Patent application number | Description | Published |
20090148168 | Optical Fiber Access Network and Commuication Protection Method Thereof - The present invention relates to an optical fiber access network and a communication protection method thereof. The optical fiber access network comprises an optical fiber communication system, a wireless communication system, a communication service switch device ( | 06-11-2009 |
20100005325 | ENERGY SAVING INFORMATION APPLIANCE NETWORK AND ENERGY SAVING CONTROL METHOD - The present invention relates to an energy saving information appliance network and an energy saving control method. The energy saving information appliance network comprises a household network host and an intelligent information appliance. The household network host is provided with a signal interface module. The intelligent information appliance is provided with a signal processing module for communicating connection with the signal interface module. The signal processing module comprises a high frequency signal processing unit and a low frequency signal processing unit. The signal processing module is connected with an information processing and transceiving unit. The energy saving control method comprising sending, by a low frequency signal processing unit provided in an intelligent information appliance, an operation triggering signal to a high frequency signal processing unit provided in the intelligent information appliance upon receiving a low frequency triggering signal. The intelligent information appliance feeds back information which indicates that a hot standby state is to be assumed. The intelligent information appliance accomplishes information processing, and then switches from the hot standby state to a cold standby state. The present invention greatly reduces the power consumption of an information appliance network, reduces the probability of important components being damaged, and eliminates the fire safety risk. | 01-07-2010 |
20100106860 | APPARATUS, SYSTEM FOR PROCESSING INTERNETWORK COMMUNICATION AND COMMUNICATION CONNECTION-ADAPTATION METHOD - The invention relates to a network communication processing apparatus including: a communication connection selection and configuration unit and an internal interface unit connected in sequence. The invention relates to a network communication processing system including: a network communication processing apparatus, an external communication module and multiple network devices connected to the network communication processing apparatus. The present invention also relates to a method for communication connection adaptation comprising: identifying, by a network communication processing apparatus, available communication connection modes of a network device when it is connected; configuring the network device into a communication connection mode based on the available communication connection modes; and when the connection mode is changed, selecting, by the network communication processing apparatus, another connection mode and configures the network device into the another connection mode. | 04-29-2010 |
20100142696 | MESSAGE-BASED NOTIFYING METHOD FOR NOTIFYING WAITING QUEUE AND APPLICATION SERVER - The present invention relates to a message-based notifying method for notifying a waiting queue and an application server, wherein the method includes: sending, by a calling terminal, a call request to a called terminal; forwarding, by an application server, to the called terminal the call request sent from the calling terminal, and determining from a response message returned from the called terminal whether the called terminal is in an idle status; and if the called terminal is in a busy status, then adding by the application server the calling terminal into a waiting enqueuing queue of the called terminal, and sending to the calling terminal a waiting notification message containing a waiting queue value corresponding to the calling terminal; or if the called terminal is in an idle status, then establishing directly a communication connection between the calling terminal and the called terminal. | 06-10-2010 |
20100153437 | DATA STORING SYSTEM AND DATA PROCESSING METHOD OF INFORMATIONAL HOUSEHOLD APPLIANCE - A data storing system and data processing method of the informational household appliance are provided. The system includes: one or plurality of home database server of informational household appliance which connected with each other, one or plurality of household gateway server, and one or plurality of data managing server of informational household appliance. The data processing method includes: the data processing method of the informational household appliance on-lining, off-lining and status data updating thereof, and the current status of informational household appliance in real-time reflects to the data managing server of informational household appliance through the household gateway server by this data processing method. The data of the informational household appliance can be stored separately from the informational household appliance, and the data of the informational household appliance can be unitedly managed by the system and method. | 06-17-2010 |
20100172362 | HOUSEHOLD GATEWAY SUBSYSTEM AND DIGITAL HOUSEHOLD SYSTEM BASED ON BUS - A household gateway subsystem, the subsystem comprises: a host device, for connecting an external network with the interior of the household, and controlling various information appliances in the household based on a digital bus; a user operating device, for communicating with the host device via a digital bus interface, and providing various user operating interfaces and control units. A digital household system is also provided, the system comprises: a household gateway subsystem, connected with an external communicating network by IP access; the household gateway subsystem comprises: a host device; a user operating device, for communicating with the host device via a digital bus interface; a number of wireless signal transceivers, connected with the host device of the household gateway subsystem. | 07-08-2010 |
Patent application number | Description | Published |
20110194112 | SEMICONDUCTOR WAFER ALIGNMENT MARKERS, AND ASSOCIATED SYSTEMS AND METHODS - Semiconductor wafer alignment markers and associated systems and methods are disclosed. A wafer in accordance with a particular embodiment includes a wafer substrate having an alignment marker that includes a first structure and a second structure, each having a pitch, with first features and second features positioned within the pitch. The first features are positioned to generate first phase portions of an interference pattern, with at least one of the first features having a width different than another of the first features in the pitch, and with the second features positioned to generate second phase portions of the interference pattern, with the second phase portions having a second phase opposite the first phase, and with at least one of the second features having a width different than that of another of the second features in the pitch. The pitch for the first structure is different than the pitch for the second structure. | 08-11-2011 |
20120015486 | Semiconductor Constructions And Methods Of Forming Patterns - Some embodiments include methods of forming patterns. A semiconductor substrate is formed to comprise an electrically insulative material over a set of electrically conductive structures. An interconnect region is defined across the electrically conductive structures, and regions on opposing sides of the interconnect region are defined as secondary regions. A two-dimensional array of features is formed over the electrically insulative material. The two-dimensional array extends across the interconnect region and across the secondary regions. A pattern of the two-dimensional array is transferred through the electrically insulative material of the interconnect region to form contact openings that extend through the electrically insulative material and to the electrically conductive structures, and no portions of the two-dimensional array of the secondary regions is transferred into the electrically insulative material. | 01-19-2012 |
20120038895 | LENS HEATING COMPENSATION IN PHOTOLITHOGRAPHY - Photolithographic apparatus and methods are disclosed. One such apparatus includes an optical path configured to provide a first diffraction pattern in a portion of an optical system and to provide a second diffraction pattern to the portion of the optical system after providing the first diffraction pattern. Meanwhile, one such method includes providing a first diffraction pattern onto a portion of an optical system, wherein a semiconductor article is imaged using the first diffraction pattern. A second diffraction pattern is also provided onto the portion of the optical system, but the second diffraction pattern is not used to image the semiconductor article. | 02-16-2012 |
20120177891 | METHODS OF FORMING A PATTERNED, SILICON-ENRICHED DEVELOPABLE ANTIREFLECTIVE MATERIAL AND SEMICONDUCTOR DEVICE STRUCTURES INCLUDING THE SAME - Methods of forming a patterned, silicon-enriched developable antireflective material. One such method comprises forming a silicon-enriched developable antireflective composition. The silicon-enriched developable antireflective composition comprises a silicon-enriched polymer and a crosslinking agent. The silicon-enriched polymer and the crosslinking agent are reacted to form a silicon-enriched developable antireflective material that is insoluble and has at least one acid-sensitive moiety. A positive-tone photosensitive material, such as a positive-tone photoresist, is formed over the silicon-enriched developable antireflective material and regions thereof are exposed to radiation. The exposed regions of the positive-tone photosensitive material and underlying regions of the silicon-enriched developable antireflective material are removed. Additional methods are disclosed, as are semiconductor device structures including a silicon-enriched developable antireflective material. | 07-12-2012 |
20120178026 | IMAGING DEVICES, METHODS OF FORMING SAME, AND METHODS OF FORMING SEMICONDUCTOR DEVICE STRUCTURES - An imaging device comprising at least one array pattern region and at least one attenuation region. A plurality of imaging features in the at least one array pattern region and a plurality of assist features in the at least one attenuation region are substantially the same size as one another and are formed substantially on pitch. Methods of forming an imaging device and methods of forming a semiconductor device structure are also disclosed. | 07-12-2012 |
20120257177 | ILLUMINATION DESIGN FOR LENS HEATING MITIGATION - A method for reducing the effects of lens heating of a lens in an imaging process includes determining heat load locations on the lens according to an illumination source and a reticle design, obtaining a lens response characterization according to the heat load locations, and utilizing the heat load locations and the lens response characterization to generate a lens heating sensitivity map. | 10-11-2012 |
20120314196 | LITHOGRAPHY WAVE-FRONT CONTROL SYSTEM AND METHOD - Some embodiments include system and methods to obtain information for adjusting variations in features formed on a substrate of a semiconductor device. Such methods can include determining a first pupil in an illumination system used to form a first feature, and determining a second pupil used to form a second feature. The methods can also include determining a pupil portion belonging to only one of the pupils, and generating a modified pupil portion from the pupil portion. Information associated with the modified pupil portion can be obtained for controlling a portion of a projection lens assembly of an illumination system. Other embodiments are described. | 12-13-2012 |
20130040245 | Methods Of Processing Substrates - A method of processing a substrate includes forming first photoresist on a substrate. A portion of the first photoresist is selectively exposed to actinic energy and then the first photoresist is negative tone developed to remove an unexposed portion of the first photoresist. Second photoresist is formed on the substrate over the developed first photoresist. A portion of the second photoresist is selectively exposed to actinic energy and then the second photoresist is negative tone developed to remove an unexposed portion of the second photoresist and form a pattern on the substrate which comprises the developed first photoresist and the developed second photoresist. Other implementations are disclosed. | 02-14-2013 |
20130052566 | LITHOGRAPHY METHODS, METHODS FOR FORMING PATTERNING TOOLS AND PATTERNING TOOLS - Methods of lithography, methods for forming patterning tools, and patterning tools are described. One such patterning tool include an active region that forms a first diffraction image on a lens when in use, and an inactive region that forms a second diffraction image on a lens when in use. The inactive region includes a pattern of phase shifting features formed in a substantially transparent material of the patterning tool. Patterning tools and methods, as described, can be used to compensate for lens distortion from effects such as localized heating. | 02-28-2013 |
20130182255 | OVERLAY MARK AND APPLICATION THEREOF - An overlay mark for checking alignment accuracy between a former layer and a later layer on a wafer is described, including a former pattern as a part of the former layer, and a later pattern as a part of a patterned photoresist layer defining the later layer. The former pattern has two parallel opposite edges each forming a sharp angle α with the x-axis of the wafer. The later pattern also has two parallel opposite edges each forming the sharp angle α with the x-axis of the wafer. | 07-18-2013 |
20130216795 | RETICLE DESIGN FOR THE REDUCTION OF LENS HEATING PHENOMENON - A reticle for lens heating mitigation includes a substrate, a target pattern and a redistributive pattern. The substrate includes a live pattern region and the target pattern is disposed within the live pattern region for constructing the target pattern onto a wafer. The redistributive pattern is also disposed within the live pattern region for redistributing energy onto a lens without being printed onto the wafer and without correcting said target pattern to be printed onto the wafer. | 08-22-2013 |
20130252142 | IMAGING DEVICES, METHODS OF FORMING SAME, AND METHODS OF FORMING SEMICONDUCTOR DEVICE STRUCTURES - An imaging device comprising a first region and a second region. Imaging features in the first region and assist features in the second region are substantially the same size as one another and are formed substantially on pitch. Methods of forming an imaging device and methods of forming a semiconductor device structure are also disclosed. | 09-26-2013 |
20130302981 | Semiconductor Constructions And Methods Of Forming Patterns - Some embodiments include methods of forming patterns. A semiconductor substrate is formed to comprise an electrically insulative material over a set of electrically conductive structures. An interconnect region is defined across the electrically conductive structures, and regions on opposing sides of the interconnect region are defined as secondary regions. A two-dimensional array of features is formed over the electrically insulative material. The two-dimensional array extends across the interconnect region and across the secondary regions. A pattern of the two-dimensional array is transferred through the electrically insulative material of the interconnect region to form contact openings that extend through the electrically insulative material and to the electrically conductive structures, and no portions of the two-dimensional array of the secondary regions is transferred into the electrically insulative material. | 11-14-2013 |
20130323628 | RETICLE WITH COMPOSITE POLARIZER AND METHOD OF SIMULTANEOUS OPTIMIZATION OF IMAGING OF A SET OF DIFFERENT PATTERNS - A reticle with a composite polarizer includes: a transparent substrate; a patterned layer disposed on said transparent substrate; and a polarizing filter disposed on said transparent substrate, wherein said transparent substrate is substantially transparent with respect to illumination light, said patterned layer is partially opaque with respect to said illumination light, and said polarizing filter is capable of selectively polarizing said illumination light. | 12-05-2013 |
20130341795 | Methods of Forming Semiconductor Constructions - Some embodiments include a semiconductor construction having a pair of lines extending primarily along a first direction, and having a pair of contacts between the lines. The contacts are spaced from one another by a lithographic dimension, and are spaced from the lines by sub-lithographic dimensions. Some embodiments include a method of forming a semiconductor construction. Features are formed over a base. Each feature has a first type sidewall and a second type sidewall. The features are spaced from one another by gaps. Some of the gaps are first type gaps between first type sidewalls, and others of the gaps are second type gaps between second type sidewalls. Masking material is formed to selectively fill the first type gaps relative to the second type gaps. Excess masking material is removed to leave a patterned mask. A pattern is transferred from the patterned mask into the base. | 12-26-2013 |
20140063476 | METHODS AND APPARATUSES FOR TEMPLATE COOLING - Disclosed are cooling apparatus and methods of cooling a template. The cooling apparatus includes a reticle and an optical cooling material. The reticle includes patterning for at least partially reflecting patterning radiation incident on a first side of the reticle. The optical cooling material is in thermally-conductive coupling with the reticle mount and is configured to produce cooling when exposed to a laser radiation. More particularly, the optical cooling material includes a glass material that exhibits anti-Stokes fluorescence that produces cooling of the glass material when exposed to an infrared laser beam. In some embodiments, the cooling apparatus may be incorporated with a reticle mount. The reticle mount is in thermally-conductive coupling with a second side of the reticle. | 03-06-2014 |
20140106280 | LITHOGRAPHY METHODS, METHODS FOR FORMING PATTERNING TOOLS AND PATTERNING TOOLS - Methods of lithography, methods for forming patterning tools, and patterning tools are described. One such patterning tool include an active region that forms a first diffraction image on a lens when in use, and an inactive region that forms a second diffraction image on a lens when in use. The inactive region includes a pattern of phase shifting features formed in a substantially transparent material of the patterning tool. Patterning tools and methods, as described, can be used to compensate for lens distortion from effects such as localized heating. | 04-17-2014 |
20140232008 | Semiconductor Constructions and Methods of Forming Semiconductor Constructions - Some embodiments include a semiconductor construction having a pair of lines extending primarily along a first direction, and having a pair of contacts between the lines. The contacts are spaced from one another by a lithographic dimension, and are spaced from the lines by sub-lithographic dimensions. Some embodiments include a method of forming a semiconductor construction. Features are formed over a base. Each feature has a first type sidewall and a second type sidewall. The features are spaced from one another by gaps. Some of the gaps are first type gaps between first type sidewalls, and others of the gaps are second type gaps between second type sidewalls. Masking material is formed to selectively fill the first type gaps relative to the second type gaps. Excess masking material is removed to leave a patterned mask. A pattern is transferred from the patterned mask into the base. | 08-21-2014 |
20140247476 | LITHOGRAPHY WAVE-FRONT CONTROL SYSTEM AND METHOD - Some embodiments include system and methods to obtain information for adjusting variations in features formed on a substrate of a semiconductor device. Such methods can include determining a first pupil in an illumination system used to form a first feature, and determining a second pupil used to form a second feature. The methods can also include determining a pupil portion belonging to only one of the pupils, and generating a modified pupil portion from the pupil portion. Information associated with the modified pupil portion can be obtained for controlling a portion of a projection lens assembly of an illumination system. Other embodiments are described. | 09-04-2014 |
20150015860 | Reticles, And Methods Of Mitigating Asymmetric Lens Heating In Photolithography - A method of mitigating asymmetric lens heating in photolithographically patterning a photo-imageable material using a reticle includes determining where first hot spot locations are expected to occur on a lens when using a reticle to pattern a photo-imageable material. The reticle is then fabricated to include non-printing features within a non-printing region of the reticle which generate additional hot spot locations on the lens when using the reticle to pattern the photo-imageable material. Other implementations are contemplated, including reticles which may be independent of method of use or fabrication. | 01-15-2015 |