Patent application number | Description | Published |
20080237037 | MASK AND METHOD OF MANUFACTURING THE SAME - A mask includes a transparent substrate, a light-blocking layer and a halftone layer. The light-blocking layer includes a source electrode pattern portion including a first electrode portion, a second electrode portion and a third electrode portion, and a drain electrode pattern portion disposed between the second electrode portion and the third electrode portion. The halftone layer includes a halftone portion corresponding to a spaced-apart portion between the source electrode pattern portion and the drain electrode pattern portion, and a dummy halftone portion more protrusive than ends of the second electrode portion and the third electrode portion. Thus, a photoresist pattern corresponding to a channel portion of a thin film transistor (TFT) may be formed with a uniform thickness, to thereby prevent an excessive etching of the channel portion. | 10-02-2008 |
20090135347 | DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF - A manufacturing method of a display device, wherein the manufacturing method for an embodiment includes: forming color filters in a plurality of pixel regions; forming a conductive layer on the color filters; and separating the conductive layer in each of the pixel regions through a photolithography process and forming a pixel electrode; wherein a groove is formed between the adjacent color filters having different colors at boundaries between the pixel regions; and wherein the photolithography process uses a negative photoresist material. | 05-28-2009 |
20090159888 | DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAME - A display panel and a manufacturing method thereof which includes forming a color filter on an insulating substrate, forming a plurality of trenches in the color filter, forming a first metal layer in the trenches, forming a second metal layer on the first metal layer to form gate lines, forming a gate insulating layer on the color filter and the gate lines, forming a semiconductor on the gate insulating layer, forming data lines including source electrodes and drain electrodes, and forming pixel electrodes connected to the drain electrodes. | 06-25-2009 |
20090176325 | HALFTONE MASK, METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING AN ARRAY SUBSTRATE USING THE SAME - A halftone mask includes a transparent substrate, a light-blocking layer, a first semi-transparent layer and a second semi-transparent layer. The transparent substrate includes a light-blocking area, a light-transmitting area, a first halftone area transmitting first light, and a second halftone area transmitting second light that is less than the first light. The light-blocking layer is formed in the light-blocking area to fully block light from being transmitted. The first and second semi-transparent layers are formed on the transparent substrate. At least one of the first and second semi-transparent layers is formed in the first halftone area, and the first and second semi-transparent layers are overlapped with each other on the second halftone area. | 07-09-2009 |
20100055851 | PHOTORESIST COMPOSTION, METHOD FOR FORMING THIN FILM PATTERNS, AND METHOD FOR MANUFACTURING A THIN FILM TRANSISTOR USING THE SAME - The present invention relates to a photoresist composition that comprises a resin that is represented by Formula 1, a method for forming a thin film pattern, and a method for manufacturing a thin film transistor array panel by using the same. | 03-04-2010 |
20100167476 | PHOTORESIST COMPOSITION AND METHOD OF FABRICATING THIN FILM TRANSISTOR SUBSTRATE - The present invention relates to a photoresist composition for digital exposure and a method of fabricating a thin film transistor substrate. The photoresist composition for digital exposure includes a binder resin including a novolak resin and a compound represented by the chemical formula (1), a photosensitizer including a diazide-based compound, and a solvent: | 07-01-2010 |
20110051059 | ORGANIC LAYER COMPOSITION AND LIQUID CRYSTAL DISPLAY USING THE SAME - An organic layer composition and a liquid crystal display including the same are provided. An organic layer composition according to an exemplary embodiment includes a binder formed by copolymerizing compounds included in a first group and a second group, wherein the first group includes an acryl-based compound and the second group includes a compound without a —COO— group. | 03-03-2011 |
20110199620 | METHOD OF DETERMINING AN OVERLAP DISTANCE OF AN OPTICAL HEAD AND DIGITAL EXPOSURE DEVICE USING THE METHOD - An apparatus and a method for determining an overlap distance of an optical head is disclosed. Positions and light amount distributions of each light spot can be measured, which may be provided from an optical head to a substrate. Gaussian distribution may be applied to the positions and the light amount distributions to calculate a compensation model of each of the light spots. A first accumulated light amount corresponding to each first area of the substrate may be calculated if the optical head is scanning along a first direction of the substrate using the compensation model. A second accumulated light amount corresponding to each second area overlapped with the each first area is calculated if the optical head is scanning along the first direction, which is moved in a second direction by a first distance using the compensation model. An overlap distance may be determined based on a uniformity of summations of the first and second accumulated light amount. | 08-18-2011 |
20110205508 | Digital Exposure Method and Digital Exposure Device for Performing the Method - A digital exposure method and a digital exposure device for performing the method are disclosed. In the method, a graphic data system file is produced in correspondence with each of a plurality of patterns formed on a substrate. Then, a digital micromirror device on/off data is generated from the graphic data system file. Then, the substrate is exposed in response to the digital micromirror device on/off data. Thus, at least a first exposure for forming a first pattern of a display panel, and a second exposure for forming identification numbers of a substrate and each display panel and removing an edge portion of the substrate may be simultaneously performed, to simplify the exposure process decrease costs. | 08-25-2011 |
20110230019 | METHOD OF MANUFACTURING A THIN-FILM TRANSISTOR AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME - An approach for patterning and etching without a mask is provided in a manufacturing a thin-film transistor, a gate electrode, a gate insulating layer, a semiconductor layer, an ohmic contact layer and source metal layer of a substrate. A first photoresist pattern including a first photo pattern and a second photo pattern is formed using a digital exposure device by generating a plurality of spot beams, the first photo pattern is formed to a first region of the base substrate and has a first thickness, and the second photo pattern is formed to a second region adjacent to the first region, and has a second thickness and a width in a range of about 50% to about 60% of a diameter of the spot beam. The source metal layer is patterned to form a source electrode and a drain electrode, and the source electrode and the drain electrode are spaced apart from each other in the first region of an active pattern. | 09-22-2011 |
20110236825 | PHOTORESIST COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME - In a photoresist composition suitable for forming a photoresist pattern having a high profile angle, and a method of forming a photoresist pattern using the same, the photoresist composition includes an alkali-soluble resin, a quinone diazide containing compound, a compound represented by Formula 1, and a solvent: | 09-29-2011 |
20110287360 | PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME - A photoresist composition is provided. The photoresist composition includes an alkali-soluble resin; a photosensitizer containing a first compound that contains a diazonaphthoquinone represented by Formula 1 and a second compound that contains a diazonaphthoquinone represented by Formula 2; and a solvent. | 11-24-2011 |
Patent application number | Description | Published |
20120241740 | METHOD OF FORMING A PHOTOSENSITIVE PATTERN, METHOD OF MANUFACTURING A DISPLAY SUBSTRATE, AND DISPLAY SUBSTRATE - A method of forming a photosensitive pattern on a substrate with a photosensitive layer disposed thereon may include moving at least one of the substrate and a set of micro-mirrors in a first direction, the set of micro-mirrors being disposed above the substrate and being arranged as an array, the array having a first edge extending in a second direction, the second direction being at an acute angle with respect to the first direction. The method may also include selectively turning on one or more micro-mirrors of the set of micro-mirrors according to a position of the set of micro-mirrors relative to the photosensitive layer, thereby irradiating one or more spot beams on the photosensitive layer. The photosensitive layer exposed by the spot beams is developed to form a photosensitive pattern having an edge portion extending in a third direction crossing the first and second directions. | 09-27-2012 |
20120270142 | PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING A SUBSTRATE FOR A DISPLAY DEVICE USING THE SAME - A photosensitive composition and a method of manufacturing a substrate used for a display device are disclosed. The photosensitive composition includes an acrylic based copolymer, a photo-initiator, a photo-sensitizer and a solvent. Thus, a photosensitivity of the photosensitive composition for ultra violet light of a long wavelength may be improved. | 10-25-2012 |
20120301684 | PHOTOSENSITIVE FILM PATTERN AND METHOD FOR MANUFACTURING A PHOTOSENSITIVE FILM PATTERN - A method for manufacturing a photosensitive film pattern includes: forming a thin film on a substrate; forming a photosensitive film on the thin film; arranging an exposure apparatus including a photo-modulation element on the photosensitive film; exposing the photosensitive film using the exposure apparatus according to an exposure pattern of the photo-modulation element; and developing the exposed photosensitive film to form a photosensitive film pattern. The exposure pattern includes a main pattern of a quadrangular shape and a at least one assistance pattern positioned at a corner of the main pattern. The photosensitive film pattern has a quadrangular shape with a long edge and a short edge, and a corner with a curved surface having a curvature radius of 20% to 40% of a length of the short edge. | 11-29-2012 |
20130016330 | DIGITAL EXPOSURE APPARATUS AND METHOD OF EXPOSING A SUBSTRATE USING THE SAMEAANM Yun; Sang-HyunAACI Suwon-siAACO KRAAGP Yun; Sang-Hyun Suwon-si KRAANM Kim; Cha-DongAACI Hwaseong-siAACO KRAAGP Kim; Cha-Dong Hwaseong-si KRAANM Park; Jung-InAACI SeoulAACO KRAAGP Park; Jung-In Seoul KRAANM Sim; Su-YeonAACI Changwon-siAACO KRAAGP Sim; Su-Yeon Changwon-si KRAANM Lee; Hi-KukAACI Yongin-siAACO KRAAGP Lee; Hi-Kuk Yongin-si KR - A digital exposure apparatus includes a displaceable stage, a light source part, a digital micro mirror part and a micro lens part. A substrate is disposed on the stage. The light source part generates a first light. The digital micro mirror part is disposed over the stage. The digital micro mirror part includes a plurality of digital micro mirrors. The digital micro mirror converts the first light into one or more second light beams. The micro lens part is disposed between the stage and the digital micro mirror part and includes a plurality of micro lenses. The micro lenses convert the one or more second light beams into one or more third light beams which are irradiated upon the substrate. The third light has an oval cross sectional shape. | 01-17-2013 |
20130040410 | PHOTORESIST COMPOSITION, METHOD OF FORMING A PATTERN USING THE SAME, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE - A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved. | 02-14-2013 |
20130141714 | METHOD OF MEASURING UNIFORMITY OF EXPOSING LIGHT AND EXPOSURE SYSTEM FOR PERFORMING THE SAME - An exposure system includes an exposure apparatus, a mask, a test pattern portion and a uniformity measuring part. The exposure apparatus includes a first module and a second module. The first and second modules each emit light and are overlapped in an overlapping area. The mask includes a plurality of transmission portions which are spaced apart from each other. Each of the transmission portions has a width less than a width of the overlapping area. The test pattern portion includes a plurality of test patterns which are patterned by using the light transmitted through the transmission portions of the mask. The uniformity measuring part measures a uniformity of the test patterns. | 06-06-2013 |
20130290245 | DATABASE HISTORY MANAGEMENT METHOD AND SYSTEM THEREOF - Disclosed is a technology of managing a database. A database history management system includes at least one management object database server and a master management server for managing a history of the at least one management object database server. The database history management system includes at least one management object DB server and a master management server. The at least one management object database server establishing a management object database, and generating or updating a history database with respect to the management object database according to the history policy from the master management server. The master manager server manages a history policy with respect to the at least one management object database server, and accesses the at least one management object database server to remotely manage a history database with respect to a corresponding management object database. It is unnecessary to establish a separate server and there is no problem in a network load, and collected data can be rapidly inquired by constructing a history DB in each DB server | 10-31-2013 |
20130290929 | METHOD OF MANAGING SCRIPT, SERVER PERFORMING THE SAME AND STORAGE MEDIA STORING THE SAME - The present invention relates to a script management technology. Disclosed are approaches for managing scripts carried out in a script management server, which is connected to a user terminal and which manages script codes. Approaches comprise preparing a plurality of databases including a meta database and a plurality of script databases without necessarily separating physically the two types of databases; designating an active script database by providing the plurality of the original script lists to the user terminal; and storing identifiers of the user terminal and the designated active script database in the meta database, where the plurality of script databases are classified according to script version and each of them manages the original script code and user-specific script code, and the meta database manages a plurality of the original script lists related to the plurality of script databases and a list of user-specific scripts. | 10-31-2013 |
20130304695 | METHOD FOR PROVIDING DATABASE MANAGEMENT AND THE DATABASE MANAGEMENT SERVER THEREOF - The present invention provides diagnosis and management of a database system. The method for database management comprises (a) generating a list of at least one database managed by the database system; (b) providing a list of diagnostic items including a plurality of diagnostic items which can be carried out against at least one database selected from the list; and (c) carrying out diagnosis by providing the database system with at least one script related to at least one diagnostic item selected from the list of diagnostic items, wherein the at least one script is configured to have a run time set up differently according to the status of the database system. Database management provides various diagnostic items through remote connection to a particular database system and providing a quantitative analysis of the corresponding diagnosis result, thereby enabling more complete and comfortable database management. | 11-14-2013 |
20140167298 | ALIGNMENT APPARATUS, EXPOSING APPRATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF LIQUID CRYSTAL DISPLAY DEVICE - Exemplary embodiments of the invention relate to an alignment apparatus including a source unit providing an electromagnetic signal, a receiving unit detecting the provided electromagnetic signal, and a polarization element positioned between the source unit and the receiving unit and having a transmissive axis fixed in a predetermined direction. A substrate may be positioned between the source unit and the receiving unit, and may be formed with a polarizer including a plurality of metal lines with a minute linear pattern. The luminance or intensity of the electromagnetic signal may be detected by the receiving unit while rotating the substrate. | 06-19-2014 |
20140186595 | METHOD OF FABRICATING DISPLAY DEVICE USING MASKLESS EXPOSURE APPARATUS AND DISPLAY DEVICE - The present invention relates to a method of fabricating a display device using a maskless exposure apparatus, and the display device, and more particularly, to a method of fabricating a display device by using a maskless exposure apparatus, which is capable of preventing a stain from being viewed, and the display device. An exemplary embodiment of the present invention provides a method of fabricating a display device, including: forming a first exposure region on a substrate by performing exposure while scanning the substrate with a first exposure head irradiating an exposure beam according to pattern information of a first pattern in a scanning direction; and forming a second exposure region adjacent to the first exposure region on the substrate by performing exposure while scanning the substrate with a second exposure head irradiating an exposure beam according to the pattern information of the first pattern in the scanning direction; in which an exposure boundary region between the first exposure region and the second exposure region is extended in the scanning direction, and the exposure boundary region overlaps a light blocking region. | 07-03-2014 |
20140204392 | STAGE TRANSFERRING DEVICE AND POSITION MEASURING METHOD THEREOF - A stage transferring device invention includes: a transferring stage upon which an object is mounted and which transfers the object in an x-y plane; and a stage position measuring device. The stage position measuring device includes a one-dimensional scale on the transferring stage; a one-dimensional scale reading head which is configured to overlap the one-dimensional scale, irradiate a measuring beam to the overlapped one-dimensional scale and measure a 1D y-axis coordinate of the transferring stage; a two-dimensional encoder on the transferring stage; and a two-dimensional encoder reading head which is configured to overlap the two-dimensional encoder, irradiate a measuring beam to the overlapped two-dimensional encoder and measure a 2D x-axis coordinate and a 2D y-axis coordinate of the transferring stage. | 07-24-2014 |
20150015859 | DIGITAL EXPOSURE DEVICE USING DIGITAL MICRO-MIRROR DEVICE AND A METHOD FOR CONTROLLING THE SAME - Provided is a digital exposure device. The digital exposure device includes a stage mounted with a substrate on which a pattern is formed, a first light source, a first head, and a digital micro-mirror device control unit. The stage is configured to move in a scan direction. The first light source is configured to provide a first light. The first head is spaced apart from the stage in a first direction and is configured to receive the first light, to generate at least one spot beam by modulating the first light, and to project the at least one spot beam onto the substrate. The digital micro-mirror device control unit is configured to control an energy of the at least one spot beam generated from the first head to be inversely proportional to a size of the at least spot beam generated from the first head. | 01-15-2015 |
20150049316 | EXPOSURE APPARATUS AND METHOD THEREOF - An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions. | 02-19-2015 |
20150205212 | MASKLESS LIGHT EXPOSURE DEVICE - A light exposure device is provided. The light exposure device includes a light source, a light modulation part, and a projection optical part. The light modulation part modulates the light based on a predetermined exposure pattern. The projection optical part projects the light from the light modulation part onto a substrate. The projection optical part includes a first optical part, a hole arrangement part, and a second optical part. The first optical part receives the light from the light modulation part. The first optical part includes a plurality of first lenses. The hole arrangement part emits the light from the first optical part. The second optical part emits the light from the hole arrangement part onto the substrate. The second optical part includes a plurality of second lenses. At least one of the first lenses and the second lenses is a transreflective lens. | 07-23-2015 |