Patent application number | Description | Published |
20090111678 | HIGH RESISTIVITY SILICON CARBIDE - A recrystallized silicon carbide body is provided that has a resistivity of not less than about 1 | 04-30-2009 |
20090199488 | CERIA MATERIAL AND METHOD OF FORMING SAME - A particulate material comprising cerium oxide particles having a secondary particle size distribution in a range of 80 nm to 199 nm and a density of at least 6.6 g/cm | 08-13-2009 |
20100233880 | CHEMICAL MECHANICAL PLANARIZATION USING NANODIAMOND - A method for chemical mechanical polishing of a substrate includes polishing the substrate at a stock removal rate of greater than about 2.5 Å/min to achieve a Ra of not greater than about 5.0 Å. The substrate can be a III-V substrate or a SiC substrate. The polishing utilizes a chemical mechanical polishing slurry comprising ultra-dispersed diamonds and at least 80 wt % water. | 09-16-2010 |
20110252714 | CERIA MATERIAL AND METHOD OF FORMING SAME - A particulate material comprising cerium oxide particles having a secondary particle size distribution in a range of 80 nm to 199 nm and a density of at least 6.6 g/cm | 10-20-2011 |
20120153547 | CERAMIC PARTICULATE MATERIAL AND PROCESSES FOR FORMING SAME - Processes for forming ceramic particulate material. The ceramic particulate material includes alumina particles, the particles having a specific surface area (SSA) not less than 15 m | 06-21-2012 |
20120171936 | POLISHING SLURRY INCLUDING ZIRCONIA PARTICLES AND A METHOD OF USING THE POLISHING SLURRY - A polishing slurry can include zirconia particles. The polishing slurry can be used to polish conductive and insulating materials, and is particularly well suited for polishing oxide materials as well as metals. The characteristics of the zirconia particles can affect the polishing of workpieces. By selecting the proper characteristics, the polishing slurry can have a good material removal rate while still providing an acceptable surface finish. The zirconia particles can be used as a replacement for, or in conjunction with, ceria or other abrasive particles. The content of zirconia particles in the polishing slurry may be less than a comparable polishing slurry having silica or alumina particles. | 07-05-2012 |
Patent application number | Description | Published |
20080252342 | Charge pump for PLL/DLL - A charge pump for use in a Phase Locked Loop/Delay Locked Loop minimizes static phase error through the use of an operational amplifier. The operational amplifier also mitigates the effects of low power supply voltage. | 10-16-2008 |
20090121760 | Charge pump for PLL/DLL - A charge pump for use in a Phase Locked Loop/Delay Locked Loop minimizes static phase error through the use of an operational amplifier. The operational amplifier also mitigates the effects of low power supply voltage. | 05-14-2009 |
20090201058 | CHARGE PUMP FOR PLL/DLL - A charge pump for use in a Phase Locked Loop/Delay Locked Loop minimizes static phase error through the use of an operational amplifier. The operations amplifier also mitigates the effects of low power supply voltage. | 08-13-2009 |
20090206854 | CIRCUIT AND METHOD FOR CAPACITOR EFFECTIVE SERIES RESISTANCE MEASUREMENT - A circuit and method for capacitor effective series resistance measurement. One embodiment provides a method for measuring the effective series resistance of a capacitor having a capacitor voltage. The method includes amplifying the capacitor voltage with an AC coupled amplifier yielding a first amplified signal. The capacitor is discharged with a constant current for a measurement time thus causing a voltage swing of the capacitor voltage due to a voltage drop across the effective series resistance. The capacitor voltage is amplified with the AC coupled amplifier yielding a second amplified signal being dependent on the voltage swing; calculating the effective series resistance from the first and the second amplified signal. | 08-20-2009 |
20100213994 | Charge Pump for PLL/DLL - A charge pump for use in a Phase Locked Loop/Delay Locked Loop minimizes static phase error through the use of an operational amplifier. The operational amplifier also mitigates the effects of low power supply voltage. | 08-26-2010 |
20110102034 | CHARGE PUMP FOR PLL/DLL - A charge pump for use in a Phase Locked Loop/Delay Locked Loop minimizes static phase error through the use of an operational amplifier. The operational amplifier also mitigates the effects of low power supply voltage. | 05-05-2011 |
20110291721 | Wide Frequency Range Delay Locked Loop - A delay locked loop operates over a wide range of frequencies and has high accuracy, small silicon area usage, low power consumption and a short lock time. The DLL combines an analog domain and a digital domain. The digital domain is responsible for initial lock and operational point stability and is frozen after the lock is reached. The analog domain is responsible for normal operation after lock is reached and provides high accuracy using smaller silicon area and low power. | 12-01-2011 |
20120098581 | CHARGE PUMP FOR PLL/DLL - A charge pump for use in a Phase Locked Loop/Delay Locked Loop minimizes static phase error through the use of an operational amplifier. The operational amplifier also mitigates the effects of low power supply voltage. | 04-26-2012 |
20130176061 | Delay Locked Loop Circuit and Method - A delay locked loop includes initialization circuitry that ensures that a DLL is initialized to an operating point that is not to close to either end of a delay vs. control voltage characteristic. The initialization circuitry forces the DLL to initially search for a lock point starting from an initial delay, the delay is varied in one direction, forcing the DLL to skip the first lock point. The initialization circuitry only allows the DLL to vary the delay of the voltage controlled delay loop in the one direction from the initial delay until the operating point is reached. | 07-11-2013 |
20130271192 | WIDE FREQUENCY RANGE DELAY LOCKED LOOP - A delay locked loop operates over a wide range of frequencies and has high accuracy, small silicon area usage, low power consumption and a short lock time. The DLL combines an analog domain and a digital domain. The digital domain is responsible for initial lock and operational point stability and is frozen after the lock is reached. The analog domain is responsible for normal operation after lock is reached and provides high accuracy using smaller silicon area and low power. | 10-17-2013 |
20140084977 | Wide Frequency Range Delay Locked Loop - A delay locked loop operates over a wide range of frequencies and has high accuracy, small silicon area usage, low power consumption and a short lock time. The DLL combines an analog domain and a digital domain. The digital domain is responsible for initial lock and operational point stability and is frozen after the lock is reached. The analog domain is responsible for normal operation after lock is reached and provides high accuracy using smaller silicon area and low power. | 03-27-2014 |
Patent application number | Description | Published |
20090164486 | BUSINESS INTELLIGENCE DATA EXTRACTION ON DEMAND - Methods and apparatus, including computer program products, for business intelligence data extraction on demand. In general, a first request is sent from a first system to a second system for a query of a data structure to include indications of updates at the second system to data at both the first and second systems. An indication of an update at the second system is received in response to the first request, where the indication includes an identification of updated data. A second request is sent to a database data structure of the second system for data corresponding to the updated data. The updated data is received at the first system in response to the second request. Data is updated at the first system in accordance with the updated data in response to the receiving the updated data. | 06-25-2009 |
20100153432 | OBJECT BASED MODELING FOR SOFTWARE APPLICATION QUERY GENERATION - This disclosure relates to computer implemented methods, systems, and software for querying data associated with a service-oriented enterprise software application. A query request is received, for data associated with a service-oriented enterprise software application. A business information view object can be identified based on the query request. Using a query embodied in the business information view object, business objects can be queried that are decoupled from the enterprise software application. In another instance, a business object associated with a service-oriented enterprise software application can be identified and metadata extracted, relating to the identified business object. Business information view objects can be automatically generated based on the business object and the extracted metadata. | 06-17-2010 |
20130036115 | GENERIC FRAMEWORK FOR HISTORICAL ANALYSIS OF BUSINESS OBJECTS - The present disclosure describes methods, systems, and computer program products for analyzing historic changes to business objects. One method includes monitoring at least one business object for a modification made to at least one business object node attribute. In response to a monitored modification associated with a particular business object node attribute, a new historical version of the at least one business object node attribute is prepared, the new historical version of the at least one business object node attribute including the modified business object node attribute value. A previous historical version of the at least one business object node attribute is retrieved and updated in response to the monitored modification. The new historical version of the at least one business object node attribute and the updated previous historical version of the at least one business object node attribute are then stored. | 02-07-2013 |