De Winter, NL
Andreas Wilhelmus De Winter, Amesterdam NL
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20090143625 | PROCESS FOR THE PREPARATION OF POLYETHER POLYOLS - A process for the preparation of a polyether polyol containing at most about 15 ppm of sodium and potassium, comprising: (a) reacting an initiator having at least two active hydrogen atoms with at least one alkylene oxide in the presence of a catalyst having an alkali metal hydroxide to form a polyether polyol reaction product; (b) neutralizing the polyether polyol reaction product obtained in step (a) by contacting this reaction product with phosphoric acid and water; and (c) removing the salt crystals from the polyether polyol and recovering the neutralized polyether polyol containing at most about 15 ppm of sodium and potassium, wherein no adsorption agent and no hydrate of a metal salt of the acid are used before, during or after the neutralization. | 06-04-2009 |
Annemieke De Winter, Bergen Op Zoom NL
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20120259131 | PHTHALIC ANHYDRIDE PROCESS - Disclosed is an improved process for the production of phthalic anhydride wherein the spent catalyst is removed from the oxidation reactor tubes more effectively by vacuuming from the top and using a vacuum hose having a tip with an increased impact strength and with a maximum hardness. As a result, the new catalyst loading can be made more uniform and the process may be operated with improved stability at higher organics loadings in the reactor feed. Process stability may be further improved by varying the outlet temperature of the phthalic anhydride precondenser over time. | 10-11-2012 |
Arjan De Winter, Geldrop NL
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20110242829 | COOLING ARRANGEMENT FOR A LUMINAIRE - A cooling arrangement comprising a source electrode, a first and a second target electrode arranged at a distance from the source electrode and control circuitry for controlling a voltage being applied between the source electrode and at least one of the first and the second target electrodes. The voltage is controlled such that an airflow resulting from a potential difference between the source electrode and at least one of the first and the second target electrodes is arranged to have alternating directions. By means of the invention it may be possible to provide cooling of a device having similar or better performances than a conventional heat sink and fan system, but with a smaller size and weight as well as being silent. | 10-06-2011 |
Dirk Arie Mattheus De Winter, Utrecht NL
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20140014834 | FORMING AN ELECTRON MICROSCOPE SAMPLE FROM HIGH-PRESSURE FROZEN MATERIAL - A method of forming a sample from a capillary with high-pressure frozen sample material comprises providing a high-pressure capillary with vitrified sample material at a temperature T | 01-16-2014 |
E. J. B. De Winter, Twello NL
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20100288076 | DEVICE AND METHOD FOR OBTAINING NON-FERROUS METALS - Device and method for separating metals and metal oxides thereof, in particular in non-ferrous alloys, such as zinc. To this end, zinc residues (dross) is placed in a rotary drum and heated. After a certain treatment time, pure metal located in the bottom part of the drum is poured out. The invention proposes that the drum be held rotatably on a drive mechanism arranged in the cover of the furnace. This facilitates handling of the drum, more particularly when placing it on its drive mandrel. As a result, it is possible to use larger drums, resulting in a larger capacity and a more efficient process. | 11-18-2010 |
Laurentius Cornelis De Winter, Vessem NL
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20100129742 | METHOD FOR A LITHOGRAPHIC APPARATUS - A method of increasing a depth of focus of a lithographic apparatus is disclosed. The method includes forming diffracted beams of radiation using a patterning device pattern; and transforming a phase-wavefront of a portion of the diffracted beams into a first phase-wavefront having a first focal plane for the lithographic apparatus, and a second phase-wavefront having a second, different focal plane, wherein the transforming comprises: subjecting a phase of a first portion of a first diffracted beam and a phase of a corresponding first portion of a second diffracted beam to a phase change which results in an at least partial formation of the first phase-wavefront, and subjecting a phase of a second portion of the first diffracted beam and a phase of a corresponding second portion of the second diffracted beam to a phase change which results in an at least partial formation of the second phase-wavefront. | 05-27-2010 |
Laurentius Cornelius De Winter, Vessem NL
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20080291412 | Lithographic apparatus and method - A lithographic method is provided that includes using an illumination system to provide a beam of radiation having an illumination mode, using a patterning device to impart the radiation beam with a pattern in its cross-section, and projecting the patterned radiation beam onto a substrate. The illumination mode is adjusted after the radiation beam has been projected onto the substrate. The adjustment is arranged to reduce the effect of optical aberrations due to lens heating on the projected pattern during projection of the pattern onto a subsequent substrate. | 11-27-2008 |
20100123887 | METHOD FOR A LITHOGRAPHIC APPARATUS - A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern features. | 05-20-2010 |
20100149508 | METHOD FOR A LITHOGRAPHIC APPARATUS - In an embodiment, there is provided a method of at least partially compensating for a deviation in a property of a pattern feature to be applied to a substrate using a lithographic apparatus. The method includes determining a desired phase change to be applied to at least a portion of a radiation beam that is to be used to apply the pattern feature to the substrate and which would at least partially compensate for the deviation in the property. The determination of the desired phase change includes determining a desired configuration of a phase modulation element. The method further includes implementing the desired phase change to the portion of the radiation beam when applying the pattern feature to the substrate, the implementation of the desired phase change comprising illuminating the phase modulation element with the portion of the radiation beam when the phase modulation element is in the desired configuration. | 06-17-2010 |
20100265479 | DEVICE MANUFACTURING METHOD AND LITHOGRAPHIC APPARATUS - A mask can be used to print a pattern. Due to mask pattern surface topography, an image error may occur, such as an intensity imbalance between adjacent bright lines in the projected pattern. To help alleviate or eliminate the problem of intensity imbalance, the projection system may include an optical phase adjuster constructed and arranged to adjust a phase of an electric field of optical beams of radiation beam traversing the adjuster. A reduction of intensity imbalance is achieved by suitably adjusting the phases of the zeroth, plus first and minus first-order diffracted radiation emanating from the mask pattern. By adjusting the phase differently for different portions of the illumination, the method can be applied such that no decrease of depth of focus due, for example, the 0 | 10-21-2010 |
20110200922 | Lithographic Apparatus and Method - Embodiments of the invention related to lithographic apparatus and methods. A lithographic method comprises calculating a laser metric based on a spectrum of laser radiation emitted from a laser to a lithographic apparatus together with a representation of an aerial image of a pattern to be projected onto the substrate by the lithographic apparatus, and using the laser metric to modify operation of the laser or adjust the lithographic apparatus, and projecting the pattern onto the substrate. | 08-18-2011 |
20120200838 | METHOD FOR A LITHOGRAPHIC APPARATUS - A method of increasing a depth of focus of a lithographic apparatus is disclosed. The method includes forming diffracted beams of radiation using a patterning device pattern; and transforming a phase-wavefront of a portion of the diffracted beams into a first phase-wavefront having a first focal plane for the lithographic apparatus, and a second phase-wavefront having a second, different focal plane, wherein the transforming comprises: subjecting a phase of a first portion of a first diffracted beam and a phase of a corresponding first portion of a second diffracted beam to a phase change which results in an at least partial formation of the first phase-wavefront, and subjecting a phase of a second portion of the first diffracted beam and a phase of a corresponding second portion of the second diffracted beam to a phase change which results in an at least partial formation of the second phase-wavefront. | 08-09-2012 |
20130141706 | LITHOGRAPHIC METHOD AND APPARATUS - A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern. | 06-06-2013 |
20140152969 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is provided and configured to project a patterned beam of radiation onto a substrate. The apparatus has a measurement system to provide measurement data related to a thickness of a resist layer on the substrate, and a controller to control the operation of the lithographic apparatus such that a radiation intensity level in the patterned beam to be projected onto the substrate is controlled based on the measurement data. | 06-05-2014 |
Suzanna Helena Petronella Maria De Winter, S-Hertogenbosh NL
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20100221190 | METHOD FOR PRODUCING A PARTICLE COMPRISING A GAS CORE AND A SHELL AND PARTICLES THUS OBTAINED - The invention relates to a method for the preparation of particles comprising a gas core and shell which particles are suitable for use as contrast agent and as part of a therapeutic composition, especially for drug delivery. These particles show a surprisingly high activation level on provision of ultrasound energy. | 09-02-2010 |
Suzanna Helena Petronella Maria De Winter, Eindhoven NL
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20080220288 | Light-Emitting Device, And Method For The Manufacture Thereof - A light-emitting device comprising an anode; a cathode; a light-emitting layer arranged between said anode and said cathode; and a buffer layer, comprising a conducting polymer and a polymeric acid, arranged between said anode and said light-emitting layer, is disclosed. Acidic groups of said polymeric acid have been converted to non-acidic groups in at least a part of said buffer layer, which minimises acid quenching of photoluminescence. A method for manufacturing such a device is also disclosed. | 09-11-2008 |
Suzanna Helena Petronella Maria De Winter, 'S-Hertogenbosch NL
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20100209525 | METHODS FOR PREPARING POLYMER MICROPARTICLES - The present invention describes methods and tools for preparing a population of monodisperse polymer microparticles, which are of particular interest in the field of drug delivery. | 08-19-2010 |
20100237523 | METHODS FOR PREPARING POLYMER MICROPARTICLES - The present invention describes methods and tools for preparing a population of monodisperse polymer microparticles, which are of particular interest in the field of drug delivery. | 09-23-2010 |