Hulsebos
Edo Maria Hulsebos, 'S-Hertogenbosch NL
Patent application number | Description | Published |
---|---|---|
20090176167 | Alignment System and Alignment Marks for Use Therewith - A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal. | 07-09-2009 |
20100214550 | Alignment System and Alignment Marks for Use Therewith - A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal. | 08-26-2010 |
Edo Maria Hulsebos, Waalre NL
Patent application number | Description | Published |
---|---|---|
20150241791 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A method involving obtaining first calibration vibration data relating to vibrations of the lithographic apparatus from a sensor that is part of the lithographic apparatus and obtaining second calibration vibration data, the second calibration vibration data being a component of first parameter data of the lithographic apparatus. A filter is calculated from the first and second calibration vibration data, the filter being such that when applied to the first calibration vibration data, its output correlates closer with the second calibration vibration data. The filter can then be applied to vibration data obtained using the first sensor to obtain an estimate of a vibration component of the first parameter data during the lithographic process. | 08-27-2015 |
Michel Paul Hulsebos, Holten NL
Patent application number | Description | Published |
---|---|---|
20150308594 | COUPLING DEVICE FOR A TUBE - The invention relates to a coupling device for coupling with a tube, comprising at least one pressure element for exerting a clamping force on the tube, wherein the said at least one pressure element is one of a series of correspondingly embodied neighboring pressure elements, wherein each pressure element of said series comprises a first pressure element segment and a second pressure element segment, and wherein the first pressure element segment is placed proximally and the second pressure element segment distally with respect to the tube, and that of each pressure element the first pressure element segment is provided with a protrusion extending transversely to the longitudinal direction of the tube, and that said protrusion extends into a slit that is provided in a directly neighboring second pressure element segment that forms part of a neighboring pressure element. | 10-29-2015 |