Kakizawa, JP
Hiroshi Kakizawa, Hiratsuka-Shi, Kanagawa JP
Patent application number | Description | Published |
---|---|---|
20150314647 | Pneumatic Radial Tire - A pneumatic radial tire includes: a pair of bead portions; a pair of side wall portions; and a tread portion in which a carcass layer is mounted between the pair of bead portions, and a belt layer that includes a plurality of monofilament steel wires laid in parallel and embedded in rubber is disposed between the pair of side wall portions on an outer circumferential side in the tread portion. The wire strand diameter of the monofilament steel wires is from 0.30 mm to 0.40 mm, each of the monofilament steel wires is twisted around their axial direction with a wire surface twisting angle of 1° to 15° with respect to the axial direction of the monofilament steel wires, and the surface residual stress of the monofilament steel wires is 0 MPa or less. | 11-05-2015 |
Hiroshi Kakizawa, Hiratsuka-Shi JP
Patent application number | Description | Published |
---|---|---|
20140041779 | Pneumatic Tire - The pneumatic tire according to the present technology has a reinforcing layer in which a plurality of steel cords is laid in parallel and embedded in rubber, wherein each steel cord is configured from a plurality of wires twisted together, the wire diameter is from 0.15 mm to 0.40 mm, each wire is configured from a core and a plating layer formed on the periphery of the core, the core is made from carbon steel with a carbon content of from 0.60 mass % to 0.75 mass %, the average thickness of the plating layer is from 0.23 μm to 0.33 μm, and the strength of the steel cord is from 3000 MPA to 3500 MPa. | 02-13-2014 |
Kenji Kakizawa, Ibaraki JP
Patent application number | Description | Published |
---|---|---|
20090126361 | Pump Torque Controller of Hydraulic Working Machine - [Object] To permit an precise and easy adjustment of a pump absorption torque of a main pump in accordance with environmental conditions or the like when a sub-pump different in characteristics from the main pump is connected to a prime mover. | 05-21-2009 |
Kenji Kakizawa, Tsuchiura-Shi JP
Patent application number | Description | Published |
---|---|---|
20100162696 | Hydraulic Drive Device for Large Hydraulic Excavator - [Problem] To provide a large hydraulic excavator permitting an easy change from a machine mode corresponding to a backhoe excavator to a machine mode corresponding to a loader excavator, and vice versa. | 07-01-2010 |
Masahiko Kakizawa, Saitama JP
Patent application number | Description | Published |
---|---|---|
20120000485 | CLEANING AGENT FOR SUBSTRATE AND CLEANING METHOD - The present invention provides a cleaning agent for a substrate and a cleaning method thereof, which can effectively remove fine particles (particles) present on a surface of substrate or impurities derived from various kinds of metals (metallic impurities), without causing roughness surface of a substrate, in particular, a semiconductor substrate, and without causing corrosion or oxidation of metal wirings, in particular, copper wirings, provided on a surface of substrate, and can further remove at the same time a carbon defect present on a surface of substrate, without removing a metal corrosion inhibitor—Cu film, in particular, a Cu-BTA film. | 01-05-2012 |
20120172274 | RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING THE COMPOSITION - The present invention is directed to provide a resist remover composition for semiconductor substrate which enables to remove a resist simply and easily in the photolithography process in the semiconductor field, and a method for removing a resist comprising that the composition is used. The present invention relates to a resist remover composition for semiconductor substrate, comprising [I] a carbon radical generating agent, [II] an acid, [III] a reducing agent, and [IV] an organic solvent, and having pH of lower than 7, and a method for removing a resist, comprising that the composition is used. | 07-05-2012 |
20130171835 | COMPOSITION FOR WATER-REPELLENT TREATMENT OF SURFACE, AND METHOD FOR WATER-REPELLENT TREATMENT OF SURFACE OF SEMICONDUCTOR SUBSTRATE USING SAME - The purpose of the present invention to provide: a composition which can be used for water-repellent treating of the entire surface of a semiconductor substrate having a pattern formed by laminating a Si-containing insulating layer and a metal layer, at one time; and a method for water-repellent treatment of the semiconductor substrate surface using the composition. | 07-04-2013 |
20130261040 | SUBSTRATE CLEANER FOR COPPER WIRING, AND METHOD FOR CLEANING COPPER WIRING SEMICONDUCTOR SUBSTRATE - A cleaning agent for a substrate having a copper wiring consisting of an aqueous solution comprising [I] an amino acid represented by the following general formula [1], and [II] an alkylhydroxylamine; and a method for cleaning a semiconductor substrate having a copper wiring characterized by using the relevant cleaning agent for a substrate having a copper wiring; | 10-03-2013 |
Masahiko Kakizawa, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20100269903 | PROCESS FOR PRODUCING POLYCRYSTALLINE SILICON SUBSTRATE AND POLYCRYSTALLINE SILICON SUBSTRATE - Provided are: a safe, low-cost method of producing a polycrystalline silicon substrate excellent in photoelectric conversion efficiency by which a uniform, fine uneven structure suited to a solar cell can be simply formed on the surface of the polycrystalline silicon substrate; and a polycrystalline silicon substrate having a uniform, fine, pyramid-shaped uneven structure so that its reflectance can be significantly reduced. The uneven structure is formed on the surface of the polycrystalline silicon substrate by etching the polycrystalline silicon substrate with an alkaline etching solution containing at least one kind selected from the group consisting of a carboxylic acid having 1 or more and 12 or less carbon atoms and each having at least one carboxyl group in one molecule, and salts of the acids. | 10-28-2010 |
Masahiko Kakizawa, Kawagoe-Shi JP
Patent application number | Description | Published |
---|---|---|
20150125985 | ETCHING FLUID AND PRODUCTION METHOD FOR SILICON-BASED SUBSTRATE USING SAME - It is the object of the present invention to provide an alkali etching solution for solar cell manufacturing, which is capable of forming uniformly a fine hubbly structure throughout a whole wafer on the surface of a wafer having a silicon as a main component, and still more is applicable to various wafers; and a method for manufacturing a silicon-based substrate for solar cell manufacturing, using the etching solution. The present invention relates to the alkali etching solution for solar cell manufacturing, comprising (A) a mono- or disulfonic acid or a salt thereof represented by the general formula [1], (B) an alkali compound, and (C) water; and a method for manufacturing a silicon-based substrate for solar cell manufacturing, characterized by etching a wafer having a silicon as a main component, using the etching solution, to form a hubbly structure at the surface of the wafer: | 05-07-2015 |
Masayuki Kakizawa, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20090163604 | Process for Producing Tablet by High-Speed Direct Compression - A process for producing a tablet characterized by performing high-speed direct compression with a moving speed of a pestle of 800 mm/s or more while compressing a powder which contains at least 15 to 80% by mass of cellulose, an active ingredient and a lubricant and has an angle of repose of 50° C. or less, a compression degree of 20% or more and an elongation at break of 30 μm or more. | 06-25-2009 |
20100178332 | CELLULOSE-BASED FINE CORE PARTICLE AND PROCESS FOR PRODUCING THE SAME - It is an object of the present invention to provide a fine core particle, which comprises a coating layer having a uniform thickness, and which can be used to produce, at a high yield, a small granule causing no sandy feeling in the oral cavity when the fine core particle is applied to a fine granule or an orally-disintegrating tablet. According to the present invention, there is provided a core particle, which comprises 50% by mass or more of microcrystalline cellulose, and which has a mean particle diameter of less than 100 μm, a relative flow index of 7.0 to 30.0, a specific surface area of less than 0.15 m | 07-15-2010 |
20150110900 | CELLULOSE POWDER - This cellulose powder has: an average degree of polymerization of 100 to 350; a weight average particle size of over 30 gm, but less than 250 μm; an apparent specific volume of 2 to less than 15 cm | 04-23-2015 |
20150150804 | CELLULOSE POWDER - This cellulose powder has: an average degree of polymerization of 100 to 350; a weight average particle size of over 30 μm, but less than 250 gm; an apparent specific volume of 2 to less than 15 cm | 06-04-2015 |
Shinichi Kakizawa, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20100248602 | SHAFT PORTION FINISHING DEVICE - A shaft portion finishing device for finishing the surface of a work having a shaft portion comprises a first shoe and a second shoe clamping the shaft portion, and an abrasive cloth interposed between the first and second shoes and the shaft portion. On the end face of the first shoe facing the abrasive cloth, a portion set softer than the end face of the second shoe facing the abrasive disc exists. | 09-30-2010 |
Takahiro Kakizawa, Yokohama-Shi JP
Patent application number | Description | Published |
---|---|---|
20130257857 | STEREOSCOPIC DEVICE AND IMAGE GENERATION METHOD - An image projected onto a screen from a projector is generated as follows. Specifically, two virtual viewpoints that correspond to the right eye and the left eye of a viewer are set in a virtual three-dimensional space, and two virtual planes are set to be circumscribed to the screen (plane of projection). A plane image is generated by perspective projection transformation of a game space onto the virtual plane based on each virtual viewpoint. A projection image is generated from each plane image according to the relationship between the pixel position of the virtual plane and the pixel position of the projection image that is defined so that the plane image is observed without distortion when observing the screen from a presumed viewing position to generate a right-eye projection image and a left-eye projection image. | 10-03-2013 |
20140292755 | IMAGE GENERATION SYSTEM, IMAGE GENERATION METHOD, AND INFORMATION STORAGE MEDIUM - An image generation system includes a vertex split count setting section that performs a vertex split count setting process that sets a vertex split count m, a vertex split processing section that performs a vertex split process on a three-dimensional object OB in an object space using the vertex split count m, a vertex position calculation section that calculates an intersection position of a projection screen SC and a straight line that connects a vertex position of the three-dimensional object OB after the vertex split process and a position of a virtual camera VC, and calculates a vertex position of a drawing object corresponding to the three-dimensional object OB on a drawing buffer based on the calculated intersection position, and a drawing section that draws the drawing object on the drawing buffer based on the vertex position of the drawing object to generate a projection image. | 10-02-2014 |
Tetsurou Kakizawa, Kanagawa JP
Patent application number | Description | Published |
---|---|---|
20150127485 | CUSTOMER MANAGEMENT DEVICE, CUSTOMER MANAGEMENT SYSTEM AND CUSTOMER MANAGEMENT METHOD - A customer management device for managing states of customers visiting a commercial establishment that provides articles or services to the customers in response to orders from the customers, includes: a first image obtainer that obtains customer images of customers captured at some point from when the customers enter the commercial establishment till when the customers go through reception procedures; a second image obtainer that obtains customer images of customers captured at least either when the customers receive the articles or services or when the customers make payment; a customer information manager that, based on the customer images obtained by the first image obtainer and the second image obtainer, generates and manages customer information relating to customers in a state of waiting for provision of the articles or services; and a customer information provider that provides a user with the customer information managed by the customer information manager. | 05-07-2015 |
20150222861 | MONITORING APPARATUS, MONITORING SYSTEM, AND MONITORING METHOD - A monitoring apparatus according to embodiments of the invention generates and outputs an output moving image obtained by changing an image area of a person detected from an imaged moving image of a monitoring area to a mask image. The monitoring apparatus includes a person image analyzer including a person detector which detects a person from the imaged moving image and acquires area information regarding each person and an attribute determinator which determines attributes for each person detected from the imaged moving image, a mask image setter which sets the mask image by the attribute, and a moving image output controller which generates and outputs the output moving image obtained by changing the image area for each person to the mask image by the attribute, based on the area information and the attribute for each person output from the person image analyzer. | 08-06-2015 |
Tomohiro Kakizawa, Tokyo JP
Patent application number | Description | Published |
---|---|---|
20100190104 | METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE METHOD - A pattern forming method includes (1) selectively exposing a first resist layer, and developing the exposed first resist layer to form a first pattern, (2) applying a resin composition containing a hydroxyl group-containing resin and a solvent to the first pattern, baking the applied resin composition, and developing the baked resin composition to form a second pattern, the hydroxyl group-containing resin becoming insoluble or scarcely soluble in a developer when baked, and (3) totally or selectively exposing the second pattern to make the second pattern partly soluble in the developer, and developing the exposed second pattern to form a third pattern in which at least a hole or a groove is formed in the second pattern. | 07-29-2010 |
20100323292 | RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN - A resist pattern formation method includes (1) a step of forming a first resist pattern which includes forming a first resist layer on a substrate, selectively exposing the first resist layer to radiation through a mask, and developing the exposed first resist layer, (2) a step of insolubilizing the first resist pattern by coating the first resist pattern with a resist pattern insolubilizing resin composition, baking or curing with UV, and developing the resist pattern insolubilizing resin composition, (3) a step of forming a second resist layer on the insolubilized resist pattern and selectively exposing the second resist layer to radiation through a mask, and (4) a step of developing the exposed second resist layer to form a second resist pattern. | 12-23-2010 |
20110123936 | RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD - A resist pattern coating agent includes a hydroxyl group-containing resin, a solvent, and at least two compounds including at least two groups shown by a following formula (1), compounds including a group shown by a following formula (2), and compounds including a group shown by a following formula (4). | 05-26-2011 |
20110223544 | RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME - A resist pattern coating agent includes a hydroxyl group-containing resin and a solvent. The solvent includes an alcohol shown by a following formula (1) in an amount of about 30 mass % or more, | 09-15-2011 |
20120156621 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes a resin including a repeating unit shown by a following general formula (1), a photoacid generator and a photodisintegrating base shown by a following general formula (8). R | 06-21-2012 |
20120171612 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYMER - A radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation-sensitive acid generator. The first polymer includes a repeating unit (I) shown by the following general formula (1), a fluorine atom in a molecule of the first polymer. The second a polymer includes an acid-labile group, and is insoluble or scarcely soluble in an alkali. R | 07-05-2012 |
20120244478 | RESIST PATTERN FORMATION METHOD - A resist pattern formation method includes providing a first positive-tone radiation-sensitive resin composition on a substrate to form a first resist layer. The first resist layer is selectively exposed and developed to form a first resist pattern. The first resist pattern is coated with a resist pattern insolubilizing resin composition which comprises a resin and an alcohol solvent, the resin having a hydroxyl group. The resist pattern insolubilizing resin composition is baked or cured with UV to insolubilize the first resist pattern in a developer and in a second positive-tone radiation-sensitive resin composition. The resist pattern insolubilizing resin composition is developed to form an insolubilized resist pattern. The second positive-tone radiation-sensitive resin composition is provided on the insolubilized resist pattern to form a second resist layer. The second resist layer is selectively exposed and developed to form a second resist pattern. | 09-27-2012 |
20120276482 | RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN, POLYMER AND COMPOUND - A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each Q independently represents a group that includes an alkali-dissociable group. | 11-01-2012 |
20130203000 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND RESIST PATTERN-FORMING METHOD - A radiation-sensitive resin composition includes a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound having a ring structure. The polymer component includes, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). R | 08-08-2013 |
20140363773 | PATTERN-FORMING METHOD - A radiation-sensitive resin composition includes a resin including a repeating unit shown by a following general formula (1), a photoacid generator and a photodisintegrating base shown by a following general formula (8). R | 12-11-2014 |
Yoshinori Kakizawa, Kamakura JP
Patent application number | Description | Published |
---|---|---|
20130156859 | IMMUNOGENIC COMPOSITION - An immunogenic composition includes as effective ingredients: an immunogenic micro-particle composed of an antigen-adjuvant microparticle complex wherein an antigen(s) is/are encapsulated in an adjuvant microparticle composed of an amphiphilic polymer(s) whose hydro-phobic segment(s) is/are poly(hydroxy acid); and a surfactant encapsulated in the immunogenic microparticle. | 06-20-2013 |
Yoshinori Kakizawa, Kanagawa JP
Patent application number | Description | Published |
---|---|---|
20110003007 | MICROPARTICLE AND PHARMACEUTICAL COMPOSITION THEREOF - A microparticle includes an agglomerate of a hydrophilic active substance containing particle, which particle includes an amphiphilic polymer composed of a hydrophobic segment of poly (hydroxy acid) and a hydrophilic segment of polysaccharides or polyethylene glycol, and a hydrophilic active substance. It is characterized by an efficient inclusion of the hydrophilic active substance, and a release of the hydrophilic active substance at an appropriate speed in the human body, and is hence very useful as a DDS pharmaceutical preparation. | 01-06-2011 |
Yoshinori Kakizawa, Kahagawa JP
Patent application number | Description | Published |
---|---|---|
20100184695 | VASCULAR ENDOTHELIAL CELL-BINDING PEPTIDE - A peptide consisting of an amino acid sequence represented by any one of SEQ ID Nos. 1 to 76 of the present invention, a peptide consisting of an amino acid sequence in which one or several amino acids are substituted, deleted, inserted or added in these amino acid sequences, and having an ability to bind to, or to be taken into an activated vascular endothelial cell, or a peptide containing the above peptide as a partial sequence, and having an ability to bind to, or to be taken into an activated vascular endothelial cell is a novel peptide ligand specifically binding to a neovascular endothelial cell, and such a ligand can be effectively used for treating and diagnosing a disease accompanying vascularization such as a solid tumor. | 07-22-2010 |