Patent application number | Description | Published |
20120081683 | Lithographic Apparatus And Detector Apparatus - A detector including a layer of scintillation material, a layer of spacer material on the scintillation material, and a spectral purity filter layer on the spacer material. A method includes directing EUV radiation through a spectral purity filter layer, directing the EUV radiation through a spacer material layer provided beneath the spectral purity filter layer, directing the EUV onto a layer of scintillation material, and detecting scintillation radiation emitted by the scintillation material | 04-05-2012 |
20150083898 | System and Method for Controlling Droplet Timing in an LPP EUV Light Source - A method and apparatus for improved control of the trajectory and timing of droplets of target material in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A droplet illumination module generates two laser curtains for detecting the droplets. The first curtain is used for detecting the position of the droplets relative to a desired trajectory to the irradiation site so that the position of a droplet generator may be adjusted to direct the droplets to the irradiation site, as in the prior art. A droplet detection module detects each droplet as it passes through the second curtain, determines when the source laser should generate a pulse so that the pulse arrives at the irradiation site at the same time as the droplet, and sends a signal to the source laser to fire at the correct time. | 03-26-2015 |
20150083936 | System and Method for Creating and Utilizing Dual Laser Curtains From a Single Laser in an LPP EUV Light Source - A method and apparatus for creating and utilizing dual laser curtains from a single laser source in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. A polarizing beam splitter creates two beams of orthogonal polarization from a single laser, and the beams are used to generate two laser curtains. Sensors detect flashes from droplets of target material as they pass through the curtains. One sensor may detect the position of the droplets relative to a desired trajectory to the irradiation site so that the orientation of a droplet generator may be adjusted to direct subsequent droplets to the irradiation site, as in the prior art. A second sensor may detect each droplet as it passes through a curtain to determine when a source laser should generate a pulse so that the pulse will arrive at the irradiation site at the same time as the droplet, so that a signal may be sent to the source laser to fire at the correct time. | 03-26-2015 |
Patent application number | Description | Published |
20100045956 | Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor Thereof - A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens. | 02-25-2010 |
20100118288 | Lithographic projection system and projection lens polarization sensor - A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens. | 05-13-2010 |
20100182582 | Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool - A lithographic apparatus includes an illumination system configured to condition a radiation beam; a polarization sensor configured at least in part to couple to a reticle stage, wherein components of the reticle polarization sensor can be loaded and unloaded in the lithographic apparatus in the manner used for conventional reticles. In one configuration an active reticle tool includes a rotatable retarder configured to vary the retardation applied to polarized light received from a field point in the illumination system. In another configuration, a passive reticle tool is configured as an array of polarization sensor modules, where the amount of retardation applied to received light by fixed retarders varies according to position of the polarization sensor module. Accordingly, a plurality of retardation conditions for light received at a given field point can be measured, wherein a complete determination of a polarization state of the light at the given field point can be determined. In another configuration, the polarization sensor is configured to measure the effect of a projection lens on a polarization state of light passing through the projection lens. | 07-22-2010 |
20100284064 | GRATING FOR EUV-RADIATION, METHOD FOR MANUFACTURING THE GRATING AND WAVEFRONT MEASUREMENT SYSTEM - A grating for EUV-radiation includes a plurality of reflecting lines. Each reflecting line includes a plurality of first reflecting dots, and a plurality of second reflecting dots arranged between each other. The first reflecting dots and the second reflecting dots are configured to reflect EUV-radiation with a mutual phase difference of 180±10 degrees mod 360 degrees. | 11-11-2010 |
20110220806 | Radiation Detector - A radiation detector detects radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target. | 09-15-2011 |
20120091357 | Radiation Detector - A method for detecting radiation. The radiation detector includes a plurality of Faraday cups. Each Faraday cup being provided with a cover. Each cover comprising a window arrangement through which the radiation may pass into the Faraday cup. The window arrangement of each cover being different for each Faraday cup. Each Faraday cup housing a target configured to emit photoelectrons if the radiation is incident upon the target. | 04-19-2012 |
20130176547 | Lithographic Apparatus and a Method for Determining a Polarization Property - A lithographic apparatus includes an illumination system, a support, a patterning device, a substrate table, a projection system, and a detector. The apparatus further includes a polarization changing element, such as a quarter-wave plate, that is adjustable and a polarization analyzer, such as a linear polarizer. The polarization changing element and the polarization analyzer are arranged in order in the radiation beam path at the level at which a patterning device would be held by the support. By taking intensity measurements for different rotational orientations of the polarization changing element, information on the state of polarization of the radiation at the level of the patterning device can be obtained. Because the polarization analyzer is located before the projection system, the measurements are not affected by the fact that the detector is located after the projection system, such as at the level of the substrate. | 07-11-2013 |