Kikutani, JP
Hideki Kikutani, Tokyo JP
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20160090235 | ORE SUPPLY APPARATUS AND ORE SUPPLY METHOD - The present invention provides an ore supply apparatus and an ore supply method which are capable of securing a stable ore-supply amount. The ore supply apparatus according to the present invention includes a storage unit | 03-31-2016 |
20160090236 | ORE SUPPLY APPARATUS AND ORE SUPPLY METHOD - The present invention provides an ore supply apparatus and an ore supply method which are capable of securing a stable ore-supply amount. The ore supply apparatus | 03-31-2016 |
Hitoshi Kikutani, Suita Osaka JP
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20080317766 | Costimulatory Molecules and Uses Thereof - The invention relates to a novel costimulatory pathway mediated by a member of the semaphorin protein family, Sema4A, which is selectively expressed on the surface of dendritic cells. In addition, the invention relates to the use of Sema4A protein and protein derivatives in a method for the identification of immunomodulatory substances and to therapeutic applications making use thereof. | 12-25-2008 |
Keisuke Kikutani, Yokkaichi-Shi JP
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20130237050 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - According to one embodiment, a method of manufacturing a semiconductor device, includes forming first layer on first and second regions in substrate, first layer having first width in first region and having larger dimension than first width in second region, forming first sidewall on first layer, forming second layer covering first sidewall in the second region and forming third layer having second width smaller than first width on the side face of first sidewall having second width after removing first layer, forming second and third sidewalls having second width so that second and third sidewalls is adjacent to first sidewall across third layer by second width in first region and across second and third layers by second interval larger than second width in the second region. | 09-12-2013 |
20130237051 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - According to one embodiment, a method of manufacturing a device, includes forming a first core including a line portion extending between first and second regions and having a first width and a fringe having a dimension larger than the first width, forming a mask on the fringe and on a first sidewall on the first core, removing the first core so that a remaining portion having a dimension larger than the first width is formed below the mask, forming a second sidewall on a pattern corresponding the first sidewall and the remaining portion, the second sidewall having a second width less than the first width and facing a first interval less than the first width in the first region and facing a second interval larger than the first interval in the second region. | 09-12-2013 |
Keisuke Kikutani, Fujisawa-Shi JP
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20100304568 | PATTERN FORMING METHOD - A pattern forming method includes forming a first photoresist on an underlying region, forming a second photoresist on the first photoresist, the second photoresist having an exposure sensitivity which is different from an exposure sensitivity of the first photoresist, radiating exposure light on the first and second photoresists via a photomask including a first transmissive region and a second transmissive region which cause a phase difference of 180° between transmissive light components passing therethrough, the first transmissive region and the second transmissive region being provided in a manner to neighbor in an irradiation region, and developing the first and second photoresists which have been irradiated with the exposure light, thereby forming a structure includes a first region where the underlying region is exposed, a second region where the first photoresist is exposed and a third region where the first photoresist and the second photoresist are left. | 12-02-2010 |
20120228263 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - In one embodiment, a substrate processing apparatus, includes: a chamber; a first electrode disposed in the chamber; a second electrode disposed in the chamber to face the first electrode, and to hold a substrate; an RF power supply to apply an RF voltage with a frequency of 50 MHz or more to the second electrode; and a pulse power supply to repeatedly apply a voltage waveform including a negative voltage pulse and a positive voltage pulse of which delay time from the negative voltage pulse is 50 nano-seconds or less to the second electrode while superposing on the RF voltage. | 09-13-2012 |
Keisuke Kikutani, Kanagawa JP
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20090163030 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A first silicon containing film, an organic material film, a second silicon containing film are formed. The second silicon containing film is patterned to have a narrow width pattern and a wide width pattern. The organic material film is patterned to have a narrow width pattern and a wide width pattern. A side wall is formed on a side surface of the second silicon containing film and the organic material film by coating with a third silicon containing film. The narrow width pattern of the second silicon containing film is removed by using a mask that covers the second silicon containing film patterned to have a wide width pattern and the side wall. Finally, the organic material film is removed. | 06-25-2009 |
20090221147 | METHOD OF FABRICATING SEMICONDUCTOR DEVICE - A method of fabricating a semiconductor device according to an embodiment includes: forming a core material on a workpiece material; forming a cover film to cover the upper and side surfaces of the core material; after forming the cover film, removing the core material; after removing the core material, removing the cover film while leaving portions thereof located on the side surfaces of the core material, so as to form sidewall spacer masks; and etching the workpiece material by using the sidewall spacer masks as a mask. | 09-03-2009 |
20090305166 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device according to one embodiment, includes: forming a first mask material film on a workpiece film formed on a semiconductor substrate; forming a resist pattern on the first mask material film; forming a second mask material film having a desired film thickness on the first mask material film so as to cover the resist pattern; carrying out etchback of the second mask material film so as to expose the resist pattern and the first mask material film; processing the resist pattern and the first mask material film simultaneously which are exposed, while leaving the second mask material film of which etchback is carried out; and processing the workpiece film which exposes under the first mask material film. | 12-10-2009 |
Keisuke Kikutani, Mie JP
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20110117745 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A method of manufacturing a semiconductor device according to an embodiment includes processing a second film | 05-19-2011 |
Keisuke Kikutani, Yokkaichi JP
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20150262832 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - In accordance with an embodiment, a manufacturing method of a semiconductor device includes manufacturing a mask pattern and forming an interconnection using the mask pattern. The manufacturing the mask pattern includes forming a first pattern of a first material, depositing a second material over the first pattern, forming a first sidewall film on sidewalls of the first pattern by a first etchback, depositing a third material over the first sidewall film, forming a second sidewall film on sidewalls of the first sidewall film by a second etchback, adjusting the first pattern and second sidewall film so as to have the same height, and selectively removing the first sidewall film. The first pattern has a line width of a first width equal to the thicknesses of the first and second sidewall films. The mask pattern includes a line-and-space having a line width and a space equal to the first width, respectively. | 09-17-2015 |
20160071739 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A semiconductor device manufacturing method includes performing reactive ion etching of the film containing a metal disposed on the bottom of the first groove and the film containing a metal disposed on the bottom of the second groove under a same condition in a state where the substrate is heated to the target temperature. | 03-10-2016 |
Shinya Kikutani, Osaka JP
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20090080943 | DEVELOPING DEVICE AND IMAGE FORMING APPARATUS - A developing device includes a rotator that rotates around a shaft, and a bearing element that supports the shaft to a housing. A sliding element formed of a composite material that contains self-lubricating thermoplastic olefin resin as a base material is used as the bearing element. The sliding element formed of the composite material has at least a ratio of numerical values of “Rockwell hardness”/“bending elastic modulus” in a range from 25 to 45, and provides a sliding surface of which a frictional coefficient is lower than that of the sliding element formed of the base material. | 03-26-2009 |
Shinya Kikutani, Shiga JP
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20130313774 | SLIDING MEMBER FOR SHEET-SHAPED RECORDING MATERIAL DETACHMENT, SEAL RING FOR AUTOMOBILE, AND SEAL RING AND SLIDING MEMBER FOR INDUSTRIAL GAS COMPRESSOR - An objective of the present invention is to provide a sliding member for sheet-shaped recording material detachment having superior resistance to abrasion and superior heat resistant rigidity, and either a seal ring for an automobile or a seal ring or a sliding member for an industrial gas compressor, having high mechanical strength while ensuring flexibility. The objective is achieved with a sliding member for sheet-shaped recording material detachment, and either a seal ring for an automobile or a seal ring or a sliding member for an industrial gas compressor, made from a resin composite comprising: as a first element, either an adhesive fluorocarbon resin (A) or a resin compound of the resin (A) and a fluorocarbon resin (B) which differs from the resin (A), which are in a volumetric ratio (AB) of 5/95 to 99/1; and as a second element, 0.5 to 99 volume % of a thermoplastic polyimide (C). | 11-28-2013 |
Takashi Kikutani, Ama-Gun JP
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20090283074 | FUEL SUPPLY APPARATUS - An ECU reduces a fuel flow rate discharged from an electric pump to the filter when a fuel temperature and a fuel pressure in the filter detected by a sensor portion drop. Since a mechanical pump continues to be driven without respect to the fuel quantity discharged from the electric pumps when the fuel flow rate discharged from the electric pump is decreased, a suction pressure is generated at an inlet of the filter. The fuel in a recirculation passage is introduced into the filter through a branch passage. As the result, relatively high temperature fuel is introduced into the filter to melt a solidified fuel causing a clogging of the filter. | 11-19-2009 |
20120303204 | FUEL FILTER DIAGNOSTIC SYSTEM AND FILTER CARTRIDGE - An electronic tag is attached to a filter cartridge, which includes a filter. The electronic tag stores individual product information of the filter and wirelessly transmits the individual product information. A wireless receiver device is installed to a predetermined location of a vehicle, which is other than the filter cartridge and receives the individual product information transmitted from the electronic tag. A diagnostic device diagnoses whether the individual product information is received by the wireless receiver device or whether the filter cartridge installed in the vehicle has a desired filtering performance based on contents of the individual product information received by the wireless receiver device. | 11-29-2012 |
Takashi Kikutani, Osaka-Shi JP
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20110243591 | IMAGE FORMING APPARATUS - Provided is an image forming apparatus in which one of developing units that respectively contain visible toners of black, yellow, magenta, and cyan other than the developing unit that contains the visible toner of black is replaced by a developing unit that contains a transparent fluorescent toner. Consequently, a document image can be expressed by the visible toner of black and a designated color which falls within a color reproduction range determined by two of the visible toners of yellow, magenta, and cyan, and an additional pattern which is an additional information image for preventing falsification and forgery can be printed on the document image with the use of the transparent fluorescent toner. | 10-06-2011 |
Takashi Kikutani, Osaka JP
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20090279146 | IMAGE READING DEVICE AND IMAGE FORMING APPARATUS - An image reading device includes an image reading section, a frame, and an operating unit. The image reading section is configured to obtain image data by reading an image carried on a document. The frame supports the image reading section. The operating unit has an operating section including a plurality of input keys adapted to receive an input operation for controlling the image reading section, and an operating unit body supporting the operating section for displacement between a drawn-out position in which the input keys are exposed to outside and a housed position in which the input keys are housed inside. The operating unit is supported by the frame. | 11-12-2009 |
20090323130 | IMAGE PROCESSING DEVICE - An image processing device includes a processing section, a load section, an operating section, and a display unit. The processing section performs processing upon sheets of a recording medium. The operating section includes input keys which receive input operation for controlling the processing section, and is disposed over the load section. The display unit displays information corresponding to input operation from the operating section. And the operating section can be freely shifted between a pulled out position in which its input keys are exposed to the exterior, and a storage position in which it is stored internally, and, in the storage position, is disposed below the display unit. | 12-31-2009 |
Takemi Kikutani, Shiga JP
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20100155666 | PHOSPHOR COMPOSITE MATERIAL AND PHOSPHOR COMPOSITE MEMBER - Disclosed is a phosphor composite material which can be fired at low temperatures and enables to obtain a phosphor composite member which is excellent in weather resistance and reduced in deterioration after long use. Also disclosed is a phosphor composite member obtained by firing such a phosphor composite material. Specifically disclosed is a phosphor composite material composed of a glass powder and a phosphor powder, which is characterized in that the glass powder is composed of SnO—P | 06-24-2010 |
20110126976 | SEALING GLASS - A sealing glass of the present invention is a sealing glass for vacuum sealing an exhaust opening provided in a metal-made vacuum double container, wherein the sealing glass is used in a metal-made vacuum double container having a structure that the sealing glass is placed in a position excepting a position right over the exhaust opening in a vacuum sealing process, the sealing glass is substantially free of a Pb component, and the sealing glass produces a total amount of gases of 900 to 7000 μL/cm | 06-02-2011 |
Takemi Kikutani, Otsu-City JP
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20120138855 | ILLUMINATING DEVICE AND PHOSPHOR COMPOSITE MATERIAL - Disclosed is a phosphor composite material which can be fired at low temperatures and enables to obtain a phosphor composite member which is excellent in weather resistance and reduced in deterioration after long use. Also disclosed is a phosphor composite member obtained by firing such a phosphor composite material. Specifically disclosed is a phosphor composite material composed of a glass powder and a phosphor powder, which is characterized in that the glass powder is composed of SnO—P | 06-07-2012 |
Takemi Kikutani, Otsu-Shi JP
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20130305786 | SEALING GLASS - A sealing glass of the present invention is a sealing glass for vacuum sealing an exhaust opening provided in a metal-made vacuum double container, wherein the sealing glass is used in a metal-made vacuum double container having a structure that the sealing glass is placed in a position excepting a position right over the exhaust opening in a vacuum sealing process, the sealing glass is substantially free of a Pb component, and the sealing glass produces a total amount of gases of 900 to 7000 μL/cm | 11-21-2013 |
Takeshi Kikutani, Tokyo JP
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20090111950 | Polyester high-strength fiber - An object of the present invention is to provide a high-strength polyester fiber suitable for industrial materials, in particular, for a tire cord. | 04-30-2009 |
Yoshikuni Kikutani, Kanagawa JP
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20100247429 | MICROCHIP, MICROCHIP DEVICE AND EVAPORATION METHOD USING MICROCHIP - Provided is a microchip capable of integrating liquid evaporation as an operation on the microchip. In the microchip | 09-30-2010 |