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Akiyuki Sugiyama
HITACHINAKA, JP
1. 20090232405 METHOD AND APPARATUS FOR COMPUTING DEGREE OF MATCHING 09-17-20092. 20090232385 PATTERN MEASURING METHOD AND PATTERN MEASURING DEVICE 09-17-2009
3. 20090218491 SAMPLE DIMENSION INSPECTING/MEASURING METHOD AND SAMPLE DIMENSION INSPECTING/MEASURING APPARATUS 09-03-2009
4. 20090152463 METHOD AND APPARATUS OF PATTERN INSPECTION AND SEMICONDUCTOR INSPECTION SYSTEM USING THE SAME 06-18-2009
5. 20090039263 PATTERN MEASUREMENT APPARATUS - Mutual compatibility is established between the measurement with a high magnification and the measurement in a wide 02-12-2009
6. 20080245965 Charged Particle System - capable of facilitating comparison between an actual pattern and an ideal pattern using not only two-dimensional CAD data but 10-09-2008
7. 20080224035 Pattern displacement measuring method and pattern measuring device 09-18-2008