Taro Yamamoto
Taro Yamamoto, Kumamoto JP
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20100073647 | COATING FILM FORMING APPARATUS AND COATING FILM FORMING METHOD FOR IMMERSION LIGHT EXPOSURE - A coating film forming apparatus for immersion light exposure, for forming a coating film including a resist film or a resist film and an additional film on a substrate to be fed to an immersion light exposure apparatus configured to perform a light exposure process through a liquid, includes: one or more coating units configured to apply the resist film or the resist film and the additional film onto the substrate; one or more thermally processing units configured to perform a thermal process necessary for forming the coating film on the substrate; a checking unit configured to check a state of the coating film at an edge portion of the substrate before the immersion light exposure; and a control section configured to use a check result obtained by the checking unit to make a judgment of whether or not the state of the coating film at the edge portion of the substrate is within an acceptable range, and to permit transfer of the substrate to the light exposure apparatus when the state of the coating film is within the acceptable range. | 03-25-2010 |
20110014379 | DEVELOPING APPARATUS, RESIST PATTERN FORMING METHOD AND STORAGE MEDIUM - Provided is a developing apparatus configured to slim the resist pattern while reducing the number of developing modules. A room temperature developing liquid and a high temperature developing liquid to modify the surface layer of a resist pattern can be supplied from a common nozzle to a substrate disposed on a mount table. Although both developing liquids may be sequentially discharged by switching between the supply line for the room temperature developing liquid and the supply line for the high temperature developing liquid, it is also possible to join these supply lines for supplying the room temperature developing liquid from the former supply line, and then adjust the ratio of the flow rates between both supply lines, and then supply the mixed liquid of the developing liquids as a high temperature developing liquid. | 01-20-2011 |
Taro Yamamoto, Kikuchi-Gun JP
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20100323307 | DEVELOPING APPARATUS AND METHOD - A developing apparatus for developing a substrate whose surface is coated with a coating solution and then exposed includes a substrate supporting unit for horizontally supporting the substrate, a rotation driving mechanism for rotating the substrate supporting unit forwardly or backwardly with respect to a vertical axis, a developer nozzle, disposed to face a surface of the substrate supported by the substrate supporting unit, having a strip-shaped injection opening extended along a direction extending from a periphery of the substrate toward a central portion thereof, a moving unit for moving the developer nozzle from an outer portion of the substrate toward the central portion thereof, and a controller for controlling operations such that while the substrate is rotated forwardly by the rotation driving mechanism, a developer is supplied through the injection opening to the surface of the substrate by moving the developer nozzle and, then, the substrate is rotated backwardly by the rotation driving mechanism. | 12-23-2010 |
Taro Yamamoto, Amagasaki-Shi JP
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20090153902 | INFORMATION PROCESSING APPARATUS, JOB EXECUTION INSTRUCTING METHOD, AND RECORDING MEDIUM STORING JOB EXECUTION INSTRUCTING PROGRAM - In an information processing apparatus, if a target file to be used for job execution, which is stored in a directory, is detected as being dragged and dropped into an icon instructing to execute a job, the directory storing the target file is detected from the target file itself. And a job execution condition applied to the detected directory, which is stored in an execution condition storage, is given to the target file. And then, a controller outputs a job execution instruction to a job execution apparatus, in order to execute a job about the target file under the job execution condition given thereto. | 06-18-2009 |
20090306809 | SYSTEM FOR CALCULATING SPINE JACKET WIDTH - A control apparatus obtains information identifying sheets stored in an MFP to be caused to perform printing for printing a printed object to be subjected to jacketed book binding, wherein this information is stored in the MFP. The control apparatus stores thicknesses of respective paper sheets as information about paper sheets. From this information and from the information obtained from the MFP, the control apparatus creates a table indicative of the correspondence between the respective paper sheets stored in the MFP and their thicknesses. Further, on receiving a selection of paper sheets to be used for printing for the printed object and a number of these paper sheets, the control apparatus determines a thickness of each paper sheet by making a reference to the table and calculates the spine jacket width by multiplying the thickness by the number of paper sheets. | 12-10-2009 |
20100050073 | INFORMATION PROCESSING PROGRAM, INFORMATION PROCESSING METHOD, AND INFORMATION PROCESSING DEVICE - The present invention is intended to improve operability in page-by-page editing operation of a document file having multiple pages using a computer. A display processor displays multiple pages of the document file in list form on a display unit, selects an item to be displayed from a plurality of items contained in attribute information allocated to each page, and displays the attribute information relating to the item that has been selected in association with each page. An editing processor receives page selection operation and editing operation, executes editing process on a selected page, and updates the attribute information by rewriting an item associated with the editing process of the attribute information allocated to the selected page. After the editing process by the editing processor, the display processor selects an item to be displayed from the plurality of items of the attribute information based on the substance of the editing process to update a display item list of the attribute information. | 02-25-2010 |
Taro Yamamoto, Tokyo JP
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20090145489 | TEMPERATURE REGULATION METHOD AND SYSTEM FOR LOW FLOW RATE LIQUID - ABSTRACT A method and a system for controlling temperature of a liquid in small flow amount, for supplying a liquid whose temperature is highly accurately controlled, as a flow of a small flow amount or an intermittent flow. A liquid supplied from a supply path is pressurized and introduced into a circulation path, and is temperature-controlled by a temperature control device in the circulation path, while being circulated in the circulation path by a pump in the pressurized condition. The liquid is supplied to an exterior device through a discharge path caused to branch from the circulation path, as a consecutive flow in a small amount or an intermittent flow in a small amount in a flow amount less than at least ½ times the flow amount in the circulation path, by adjusting a discharge valve provided in the discharge path. | 06-11-2009 |
20090286441 | POLYURETHANE UREA ELASTIC FIBER - Disclosed is a polyurethane urea elastic fiber containing 5-40% by weight of a polyurethane compound, wherein the compression deformation starting temperature determined by thermomechanical analysis (TMA) is not less than 150° C. but not more than 180° C. and time for thermal cutting at 180° C. is not less than 30 seconds. | 11-19-2009 |
Taro Yamamoto, Kumamoto-Ken JP
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20090130614 | Development device and development method - A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the developing solution is supplied to the surface of the wafer, the developer nozzle having a slit-like ejection port whose longitudinal direction is oriented to the direction perpendicular to the radial direction of the wafer. The movement speed of the nozzle is higher than a case where a nozzle with a small-diameter circular nozzle is used, and this enables a development time to be reduced. Further, the thickness of a developing solution on a substrate can be reduced, so that the developing solution can be saved. | 05-21-2009 |
Taro Yamamoto, Ise-Shi JP
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20090035104 | TRANSPORTING SYSTEM, AND TEACHING METHOD IN THE TRANSPORTING SYSTEM - A transporting system includes: a track portion; a plurality of loading platforms, disposed along the track portion, whose positions differ from each other in at least one direction; a plurality of transporting vehicles, each having a travelling device travelling along the track portion and a loading device, for loading transported objects; a first detecting device for detecting a first reference position, of the loading device when a reference transporting vehicle loads the transported object; a second detecting device for detecting a second reference position, of the loading device when each of the other transporting vehicles other than the reference transporting vehicle loads the transported object; and a teaching device for providing information on the position of the loading device with respect to each of the other loading platforms when each of the other transporting vehicles loads the transported object, on the basis of the detected first and second reference positions. | 02-05-2009 |
20130213257 | Transport Vehicle and Transport System - A transport vehicle that reduces shaking of a transport article includes a travelling unit, a transport unit, a fall prevention member, and a shaking reduction member. The travelling unit travels along a rail provided on a ceiling. The transport unit transports a transport article. The fall prevention member is rotatably supported such that it can rotate between a fall prevention position and a retracted position. The fall prevention member is, at the fall prevention position, below the transport article. A pushing portion of the shaking reduction member pushes against a side surface of the transport article with a pushing surface thereof in conjunction with the rotating of the fall prevention member from the retracted position to the fall prevention position. A lever portion of the shaking reduction member has one end supporting the pushing portion and the other end rotatably supported in a manner coaxial with the fall prevention member). | 08-22-2013 |
Taro Yamamoto, Koshi JP
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20110200321 | COATING AND DEVELOPING APPARATUS, DEVELOPING METHOD AND NON-TRANSITORY MEDIUM - There is provided a coating and developing apparatus that develops a substrate of which surface is coated with resist and exposed to lights. The coating and developing apparatus includes a developing module; a cleaning module; and a transfer mechanism configured to transfer a substrate developed by the developing module to the cleaning module. The developing module includes an airtightly sealed processing vessel configured to form a processing atmosphere; a temperature control plate provided in the processing vessel and mounts thereon the substrate and cools the substrate; and an atmosphere gas supply unit configured to supply an atmosphere gas including mist of a developing solution to a surface of the substrate within the processing vessel. The cleaning module includes a mounting table configured to mount thereon the substrate; and a cleaning solution supply unit configured to supply a cleaning solution to the substrate mounted on the mounting table. | 08-18-2011 |
20110200952 | DEVELOPING APPARATUS, DEVELOPING METHOD AND STORAGE MEDIUM - There is provided a developing apparatus and a developing method capable of rapidly forming a liquid film of a developing solution on an entire surface of a substrate while reducing a usage amount of the developing solution. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; a temperature control plate that is provided within the processing vessel and mounts the substrate thereon; an atmosphere gas supply unit that supplies an atmosphere gas including mist and vapor of a developing solution onto a surface of the substrate within the processing vessel; and a first temperature control unit that controls the temperature control plate to a temperature allowing the atmosphere gas to be condensed on the substrate. Here, an inner wall of the processing vessel is maintained at a temperature at which the atmosphere gas is hardly condensed on the inner wall. | 08-18-2011 |
20110200953 | DEVELOPING APPARATUS, DEVELOPING METHOD AND STORAGE MEDIUM - There is provided a developing apparatus capable of achieving high throughput. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; an atmosphere gas supply unit that supplies an atmosphere gas containing mist of a developing solution into the processing vessel in order to form a liquid film of the developing solution on a surface of a substrate loaded into the processing vessel; and a drying unit that dries the substrate in order to stop a developing process by the liquid film. A reaction between a resist and the developing solution can be stopped. Therefore, a developing process can be performed in parallel with a cleaning process performed by a cleaning module and high throughput is achieved. | 08-18-2011 |
Taro Yamamoto, Koshi City JP
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20140071411 | DEVELOPING TREATMENT APPARATUS AND DEVELOPING TREATMENT METHOD - The present invention is a developing treatment apparatus for performing development by supplying a developing solution to a substrate having a front surface coated with a positive resist or a negative resist and then subjected to exposure wherein a movable cup is raised to introduce one of scattering developing solutions for the positive and negative resists into an inner peripheral flow path of a cup and the movable cup is lowered to introduce the other of scattering developing solutions for the positive and negative resists into an outer peripheral flow path of the cup, and the developing solution introduced into the inner peripheral flow path and the developing solution introduced into the outer peripheral flow path are separately drained. | 03-13-2014 |
20150027503 | LIQUID PROCESSING APPARATUS - A liquid processing apparatus for performing liquid processing with respect to a substrate using processing fluid, includes: a plurality of substrate holding units arranged side by side in a left-right direction; a nozzle configured to supply the processing fluid to the substrate held in each of the substrate holding units; and a nozzle moving mechanism configured to move the nozzle forward and backward in a front-rear direction intersecting an arrangement direction of the substrate holding units between a supplying position in which the processing fluid is supplied to a region including a central portion of the substrate and a waiting position which is defined at a rear side of a row of the substrate holding units opposite to a front side of the row of the substrate holding units at which the substrate is loaded and unloaded. | 01-29-2015 |
20150133032 | Polishing Cleaning Mechanism, Substrate Processing Apparatus, and Substrate Processing Method - There is disclosed a polishing cleaning mechanism configured to be in contact with a rear surface of a substrate which is held in a substrate holding unit for holding the rear surface of the substrate and perform a polishing process and a cleaning process on the rear surface of the substrate, including a cleaning member configured to clean the rear surface of the substrate, a polishing member configured to polish the rear surface of the substrate, and a support member configured to support the polishing member and the cleaning member to face the rear surface of the substrate held in the substrate holding unit, wherein a surface of the polishing member facing the substrate and a surface of the cleaning member facing the substrate differ in relative height from each other. | 05-14-2015 |
Taro Yamamoto, Toyonaka-Shi JP
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20150156351 | PRINTING SYSTEM, PRINTER, JOB PROCESSING METHOD AND COMPUTER READABLE RECORDING MEDIUM STORING JOB PROCESSING PROGRAM - A printing system includes a plurality of printers capable of communicating with each other, wherein each of the plurality of printers includes a communication unit configured to transmit/receive a job, a determination unit configured to determine whether print setting of a received job is processable by a printing function of the printer, and a storage unit configured to store the job in a memory, and each of the plurality of printers stores the job in the memory by the storage unit when the print setting of the received job is determined to be processable by the determination unit by the printing function of the printer and transfers the job by the communication unit to any printer of the plurality of printers when the print setting is determined to be not processable. | 06-04-2015 |