Patent application number | Description | Published |
20100136446 | STOP METHOD FOR FUEL CELL SYSTEM - A stop method for a fuel cell system that includes a fuel cell unit in which hydrogen is supplied to an anode, and air is supplied to a cathode so as to generate electrical power via an electrochemical reaction. The stop method includes the steps of stopping supply of hydrogen to the anode, and supplying air to the anode so as to discharge water remaining at the anode. | 06-03-2010 |
20120077102 | METHOD OF SHUTTING DOWN FUEL CELL SYSTEM - A method of shutting down a fuel cell system includes a first step of supplying hydrogen gas and air to a fuel cell stack to thereby cause the fuel cell stack to generate electricity, and a second step of stopping supply of the hydrogen gas, and then supplying air to the fuel cell stack so as to cause the fuel cell stack to generate electricity upon detection of a command to shut down the fuel cell stack. In the second step, when the pressure of the hydrogen gas is lowered to a preset lower-limit value based on an anode pressure, which actually is measured, the fuel cell stack is caused to stop generating electricity. | 03-29-2012 |
20120296505 | FUEL CELL VEHICLE - A FC vehicle includes a long distance hill climbing detector for detecting long distance hill climbing and a controller for, in the case where the long distance hill climbing detector detects the long distance hill climbing, controlling the allocation amount of electric power outputted from an FC such that the allocation amount is larger than the allocation amount before the detection of the long distance hill climbing. | 11-22-2012 |
Patent application number | Description | Published |
20090109439 | MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A measurement apparatus which measures a transmittance distribution of an optical system, comprises a light source, a first spherical mirror which forms reference light by reflecting light which is emitted by the light source and is not transmitted through the optical system, a second spherical mirror which forms test light by reflecting light which is emitted by the light source and is transmitted through the optical system, a measurement unit which measures intensity distributions of the reference light and the test light, a unit which calculates reflectance distributions of the first spherical mirror and the second spherical mirror, and an arithmetic unit which calculates a transmittance distribution on a pupil plane of the optical system, on the basis of the intensity distributions of the reference light and the test light, and the reflectance distributions of the first spherical mirror and the second spherical mirror. | 04-30-2009 |
20090207400 | EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD - The present invention provides an exposure apparatus including a measuring unit which includes an imaging optical system configured to guide light having propagated through a projection optical system to an image sensor, and is configured to measure the overall birefringence of the imaging optical system and the projection optical system, a calibration unit which is set on a side of an object plane of the projection optical system in order to measure a birefringence of the imaging optical system, and is configured to reflect the light from the measuring unit back to the measuring unit without using the projection optical system, and a calculation unit configured to isolate, from the result of measuring the overall birefringence, the birefringence of the imaging optical system measured by the measuring unit, thereby calculating the birefringence of the projection optical system. | 08-20-2009 |
Patent application number | Description | Published |
20090110264 | POSITION DETECTOR, POSITION DETECTION METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - A position detector, which detects the position of a mark formed on a substrate (W), comprises a creating unit ( | 04-30-2009 |
20090219533 | EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - An exposure method comprises: a first detection step of detecting a position of a first mark by a first scope; a second detection step of detecting a position of a second mark by a second scope having a magnification higher than the first scope; a first calculation step of calculating a first correction value based on the detection results obtained in the first and second detection steps; a third detection step of detecting a position of a third mark by the second scope after the substrate is aligned based on the first correction value calculated in the first calculation step; a second calculation step of calculating a second correction value based on the detection results obtained in the second and third detection steps; and an exposure step of exposing the substrate after the substrate is aligned based on the second correction value calculated in the second calculation step. | 09-03-2009 |
20100302414 | APPARATUS AND METHOD OF PROCESSING SUBSTRATE CONTAINING MARK AND METHOD OF MANUFACTURING DEVICE - An apparatus which processes a substrate including a mark to be detected for positioning the substrate, comprises an illuminator configured to illuminate the mark, the illuminator including a shutter which opens and closes an optical path thereof, an image pickup device configured to pick up an image of the mark illuminated by the illuminator, and a storage configured to store correction data for correcting an output of the image pickup device with respect to each of a plurality of illumination periods that depend on operations of the shutter. The apparatus is configured to obtain the correction data from the storage in accordance with the illumination period, and to correct the output of the image pickup device using the obtained correction data. | 12-02-2010 |
20110074064 | IMPRINT APPARATUS AND PRODUCT MANUFACTURING METHOD - An imprint apparatus forms patterns in a plurality of shot regions on a substrate by repeating an imprint cycle in which a pattern is formed in one shot region on the substrate by curing a resin while an original and the resin are in contact with each other. The apparatus comprises a detector configured to detect a mark formed on the substrate, and a controller configured to execute overlay measurement, in which the controller causes the detector to detect the mark, and obtains an overlay error that is a shift between a pattern formed on a given layer on the substrate and a pattern newly formed on a layer on or above the given layer, between successive imprint cycles. | 03-31-2011 |
20130056903 | IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an imprint apparatus which performs an imprint process in which an imprint material on a substrate is molded with a mold to form a pattern on the substrate, the apparatus including a controller configured to control the imprint process to form a predetermined layer on the substrate with a target layer, which is formed on the substrate, used as an alignment reference, wherein the controller is configured to select a mold from a plurality of molds prepared for the predetermined layer, such that an overlay error between the target layer and the predetermined layer falls within a tolerance. | 03-07-2013 |
20130148123 | EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE - An exposure method comprises: a first detection step of detecting a position of a first mark by a first scope; a second detection step of detecting a position of a second mark by a second scope having a magnification higher than the first scope; a first calculation step of calculating a first correction value based on the detection results obtained in the first and second detection steps; a third detection step of detecting a position of a third mark by the second scope after the substrate is aligned based on the first correction value calculated in the first calculation step; a second calculation step or calculating a second correction value based on the detection results obtained in the second and third detection steps; and an exposure step of exposing the substrate after the substrate is aligned based on the second correction value calculated in the second calculation step. | 06-13-2013 |
20150013559 | IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD - The imprint method includes changing the position of a detector that detects an alignment mark formed on a shot on a substrate; bringing a pattern formed on a mold into contact with an imprint material supplied on the shot on the substrate; and detecting the alignment mark using the detector after completion of the change in the position of the detector. Here, the contacting is started prior to completion of the change in the position of the detector. | 01-15-2015 |