Patent application number | Description | Published |
20080298718 | Image Stitching - Disclosed are embodiments of systems and methods to stitch two or more images together into a composite image. By finding matching point pairs for a pair of images, a homography transform may be obtained for the pair of images. The homography transform may be used to generate a composite image of the image pair. In an embodiment, the process of identifying a homography transform may be iterated. In an embodiment, when forming the composite image, the transformed foreground regions may be selected such that there is no intersection of foreground pixel regions. In an embodiment, foreground pixel regions on the border of an image may be removed. The resulting composite image is a larger image generated from the selected regions from the input images. In embodiments, the process may be repeated for sets of images with more than two images. | 12-04-2008 |
20090060330 | Fast Segmentation of Images - Systems, apparatuses, and methods are described for performing fast segmentation of an image. In embodiments, an image may be segmented by generating a background mask, generating an edge mask, dilating the edge mask, and refining that edge mask by applying refinement operations that remove edge pixels from the edge mask. In embodiments, the refined edge mask may be used to generate a foreground mask. | 03-05-2009 |
20090060331 | Image Background Suppression - Disclosed are embodiments of systems and methods for suppressing the background of an image. In embodiments, the number of foreground pixels or background pixels within a neighborhood of an identified background pixel may be compared against an aggressiveness threshold. Responsive to the number of foreground pixels within a neighborhood of an identified background pixel not exceeding an aggressiveness threshold, the color of the identified background pixel may be changed to an average local background color. Alternatively, responsive to the number of background pixels within a neighborhood of an identified background pixel exceeding an aggressiveness threshold, the color of the identified background pixel may be changed to an average local background color. In embodiments, additional processes may be performed on the image including, but not limited to, color adjusting, filtering, image enhancing, compression, format conversion, watermarking, special effects, video editing, etc. | 03-05-2009 |
20090129625 | Extracting Data From Images - Disclosed are embodiments of systems and methods for embedding and/or extracting data from images. In embodiments, an image may be segmented into regions, and characters or other image groups within a segmented region may be determined to be embedding sites. A data vector may be embedded into a set of corresponding ordered embedding sites by representing each data element as different intensity values assigned to the pixels within one portion of an embedding site relative to the pixels in another portion of the embedding site. In embodiments, embedded data may be extracted from an image by extracting and decoding a set of bit values from a set of identified and ordered embedding sites. | 05-21-2009 |
20090136080 | Identifying Embedded Data in an Image - Disclosed are embodiments of systems and methods for embedding and/or extracting data from images. In embodiments, an image may be segmented into regions, and characters or other image groups within a segmented region may be determined to be embedding sites. A data vector may be embedded into a set of corresponding ordered embedding sites by representing each data element as different intensity values assigned to the pixels within one portion of an embedding site relative to the pixels in another portion of the embedding site. In embodiments, embedded data may be extracted from an image by extracting and decoding a set of bit values from a set of identified and ordered embedding sites. | 05-28-2009 |
20090136082 | Embedding Data in Images - Disclosed are embodiments of systems and methods for embedding and/or extracting data from images. In embodiments, an image may be segmented into regions, and characters or other image groups within a segmented region may be determined to be embedding sites. A data vector may be embedded into a set of corresponding ordered embedding sites by representing each data element as different intensity values assigned to the pixels within one portion of an embedding site relative to the pixels in another portion of the embedding site. In embodiments, embedded data may be extracted from an image by extracting and decoding a set of bit values from a set of identified and ordered embedding sites. | 05-28-2009 |
Patent application number | Description | Published |
20090094844 | CONSTANT FORCE MECHANICAL SCRIBERS AND METHODS FOR USING SAME IN SEMICONDUCTOR PROCESSING APPLICATIONS - A scribing system comprising a mounting mechanism, stylus, and force generating mechanism is provided. The mounting mechanism is configured to rotate an elongated object in such a manner that the object is subjected to a bow effect wherein a middle portion of the object bends relative to the end portions of the object. The stylus is for scribing the object at a position x along the long dimension of the object while the mounting mechanism rotates the object. The force generating mechanism is connected to the stylus so that the stylus applies the same constant force to the elongated object regardless of the position x along the long dimension of the object that the stylus is positioned, while the mounting mechanism rotates the object and thereby subjects the object to the bow effect, thereby scribing the object. | 04-16-2009 |
20100180746 | Constant Force Mechanical Scribers and Methods for Using Same In Semiconductor Processing Applications - A scribing system comprising a mounting mechanism, stylus, and force generating mechanism is provided. The mounting mechanism is configured to rotate an elongated object in such a manner that the object is subjected to a bow effect wherein a middle portion of the object bends relative to the end portions of the object. The stylus is for scribing the object at a position x along the long dimension of the object while the mounting mechanism rotates the object. The force generating mechanism is connected to the stylus so that the stylus applies the same constant force to the elongated object regardless of the position x along the long dimension of the object that the stylus is positioned, while the mounting mechanism rotates the object and thereby subjects the object to the bow effect, thereby scribing the object. | 07-22-2010 |
20110132170 | Constant Force Mechanical Scribers and Methods for Using Same In Semiconductor Processing Applications - A scribing system comprising a mounting mechanism, stylus, and force generating mechanism is provided. The mounting mechanism is configured to rotate an elongated object in such a manner that the object is subjected to a bow effect wherein a middle portion of the object bends relative to the end portions of the object. The stylus is for scribing the object at a position x along the long dimension of the object while the mounting mechanism rotates the object. The force generating mechanism is connected to the stylus so that the stylus applies the same constant force to the elongated object regardless of the position x along the long dimension of the object that the stylus is positioned, while the mounting mechanism rotates the object and thereby subjects the object to the bow effect, thereby scribing the object. | 06-09-2011 |
Patent application number | Description | Published |
20080273637 | In-Situ Gain Calibration of Radio Frequency Devices Using Thermal Noise - An apparatus for calibrating gain of an radio frequency receiver (“Rx”) is disclosed to provide, among other things, a structure for performing in-situ gain calibration of an RF integrated circuit over time and/or over temperature without removing the RF integrated circuit from its operational configuration, especially when the gain of the RF integrated circuit is susceptible to variations in process, such as inherent with the CMOS process. In one embodiment, an exemplary apparatus includes a thermal noise generator configured to generate thermal noise as a calibrating signal into an input of an Rx path of an RF integrated circuit. The apparatus also includes a calibrator configured to first measure an output signal from an output of the Rx path, and then adjust a gain of the Rx path based on the thermal noise. In one embodiment, the thermal noise generator further includes a termination resistance and/or impedance. | 11-06-2008 |
20120149322 | In-situ Gain Calibration of Radio Frequency Devices Using Thermal Noise - An apparatus for calibrating gain of an radio frequency receiver (“Rx”) is disclosed to provide, among other things, a structure for performing in-situ gain calibration of an RF integrated circuit over time and/or over temperature without removing the RF integrated circuit from its operational configuration, especially when the gain of the RF integrated circuit is susceptible to variations in process, such as inherent with the CMOS process. In one embodiment, an exemplary apparatus includes a thermal noise generator configured to generate thermal noise as a calibrating signal into an input of an Rx path of an RF integrated circuit. The apparatus also includes a calibrator configured to first measure an output signal from an output of the Rx path, and then adjust a gain of the Rx path based on the thermal noise. In one embodiment, the thermal noise generator further includes a termination resistance and/or impedance. | 06-14-2012 |
Patent application number | Description | Published |
20080253035 | Self-aligned full side shield PMR and method to make it - A process for forming the write pole of a PMR head is described. This write pole is symmetrically located relative to its side shields, This is accomplished, not through optical alignment, but by coating the pole with a uniform layer of non-magnetic material of a predetermined and precise thickness, followed by the formation of the shield layer around this. | 10-16-2008 |
20080297945 | Method to make a perpendicular magnetic recording head with a bottom side shield - A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of bottom side shields and shielded from above by an upper shield. The bottom side shields surround a lower portion of the pole tip while the upper portion of the pole tip is surrounded by non-magnetic layers. The bottom shields and the non-magnetic layer form wedge-shaped trench in which the pole tip is formed by a self-aligned plating process. The wedge shape is formed by a RIE process using specific gases applied through a masking layer formed of material that has a slower etch rate than the non-magnetic material or the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a non-magnetic layer of alumina that is formed on a shield layer of NiFe and using RIE gases of CH | 12-04-2008 |
20100119874 | Laminated high moment film for head applications - A laminated high moment film with a non-AFC configuration is disclosed that can serve as a seed layer for a main pole layer or as the main pole layer itself in a PMR writer. The laminated film includes a plurality of (B/M) stacks where B is an alignment layer and M is a high moment layer. Adjacent (B/M) stacks are separated by an amorphous layer that breaks the magnetic coupling between adjacent high moment layers and reduces remanence in a hard axis direction while maintaining a high magnetic moment and achieving low values for Hch, Hce, and Hk. The amorphous material layer may be made of an oxide, nitride, or oxynitride of one or more of Hf, Zr, Ta, Al, Mg, Zn, Ti, Cr, Nb, or Si, or may be Hf, Zr, Ta, Nb, CoFeB, CoB, FeB, or CoZrNb. Alignment layers are FCC soft ferromagnetic materials or non-magnetic FCC materials. | 05-13-2010 |
20110146060 | Method to make a perpendicular magnetic recording head with a side write shield - A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of side shields and shielded from above by an upper shield. The side shields are formed by a RIE process using specific gases applied to a shield layer through a masking layer formed of material that has a slower etch rate than the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a shield layer of NiFe and using RIE gases of CH | 06-23-2011 |
20110146062 | METHOD FOR MANUFACTURING A MAGNETIC WRITE HEAD HAVING A WRAP AROUND SHIELD THAT IS MAGNETICALLY COUPLED WITH A LEADING MAGNETIC SHIELD - A method for manufacturing a magnetic write head having a leading magnetic shield and a trailing magnetic shield that are arranged to prevent the lost of magnetic write field to the trailing magnetic shield. The write head includes a non-magnetic step layer that provides additional spacing between the trailing magnetic shield and the write pole at a region removed from the air bearing surface. | 06-23-2011 |
20110151279 | MAGNETIC WRITE HEAD MANUFACTURED BY AN ENHANCED DAMASCENE PROCESS PRODUCING A TAPERED WRITE POLE WITH A NON-MAGNETIC SPACER AND NON-MAGNETIC BUMP - A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield. | 06-23-2011 |
20110261486 | Perpendicular magnetic recording head with a bottom side shield - A perpendicular magnetic recording (PMR) head has a pole tip shielded laterally by a separated pair of bottom side shields and shielded from above by an upper shield. The bottom side shields surround a lower portion of the pole tip while the upper portion of the pole tip is surrounded by non-magnetic layers. The bottom shields and the non-magnetic layer form a wedge-shaped trench in which the pole tip has been formed by a self-aligned plating process. A write gap layer and an upper shield is formed above the side shields and pole. The resulting structure substantially eliminates track overwrite while maintaining good track definition. | 10-27-2011 |
20110262775 | Self-aligned full side shield PMR and method to make it - A magnetic pole suitable for perpendicular magnetic recording is described. This write pole is symmetrically located relative to its side shields and has at least three additional surfaces that are disposed to lie in planes that are normal to the substrate's top surface. | 10-27-2011 |
20120125885 | PERPENDICULAR WRITE HEAD WITH WRAP AROUND SHIELD AND CONFORMAL SIDE GAP - A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES. | 05-24-2012 |
20120125886 | PROCESS TO MAKE PMR WRITER WITH LEADING EDGE SHIELD (LES) AND LEADING EDGE TAPER (LET) - Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material. | 05-24-2012 |
20120127612 | PROCESS TO MAKE PMR WRITER WITH LEADING EDGE SHIELD (LES) AND LEADING EDGE TAPER (LET) - Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material. | 05-24-2012 |
20120154951 | METHOD FOR MANUFACTURING A PERPENDICULAR MAGNETIC WRITE POLE HAVING A WRITE POLE AND TRAILING SHIELD WITH A TAPERED TRAILING GAP - A method for manufacturing a magnetic write head having a that has a write pole with a tapered trailing edge in a pole tip region, and a trailing shield that has a leading edge that tapers away from the write pole at an angle that is greater than that taper angle of the trailing edge of the write pole. The magnetic head has a step feature with a front edge that is recessed from the ABS. In one embodiment a magnetic wedge is formed over the tapered surface of the write pole. In another embodiment, a non-magnetic bump is formed over a first tapered portion of the write pole adjacent to the front edge of the step feature, and a non-magnetic wedge is formed over a second tapered portion of the write pole and extends from the non-magnetic bump to the air bearing surface. | 06-21-2012 |
20130026131 | Method For Manufacturing Wraparound Shield Write Head Using Hard Masks - The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention. | 01-31-2013 |
Patent application number | Description | Published |
20140262755 | UV-ASSISTED REACTIVE ION ETCH FOR COPPER - In some embodiments, a plasma etching apparatus is provided for etching copper that includes (1) a chamber body having a process chamber adapted to receive a substrate; (2) an RF source coupled to an RF electrode; (3) a pedestal located in the processing chamber and adapted to support a substrate; and (4) a UV source configured to delivery UV light to the processing chamber during at least a portion of an etch process performed within the plasma etching apparatus. Numerous other aspects are provided. | 09-18-2014 |
20140273487 | PULSED DC PLASMA ETCHING PROCESS AND APPARATUS - In one aspect, a plasma etching apparatus is disclosed. The plasma etching apparatus includes a chamber body having a process chamber adapted to receive a substrate, an RF source coupled to an RF electrode, a pedestal located in the processing chamber and adapted to support a substrate, a plurality of conductive pins adapted to contact and support the substrate during processing, and a DC bias source electrically coupled to the plurality of conductive pins. Etching methods are provided, as are numerous other aspects. | 09-18-2014 |
20160064500 | NANOCRYSTALINE DIAMOND CARBON FILM FOR 3D NAND HARDMASK APPLICATION - A nanocrystalline diamond layer for use in forming a semiconductor device and methods for using the same are disclosed herein. The device can include a substrate with a processing surface and a supporting surface, a device layer formed on the processing surface and a nanocrystalline diamond layer formed on the processing layer, the nanocrystalline diamond layer having an average grain size of between 2 nm and 5 nm. The method can include positioning a substrate in a process chamber, depositing a device layer on a processing surface, depositing a nanocrystalline diamond layer on the device layer, the nanocrystalline diamond layer having an average grain size of between 2 nm and 5 nm, patterning and etching the nanocrystalline diamond layer, etching the device layer to form a feature and ashing the nanocrystalline diamond layer from the surface of the device layer. | 03-03-2016 |
Patent application number | Description | Published |
20080286850 | MDCK CELL LINES SUPPORTING VIRAL GROWTH TO HIGH TITERS AND BIOREACTOR PROCESS USING THE SAME - The present invention relates to novel MDCK cells which can be to grow viruses, e.g., influenza viruses, in cell culture to higher titer than previously possible. The MDCK cells can be adapted to serum-free culture medium. The present invention further relates to cell culture compositions comprising the MDCK cells and cultivation methods for growing the MDCK cells. The present invention further relates to methods for producing influenza viruses in cell culture using the MDCK cells of the invention. | 11-20-2008 |
20100098725 | METHODS FOR CULTIVATING CELLS, PROPAGATING AND PURIFYING VIRUSES - The present invention provides novel serum-free cell culture medium and methods for cultivating MDCK cells. In particular, non-tumorigenic MDCK cells. The present invention also provides methods for producing influenza viruses (e.g., particularly cold-adapted, and/or temperature sensitive, and/or attenuated influenza viruses) that eliminate the need for a cell culture medium exchange step. The novel medium and methods are useful to grow influenza viruses, in cell culture to high titer. The present invention further provides purification methods for purifying influenza viruses with high overall recovery of live virus and result in levels of host cell DNA (HCD), host cell protein (HCP) and non-specific endonuclease (e.g., Benzonase), which are below the specifications required by regulatory agencies. The immunogenic compositions can be used to actively immunize subjects or to generate antibodies for a variety of uses, including passive immunization and diagnostic immunoassays. | 04-22-2010 |
20100112669 | MDCK CELLS LINES SUPPORTING VIRAL GROWTH TO HIGH TITERS AND BIOREACTOR PROCESS USING THE SAME - The present invention relates to novel MDCK cells which can be to grow viruses, e.g., influenza viruses, in cell culture to higher titer than previously possible. The MDCK cells can be adapted to serum-free culture medium. The present invention further relates to cell culture compositions comprising the MDCK cells and cultivation methods for growing the MDCK cells. The present invention further relates to methods for producing influenza viruses in cell culture using the MDCK cells of the invention. | 05-06-2010 |
20120258136 | METHODS FOR CULTIVATING CELLS, PROPAGATING AND PURIFYING VIRUSES - The present invention provides novel serum-free cell culture medium and methods for cultivating MDCK cells. In particular, non-tumorigenic MDCK cells. The present invention also provides methods for producing influenza viruses (e.g., particularly cold-adapted, and/or temperature sensitive, and/or attenuated influenza viruses) that eliminate the need for a cell culture medium exchange step. The novel medium and methods are useful to grow influenza viruses, in cell culture to high titer. The present invention further provides purification methods for purifying influenza viruses with high overall recovery of live virus and result in levels of host cell DNA (HCD), host cell protein (HCP) and non-specific endonuclease (e.g., Benzonase), which are below the specifications required by regulatory agencies. The immunogenic compositions can be used to actively immunize subjects or to generate antibodies for a variety of uses, including passive immunization and diagnostic immunoassays. | 10-11-2012 |
20130052717 | MDCK CELL LINES SUPPORTING VIRAL GROWTH TO HIGH TITERS AND BIOREACTOR PROCESS USING THE SAME - The present invention relates to novel MDCK cells which can be to grow viruses, e.g., influenza viruses, in cell culture to higher titer than previously possible. The MDCK cells can be adapted to serum-free culture medium. The present invention further relates to cell culture compositions comprising the MDCK cells and cultivation methods for growing the MDCK cells. The present invention further relates to methods for producing influenza viruses in cell culture using the MDCK cells of the invention. | 02-28-2013 |
Patent application number | Description | Published |
20100301959 | PULSE WIDTH MODULATOR WITH TWO-WAY INTEGRATOR - A pulse width modulator (PWM) includes a driver and a two-way integrator. The driver is coupled to output a first and a subsequent period of a PWM signal. Both the first and the subsequent periods include the PWM signal changing between first and second states. The two-way integrator is coupled to integrate an input current and coupled to generate a duty ratio signal in response to integrating the input current. The driver determines a duty factor of both the first and the subsequent periods by setting the PWM signal to the second state in response to the duty ratio signal. The two-way integrator includes a capacitor that integrates the input current during the first period by charging the capacitor and integrates the input current during the subsequent period by discharging the capacitor. | 12-02-2010 |
20110227627 | PULSE WIDTH MODULATOR WITH TWO-WAY INTEGRATOR - An example two-way integrator includes a first current source, a second current source, a first offset current source, a second offset current source, a capacitor, a switching reference and a comparator. The capacitor integrates a sum of a first input current and a first offset current by charging with both the first current source and the first offset current source. The capacitor subsequently integrates a sum of the second input current and the second offset current by discharging with both the second current source and the second offset current source. The switching reference outputs a first reference voltage and a second reference voltage responsive to pulses of a pulse signal. The comparator is coupled to compare the switching reference with a voltage on the capacitor. | 09-22-2011 |
20130027151 | PULSE WIDTH MODULATOR WITH TWO-WAY INTEGRATOR - An example PWM includes a driver and a two-way oscillator. The oscillator includes, a first frequency adjust current source, a second frequency adjust current source, a capacitor, a switching reference and a comparator. The capacitor integrates a frequency adjust current by charging with the first frequency adjust current source. The capacitor subsequently integrates a second frequency adjust current by discharging with the second frequency adjust current source. The switching reference outputs a first reference voltage and a second reference voltage responsive to an oscillator signal. The comparator compares the output of the switching reference with a voltage on the capacitor. The first and second frequency adjust current sources vary the first and second frequency adjust currents to vary the frequency of the PWM signal to spread energy of switching harmonics over a frequency band and to reduce EMI. | 01-31-2013 |
Patent application number | Description | Published |
20090116698 | Intelligent fashion exploration based on clothes recognition - One embodiment of the present invention provides a system for recognizing and classifying clothes. During operation, the system captures at least one image of a clothing item. The system further determines a region on the captured image which corresponds to a torso and/or limbs. The system also determines at least one color composition, texture composition, collar configuration, and sleeve configuration of the clothing item. Additionally, the system classifies the clothing item into at least one category based on the determined color composition, texture composition, collar configuration, and sleeve configuration. The system then produces a result which indicates the classification. | 05-07-2009 |
20090116766 | METHOD AND APPARATUS FOR AUGMENTING A MIRROR WITH INFORMATION RELATED TO THE MIRRORED CONTENTS AND MOTION - One embodiment of the present invention provides a system that enables a user to visually compare the effects of one or more clothing sets in front of a mirror. During operation, the system detects and stores images of a user wearing a piece of clothing in front of mirror. Similar stored poses from either the user or from members of the user's social network can be retrieved later to compare the effects of the current piece of clothing to the retrieved clothing. The poses are then displayed in close proximity to the mirror so that the user can visually compare the effects. Displaying multiple such poses in sequence and in fast response to changes in the user's orientation creates the effect that the system is tracking the user's movements and presenting poses that are substantially synchronized to the user's movements. | 05-07-2009 |
20140244528 | METHOD AND APPARATUS FOR COMBINING MULTI-DIMENSIONAL FRAUD MEASUREMENTS FOR ANOMALY DETECTION - A fraud-detection system facilitates detecting fraudulent entities by computing weighted fraud-detecting scores for the individual entities. During operation, the system can obtain fraud warnings for a plurality of entities, and for a plurality of fraud types. The system computes, for a respective entity, a fraud-detection score which indicates a normalized cost of fraudulent transactions from the respective entity. The system then determines, from the plurality of entities, one or more anomalous entities whose fraud-detection score indicates anomalous behavior. The system can determine an entity that is likely to be fraudulent by comparing the entity's fraud-detection score to fraud-detection scores for other entities. | 08-28-2014 |
20140278729 | MULTIPLE RESOLUTION VISUALIZATION OF DETECTED ANOMALIES IN CORPORATE ENVIRONMENT - One embodiment of the present invention provides a user interface for presenting anomaly-detection outcomes associated with an organization to a user. The user interface includes a receiving mechanism configured to receive the anomaly-detection outcomes, a display that displays the anomaly-detection outcomes at a first resolution, and a command-receiving mechanism configured to receive commands from the user. In response to receiving a respective user command, the display is configured to display the anomaly-detection outcomes at a second resolution. | 09-18-2014 |
20140325643 | DETECTING ANOMALIES IN WORK PRACTICE DATA BY COMBINING MULTIPLE DOMAINS OF INFORMATION - One embodiment of the present invention provides a system for multi-domain clustering. During operation, the system collects domain data for at least two domains associated with users, wherein a domain is a source of data describing observable activities of a user. Next, the system estimates a probability distribution for a domain associated with the user. The system also estimates a probability distribution for a second domain associated with the user. Then, the system analyzes the domain data with a multi-domain probability model that includes variables for two or more domains to determine a probability distribution of each domain associated with the probability model and to assign users to clusters associated with user roles. | 10-30-2014 |
20150235152 | SYSTEM AND METHOD FOR MODELING BEHAVIOR CHANGE AND CONSISTENCY TO DETECT MALICIOUS INSIDERS - One embodiment of the present invention provides a system for identifying anomalies. During operation, the system obtains work practice data associated with a plurality of users. The work practice data includes a plurality of user events. The system further categorizes the work practice data into a plurality of domains based on types of the user events, models user behaviors within a respective domain based on work practice data associated with the respective domain, and identifies at least one anomalous user based on modeled user behaviors from the multiple domains. | 08-20-2015 |
20150286783 | PEER GROUP DISCOVERY FOR ANOMALY DETECTION - One embodiment of the present invention provides a system for detecting anomalies. During operation, the system extracts from a data set of entities features which provide meaningful information about the entities. The system identifies a peer group for the entities in the data set based on auxiliary information which comprises information that is distinct from the extracted features. In order to determine the anomalies, the system compares the extracted features of an entity in the peer group against the extracted features of other entities in the corresponding peer group, where significant differences in results of the comparison are indicative of anomalies. | 10-08-2015 |
Patent application number | Description | Published |
20120307122 | LOW COMMON MODE DRIVER - Techniques to provide a replica bias circuit for a high speed and low voltage common mode driver. In an embodiment, a pre-driver is coupled to provide driver input voltages to the driver, which driver includes a set of circuit elements coupled to provide, based on the driver input voltages, an output signal of a differential output. In another embodiment, a regulator circuit is coupled to provide regulated power to the pre-driver and driver, where the regulator circuit includes a scale replica circuit having a replica of the first set of circuit elements. | 12-06-2012 |
20140132592 | METHOD, APPARATUS AND SYSTEM FOR PROVIDING PRE-EMPHASIS IN A SIGNAL - A transmitter for generating a differential signal pair including a pre-emphasis component. In an embodiment, the transmitter comprises pre-driver circuitry including an input to receive a single-ended data signal. The differential transmitter further comprises a load circuit coupled between the input and a node coupled to an output of the pre-driver circuitry which corresponds to a constituent signal of the differential signal pair. In another embodiment, the load circuit is configurable to provide a signal path between the input and the node. A configuration of the load circuit allows for a type of pre-emphasis to be included in the constituent signal. | 05-15-2014 |
20150192949 | Digital Calibration-Based Skew Cancellation for Long-Reach MIPI D-PHY Serial Links - A Mobile Industry Processor Interface (MIPI) physical layer (D-PHY) serial communication link and a method of reducing clock-data skew in a MIPI D-PHY serial communication link include apparatus including a clock transmitting circuit for transmitting a clock signal on a first lane of the MIPI D-PHY serial link, a data transmitting circuit for transmitting a data signal on a second lane of the MIPI D-PHY serial link, a clock receiving circuit for receiving the clock signal on the first lane of the MIPI D-PHY serial link, and a data receiving circuit for receiving the data signal on the second lane of the MIPI D-PHY serial link. The clock transmitting circuit and the data transmitting circuit transmit the clock signal and the data signal in phase during a calibration mode and out of phase during a normal operation mode. | 07-09-2015 |