137035 | SURFACE ACTIVE ADDITIVE AND PHOTORESIST COMPOSITION COMPRISING SAME - A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): | 05-30-2013 |
20130244178 | PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT - New photoresist compositions are provided that comprise a component that comprises two or more amide groups. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and a multi-amide component that can function to decrease undesired photogenrated-acid diffusion out of unexposed regions of a photoresist coating layer | 09-19-2013 |
20130344439 | PHOTORESISTS COMPRISING AMIDE COMPONENT - New photoresist compositions are provided that comprise a component that comprises an amide group and multiple hydroxyl groups. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and an amide component with multiple hydroxyl groups that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer | 12-26-2013 |
20140065540 | PHOTORESIST AND COATED SUBSTRATE COMPRISING SAME - A polymer includes the polymerized product of monomers including a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): | 03-06-2014 |
20140120469 | THERMAL ACID GENERATORS FOR USE IN PHOTORESIST - New photoresist compositions are provided that comprise a component that comprises a thermal acid generator and a quencher. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and at least one thermal acid generator and at least one quencher that can function to improve line width roughness and photospeed. | 05-01-2014 |
20140120470 | PHOTORESISTS COMPRISING IONIC COMPOUND - New photoresist compositions are provided that comprise a component that comprises a radiation-insensitive ionic compound. Preferred photoresists of the invention may comprise a resin with photoacid-labile groups; a photoacid generator compound; and a radiation-insensitive ionic compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer. | 05-01-2014 |
20140295348 | COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY - Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing. | 10-02-2014 |
Patent application number | Description | Published |
20080200283 | Golf ball layer compositions comprising modified amine curing agents - Polyurethane-based and polyurea-based compositions including modified amine curing agents for use in golf ball layers where modified amine curing agent of the invention allows control of the reaction rate by providing a composition with both primary and secondary amine linkages. | 08-21-2008 |
20090105013 | ULTRAVIOLET LIGHT RESISTANT POLYMER COMPOSITIONS AND METHODS OF MAKING AND USING - Curable polyurethane/polyurea hybrid compositions that are particularly useful, when cured, as the outer layer and/or at least one inner layer of golf balls, are disclosed. Cured compositions are also disclosed. In addition, methods of increasing the ultraviolet light resistance of a golf ball layer using the curable polyurethane/polyurea hybrid compositions are disclosed. In addition, processes of making the polymer compositions are disclosed. | 04-23-2009 |
20100144467 | COMPOSITIONS USEFUL IN GOLF BALLS - Curable polyurethane, polyurea and polyurethane/polyurea compositions that are particularly useful as the outer layer and/or at least one inner layer of golf balls, cured compositions, golf balls comprising the cured composition, and methods of increasing the initial velocity of a golf ball using the curable polyurethane, polyurea and polyurethane/polyurea compositions are disclosed. | 06-10-2010 |
20100240469 | COMPOSITIONS FOR GOLF EQUIPMENT - The present invention is directed to golf balls having at least one layer formed from a polyurea composition. The polyurea is formed by combining a polyurea prepolymer, a polyamine curative, and a tin catalyst. Golf balls of the present invention include one-piece, two-piece, multi-layer, and wound golf balls. The composition may be present in any one or more of a core layer, a cover layer, or an intermediate layer. | 09-23-2010 |
20110130222 | COMPOSITIONS FOR GOLF EQUIPMENT - The present invention is directed to golf balls having at least one layer formed from a polyurea composition. The polyurea is formed by combining a polyurea prepolymer, a polyamine curative, and a tin catalyst. Golf balls of the present invention include one-piece, two-piece, multi-layer, and wound golf balls. The composition may be present in any one or more of a core layer, a cover layer, or an intermediate layer. | 06-02-2011 |
20130053185 | Compositions Useful in Golf Balls - Curable polyurethane, polyurea and polyurethane/polyurea compositions that are particularly useful as the outer layer and/or at least one inner layer of golf balls, cured compositions, golf balls comprising the cured composition, and methods of increasing the initial velocity of a golf ball using the curable polyurethane, polyurea and polyurethane/poly urea compositions are disclosed. | 02-28-2013 |
Patent application number | Description | Published |
20080249633 | Biodegradable Materials and Methods of Use - The present invention provides novel and inventive biodegradable and biocompatible materials and methods of use in biomedical area. Inventive materials can be formed by blending PLGA with ACP or any one of their family members. Inventive materials can be used in making biodegradable products including but not limit to drug eluting stents, vascular graft, bone substitutes such as bone fixation screws, surgical sutures and anti-adhesive membranes, and/or drug-slow release control vehicle etc. | 10-09-2008 |
20090136558 | Anti-Restenosis Coatings and Uses Thereof - The present invention provides coatings or coating compositions for implantable or insertable medical devices containing one or more polymers and a combination of an immunosuppressant agent and an anti-neoplastic agent. In some embodiments, the coatings or coating compositions of the invention control sustained-release of the immunosuppressant agent and the anti-neoplastic agent for at least about 4 weeks. The present invention also provides implantable or insertable medical devices and other drug delivery or eluting systems containing a coating or coating composition of the invention and uses thereof. | 05-28-2009 |
20110118827 | Biodegradable stent formed with polymer-bioceramic nanoparticle composite and method of making the same - The present invention relates to biodegradable medical devices such as stents manufactured from biodegradable polymeric-bioceramic nanoparticle composites. The invented medical devices include at least one bioceramic nanoparticle dispersed in at least one biodegradable polymer, wherein the said biodegradable polymers include biodegradable polyesters. The device and methods to disperse one or more bioceramic nanoparticle, wherein the said bioceramic nanoparticle include, but are not limited to, amorphous calcium phosphate (ACP), dicalcium phosphate (DCP), tricalcium phosphate (TCP), pentacalcium hydroxyl Apatite (HAp), tetracalcium phosphate monoxide (TTCP) and combinations or analogues thereof. Other embodiments include methods of fabricating biodegradable stent with said polymeric-nanoparticle composites. | 05-19-2011 |
20120277844 | Biodegradable Drug Eluting stent Pattern - In embodiment, pattern for polymeric radially expandable implantable medical devices such as stents for implantation into a bodily lumen are disclosed. | 11-01-2012 |
20130084322 | DRUG-IMPREGNATED BIODEGRADABLE STENT AND METHODS OF MAKING THE SAME - The present invention relates to a drug-impregnated implantable medical device such as stent manufactured from polymers, and more particularly, biodegradable polymers including biodegradable polyesters. The invented medical devices include at least one therapeutic agent impregnated in at least one biodegradable polymer wherein at least a portion of the therapeutic agent in this polymer is crystalline. The device and methods to impregnated one or more therapeutic agents, where each therapeutics agent may be chosen from the following categories: immunosuppressant agents, anti-neoplastic agents and anti-inflammatory agents were disclosed. Other embodiments include methods of fabricating drug-impregnated implantable medical devices. | 04-04-2013 |
20140142686 | BIODEGRADABLE STENT FORMED WITH POLYMER-BIOCERAMIC NANOPARTICLE COMPOSITE AND METHOD OF MAKING THE SAME - The present invention relates to biodegradable medical devices such as stents manufactured from biodegradable polymeric-bioceramic nanoparticle composites. The invented medical devices include at least one bioceramic nanoparticle dispersed in at least one biodegradable polymer, wherein the said biodegradable polymers include biodegradable polyesters. The device and methods to disperse one or more bioceramic nanoparticle, wherein the said bioceramic nanoparticle include, but are not limited to, amorphous calcium phosphate (ACP), dicalcium phosphate (DCP), tricalcium phosphate (TCP), pentacalcium hydroxyl Apatite(HAp), tetracalcium phosphate monoxide(TTCP) and combinations or analogues thereof. Other embodiments include methods of fabricating biodegradable stent with said polymeric-nanoparticle composites. | 05-22-2014 |
Patent application number | Description | Published |
20140195576 | Hardware Random Number Generator - A random number generator may include an input configured to receive a plurality of entropy bits generated by an entropy source of a random number generator, wherein the random number generator is configured to generate a plurality of random numbers; and an entropy health monitor coupled with the input, wherein the entropy health monitor is configured to perform a corrective action based on the plurality of entropy bits. | 07-10-2014 |
20140340246 | Efficient Processing of Huffman Encoded Data - A method of decoding Huffman-encoded data may comprise receiving a symbol associated with the Huffman encoded data, selecting a target group for the symbol based on a bit length value associated with the symbol, associating the symbol with the target group, associating the symbol with a code, and incrementing a starting code for each of a plurality of groups associated with a starting code that is equal to or greater than the starting code of the target group. | 11-20-2014 |
20140344826 | Architecture for Efficient Computation of Heterogeneous Workloads - Embodiments of a workload management architecture may include an input configured to receive workload data for a plurality of commands, a DMA block configured to divide the workload data for each command of the plurality of commands into a plurality of job packets, a job packet manager configured to assign one of the plurality of job packets to one of a plurality of fixed function engines (FFEs) coupled with the job packet manager, where each of the plurality of FFEs is configured to receive one or more of the plurality of job packets and generate one or more output packets based on the workload data in the received one or more job packets. | 11-20-2014 |
20140344919 | DEBUG FUNCTIONALITY IN A SECURE COMPUTING ENVIRONMENT - A computer system includes a security processor, a first scan chain coupled to the security processor, a non-secure element, and a second scan chain coupled to the non-secure element. The computer system also includes one or more test access port controllers to control operation of the first and second scan chains, and further includes debug control logic, coupled to the one or more test access port controllers, to enable the one or more test access port controllers to activate debug functionality on the second scan chain but not the first scan chain in response to a predefined condition being satisfied. | 11-20-2014 |