Patent application number | Description | Published |
20080218717 | Lithographic apparatus and device manufacturing method - In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate. | 09-11-2008 |
20080218726 | Lithographic apparatus and device manufacturing method - Lithographic Apparatus and Device Manufacturing Method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space. | 09-11-2008 |
20080273183 | Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus - The invention relates to an image sensor for detection of an aerial image formed by a beam of radiation in a lithographic projection apparatus for exposing a pattern onto a substrate held in a substrate plane by a substrate holder. The image sensor has an image detector and a lens. The lens is arranged to project at least part of the aerial image onto the image detector. The image sensor is positioned such within the substrate holder that the lens is positioned proximate the substrate plane. | 11-06-2008 |
20090002652 | Lithographic apparatus and device manufacturing method - In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space. | 01-01-2009 |
20090039554 | Imprint lithography - An imprint lithography apparatus is disclosed which has a needle, and a substrate table arranged to hold a substrate to be imprinted, wherein the needle is moveable between a first position and a second position, the first position being such that in use the needle penetrates a layer of imprintable material on the substrate, and the second position being such that in use the needle is disengaged from the imprintable material on the substrate, the substrate table and the needle arranged such that one may be scanned relative to the other. | 02-12-2009 |
20090184270 | Lithographic apparatus and device manufacturing method - A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment. | 07-23-2009 |
20090290135 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system configured to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface configured to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object. | 11-26-2009 |
20100195071 | Image Sensor, Method for Image Detection and Computer Program Product - The invention relates to an image for detection of an aerial pattern comprising spatial differences in radiation intensity in a cross section of a beam of radiation in a lithographic apparatus for exposing a substrate. The image sensor comprises a lens ( | 08-05-2010 |
20100302519 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit. | 12-02-2010 |
20110001942 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. | 01-06-2011 |
20110007285 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. | 01-13-2011 |
20110027721 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment. | 02-03-2011 |
20110122376 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate. | 05-26-2011 |
20110170077 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. | 07-14-2011 |
20110181859 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate. | 07-28-2011 |
20110228241 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space. | 09-22-2011 |
20110273683 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate. | 11-10-2011 |
20110279795 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate. | 11-17-2011 |
20110279800 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. | 11-17-2011 |
20110285977 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. | 11-24-2011 |
20120032078 | Backscatter Reduction in Thin Electron Detectors - In a direct electron detector, backscattering of electrons into the detector volume from below the sensor is prevented. In some embodiments, an empty space is maintained below the sensor. In other embodiments, a structure below the sensor includes geometry, such as multiple high aspects ratio channels, either extending to or from the sensor to trap electrons, or a structure of angled surfaces to deflect the electrons that pass through the sensor. | 02-09-2012 |
20120044468 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit. | 02-23-2012 |
20120256085 | Method of protecting a radiation detector in a charged particle instrument - The invention relates to a Method of protecting a direct electron detector ( | 10-11-2012 |
20120274911 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. | 11-01-2012 |
20130128256 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment. | 05-23-2013 |
20130235358 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate. | 09-12-2013 |
20130250270 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate. | 09-26-2013 |
20130301017 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space. | 11-14-2013 |
20140166879 | Backscatter Reduction in Thin Electron Detectors - In a direct electron detector, backscattering of electrons into the detector volume from below the sensor is prevented. In some embodiments, an empty space is maintained below the sensor. In other embodiments, a structure below the sensor includes geometry, such as multiple high aspects ratio channels, either extending to or from the sensor to trap electrons, or a structure of angled surfaces to deflect the electrons that pass through the sensor. | 06-19-2014 |
20150070668 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit. | 03-12-2015 |