Patent application number | Description | Published |
20100143735 | POLYMERIZATION INITIATOR HAVING ARYL AZIDE AND SURFACE MODIFICATION METHOD OF CYCLIC OLEFIN COPOLYMER USING THE SAME - Provided is a method for modifying a surface of a cyclic olefin copolymer, comprising: coating a compound of the following Chemical Formula 1 on the surface of a cyclic olefin copolymer substrate, irradiating UV light on the cyclic olefin copolymer substrate, and polymerizing a monomer on the cyclic olefin | 06-10-2010 |
20130284663 | REVERSE OSMOSIS MEMBRANE INCLUDING ULTRA-HYDROPHILIC PASSIVATION LAYER AND METHOD OF MANUFACTURING THE SAME - A reverse osmosis separation membrane includes a porous support, a separation active layer formed on the supporting layer, and a ultra hydrophilic layer formed on the separation active layer. The ultra-hydrophilic layer includes a complex metal oxide including at least one metal element selected from the group consisting of Ti(IV), Zr(IV), Sn(IV) and Al(III), and Si, and an organic compound containing a hydrophilic group making a physical or chemical bond with Ti(IV), Zr(IV), Sn(IV) or Al(III) among the complex metal oxide. A method of manufacturing the reverse osmosis separation membrane also is provided. A reverse osmosis membrane including a single coating layer and having an improved durability, chlorine-resistance and antifouling properties may be provided. | 10-31-2013 |
20130284665 | REVERSE OSMOSIS SEPARATION MEMBRANE HAVING HIGH DEGREE OF SALT REJECTION AND HIGH PERMEATION FLUX AND METHOD OF MANUFACTURING THE SAME - A reverse osmosis separation membrane includes a minute, porous support, and a polyamide active layer formed on the minute, porous support and including at least one compound containing grapheme is disclosed. A method of manufacturing the reverse osmosis separation membrane is also disclosed. | 10-31-2013 |
20130292325 | METHOD FOR PREPARING REVERSE OSMOSIS MEMBRANE, AND REVERSE OSMOSIS MEMBRANE PREPARED THEREBY - There is disclosed a method for preparing a reverse osmosis membrane, the method including: forming a first coating layer by coating an aqueous amine solution on a surface of a microporous support to have a thickness of 20 μm to 30 μm; removing an excess of the aqueous amine solution from the microporous support; and forming a second coating layer by coating an aliphatic hydrocarbon-based organic solution including acyl halide on the first coating layer to have a thickness of 10 μm to 30 μm. | 11-07-2013 |
20140322443 | REVERSE OSMOSIS SEPARTION MEMBRANE HAVING HIGH DEGREE OF SALT REJECTION AND HIGH PERMEATION FLUX AND METHOD OF MANUFACTURING THE SAME - A reverse osmosis separation membrane includes a minute, porous support, and a polyamide active layer formed on the minute, porous support and including at least one compound containing grapheme is disclosed. A method of manufacturing the reverse osmosis separation membrane is also disclosed. | 10-30-2014 |
Patent application number | Description | Published |
20140034240 | APPARATUS FOR TREATING SUBSTRATE - Provided is a substrate treatment apparatus using plasma. The substrate treatment apparatus includes a housing having an inner space in which a substrate is treated, a support member disposed within the housing to support the substrate, a gas supply unit supplying a gas into the housing, a plasma source generating plasma from the gas supplied into the housing, and a baffle unit disposed to surround the support member within the housing, the baffle unit including a baffle in which through holes for exhausting the gas into the inner space of the housing are defined. The baffle is divided into a plurality of areas when viewed from an upper side, and each of portions of the plurality of areas is formed of a metallic material, and each of the other portions of the plurality of areas is formed of a nonmetallic material. | 02-06-2014 |
20140090783 | APPARATUS FOR TREATING SUBSTRATE - The present invention disclosed herein relates to a substrate treating apparatus, and more particularly, to an apparatus for treating a substrate using plasma. Embodiments of the present invention provide substrate treating apparatuses including a chamber having a treating space defined therein, a support member disposed in the chamber to support a substrate, a gas supply unit supplying a gas into the chamber, a plasma source generating plasma from the gas supplied into the chamber, a baffle disposed to surround the support member in the chamber and having through holes to exhaust a gas in the treating space, and a shielding unit preventing an electromagnetic field from an inside of the chamber to an outside of the chamber. | 04-03-2014 |