Harju
David A. Harju, Franklin, TN US
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20090111046 | Direct laser and ultraviolet lithography of porous silicon photonic crystal devices - We have developed a simple method to locally change the optical properties of porous silicon multilayers and photonic crystal architectures. This technique allows for the direct photolithography of porous silicon multilayers, heterostructures, and photonic crystals. The procedure controls the local oxidation within the porous silicon layers via ultraviolet radiation or via high intensity laser beam (λ=532.8 nm) exposure. Subsequently, immersion of the non-irradiated and irradiated regions of the porous silicon heterostructures within an alcohol solvent (for example, methanol and ethanol) induces either a marked degradation or no degradation, respectively, in the optical properties of the material. This direct, optical lithographic technique may have significant use in the production of silicon-based optical and opto-electronic devices for laser, optical computation, telecommunications, and other applications. Potential devices include patternable porous silicon waveguides, optical filter, optical switches, and photonic band-gap structures. | 04-30-2009 |
Lasse Harju, Germering DE
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20160134381 | Method and Apparatus for Powering a Portable Device - A method of monitoring a process of powering a portable device through a cable connected between a power supply and said portable device is proposed, the method comprising applying a time-dependent current variation to one end of the cable in accordance with a spreading sequence, detecting a time-dependent voltage variation at the one end of the cable, the time dependent voltage variation resulting from said applying of the time-dependent current variation, and determining a quantity indicative of an impedance of the cable assembly based on the time-dependent voltage variation and the spreading sequence. Further, an apparatus for monitoring a process of powering a portable device through a cable connected between a power supply and said portable device is proposed. | 05-12-2016 |
Michael E. Harju, Dorr, MI US
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20130029059 | UNIVERSAL OPTICAL FIBER RECOAT APPARATUS AND METHODS - In some embodiments, an apparatus includes a formation member that defines a passageway configured to receive therein at least a portion of an optical fiber that includes a stripped portion to be recoated. The passageway defines at least in part a recoat cross-sectional width of the stripped portion of the optical fiber to be recoated. A nozzle is coupled to the formation member and configured to dispense a recoat material into the passageway when the nozzle is moved relative to the stripped portion of the optical fiber when the stripped portion of the optical fiber is disposed at least partially within the passageway such that the recoat material is dispensed on and surrounds the stripped portion of the optical fiber. In some embodiments, the apparatus includes a controller that can control the flow rate of the recoat material dispensed by the nozzle. | 01-31-2013 |
20130205835 | OPTICAL ELEMENT CLEAVER AND SPLICER APPARATUS AND METHODS - Apparatus and methods are described herein for cleaving an optical element at a defined distance from a splice (or other reference point/feature) of the optical element within a desired precision and/or accuracy. In some embodiments, a method includes receiving an indication of a location of a feature in an intermediate optical assembly visible within an image of the intermediate optical assembly. The feature can be for example, a splice. A position of the intermediate optical assembly is translated relative to a cleave unit based on the indication. After translating, the intermediate optical assembly, the intermediate optical assembly is cleaved to form an optical assembly that has an end face at a location disposed at a non-zero distance from the location of the feature. In some embodiments, the location of the feature can be determined with an image recognition system. | 08-15-2013 |
Rey P. Harju, San Clemente, CA US
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20150028209 | Refrigerant Gas Leak Detector - An infrared leak detector for detecting gas leaks in a pressurized gas source includes a housing that contains a sampling chamber, an infrared emitter for emitting IR energy, a filter that allows IR energy in the range of approximately 7 to approximately 14 microns to pass therethrough, a sensor that detects IR energy that has passed through the single filter to detect the presence of selected gas constituents in the gas sample, and a pump arranged to force a gas sample from a suspected gas leak that emanates from the pressurized gas source though the sampling chamber. | 01-29-2015 |