Patent application number | Description | Published |
20100250084 | REACTION FORCE APPARATUS - A reaction force apparatus incorporated in a vehicle includes a reaction force controller for setting an acceleration intention boundary threshold value, which comprises a threshold value with respect to a rate of depression of an accelerator pedal, and which determines whether the driver of the vehicle intends to accelerate the vehicle quickly or gradually. The reaction force controller reduces the reaction force when the rate of depression exceeds the acceleration intention boundary threshold value, whereas the reaction force controller maintains the reaction force when the rate of depression is less than the acceleration intention boundary threshold value. | 09-30-2010 |
20100274459 | REACTION FORCE APPARATUS - When a target vehicle speed setting unit switches from a target vehicle speed to a higher target vehicle speed, a reaction force controller of a reaction force apparatus lowers, at the same ratio, a reaction force applying characteristic, which corresponds to the target vehicle speed before being switched to the higher target vehicle speed. | 10-28-2010 |
20130173113 | VEHICLE TRAVEL CONTROL DEVICE - A vehicle travel control device can accurately determine a driver's intention to adjust the vehicle speed. After applying attention attracting reaction force corresponding to outside circumstances and the like to an accelerator pedal through a reaction force application mechanism, a reaction force control unit outputs intention determining reaction force that is used to determine the driver's intention to adjust the vehicle speed and is smaller than the attention attracting reaction force, and determines the intention to adjust the vehicle speed on the basis of the accelerator pedal operation amount of the driver while the intention determining reaction force is being applied to the accelerator pedal through the reaction force application mechanism. | 07-04-2013 |
20130304317 | REACTION FORCE CONTROL DEVICE - Provided is a reaction force control device for reducing discomfort experienced by the driver operating the accelerator pedal when continuous curves are being traveled, and setting the characteristics of the reaction force on the accelerator pedal in accordance with the curves. In the case that the target reaction force, which has been set prior to entering a subsequently traveled second curve, is greater than the current reaction force acting on the acceleration pedal and being generated during the turn through the first curve, a reaction force controller controls the operation so as to reduce the target reaction force imparted on the second curve until the vehicle leaves the first curve. | 11-14-2013 |
Patent application number | Description | Published |
20080231368 | WIRELESS FREQUENCY POWER AMPLIFIER, SEMICONDUCTOR DEVICE, AND WIRELESS FREQUENCY POWER AMPLIFICATION METHOD - A differential amplifier circuit is connected to the input node and the output node of the final amplification stage through detection circuits. The signal level difference output from the differential amplifier circuit does not change even if the input power varies. Because a change in the power gain at the output node does not travel back to the input node when the load impedance of the wireless frequency power amplifier varies, it is possible to detect only the change in the load impedance. Damage to the final stage can be prevented by controlling the operating current of the final stage and the gain of the drive stage according to the detected load variation. Nonlinear distortion in the wireless frequency power amplifier output can also be reduced by detecting and canceling the change in the gain of the drive stage by changing the gain of the adjustment stage. | 09-25-2008 |
20090011727 | WIRELESS TRANSMITTER - A wireless transmission device includes a RF power amplification section for amplifying a transmit RF signal and outputting the amplified signal to a transmission antenna, a detector section, and a control section. The RF power amplification section includes a plurality of stages of amplification, the transmit RF signal is input to an input of a first one of the plurality of stages of amplification, and an output of a last one of the plurality of stages of amplification is output to the transmission antenna. The detector section includes a plurality of detectors provided so as to correspond to the plurality of stages of amplification, each for detecting an input level of a corresponding one of the stages of amplification, and a synthesizer for synthesizing together detection outputs from the plurality of detectors. The control section controls, in a feedback control, an output level of the RF power amplification section based on an output level of the synthesizer. | 01-08-2009 |
20130257510 | HIGH FREQUENCY SWITCH CIRCUIT - A high frequency switch circuit including: a first rectifier circuit including at least one rectifier element having one end connected between the gate terminal of a first MOSFET circuit and a first control terminal and the other end connected to ground, and a second rectifier circuit including at least one rectifier element having one end connected between the gate terminal of a second MOSFET circuit and a second control terminal and the other end connected to ground. The circuit further includes a connecting section connecting the forward-current input terminal side of at least one of the rectifier elements of the first rectifier circuit and one of the main terminal sides of the first MOSFET circuit, and connecting the forward-current input terminal side of at least one of the rectifier elements of the second rectifier circuit and one of the main terminal sides of the second MOSFET circuit. | 10-03-2013 |
Patent application number | Description | Published |
20120202409 | TWO-COMPONENT URETHANE RESIN COMPOSITION FOR POLISHING PAD, POLYURETHANE POLISHING PAD, AND METHOD FOR PRODUCING POLYURETHANE POLISHING PAD - The present invention relates to a two-component urethane resin composition for a polishing pad including a base resin containing an isocyanate group-terminated urethane prepolymer (A) and a curing agent containing an isocyanate group reactive compound (B), and characterized in that the prepolymer (A) is a prepolymer having an isocyanate group equivalent of 250 to 700 and being produced by reacting a polyisocyanate (a1) with an aromatic polyester polyol (a2) and a polyether polyol (a3) which are used as polyol components in combination at a mass ratio of (a2)/(a3)=5/95 to 70/30, and the aromatic polyester polyol (a2) has 2 to 11 aromatic rings in its molecular chain, and also relates to a polyurethane polishing pad using the resin composition and a method for producing a polyurethane polishing pad. | 08-09-2012 |
20130102697 | TWO-PART CURABLE POLYURETHANE FOAM RESIN COMPOSITION, MOLDED ARTICLE USING THE SAME, AND SHOE SOLE - The two-part curable polyurethane foam resin composition uses little or no petroleum-derived raw materials but a plant-derived raw material so that the biomass ratio can be improved, the load on the environment can be reduced, and excellent physical characteristics can be exhibited. The two-part curable polyurethane foam resin composition includes a main agent that contains an isocyanate-terminated urethane prepolymer (A) and a curing agent that contains an isocyanate-reactive compound (B), water (C), and a catalyst (D), in which a polyol component used in (A) and (B) uses a castor oil polyol (b1) having 1.5 to 2.3 functional groups on average and a polyol (b2) prepared by addition polymerization of lactone to polytetramethylene glycol and/or polytetramethylene glycol (b3), the ratio (b1)/(b2) and/or (b3)=15/85 to 60/40 on a mass basis, and a content of the castor oil polyol (b1) is 10 to 45% by mass. | 04-25-2013 |
Patent application number | Description | Published |
20080268644 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - There are provided the steps of loading a substrate into a reaction vessel; forming a film on the substrate while supplying a film forming gas into the reaction vessel; unloading the substrate after film formation from the reaction vessel; supplying a cleaning gas into the reaction vessel while lowering a temperature in the reaction vessel and removing a deposit deposited on at least an inner wall of the reaction vessel in the film forming step. | 10-30-2008 |
20090239386 | PRODUCING METHOD OF SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - Disclosed is a producing method of a semiconductor device, comprising: loading a substrate into a reaction furnace; forming a film on the substrate in the reaction furnace; unloading the substrate from the reaction furnace after the film has been formed; and forcibly cooling an interior of the reaction furnace in a state where the substrate does not exist in the reaction furnace after the substrate has been unloaded. | 09-24-2009 |
20110239936 | PRODUCING METHOD OF SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS - A process for producing a semiconductor device, comprising the steps of conducting film formation on substrate ( | 10-06-2011 |
20140179085 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM - A method of manufacturing a semiconductor device can enhance controllability of the diameters of grains of a film containing a predetermined element such as a silicon film when the film is formed. The method includes (a) forming a seed layer containing a predetermined element and carbon on a substrate by performing a cycle a predetermined number of times, the cycle including alternately performing supplying a first source gas containing the predetermined element, an alkyl group and a halogen group to the substrate and supplying a second source gas containing the predetermined element and an amino group to the substrate, or by performing supplying the first source gas to the substrate a predetermined number of times; and (b) forming a film containing the predetermined element on the seed layer by supplying a third source gas containing the predetermined element and free of the alkyl group to the substrate. | 06-26-2014 |
20150287594 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM - A method of manufacturing a semiconductor device can enhance controllability of the diameters of grains of a film containing a predetermined element such as a silicon film when the film is formed. The method includes (a) forming a seed layer containing a predetermined element and carbon on a substrate by performing a cycle a predetermined number of times, the cycle including alternately performing supplying a first source gas containing the predetermined element, an alkyl group and a halogen group to the substrate and supplying a second source gas containing the predetermined element and an amino group to the substrate, or by performing supplying the first source gas to the substrate a predetermined number of times; and (b) forming a film containing the predetermined element on the seed layer by supplying a third source gas containing the predetermined element and free of the alkyl group to the substrate. | 10-08-2015 |
Patent application number | Description | Published |
20090181523 | Method of manufacturing semiconductor device and apparatus for processing substrate - A process for producing a semiconductor device, in which in the formation of a boron doped silicon film from, for example, monosilane and boron trichloride by vacuum CVD technique, there can be produced a film excelling in inter-batch homogeneity with respect to the growth rate and concentration of a dopant element, such as boron. The process includes the step of performing the first purge through conducting at least once of while a substrate after treatment is housed in a reaction furnace, vacuuming of the reaction furnace and inert gas supply thereto and the steps of performing the second purge through conducting at least once of after carrying of the substrate after treatment out of the reaction furnace, prior to carrying of a substrate to be next treated into the reaction furnace and while at least no product substrate is housed in the reaction furnace, vacuuming of the reaction furnace and inert gas supply thereto. | 07-16-2009 |
20090181524 | Method of manufacturing semiconductor device and apparatus for processing substrate - A process for producing a semiconductor device, in which in the formation of a boron doped silicon film from, for example, monosilane and boron trichloride by vacuum CVD technique, there can be produced a film excelling in inter-batch homogeneity with respect to the growth rate and concentration of a dopant element, such as boron. The process includes the step of performing the first purge through conducting at least once of while a substrate after treatment is housed in a reaction furnace, vacuuming of the reaction furnace and inert gas supply thereto and the steps of performing the second purge through conducting at least once of after carrying of the substrate after treatment out of the reaction furnace, prior to carrying of a substrate to be next treated into the reaction furnace and while at least no product substrate is housed in the reaction furnace, vacuuming of the reaction furnace and inert gas supply thereto. | 07-16-2009 |
20090205567 | Method of manufacturing semiconductor device and apparatus for processing substrate - A process for producing a semiconductor device, in which in the formation of a boron doped silicon film from, for example, monosilane and boron trichloride by vacuum CVD technique, there can be produced a film excelling in inter-batch homogeneity with respect to the growth rate and concentration of a dopant element, such as boron. The process includes the step of performing the first purge through conducting at least once of while a substrate after treatment is housed in a reaction furnace, vacuuming of the reaction furnace and inert gas supply thereto and the steps of performing the second purge through conducting at least once of after carrying of the substrate after treatment out of the reaction furnace, prior to carrying of a substrate to be next treated into the reaction furnace and while at least no product substrate is housed in the reaction furnace, vacuuming of the reaction furnace and inert gas supply thereto. | 08-20-2009 |
20110217852 | SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - Provided is technology for preventing breakage of an induction target part of a substrate processing apparatus using an induction heating method. The substrate processing apparatus including a reaction vessel configured to process a substrate therein; a first induction target part comprising a peripheral portion and a center portion wherein a thickness of the center portion is less than that of the peripheral portion, the first induction target part being configured to heat the substrate accommodated on the center portion; a second induction target part comprising a peripheral portion and a center portion wherein a thickness of the center portion is equal to or greater than that of the peripheral portion, the second induction target part being configured to heat the substrate accommodated on the center portion of the first induction target part; an induction target part holder configured to hold the first induction target part and the second induction target part in a manner that the second induction part is spaced apart from the first induction target part by a predetermined distance; and an induction heating device configured to heat at least the first and second induction target parts in the reaction vessel held by the induction target part holder using an induction heating method. | 09-08-2011 |
20130164943 | Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device - The substrate processing apparatus includes a reaction chamber configured to accommodate a substrate; a first gas supply unit configured to supply a first process gas containing a silicon element to the substrate; a second gas supply unit configured to supply a second process gas containing a silicon element and a chlorine element to the substrate; an exhaust unit configured to exhaust the first process gas and the second process gas; a cleaning gas bypass supply unit configured to supply a cleaning gas to the exhaust unit; a cleaning monitoring unit installed in the exhaust unit; a gas flow rate control unit configured to adjust an amount of the cleaning gas supplied; and a main control unit configured to control the gas flow rate control unit in response to a signal received from the cleaning gas monitoring unit. | 06-27-2013 |
20150176130 | Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device - The substrate processing apparatus includes a reaction chamber configured to accommodate a substrate; a first gas supply unit configured to supply a first process gas containing a silicon element to the substrate; a second gas supply unit configured to supply a second process gas containing a silicon element and a chlorine element to the substrate; an exhaust unit configured to exhaust the first process gas and the second process gas; a cleaning gas bypass supply unit configured to supply a cleaning gas to the exhaust unit; a cleaning monitoring unit installed in the exhaust unit; a gas flow rate control unit configured to adjust an amount of the cleaning gas supplied; and a main control unit configured to control the gas flow rate control unit in response to a signal received from the cleaning gas monitoring unit. | 06-25-2015 |
Patent application number | Description | Published |
20140202602 | COPPER ALLOY SHEET AND METHOD FOR MANUFACTURING COPPER ALLOY SHEET - An aspect of the copper alloy sheet contains 5.0 mass % to 12.0 mass % of Zn, 1.1 mass % to 2.5 mass % of Sn, 0.01 mass % to 0.09 mass % of P and 0.6 mass % to 1.5 mass % of Ni with a remainder of Cu and inevitable impurities, and satisfied a relationship of 20≦[Zn]+7×[Sn]+15×[P]+4.5×[Ni]≦32. The aspect of the copper alloy sheet is manufactured using a manufacturing process including a cold finishing rolling process in which a copper alloy material is cold-rolled, the average crystal grain diameter of the copper alloy material is 1.2 μm to 5.0 μm, round or oval precipitates are present in the copper alloy material, the average grain diameter of the precipitates is 4.0 nm to 25.0 nm or a proportion of precipitates having a grain diameter of 4.0 nm to 25.0 nm in the precipitates is 70 % or more. | 07-24-2014 |
20140255248 | COPPER ALLOY SHEET AND METHOD FOR MANUFACTURING COPPER ALLOY SHEET - An aspect of the copper alloy sheet contains 5.0 mass % to 12.0 mass % of Zn, 1.1 mass % to 2.5 mass % of Sn, 0.01 mass % to 0.09 mass % of P and 0.6 mass % to 1.5 mass % of Ni with a remainder of Cu and inevitable impurities, and satisfies a relationship of 20≦[Zn]+7×[Sn]+15×[P]+4.5×[Ni]≦32. The aspect of the copper alloy sheet is manufactured using a manufacturing process including a cold finishing rolling process in which a copper alloy material is cold-rolled, the average crystal grain diameter of the copper alloy material is 1.2 μm to 5.0 μm, round or oval precipitates are present in the copper alloy material, the average grain diameter of the precipitates is 4.0 nm to 25.0 nm or a proportion of precipitates having a grain diameter of 4.0 nm to 25.0 nm in the precipitates is 70% or more. | 09-11-2014 |
Patent application number | Description | Published |
20090168193 | Zoom lens and imaging apparatus - A zoom lens configured by arranging a first lens group, a second lens group, a third lens group, a fourth lens group, and a fifth lens group in order from the object side to the image side, and further having an aperture diaphragm on the object side of the third lens group. In the first lens group, a first lens, a second lens, and a third lens are located in order from the object side to the image side. In the second lens group, a fourth lens, a fifth lens, and a sixth lens are located in order from the object side to the image side. The third lens group is made up of a seventh lens which is a convex lens, the fourth lens group is made up of at least two or more cemented lenses, the third lens group and the fourth lens group include at least one surface formed into an aspherical surface. | 07-02-2009 |
20110007396 | Zoom lens and imaging apparatus - A zoom lens includes, in order from an object side to an image side: a first lens group that has a positive refractive power and remains stationary in a direction of an optical axis; a second lens group that has a negative refractive power and is movable on the optical axis so as to perform a zoom operation; a third lens group that has a positive refractive power and remains stationary in the direction of the optical axis during zooming and focusing; a fourth lens group that has a positive refractive power and is movable on the optical axis so as to correct fluctuation in imaging position and correct change in imaging position caused by change in object distance; and a fifth lens group that has a positive refractive power and remains stationary in the direction of the optical axis. | 01-13-2011 |
Patent application number | Description | Published |
20090323956 | ENCRYPTION DEVICE, PROGRAM, AND METHOD - Disclosed is an encryption device for generating a pseudo-random number based on a secret key and generates an encrypted text by applying the pseudo-random number sequence to a plain text, uses, an internal state in accordance with a state based on a permutation of a sequence of a finite number of numeric values, as an internal state used for generation of the pseudo-random number sequence, executes a predetermined leftward or rightward rotate shift, depending on a number smaller than an internal state number, based on the result of linear or non-linear, or combination of linear and non-linear using one or more numeric values of the internal state and sets at least one temporary variable used for generation of the pseudo-random number sequence to be a temporary variable having as a value a result of the execution of the predetermined leftward or rightward rotate shift, and generates the pseudo-random number by a predetermined prescribed operation on one or a plurality of numeric values of the internal state and the temporary variable. | 12-31-2009 |
20100128870 | PSEUDO-RANDOM NUMBER GENERATION DEVICE, PROGRAM, AND METHOD FOR STREAM ENCODING - A pseudorandom number generation apparatus used for a stream cipher comprises at least one internal state, a non-linear conversion means that updates numeric data saved in the internal state, and a transposition means that performs only bit transposition for the numeric data, updated by the non-linear conversion means, based on a predefined rule. | 05-27-2010 |
Patent application number | Description | Published |
20110253265 | QUENCHED AND TEMPERED STEEL PIPE WITH HIGH FATIGUE LIFE, AND ITS MANUFACTURING METHOD - Provided is a steel pipe suitable for machine structure members that are required to be lightweight, of which the strength is increased and the fatigue life is prolonged with preventing the increase in the material cost and the production cost. The steel pipe is a high fatigue life quenched/tempered steel pipe having a composition comprising, % by mass, C: 0.1 to 0.4%, Si: 0.5 to 1.5%, Mn: 0.3 to 2%, P: at most 0.02%, S: at most 0.01%, Cr: 0.1 to 2%, Ti: 0.01 to 0.1%, Nb: 0.01 to 0.1%, Al: at most 0.1%, B: 0.0005 to 0.01%, N: at most 0.01%, and optionally at least one of Ni: at most 0.5%, Ca: at most 0.02%, Mo: at most 0.5% and V: at most 0.5%, with a balance of Fe and inevitable impurities, in which the mean grain size of the precipitated carbides is at most 0.5 μm and of which the hardness in the center part of the wall thickness in the cross section perpendicular to the longitudinal direction of the steel pipe is at least 400 HV. | 10-20-2011 |
20120103459 | HIGH FATIGUE SERVICE LIFE QUENCHING/TEMPERING STEEL TUBE AND MANUFACTURING METHOD THEREFOR - Provided is a steel pipe designed to have a further increased high strength and a further improved fatigue life with suppressing the material cost and the production cost, especially such a steel pipe suitable for machine structure members that are required to be lightweight. The steel pipe is a high fatigue life steel pipe produced according to a process of using a steel plate having a composition that comprises, % by mass, C: 0.1 to 0.4%, Si: 0.5 to 1.5%, Mn: 0.3 to 2%, P: at most 0.02%, S: at most 0.01%, Cr: 0.1 to 2%, Ti: 0.01 to 0.1%, Nb: 0.01 to 0.1%, Al: at most 0.1%, B: 0.0005 to 0.01%, N: at most 0.01%, and optionally at least one of Ni: at most 0.5%, Ca: at most 0.02%, Mo: at most 0.5%, and V: at most 0.5%, with a balance of Fe and inevitable impurities, and having, on at least one side thereof, a smoothed surface of which the surface roughness Ra in the direction (C direction) perpendicular to the direction to be the longitudinal direction of the steel pipe is at most 0.5 μm, welding it into a pipe in such a manner that the smoothed surface thereof could be the inner surface of the steel pipe, and then quenching/tempering it. | 05-03-2012 |
20140202600 | METHOD OF MAKING QUENCHED AND TEMPERED STEEL PIPE WITH HIGH FATIGUE LIFE - A method for producing a high fatigue life quenched/tempered steel pipe comprises a quenching treatment of keeping an unquenched starting steel pipe having a composition that comprises, % by mass, C: 0.1 to 0.4%, Si: 0.5 to 1.5%, Mn: 0.3 to 2%, P: at most 0.02%, S: at most 0.01%, Cr: 0.1 to 2%, Ti: 0.01 to 0.1%, Nb: 0.01 to 0.1%, Al: at most 0.1%, B: 0.0005 to 0.01%, and N: at most 0.01%, with a balance of Fe and inevitable impurities, at 900 to 1100° C. for 10 to 60 seconds and then rapidly cooling it. The cooled pipe is subjected to a tempering treatment of keeping the pipe at 280 to 380° C. for 10 to 60 minutes. | 07-24-2014 |
Patent application number | Description | Published |
20100090870 | NAVIGATION APPARATUS - In a navigation apparatus having: a base unit fastenable to a vehicle and equipped with at least a microcomputer; and a front panel unit attachable to and detachable from the base unit and equipped with at least a display displaying map data and a microcomputer performing a navigation function to indicate a determined location of the vehicle on the map data, a front surface of the front panel unit is made same size as a mating face of the base unit; and the display occupies 70% or greater of length of the front panel unit in a lateral direction. With this, the front panel unit including the microcomputer for performing navigation functions can be configured to be attachable/detachable to/from the base unit to enhance ease of use, and the size (area) of the display formed in the front panel unit can be increased to improve viewability. | 04-15-2010 |
20100121570 | NAVIGATION APPARATUS - In a navigation apparatus having a cradle unit that is fastenable to a vehicle and is equipped with at least a microcomputer; and a front panel unit that is attachable to and detachable from the cradle unit and is equipped with at least a display displaying map data and a microcomputer performing a navigation function to indicate a determined location of the vehicle on the map data, it is configured such that a panel is integrally formed at bottom of the cradle unit to be attachable to the vehicle. With this, it becomes possible to provide the navigation apparatus configured such that a member having a microcomputer performing a navigation function is attachable/detachable to/from the main body, i.e., the base unit, thereby improving ease of use, that the member can be easily attached to the dashboard of the vehicle, and that unnatural impression is prevented from arising in the appearance. | 05-13-2010 |
20100161220 | NAVIGATION APPARATUS - In a navigation apparatus having a base unit that is fastenable to a dashboard at a driver's seat of a vehicle; a front panel unit that is attachable to and detachable from the base unit and is equipped with a display displaying map data; and a microcomputer that performs a navigation function to indicate a determined location of the vehicle on the map data, it is configured such that a part of the front panel unit projects from a surface of the dashboard toward a user seated in the driver's seat, as viewed from side, when the front panel unit is attached to the base unit. With this, the degree of freedom of front panel unit attachment/detachment with respect to the base unit is improved without sacrificing the appearance of the navigation apparatus. | 06-24-2010 |
20110160933 | OPERATION APPARATUS FOR ON-BOARD DEVICES IN AUTOMOBILE - An operation apparatus includes image capturing device capable of capturing images of a plurality of mark members provided in assembled members in a compartment; determining device capable of determining individually whether each of the mark members is or is not shielded on the basis of the image data taken and outputted by the image capturing device; and operation instructing device configured to output an operation command to on-board devices in accordance with a result of the determining by the determining device. Accordingly, it is easy for an operator to understand operational steps, thereby effectively preventing an erroneous operation due to the operator's misunderstanding. Furthermore, it is possible to simplify a determination logic of the operation instructing device, and also possible to easily provide a retrofitted option. | 06-30-2011 |