Patent application number | Description | Published |
20100213488 | LIGHT EMITTING DEVICE, LIGHT EMITTING DEVICE PACKAGE AND LIGHTING SYSTEM INCLUDING THE SAME - Provided are a light emitting device, a light emitting device package and a lighting system comprising the same. The light emitting device comprises a light emitting structure comprising a first conductive type semiconductor layer, an active layer, and a second conductive type semiconductor layer, and an anti-reflection region on a lateral surface of the light emitting structure. | 08-26-2010 |
20100224899 | LIGHT EMITTING DEVICE, LIGHT EMITTING DEVICE PACKAGE AND LIGHTING SYSTEM INCLUDING THE SAME - Provided are a light emitting device, a light emitting device package and a lighting system including the same. | 09-09-2010 |
20110133221 | LED AND LED PACKAGE - A light emitting device (LED) and Package of the same are provided. The LED comprises a first conductivity type semiconductor layer, an active layer, a second conductivity type semiconductor layer, a first dielectric layer, and a first electrode layer. The first conductivity type semiconductor layer, the active layer, and the second conductivity type semiconductor layer are on a substrate. The first dielectric layer covers the edges of the second conductivity type semiconductor layer and the active layer. The first electrode layer covers the edge of the first conductivity type semiconductor layer. | 06-09-2011 |
20110164402 | BACKLIGHT UNIT AND DISPLAY DEVICE USING THE SAME - A backlight unit includes a bottom cover; a light emitting module on the bottom cover and including a substrate and a plurality of light emitting devices, each light emitting device including a light emitting structure having a first conductive semiconductor layer, an active layer and a second conductive semiconductor layer; and a light guide member on the light emitting module and including at least one insertion cavity into which at least one of the plurality of light emitting devices is inserted, wherein the at least one insertion cavity is opened only on one side. | 07-07-2011 |
Patent application number | Description | Published |
20080204684 | PROCESS AND APPARATUS FOR ULTRAVIOLET NANO-IMPRINT LITHOGRAPHY - A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process. | 08-28-2008 |
20090029298 | METHOD OF MANUFACTURING PATTERNED MAGNETIC RECORDING MEDIUM - Provided is a method of manufacturing a patterned magnetic recording medium. The method includes (a) forming a patterned recording layer on an underlayer of a first substrate; (b) coating a polymer layer on a surface of a second substrate; (c) transferring the polymer layer on the patterned recording layer; and (d) exposing the surface of the patterned recording layer. | 01-29-2009 |
20090061035 | DUAL-SIDE IMPRINTING LITHOGRAPHY SYSTEM - Provided is a dual-side imprinting lithography system that includes a medium supporting unit that supports a medium wherein both surfaces of the medium are coated with a ultraviolet (UV) hardening resin; a first mold supporting unit and a second mold supporting unit that respectively support a first mold and a second mold, disposed respectively above the medium supporting unit and under the medium supporting unit; a vertical moving device that moves vertically at least one of the medium supporting unit, the first mold supporting unit, and the second mold supporting unit; a first UV radiating device that is installed above the first mold supporting unit to radiate UV rays; and a second UV radiating device that is installed under the second mold supporting unit to radiate UV rays. | 03-05-2009 |
20090297889 | MASTER RECORDING MEDIUM FOR MAGNETICALLY TRANSFERRING SERVO PATTERN TO THE MAGNETIC RECORDING MEDIUM AND METHOD OF MANUFACTURING THE SAME - Provided are a master recording medium and a method of manufacturing the master recording medium. The master recording medium includes: a plate; and a magnetic layer which is formed on the plate for magnetically transferring of a servo pattern that is to be formed on a magnetic recording medium. The method of manufacturing a master recording medium includes: engraving a polymer layer by nano imprinting to form an engraved pattern corresponding to a servo pattern to be formed on a magnetic recording medium; forming a magnetic layer which fills in the engraved pattern of the polymer layer; forming a back plate layer on the magnetic layer; and performing processing to expose the servo pattern on a surface of the magnetic layer that is opposite a surface of the magnetic layer on which the back plate layer is formed. | 12-03-2009 |
20100090191 | Cross point memory arrays, methods of manufacturing the same, masters for imprint processes, and methods of manufacturing masters - A cross point memory array includes a structure in which holes are formed in an insulating layer and a storage node is formed in each of the holes. The storage node may include a memory resistor and a switching structure. The master for an imprint process used to form the cross-point memory array includes various pattern shapes, and the method of manufacturing the master uses various etching methods. | 04-15-2010 |
20120056355 | PROCESS AND APPARATUS FOR ULTRAVIOLET NANO-IMPRINT LITHOGRAPHY - A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process. | 03-08-2012 |
20120104353 | CROSS POINT MEMORY ARRAYS, METHODS OF MANUFACTURING THE SAME, MASTERS FOR IMPRINT PROCESSES, AND METHODS OF MANUFACTURING MASTERS - A cross point memory array includes a structure in which holes are formed in an insulating layer and a storage node is formed in each of the holes. The storage node may include a memory resistor and a switching structure. The master for an imprint process used to form the cross-point memory array includes various pattern shapes, and the method of manufacturing the master uses various etching methods. | 05-03-2012 |
20120152887 | Method Of Manufacturing Nanoimprint Stamp - Methods of manufacturing a nanoimprint stamp are provided. The method may include forming a pattern on a surface of a master substrate, depositing an etch barrier layer on a surface of a stamp substrate, coating a photoresist on one of the surfaces of the master substrate and the stamp substrate on which an etch barrier layer is formed, forming a photoresist pattern by pressing the master substrate against the stamp substrate, forming a hard mask by etching the etch barrier layer using the photoresist pattern, and etching the stamp substrate using the hard mask as an etch mask. | 06-21-2012 |
20120168404 | METHODS OF FABRICATING NANOIMPRINT STAMP - A method of fabricating a nanoimprint stamp includes forming a resist pattern having a nano size width on a stamp substrate by performing imprint processes repeatedly. In the imprint processes, resist layers that are selectively etched are sequentially used. The stamp substrate is etched using the resist pattern as an etch mask. | 07-05-2012 |
20130042779 | STAMP, METHOD OF MANUFACTURING THE SAME, AND IMPRINTING METHOD USING THE STAMP - A stamp includes at least one protrusion on a protrusion pattern, and an end portion of the at least one protrusion may have a non-planarized surface. The end portion of the protrusion may have a concave structure, that is, the end portion includes a center region and an edge region, and the edge region is higher than the center region. | 02-21-2013 |
20130147096 | Imprinting Stamp And Nano-Imprinting Method Using The Same - An imprinting stamp and a nano-imprinting method using the imprinting stamp are provided. The imprinting stamp includes a first substrate; one or more field regions on the first substrate, the first substrate including nano-patterns; and a first dummy pattern region on the first substrate and adjacent to the field region, the dummy pattern region including first dummy patterns having greater dimensions than that of the nano-patterns, the first dummy patterns being a plurality of polygons, each of the polygons having a vertex pointing in a first direction proceeding from the field region toward the first dummy pattern region. | 06-13-2013 |
20130187309 | STAMP, METHOD OF FABRICATING THE STAMP, AND IMPRINT METHOD USING THE SAME - A stamp includes a transparent body having an inner chamber containing an inlet/outlet tube configured to have a fluid injected and removed therefrom. | 07-25-2013 |
20130292865 | TEMPLATE SYSTEM AND NANO-IMPRINT METHOD USING THE SAME - A template system, and a nano-imprint method using the same, include a template having a nano-pattern and configured to transfer the nano-pattern to a resin material on a substrate, and a pressure controlling apparatus configured to change a pressure of the template with respect to the substrate according to an intensity of bubbles captured between the substrate and the template. | 11-07-2013 |
20140054264 | METHOD OF MANUFACTURING NANOIMPRINT STAMP - Methods of manufacturing a nanoimprint stamp are provided. The method may include forming a pattern on a surface of a master substrate, depositing an etch barrier layer on a surface of a stamp substrate, coating a photoresist on one of the surfaces of the master substrate and the stamp substrate on which an etch barrier layer is formed, forming a photoresist pattern by pressing the master substrate against the stamp substrate, forming a hard mask by etching the etch barrier layer using the photoresist pattern, and etching the stamp substrate using the hard mask as an etch mask. | 02-27-2014 |
20140061975 | Process and Apparatus for Ultraviolet Nano-Imprint Lithography - A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process. | 03-06-2014 |
20140158662 | NANOIMPRINT STAMP HAVING ALIGNMENT MARK AND METHOD OF FABRICATING THE SAME - A nanoimprint stamp having an alignment mark includes a transparent substrate having a plurality of convex portions, and a semitransparent layer on each of the plurality of convex portions. The semitransparent layer has a transmittance of about 20% to about 80% with respect to ultraviolet rays. | 06-12-2014 |
Patent application number | Description | Published |
20100296032 | OPTICAL FILM, PREPARATION METHOD OF THE SAME, AND LIQUID CRYSTAL DISPLAY COMPRISING THE SAME - The present invention relates to a composition for liquid crystal alignment layer, a preparation method of liquid crystal alignment layer using the same, and an optical film comprising the liquid crystal alignment layer. More particularly, the composition for liquid crystal alignment layer according to the present invention includes crosslinkable functional monomers as well as a photoreactive polymer, thereby improving thermal stability and durability of the liquid crystal alignment layer that is prepared by using the composition for liquid crystal alignment layer. In addition, when the liquid crystal alignment layer is used to produce an optical film, adhesive strength between substrate and liquid crystal alignment layer and between liquid crystal alignment layer and liquid crystal film can be improved. | 11-25-2010 |
20110043731 | COMPOSITION FOR LIQUID CRYSTAL ALIGNMENT LAYER, PREPARATION METHOD OF LIQUID CRYSTAL ALIGNMENT LAYER USING THE SAME, AND OPTICAL FILM COMPRISING THE LIQUID CRYSTAL ALIGNMENT LAYER - The present invention relates to a composition for liquid crystal alignment layer, a preparation method of liquid crystal alignment layer using the same, and an optical film comprising the liquid crystal alignment layer. More particularly, the composition for liquid crystal alignment layer according to the present invention includes crosslinkable functional monomers as well as a photoreactive polymer, thereby improving thermal stability and durability of the liquid crystal alignment layer that is prepared by using the composition for liquid crystal alignment layer. In addition, when the liquid crystal alignment layer is used to produce an optical film, adhesive strength between substrate and liquid crystal alignment layer and between liquid crystal alignment layer and liquid crystal film can be improved. | 02-24-2011 |
20110051050 | OPTICAL FILM, PREPARATION METHOD OF THE SAME, AND LIQUID CRYSTAL DISPLAY COMPRISING THE SAME - The present invention relates to a composition for liquid crystal alignment layer, a preparation method of liquid crystal alignment layer using the same, and an optical film comprising the liquid crystal alignment layer. More particularly, the composition for liquid crystal alignment layer according to the present invention includes crosslinkable functional monomers as well as a photoreactive polymer, thereby improving thermal stability and durability of the liquid crystal alignment layer that is prepared by using the composition for liquid crystal alignment layer. In addition, when the liquid crystal alignment layer is used to produce an optical film, adhesive strength between substrate and liquid crystal alignment layer and between liquid crystal alignment layer and liquid crystal film can be improved. | 03-03-2011 |
20140192299 | COMPOSITION FOR LIQUID CRYSTAL ALIGNMENT LAYER, PREPARATION METHOD OF LIQUID CRYSTAL ALIGNMENT LAYER USING THE SAME, AND OPTICAL FILM COMPRISING THE LIQUID CRYSTAL ALIGNMENT LAYER - The present invention relates to a composition for liquid crystal alignment layer, a preparation method of liquid crystal alignment layer using the same, and an optical film comprising the liquid crystal alignment layer. More particularly, the composition for liquid crystal alignment layer according to the present invention includes crosslinkable functional monomers as well as a photoreactive polymer, thereby improving thermal stability and durability of the liquid crystal alignment layer that is prepared by using the composition for liquid crystal alignment layer. In addition, when the liquid crystal alignment layer is used to produce an optical film, adhesive strength between substrate and liquid crystal alignment layer and between liquid crystal alignment layer and liquid crystal film can be improved. | 07-10-2014 |
20140199498 | COMPOSITION FOR LIQUID CRYSTAL ALIGNMENT LAYER, PREPARATION METHOD OF LIQUID CRYSTAL ALIGNMENT LAYER USING THE SAME, AND OPTICAL FILM COMPRISING THE LIQUID CRYSTAL ALIGNMENT LAYER - The present invention relates to a composition for liquid crystal alignment layer, a preparation method of liquid crystal alignment layer using the same, and an optical film comprising the liquid crystal alignment layer. More particularly, the composition for liquid crystal alignment layer according to the present invention includes crosslinkable functional monomers as well as a photoreactive polymer, thereby improving thermal stability and durability of the liquid crystal alignment layer that is prepared by using the composition for liquid crystal alignment layer. In addition, when the liquid crystal alignment layer is used to produce an optical film, adhesive strength between substrate and liquid crystal alignment layer and between liquid crystal alignment layer and liquid crystal film can be improved. | 07-17-2014 |