Patent application number | Description | Published |
20140215551 | CONTROLLING ACCESS TO SHARED CONTENT IN AN ONLINE CONTENT MANAGEMENT SYSTEM - Systems and methods for controlling access to shared content in an online content management system, include receiving a request to access a content item from a requester, wherein the content item is stored in a synchronized online content management system. The example method then includes determining that the requester is in an approved list of requestors and granting access to the content item. In one variation, the request to access the content item includes activation of a shared link. In another variation, the request to access the content item includes access to a shared folder in the synchronized online content management system. In a third variation, determining that the requester is in an approved list of requesters includes determining that the requester is logged into a primary and secondary account, and that the requester is in an approved list for the secondary account. | 07-31-2014 |
20140258418 | CONTENT ITEM SHARING AND SYNCHRONIZATION SYSTEM WITH TEAM SHARED FOLDERS - A content item sharing and synchronization system providing team shared folders is described. Users of the system have access to the team shared folder simply by being a member of a team. A team account manager of the team can grant access to the team shared folder simply by inviting selected users to the team. Similarly, the team account manager can revoke access to the team shared folder simply by removing a user from the team. Unlike typical network file server folders, separate access control list management for the team shared folder apart from user team membership management is not needed to grant and revoke access to the team shared folder, thereby reducing administrative steps necessary to effectively manage access to the team shared folder. | 09-11-2014 |
20140331301 | TOGGLE BETWEEN ACCOUNTS - Techniques are described for enabling administrators of teams that use a particular service to specify which sign-on options, of multiple possible sign-on options, are assigned to the members of the teams to which the administrators belong. For example, an administrator may assign a first sign-on option, which only allows users to use native authentication, to one set of members of the team. At the same time, the administrator may assign a second sign-on option, which only allows users to use third-party single-sign-on authentication, to another set of members of the same team. | 11-06-2014 |
20150039738 | TECHNIQUES FOR MANAGING UNSYNCHRONIZED CONTENT ITEMS AT UNLINKED DEVICES - Techniques are described herein for managing unsynchronized content items when the personal computing devices storing the unsynchronized content items are unlinked from a content item synchronization service. The techniques involve treating synchronized content items differently from unsynchronized content items. For example, after a personal computing is unlinked from the service, synchronized content items may be removed or deleted from the personal computing device and unsynchronized content items encrypted and/or moved to another data storage location. | 02-05-2015 |
20150256533 | TOGGLE BETWEEN ACCOUNTS - Techniques are described for enabling administrators of teams that use a particular service to specify which sign-on options, of multiple possible sign-on options, are assigned to the members of the teams to which the administrators belong. For example, an administrator may assign a first sign-on option, which only allows users to use native authentication, to one set of members of the team. At the same time, the administrator may assign a second sign-on option, which only allows users to use third-party single-sign-on authentication, to another set of members of the same team. | 09-10-2015 |
20150319175 | RETROACTIVE SHARED CONTENT ITEM LINKS - A content management system implementing methodologies providing retroactive shared content item links is disclosed. The content management system and methodologies allow a team administrator of a team to configure a team-wide shared link policy that determines whether non-team members can access content items associated with team accounts using shared links generated for the content items by team members. The team shared link policy has two settings. In a first setting, the content management system allows non-team members to use shared links generated by team members to access content items associated with team accounts. In a second setting, the content management system blocks access to the content items by non-team members. Shared links are retroactive in the sense they do not need to be regenerated after the team shared link policy has been changed from the second setting back to the first setting. | 11-05-2015 |
Patent application number | Description | Published |
20090142512 | APPARATUS AND METHOD FOR DEPOSITING ELECTRICALLY CONDUCTIVE PASTING MATERIAL - A method and apparatus are described for reducing particle contamination in a plasma processing chamber. In one embodiment, a pasting disk is provided which includes a disk-shaped base of high-resistivity material that has an electrically conductive pasting material layer applied to a top surface of the base so that the pasting material layer partially covers the top surface of the base. The pasting disk is sputter etched to deposit conductive pasting material over a wide area on the interior surfaces of a plasma processing chamber while minimizing deposition on dielectric components that are used to optimize the sputter etch process during substrate processing. | 06-04-2009 |
20090260982 | WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS - Embodiments described herein generally relate to components for a semiconductor processing chamber, a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a process kit. In one embodiment a lower shield for encircling a sputtering target and a substrate support is provided. The lower shield comprises a cylindrical outer band having a first diameter dimensioned to encircle the sputtering surface of the sputtering target and the substrate support, the cylindrical band comprising a top wall that surrounds a sputtering surface of a sputtering target and a bottom wall that surrounds the substrate support, a support ledge comprising a resting surface and extending radially outward from the cylindrical outer band, a base plate extending radially inward from the bottom wall of the cylindrical band, and a cylindrical inner band coupled with the base plate and partially surrounding a peripheral edge of the substrate support. | 10-22-2009 |
20120211359 | WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS - Embodiments described herein generally relate to components for a semiconductor processing chamber, a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a process kit. In one embodiment a lower shield for encircling a sputtering target and a substrate support is provided. The lower shield comprises a cylindrical outer band having a first diameter dimensioned to encircle the sputtering surface of the sputtering target and the substrate support, the cylindrical band comprising a top wall that surrounds a sputtering surface of a sputtering target and a bottom wall that surrounds the substrate support, a support ledge comprising a resting surface and extending radially outward from the cylindrical outer band, a base plate extending radially inward from the bottom wall of the cylindrical band, and a cylindrical inner band coupled with the base plate and partially surrounding a peripheral edge of the substrate support. | 08-23-2012 |
20120252207 | POST DEPOSITION TREATMENTS FOR CVD COBALT FILMS - Embodiments of the invention provide methods for forming materials on a substrate used for metal gate and other applications. In one embodiment, a method includes forming a cobalt stack over a barrier layer disposed on a substrate by depositing a cobalt layer during a deposition process, exposing the cobalt layer to a plasma to form a plasma-treated cobalt layer during a plasma process, and repeating the cobalt deposition process and the plasma process to form the cobalt stack containing a plurality of plasma-treated cobalt layers. The method further includes exposing the cobalt stack to an oxygen source gas to form a cobalt oxide layer from an upper portion of the cobalt stack during a surface oxidation process and heating the remaining portion of the cobalt stack to a temperature within a range from about 300° C. to about 500° C. to form a crystalline cobalt film during a thermal annealing crystallization process. | 10-04-2012 |
20130196514 | OFF-ANGLED HEATING OF THE UNDERSIDE OF A SUBSTRATE USING A LAMP ASSEMBLY - Disclosed are method and apparatus for treating a substrate. The apparatus is a dual-function process chamber that may perform both a material process and a thermal process on a substrate. The chamber has an annular radiant source disposed between a processing location and a transportation location of the chamber. Lift pins have length sufficient to maintain the substrate at the processing location while the substrate support is lowered below the radiant source plane to afford radiant heating of the substrate. A method of processing a substrate having apertures formed in a first surface thereof includes depositing material on the first surface in the apertures and reflowing the material by heating a second surface of the substrate opposite the first surface. A second material can then be deposited, filling the apertures partly or completely. Alternately, a cyclical deposition/reflow process may be performed. | 08-01-2013 |
20130264035 | EDGE RING FOR A DEPOSITION CHAMBER - Disclosed are apparatus and methods for material and thermal processing of substrates in a single chamber. In one embodiment, an edge ring is provided. The edge ring includes an annular body having an inner peripheral edge, a first surface, and a second surface opposite the first surface, a first raised member extending substantially orthogonally from the second surface, a second raised member extending from the second surface adjacent the first raised member and separated from the first raised member by a first depression, and a third raised member extending from the second surface adjacent the second raised member and separated by a second depression, the second depression comprising a sloped surface having a reflectivity value that is different than a reflectivity value of the first surface. | 10-10-2013 |
20130284096 | COOLED REFLECTIVE ADAPTER PLATE FOR A DEPOSITION CHAMBER - In one embodiment, An adapter plate for a deposition chamber is provided. The adapter plate comprises a body, a mounting plate centrally located on the body, a first annular portion extending longitudinally from a first surface of the mounting plate and disposed radially inward from an outer surface of the mounting plate, a second annular portion extending longitudinally from an opposing second surface of the mounting plate and disposed radially inward from the outer surface of the mounting plate, and a mirror-finished surface disposed on the interior of the second annular portion, the mirror-finished surface having an average surface roughness of 6 Ra or less. | 10-31-2013 |
20130285065 | PVD BUFFER LAYERS FOR LED FABRICATION - Fabrication of gallium nitride-based light devices with physical vapor deposition (PVD)-formed aluminum nitride buffer layers is described. Process conditions for a PVD AlN buffer layer are also described. Substrate pretreatments for a PVD aluminum nitride buffer layer are also described. In an example, a method of fabricating a buffer layer above a substrate involves pre-treating a surface of a substrate. The method also involves, subsequently, reactive sputtering an aluminum nitride (AlN) layer on the surface of the substrate from an aluminum-containing target housed in a physical vapor deposition (PVD) chamber with a nitrogen-based gas or plasma. | 10-31-2013 |
20130330920 | METHOD AND APPARATUS FOR SUBSTRATE PRECLEAN WITH HYDROGEN CONTAINING HIGH FREQUENCY RF PLASMA - A high-frequency, hydrogen-based radio-frequency (RF) plasma is used to reduce a metal oxide and other contaminant disposed in an aperture that is formed in an ultra-low k dielectric material. Because the frequency of the plasma is at least about 40 MHz and the primary gas in the plasma is hydrogen, metal oxide can be advantageously removed without damaging the dielectric material. | 12-12-2013 |
20130334038 | WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS - Embodiments described herein generally relate to components for a semiconductor processing chamber, a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a process kit. In one embodiment a lower shield for encircling a sputtering target and a substrate support is provided. The lower shield comprises a cylindrical outer band having a first diameter dimensioned to encircle the sputtering surface of the sputtering target and the substrate support, the cylindrical band comprising a top wall that surrounds a sputtering surface of a sputtering target and a bottom wall that surrounds the substrate support, a support ledge comprising a resting surface and extending radially outward from the cylindrical outer band, a base plate extending radially inward from the bottom wall of the cylindrical band, and a cylindrical inner band coupled with the base plate and partially surrounding a peripheral edge of the substrate support. | 12-19-2013 |
20140264363 | Oxygen Controlled PVD Aluminum Nitride Buffer for Gallium Nitride-Based Optoelectronic and Electronic Devices - Oxygen controlled PVD AlN buffers for GaN-based optoelectronic and electronic devices is described. Methods of forming a PVD AlN buffer for GaN-based optoelectronic and electronic devices in an oxygen controlled manner are also described. In an example, a method of forming an aluminum nitride (AlN) buffer layer for GaN-based optoelectronic or electronic devices involves reactive sputtering an AlN layer above a substrate, the reactive sputtering involving reacting an aluminum-containing target housed in a physical vapor deposition (PVD) chamber with a nitrogen-containing gas or a plasma based on a nitrogen-containing gas. The method further involves incorporating oxygen into the AlN layer. | 09-18-2014 |
20150162171 | WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS - Embodiments described herein generally relate to components for a semiconductor processing chamber, a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a process kit. In one embodiment a lower shield for encircling a sputtering target and a substrate support is provided. The lower shield comprises a cylindrical outer band having a first diameter dimensioned to encircle the sputtering surface of the sputtering target and the substrate support, the cylindrical band comprising a top wall that surrounds a sputtering surface of a sputtering target and a bottom wall that surrounds the substrate support, a support ledge comprising a resting surface and extending radially outward from the cylindrical outer band, a base plate extending radially inward from the bottom wall of the cylindrical band, and a cylindrical inner band coupled with the base plate and partially surrounding a peripheral edge of the substrate support. | 06-11-2015 |
20150348773 | ALUMINUM-NITRIDE BUFFER AND ACTIVE LAYERS BY PHYSICAL VAPOR DEPOSITION - Embodiments of the invention described herein generally relate to an apparatus and methods for forming high quality buffer layers and Group III-V layers that are used to form a useful semiconductor device, such as a power device, light emitting diode (LED), laser diode (LD) or other useful device. Embodiments of the invention may also include an apparatus and methods for forming high quality buffer layers, Group III-V layers and electrode layers that are used to form a useful semiconductor device. In some embodiments, an apparatus and method includes the use of one or more cluster tools having one or more physical vapor deposition (PVD) chambers that are adapted to deposit a high quality aluminum nitride (AlN) buffer layer that has a high crystalline orientation on a surface of a plurality of substrates at the same time. | 12-03-2015 |
20160035937 | OXYGEN CONTROLLED PVD ALN BUFFER FOR GAN-BASED OPTOELECTRONIC AND ELECTRONIC DEVICES - Oxygen controlled PVD AlN buffers for GaN-based optoelectronic and electronic devices is described. Methods of forming a PVD AlN buffer for GaN-based optoelectronic and electronic devices in an oxygen controlled manner are also described. In an example, a method of forming an aluminum nitride (AlN) buffer layer for GaN-based optoelectronic or electronic devices involves reactive sputtering an AlN layer above a substrate, the reactive sputtering involving reacting an aluminum-containing target housed in a physical vapor deposition (PVD) chamber with a nitrogen-containing gas or a plasma based on a nitrogen-containing gas. The method further involves incorporating oxygen into the AlN layer. | 02-04-2016 |
20160086775 | APPARATUS AND METHOD FOR DEPOSITING ELECTRONICALLY CONDUCTIVE PASTING MATERIAL - A method and apparatus are described for reducing particle contamination in a plasma processing chamber. In one embodiment, a pasting disk is provided which includes a disk-shaped base of high-resistivity material that has an electrically conductive pasting material layer applied to a top surface of the base so that the pasting material layer partially covers the top surface of the base. The pasting disk is sputter etched to deposit conductive pasting material over a wide area on the interior surfaces of a plasma processing chamber while minimizing deposition on dielectric components that are used to optimize the sputter etch process during substrate processing. | 03-24-2016 |
Patent application number | Description | Published |
20090308732 | APPARATUS AND METHOD FOR UNIFORM DEPOSITION - Embodiments of the present invention generally relate to an apparatus and method for uniform sputter depositing of materials into the bottom and sidewalls of high aspect ratio features on a substrate. In one embodiment, a sputter deposition system includes a collimator that has apertures having aspect ratios that decrease from a central region of the collimator to a peripheral region of the collimator. In one embodiment, the collimator is coupled to a grounded shield via a bracket member that includes a combination of internally and externally threaded fasteners. In another embodiment, the collimator is integrally attached to a grounded shield. In one embodiment, a method of sputter depositing material includes pulsing the bias on the substrate support between high and low values. | 12-17-2009 |
20090308739 | WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS - Embodiments described herein generally relate to an apparatus and method for uniform sputter depositing of materials into the bottom and sidewalls of high aspect ratio features on a substrate. In one embodiment, a collimator for mechanical and electrical coupling with a shield member positioned between a sputtering target and a substrate support pedestal is provided. The collimator comprises a central region and a peripheral region, wherein the collimator has a plurality of apertures extending therethrough and where the apertures located in the central region have a higher aspect ratio than the apertures located in the peripheral region. | 12-17-2009 |
20100243440 | Mechanism for continuously varying radial position of a magnetron - A continuously variable multi-position magnetron that is rotated about a central axis in back of a sputtering target at a freely selected radius. The position is dynamically controlled from the outside, for example, through a hydraulic actuator connected between a pivoting arm supporting the magnetron and an arm fixed to the shaft, by two coaxial shafts independent controllable from the outside and supporting the magnetron through a frog-leg mechanism, or a cable connected between the pivoting arms and moved by an external slider. The magnetron can be rotated at two, three, or more discrete radii or be moved in a continuous spiral pattern. | 09-30-2010 |
20120231633 | OFF-ANGLED HEATING OF THE UNDERSIDE OF A SUBSTRATE USING A LAMP ASSEMBLY - Disclosed are method and apparatus for treating a substrate. The apparatus is a dual-function process chamber that may perform both a material process and a thermal process on a substrate. The chamber has an annular radiant source disposed between a processing location and a transportation location of the chamber. Lift pins have length sufficient to maintain the substrate at the processing location while the substrate support is lowered below the radiant source plane to afford radiant heating of the substrate. A method of processing a substrate having apertures formed in a first surface thereof includes depositing material on the first surface in the apertures and reflowing the material by heating a second surface of the substrate opposite the first surface. A second material can then be deposited, filling the apertures partly or completely. Alternately, a cyclical deposition/reflow process may be performed. | 09-13-2012 |
20120258602 | Method for Metal Deposition Using Hydrogen Plasma - Methods for formation and treatment of pure metal layers using CVD and ALD techniques are provided. In one or more embodiments, the method includes forming a metal precursor layer and treating the metal precursor layer to a hydrogen plasma to reduce the metal precursor layer to form a metal layer. In one or more embodiments, treating the metal precursor layer includes exposing the metal precursor layer to a high frequency-generated hydrogen plasma. Methods of preventing a hydrogen plasma from penetrating a metal precursor layer are also provided. | 10-11-2012 |
20130055952 | REFLECTIVE DEPOSITION RINGS AND SUBSTRATE PROCESSING CHAMBERS INCORPORTING SAME - Apparatus for improving temperature uniformity across a substrate are provided herein. In some embodiments, a deposition ring for use in a substrate processing system to process a substrate may include an annular body having a first surface, an opposing second surface, and a central opening passing through the first and second surfaces, wherein the second surface is configured to be disposed over a substrate support having a support surface to support a substrate having a given width, and wherein the opening is sized to expose a predominant portion of the support surface; and wherein the first surface includes at least one reflective portion configured to reflect heat energy toward a central axis of the annular body, wherein the at least one reflective portion has a surface area that is about 5 to about 50 percent of a total surface area of the first surface. | 03-07-2013 |
20130139878 | USE OF A1 BARRIER LAYER TO PRODUCE HIGH HAZE ZNO FILMS ON GLASS SUBSTRATES - Embodiments of the invention provide a method for forming a solar cell including forming a layer comprising alumina on a substrate and forming a transparent conductive layer on the layer comprising alumina. The method may also include forming a transparent conductive seed layer on the layer comprising alumina and forming a transparent conductive bulk layer on the transparent conductive seed layer. Embodiments of the invention also include photovoltaic devices having a substrate, a layer comprising alumina adjacent to the substrate, a zinc oxide-containing transparent conductive seed layer adjacent to the layer comprising alumina, and a zinc oxide-containing transparent conductive bulk layer adjacent the zinc oxide-containing transparent conductive seed layer. | 06-06-2013 |
20130196507 | Method Of Depositing Metals Using High Frequency Plasma - Methods for depositing metal layers, and more specifically TaN layers, using CVD and ALD techniques are provided. In one or more embodiments, the method includes sequentially exposing a substrate to a metal precursor, or more specifically a tantalum precursor, followed by a high frequency plasma. | 08-01-2013 |
20130270107 | OFF-ANGLED HEATING OF THE UNDERSIDE OF A SUBSTRATE USING A LAMP ASSEMBLY - Disclosed are method and apparatus for treating a substrate. The apparatus is a dual-function process chamber that may perform both a material process and a thermal process on a substrate. The chamber has an annular radiant source disposed between a processing location and a transportation location of the chamber. Lift pins have length sufficient to maintain the substrate at the processing location while the substrate support is lowered below the radiant source plane to afford radiant heating of the substrate. A method of processing a substrate having apertures formed in a first surface thereof includes depositing material on the first surface in the apertures and reflowing the material by heating a second surface of the substrate opposite the first surface. A second material can then be deposited, filling the apertures partly or completely. Alternately, a cyclical deposition/reflow process may be performed. | 10-17-2013 |
20140190822 | WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS - Embodiments described herein generally relate to components for a semiconductor processing chamber, a process kit for a semiconductor processing chamber, and a semiconductor processing chamber having a process kit. In one embodiment a lower shield for encircling a sputtering target and a substrate support is provided. The lower shield comprises a cylindrical outer band having a first diameter dimensioned to encircle the sputtering surface of the sputtering target and the substrate support, the cylindrical band comprising a top wall that surrounds a sputtering surface of a sputtering target and a bottom wall that surrounds the substrate support, a support ledge comprising a resting surface and extending radially outward from the cylindrical outer band, a base plate extending radially inward from the bottom wall of the cylindrical band, and a cylindrical inner band coupled with the base plate and partially surrounding a peripheral edge of the substrate support. | 07-10-2014 |
20140262767 | SPUTTER SOURCE FOR SEMICONDUCTOR PROCESS CHAMBERS - Embodiments of a sputter source for semiconductor process chambers are provided herein. In some embodiments, a sputter source for a semiconductor process chamber may include: a target comprising a magnetic material to be deposited on a substrate, the magnetic material including a front surface where material is to be sputtered and an opposing back surface; and an outer magnet disposed proximate a back surface of the target and arranged symmetrically with respect to a central axis of the target, wherein the target has an annular groove formed in the back surface of the target disposed proximate the outer magnet to reduce a magnetic permeability of a region of the target proximate the outer magnet, wherein the groove is an unfilled v-shaped groove having an inner angle greater than 90 degrees. | 09-18-2014 |
20140269826 | IN-SITU TEMPERATURE MEASUREMENT IN A NOISY ENVIRONMENT - Disclosed are method and apparatus for treating a substrate. The apparatus is a dual-function process chamber that may perform both a material process and a thermal process on a substrate. The chamber has an annular radiant source disposed between a processing location and a transportation location of the chamber. Lift pins have length sufficient to maintain the substrate at the processing location while the substrate support is lowered below the radiant source plane to afford radiant heating of the substrate. One or more lift pins has a light pipe disposed therein to collect radiation emitted or transmitted by the substrate when the lift pin contacts the substrate surface. | 09-18-2014 |
20150279635 | DEPOSITION SYSTEM WITH MULTI-CATHODE AND METHOD OF MANUFACTURE THEREOF - A deposition system, and a method of operation thereof, includes: a cathode; a shroud below the cathode; a rotating shield below the cathode for exposing the cathode through the shroud and through a shield hole of the rotating shield; and a rotating pedestal for producing a material to form a carrier over the rotating pedestal, wherein the material having a non-uniformity constraint of less than 1% of a thickness of the material and the cathode having an angle between the cathode and the carrier. | 10-01-2015 |
Patent application number | Description | Published |
20090006297 | OPEN-WORLD MODELING - The claimed subject matter provides systems and/or methods that facilitate generating an inference about events that may not have yet been observed. Open-world modeling can be used to take a history of observation so as to understand trends over time in the revelation of previously unseen events, and to make inferences with subsets of data that new unseen events will be seen. Thus, inaccuracies associated with predictions generated from incomplete data sets can be mitigated. To yield such predictions, open-world submodels and closed-world submodels that do not allow for previously unseen events can be combined via a model mixture methodology, which fuses inferences from the open- and close-world models. | 01-01-2009 |
20090006574 | SYSTEM AND METHODS FOR DISRUPTION DETECTION, MANAGEMENT, AND RECOVERY - A task disruption and recovery system and methods are described that detects shifts away from ongoing tasks, whether by self-interruption or by disruptive events from within or outside a computing system, based on signals detected. Among other functions, the system works to enhance the efficient recovery of suspended tasks or problem-solving sessions via storing and presenting representations of the suspended sessions in a manner that facilitates recovery and continuation. | 01-01-2009 |
20100075639 | COMPUTING AND HARNESSING INFERENCES ABOUT THE TIMING, DURATION, AND NATURE OF MOTION AND CESSATION OF MOTION WITH APPLICATIONS TO MOBILE COMPUTING AND COMMUNICATIONS - An information delivery system comprises a receiver component that receives information about the movement, velocity, acceleration, and/or locations over time of a user. A computation component using a predictive model generates a probability distribution relating to one or more of when the user will next be stopped, how long the user will be stopped, how long a pattern of motion, such as walking, driving in stop and go traffic, and smooth highway motion will last, based at least in part upon signals about motion over time. The system can further comprise an alerting component that determines when to provide the user with information based at least in part upon the probability distribution over some aspect of motion or cessation of motion, and optionally the content, or tagged or inferred urgency or importance, of a message or communication. | 03-25-2010 |
20100269051 | STATISTICAL MODELS AND METHODS TO SUPPORT THE PERSONALIZATION OF APPLICATIONS AND SERVICES VIA CONSIDERATION OF PREFERENCE ENCODINGS OF A COMMUNITY OF USERS - A statistical methodology is employed for assisting people with the setting of parameters of software applications or services. With the method, information about demographics and/or about the complete or partial preferences of other people, are analyzed to infer recommendations for settings and functionality of a computer application or service. A system is reviewed with the ability to receive data regarding a plurality of users, and stores respective profiles for these users in a community store. The system can leverage off of these completed and/or partially completed profiles of parameters representing preferences about software operation in connection with building new profiles for users (new and/or existing). Data regarding a user that desires to build a new profile is employed in connection with the community profiles to facilitate the user building a personalized profile. Various statistical and/probabilistic schemes can be employed, for example, collaborative filtering techniques to identify to the user the top n settings by particular parameter(s), top m settings by popularity, top x most similar profiles to facilitate the user selecting most appropriate sub-profiles as part of a personalized profile building and selection effort. | 10-21-2010 |
20110288839 | OPEN-WORLD MODELING - The claimed subject matter provides systems and/or methods that facilitate generating an inference about events that may not have yet been observed. Open-world modeling can be used to take a history of observation so as to understand trends over time in the revelation of previously unseen events, and to make inferences with subsets of data that new unseen events will be seen. Thus, inaccuracies associated with predictions generated from incomplete data sets can be mitigated. To yield such predictions, open-world submodels and closed-world submodels that do not allow for previously unseen events can be combined via a model mixture methodology, which fuses inferences from the open- and close-world models. | 11-24-2011 |
20140120954 | COMPUTING AND HARNESSING INFERENCES ABOUT THE TIMING, DURATION, AND NATURE OF MOTION AND CESSATION OF MOTION WITH APPLICATIONS TO MOBILE COMPUTING AND COMMUNICATIONS - An information delivery system comprises a receiver component that receives information about the movement, velocity, acceleration, and/or locations over time of a user. A computation component using a predictive model generates a probability distribution relating to one or more of when the user will next be stopped, how long the user will be stopped, how long a pattern of motion, such as walking, driving in stop and go traffic, and smooth highway motion will last, based at least in part upon signals about motion over time. The system can further comprise an alerting component that determines when to provide the user with information based at least in part upon the probability distribution over some aspect of motion or cessation of motion, and optionally the content, or tagged or inferred urgency or importance, of a message or communication. | 05-01-2014 |
Patent application number | Description | Published |
20090093956 | Transmitting location data in wireless networks - A wireless access point in a wireless network that may be adapted to transmit location data indicating its location to other devices within range, including other wireless access points and client devices. In some embodiments of the invention, the location data may be embedded in a control message or announcement transmission transmitted by the wireless access point, or other message conventionally used to broadcast network characteristics necessary for a client device to establish a connection to the wireless access point. In terms of the Open Systems Interconnect (OSI) layered model of a network, layer 2 control messages, including beacons, probe responses, or other suitable transmissions may be used for control messages or announcement transmissions. The other wireless access points and client devices may receive the location data broadcast by the wireless access point without establishing a connection to the client device. Devices receiving the location data may use the received location data to determine their own locations, and may provide the determined locations to consumers of location data. | 04-09-2009 |
20090094111 | Advertising framework for wireless networks - An advertising framework for transmitting advertisements from wireless access points to client devices that need not be connected to the wireless access point. The client device can display the advertisements on a user interface of the client device. Such advertisements may be transmitted, for example, as part of a control message transmitted by a wireless access point of a wireless network, or other message conventionally used to broadcast network characteristics necessary for a client device to establish a connection to the wireless access point. In terms of the Open Systems Interconnect (OSI) layered model of a network, layer 2 control messages, including announcement transmissions such as beacons, may be used for control messages. | 04-09-2009 |
20090254924 | OPERATING SYSTEM INTERFACES FOR VIRTUAL WIFI AND SOFTAP CAPABLE DRIVERS - Some embodiments of the invention provide an interface between programmed instructions (e.g., an operating system) and a miniport driver configured to communicate with radio hardware on a computer. The interface may include components operable to invoke various wireless connectivity-related functionality implemented by the radio hardware and/or miniport driver. The functionality may, for example, include a capability whereby the computer may maintain simultaneous connections on a plurality of wireless networks using a single radio, and/or a capability whereby the computer may function as an access point for a wireless network. | 10-08-2009 |
20120022948 | ADVERTISING FRAMEWORK FOR WIRELESS NETWORKS - Discovery of services between devices is provided prior to establishing a connection between devices, including wireless-enabled devices or devices that are communicatively coupled to wireless access points or other wireless communication devices. Discovering services prior to establishing a connection may facilitate finding a desired service. The services that may be discovered may be, for example, print services, camera services, PDA services or any other suitable services. Services may be discovered using 802.11, Bluetooth, UWB or any other suitable wireless technology. A graphical user interface is provided that enables a user to select a desired service. | 01-26-2012 |
20160037479 | TRANSMITTING LOCATION DATA IN WIRELESS NETWORKS - A wireless access point in a wireless network that may be adapted to transmit location data indicating its location to other devices within range, including other wireless access points and client devices. In some embodiments of the invention, the location data may be embedded in a control message or announcement transmission transmitted by the wireless access point, or other message conventionally used to broadcast network characteristics necessary for a client device to establish a connection to the wireless access point. In terms of the Open Systems Interconnect (OSI) layered model of a network, layer 2 control messages, including beacons, probe responses, or other suitable transmissions may be used for control messages or announcement transmissions. The other wireless access points and client devices may receive the location data broadcast by the wireless access point without establishing a connection to the client device. Devices receiving the location data may use the received location data to determine their own locations, and may provide the determined locations to consumers of location data. | 02-04-2016 |
Patent application number | Description | Published |
20110066591 | POLICY-BASED STORAGE STRUCTURE DISTRIBUTION - Policy-based storage and retrieval combined with a distribution algorithm results in automatic and even distribution of policy-based storage structures across a set of nodes and dynamic, automated homing or ownership of policy-based storage structures. Large numbers of policy-based storage structures may be distributed without manual administration, allowing for rapid creation and destruction of storage structures. The overall load may be distributed and balanced across the server pool. Multiple entries having the same key value in a database- or table-like structure allow for distribution of policy-based storage and retrieval by key value and for queue semantics to be utilized for microqueues in the large database- or table-like structure. | 03-17-2011 |
20130138679 | Database query optimization and cost estimation - Described are systems and methods relating to database query optimization and query cost estimation. The approach is described in the context of searching balanced and semi-balanced tree indexes such as B-trees, B+ trees, and R-B trees. The described approach may be used for both simple and composite queries, and the described approach may be used for relational queries, i.e., where a variable is less than or greater than a certain value and the database is being used to find the set of records that satisfy the relation. Further, the described approach may be used for generalized N-ary tree queries and cost estimations. | 05-30-2013 |
20140258382 | APPLICATION CONGESTION CONTROL - Controlling client side application congestion at least in part by using one or more heuristics to predict at a data producer node, such as a server, how much time an application at a data consumer node, such as a client, will require to process a unit of data is disclosed. In various embodiments, a predicted client side processing time associated with a unit of data to be sent to a client is determined. The predicted client side processing time associated with the unit of data is used to determine a time to send a data transmission to the client. | 09-11-2014 |