Patent application number | Description | Published |
20090084474 | RECRYSTALLIZED ALUMINUM ALLOYS WITH BRASS TEXTURE AND METHODS OF MAKING THE SAME - A recrystallized aluminum alloy having brass texture and Goss texture, wherein the amount of brass texture exceeds the amount of Goss texture, and wherein the recrystallized aluminum alloy exhibits at least about the same tensile yield strength and fracture toughness as a compositionally equivalent unrecrystallized alloy of the same product form and of similar thickness and temper. | 04-02-2009 |
20100037998 | Aluminum alloy products having improved property combinations and method for artificially aging same - Aluminum alloy products about 4 inches thick or less that possesses the ability to achieve, when solution heat treated, quenched, and artificially aged, and in parts made from the products, an improved combination of strength, fracture toughness and corrosion resistance, the alloy consisting essentially of: about 6.8 to about 8.5 wt. % Zn, about 1.5 to about 2.00 wt. % Mg, about 1.75 to about 2.3 wt. % Cu; about 0.05 to about 0.3 wt. % Zr, less than about 0.1 wt. % Mn, less than about 0.05 wt. % Cr, the balance Al, incidental elements and impurities and a method for making same. The instantly disclosed alloys are useful in making structural members for commercial airplanes including, but not limited to, upper wing skins and stringers, spar caps, spar webs and ribs of either built-up or integral construction. | 02-18-2010 |
20100183474 | ALUMINUM-COPPER ALLOYS CONTAINING VANADIUM - New 2xxx aluminum alloys containing vanadium are disclosed. In one embodiment, the aluminum alloy includes 3.3-4.1 wt. % Cu, 0.7-1.3 wt. % Mg, 0.01-0.16 wt. % V, 0.05-0.6 wt. % Mn, 0.01 to 0.4 wt. % of at least one grain structure control element, the balance being aluminum, incidental elements and impurities. The new alloys may realize an improved combination of properties, such as in the T39 or T89 tempers. | 07-22-2010 |
20110017055 | 5XXX ALUMINUM ALLOYS AND WROUGHT ALUMINUM ALLOY PRODUCTS MADE THEREFROM - Improved 5xxx aluminum alloys and products made therefrom are disclosed. The new 5xxx aluminum alloy products may achieve an improved combination of properties due to, for example, the presence of copper. In one embodiment, the new 5xxx aluminum alloy products are able to achieve an improved combination of properties by solution heat treatment. | 01-27-2011 |
20110268603 | ALUMINUM ALLOY PRODUCTS HAVING IMPROVED PROPERTY COMBINATIONS AND METHOD FOR ARTIFICIALLY AGING SAME - Aluminum alloy products, such as plate, forgings and extrusions, suitable for use in making aerospace structural components like integral wing spars, ribs and webs, comprises about: 6 to 10 wt. % Zn; 1.2 to 1.9 wt. % Mg; 1.2 to 2.2 wt. % Cu, with Mg≦(Cu+0.3); and 0.05 to 0.4 wt. % Zr, the balance Al, incidental elements and impurities. Preferably, the alloy contains about 6.9 to 8.5 wt. % Zn; 1.2 to 1.7 wt. % Mg; 1.3 to 2 wt. % Cu. This alloy provides improved combinations of strength and fracture toughness in thick gauges. When artificially aged per the 3-stage method of preferred embodiments, this alloy also achieves superior SCC performance, including under seacoast conditions. | 11-03-2011 |
20120225271 | 2XXX SERIES ALUMINUM LITHIUM ALLOYS - Thick wrought 2xxx aluminum lithium alloy products are disclosed. The wrought aluminum alloy products have a thickness of at least 12.7 mm and contain from 3.00 to 3.80 wt. % Cu, from 0.05 to 0.35 wt. % Mg, from 0.975 to 1.385 wt. % Li, wherein −0.3*Mg−0.15Cu+1.65≦Li≦−0.3*Mg−0.15Cu+1.85, from 0.05 to 0.50 wt. % of at least one grain structure control element, wherein the grain structure control element is selected from the group consisting of Zr, Sc, Cr, V, Hf, other rare earth elements, and combinations thereof, up to 1.0 wt. % Zn, up to 1.0 wt. % Mn, up to 0.12 wt. % Si, up to 0.15 wt. % Fe, up to 0.15 wt. % Ti, up to 0.10 wt. % of any other element, with the total of these other elements not exceeding 0.35 wt. %, the balance being aluminum. | 09-06-2012 |
20130312877 | ALUMINUM ALLOY PRODUCTS HAVING IMPROVED PROPERTY COMBINATIONS AND METHOD FOR ARTIFICIALLY AGING SAME - Aluminum alloy products, such as plate, forgings and extrusions, suitable for use in making aerospace structural components like integral wing spars, ribs and webs, comprises about: 6 to 10 wt. % Zn; 1.2 to 1.9 wt. % Mg; 1.2 to 2.2 wt. % Cu, with Mg≦(Cu+0.3); and 0.05 to 0.4 wt. % Zr, the balance Al, incidental elements and impurities. Preferably, the alloy contains about 6.9 to 8.5 wt. % Zn; 1.2 to 1.7 wt. % Mg; 1.3 to 2 wt. % Cu. This alloy provides improved combinations of strength and fracture toughness in thick gauges. When artificially aged per the 3-stage method of preferred embodiments, this alloy also achieves superior SCC performance, including under seacoast conditions. | 11-28-2013 |
20140050936 | 2XXX SERIES ALUMINUM LITHIUM ALLOYS - Wrought 2xxx aluminum lithium alloy products having a thickness of from 0.040 inch to 0.500 inch are disclosed. The wrought aluminum alloy products contain from 3.00 to 3.80 wt. % Cu, from 0.05 to 0.35 wt. % Mg, from 0.975 to 1.385 wt. % Li, wherein −0.3*Mg−0.15Cu+1.65≦Li≦−0.3*Mg−0.15Cu+1.85, from 0.05 to 0.50 wt. % of at least one grain structure control element, wherein the grain structure control element is selected from the group consisting of Zr, Sc, Cr, V, Hf, other rare earth elements, and combinations thereof, up to 1.0 wt. % Zn, up to 1.0 wt. % Mn, up to 0.12 wt. % Si, up to 0.15 wt. % Fe, up to 0.15 wt. % Ti, up to 0.10 wt. % of any other element, with the total of these other elements not exceeding 0.35 wt. %, the balance being aluminum. | 02-20-2014 |
20140137995 | ALUMINUM-COPPER ALLOYS CONTAINING VANADIUM - New 2xxx aluminum alloys containing vanadium are disclosed. In one embodiment, the aluminum alloy includes 3.3-4.1 wt. % Cu, 0.7-1.3 wt. % Mg, 0.01-0.16 wt. % V, 0.05-0.6 wt. % Mn, 0.01 to 0.4 wt. % of at least one grain structure control element, the balance being aluminum, incidental elements and impurities. The new alloys may realize an improved combination of properties, such as in the T39 or T89 tempers. | 05-22-2014 |
20140248176 | ALUMINUM-COPPER ALLOYS CONTAINING VANADIUM - New 2xxx aluminum alloys containing vanadium are disclosed. In one embodiment, the aluminum alloy includes 3.3-4.1 wt. % Cu, 0.7-1.3 wt. % Mg, 0.01-0.16 wt. % V, 0.05-0.6 wt. % Mn, 0.01 to 0.4 wt. % of at least one grain structure control element, the balance being aluminum, incidental elements and impurities. The new alloys may realize an improved combination of properties, such as in the T39 or T89 tempers. | 09-04-2014 |
20150368773 | ALUMINUM ALLOY PRODUCTS HAVING IMPROVED PROPERTY COMBINATIONS AND METHOD FOR ARTIFICIALLY AGING SAME - Aluminum alloy products about 4 inches thick or less that possesses the ability to achieve, when solution heat treated, quenched, and artificially aged, and in parts made from the products, an improved combination of strength, fracture toughness and corrosion resistance, the alloy consisting essentially of: about 6.8 to about 8.5 wt. % Zn, about 1.5 to about 2.00 wt. % Mg, about 1.75 to about 2.3 wt. % Cu; about 0.05 to about 0.3 wt. % Zr, less than about 0.1 wt. % Mn, less than about 0.05 wt. % Cr, the balance Al, incidental elements and impurities and a method for making same. The instantly disclosed alloys are useful in making structural members for commercial airplanes including, but not limited to, upper wing skins and stringers, spar caps, spar webs and ribs of either built-up or integral construction. | 12-24-2015 |
Patent application number | Description | Published |
20090168032 | Lithographic apparatus and device manufacturing method - The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed. | 07-02-2009 |
20090290139 | SUBSTRATE TABLE, SENSOR AND METHOD - A sensor for measuring a patterned beam of radiation in a lithographic exposure apparatus includes a receiving part for receiving the patterned beam of radiation and a processing part arranged to receive at least a part of the patterned radiation beam via the receiving part. The receiving part of the sensor is integrated in a substrate table for holding a substrate. | 11-26-2009 |
20110090476 | LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF APPLYING A PATTERN TO A SUBSTRATE - A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems. | 04-21-2011 |
20120133914 | METHOD OF OPERATING A PATTERNING DEVICE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s | 05-31-2012 |
20130077079 | LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD - A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit. | 03-28-2013 |
20140313500 | LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF APPLYING A PATTERN TO A SUBSTRATE - A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems. | 10-23-2014 |
20150029481 | METHOD OF OPERATING A PATTERNING DEVICE AND LITHOGRAPHIC APPARATUS - A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations. | 01-29-2015 |