Patent application number | Description | Published |
20100019410 | Resin for Thermal Imprinting - A cyclic-olefin-based thermoplastic resin for thermal imprint to be used in the production of a sheet or a film which contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]<30. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. | 01-28-2010 |
20140015162 | MOLD, FINE PATTERN PRODUCT, AND METHOD OF MANUFACTURING THOSE - A mold for imprinting has a mold pattern for transferring a pattern to a processing object. A base layer having a predetermined base pattern is formed by imprinting on a thermoplastic resin, a thermosetting resin, a photo-curable resin, or the like, and a mold layer is formed in such a way that the mode pattern is shapened along a surface of the base pattern by a surface preparation technique, such as CVD, PVD, or plating. | 01-16-2014 |
20140339735 | RESIN FOR THERMAL IMPRINTING - A cyclic-olefin-based thermoplastic resin for thermal imprint to be used in the production of a sheet or a film which contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]<30. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. | 11-20-2014 |
Patent application number | Description | Published |
20100013122 | Resin for Thermal Imprint - A resin for thermal imprint comprises a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260 ° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. | 01-21-2010 |
20100189984 | THERMAL-IMPRINTING RESIN SOLUTION, THERMAL-IMPRINTING RESIN THIN FILM, AND METHOD OF MANUFACTURING THOSE - There are provided a resin solution substantially applicable to thermal imprinting, a thin film thereof, and manufacturing methods of those. A thermal imprinting resin solution for forming a thin film used for thermal imprinting applications comprises a thermoplastic resin and greater than or equal to at least one kind of solvent which can dissolve the resin, and an containing amount of foreign particles having a grain diameter larger than or equal to 0.2 μm is controlled to be less than 3000 particles/cm | 07-29-2010 |
20100189985 | THERMAL-IMPRINTING RESIN, THERMAL-IMPRINTING-RESIN SOLUTION, THERMAL-IMPRINTING INJECTION-MOLDED BODY, THERMAL-IMPRINTING THIN FILM AND PRODUCTION METHOD THEREOF - There are provided a thermal-imprinting resin which has a good heat-deterioration tolerability and a low resin elastic modulus at the time of fluidization in order to suppress any production of particle-like materials in microfabrication by thermal imprinting, and has a good fine-pattern transfer characteristic, a thermal-imprinting-resin solution using the same, a thermal-imprinting injection-molded body using the same, a thermal-imprinting thin film using the same and a production method thereof. The thermal-imprinting resin has an exothermic onset temperature (oxidation onset temperature) of an exothermic peak due to oxidation greater than or equal to +35° C. to the glass transition temperature of the resin in differential scanning calorimetric measurement at a temperature rise rate of 5° C./min in air, and has a complex modulus less than 0.24 MPa at the glass transition temperature of the resin +35° C. in a dynamic viscoelastic modulus measurement at a frequency of 1 rad/sec in nitrogen stream. The thermal-imprinting-resin solution, the thermal-imprinting injection-molded body, the thermal-imprinting thin film and the production method thereof use the foregoing resin. | 07-29-2010 |
20100304087 | Mold, Fine Pattern Product, and Method of Manufacturing Those | 12-02-2010 |
20100310830 | Etching Mask, Base Material Having Etching Mask, Finely Processed Article, And Method For Production Of Finely Processed Article - There are provided an etching mask which has a superior thermal imprinting characteristic and also a good anti-etching characteristic, a base material with the etching mask, a microfabricated product to which those etching mask and base material are applied, and a production method of the microfabricated product. The etching mask formed of a thermoplastic resin containing at least one kind of skeleton expressed by a chemical formula (1) or a chemical formula (2) in a main chain wherein R | 12-09-2010 |
20130056906 | RESIN FOR THERMAL IMPRINT - A resin for thermal imprint include a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. | 03-07-2013 |
Patent application number | Description | Published |
20130190857 | MEANS FOR CONTROLLED SEALING OF ENDOVASCULAR DEVICES - Expandable sealing means for endoluminal devices have been developed for controlled activation. The devices have the benefits of a low profile mechanism (for both self-expanding and balloon-expanding prostheses), contained, not open, release of the material, active conformation to the “leak sites” such that leakage areas are filled without disrupting the physical and functional integrity of the prosthesis, and on-demand, controlled activation, that may not be pressure activated. | 07-25-2013 |
20130197622 | Means for Controlled Sealing of Endovascular Devices - Expandable sealing means for endoluminal devices have been developed for controlled activation. The devices have the benefits of a low profile mechanism (for both self-expanding and balloon-expanding prostheses), contained, not open, release of the material, active conformation to the “leak sites” such that leakage areas are filled without disrupting the physical and functional integrity of the prosthesis, and on-demand, controlled activation, that may not be pressure activated. | 08-01-2013 |
20130331929 | Means for Controlled Sealing of Endovascular Devices - Expandable sealing means for endoluminal devices have been developed for controlled activation. The devices have the benefits of a low profile mechanism (for both self-expanding and balloon-expanding prostheses), contained, not open, release of the material, active conformation to the “leak sites” such that leakage areas are filled without disrupting the physical and functional integrity of the prosthesis, and on-demand, controlled activation, that may not be pressure activated. | 12-12-2013 |
Patent application number | Description | Published |
20080212634 | Optical Irradiation Device for the Polarization of Alkali Atoms and a Device for the Hyperpolarization of Noble Gases - An optical irradiation device for the polarization of alkali metal atoms for the hyperpolarization of noble gases by spin exchange includes at least one semiconductor laser device which can generate laser light which, with regard to its wavelength, is suitable for the polarization of the alkali metal atoms. A polarizer effects circular polarization of the laser light generated by the semiconductor laser device. A device for introducing the laser light into a working region in which the alkali metal atoms to be polarized can be present, and a device for defining a wavelength of the laser light, which can couple part of the laser light back into the semiconductor laser device in order thereby to define the wavelength of the laser light at a predetermined wavelength or a predetermined wavelength range. | 09-04-2008 |
20090296222 | Device for Homogenizing Light - A device for homogenizing light has a first lens array provided with a number of convex lenses, and at least one second lens array disposed at a distance from the first lens array in the beam scattering direction and through which the light refracted by the first lens array can pass. The second lens array is formed with a number of first lenses that are respectively arranged at a distance from each other. At least one of the first lenses of the second lens array is associated with each convex lens of the first lens array. The convex lenses of the first lens array have a smaller curvature than the first lenses of the second lens array associated with said convex lenses. | 12-03-2009 |
20110051253 | APPARATUS FOR HOMOGENIZING LIGHT AND LASER APPARATUS FOR PRODUCING A LINEAR INTENSITY DISTRIBUTION IN A WORK PLANE - An apparatus for homogenizing light, including a lens array ( | 03-03-2011 |
20110157706 | DEVICE AND METHOD FOR BEAM FORMING - A device for beam forming includes at least two laser light sources capable of emitting laser radiation and an optical device capable of influencing the laser radiation such that the laser radiation has an intensity distribution in a working plane that at least partially corresponds to a top-hat distribution at least with regard to one direction. The laser beam may be at least partially overlapped by the optical device. The laser beam is a single-mode laser beam at least with regard to a direction perpendicular to the distribution direction. | 06-30-2011 |
20140003456 | Device For Converting The Profile of a Laser Beam Into a Laser Beam With a Rotationally Symmetrical Intensity Distribution | 01-02-2014 |