Patent application number | Description | Published |
20080302652 | Particle Reduction Through Gas and Plasma Source Control - A system for producing excited gases for introduction to a semiconductor processing chamber. The system includes a plasma source for generating a plasma. The plasma source includes a plasma chamber and a gas inlet for receiving process gases from a gas source. A gas flow rate controller is coupled to the gas inlet for controlling an inlet flow rate of the process gases from the gas source to the plasma chamber via the gas inlet. The system includes a control loop for detecting a transition from a first process gas to a second process gas and for adjusting the inlet flow rate of the second process gas from about 0 sccm to about 10,000 sccm over a period of time greater than about 300 milliseconds to maintain transient heat flux loads applied by the plasma to an inner surface of the plasma chamber below a vaporization temperature of the plasma chamber. | 12-11-2008 |
20090320677 | PARTICLE TRAP FOR A PLASMA SOURCE - A particle trap for a remote plasma source includes a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet. The particle trap for a remote plasma source also includes a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet. The gas channel can define a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall. A coolant member can be in thermal communication with the gas channel. | 12-31-2009 |
20100206847 | Toroidal plasma chamber for high gas flow rate process - A plasma chamber for activating a process gas, including at least four legs forming a toroidal plasma channel, each leg having a cross-sectional area, and an outlet formed on one leg, the outlet having a greater cross-sectional area than the cross-sectional area of the other legs. The plasma chamber further includes an inlet for receiving the process gas and a plenum for introducing the process gas over a broad area of the leg opposing the outlet to reduce localized high plasma impedance and gas flow instability, wherein the leg opposing the outlet defines a plurality of holes for providing a helical gas rotation in the plasma channel. | 08-19-2010 |
20100219757 | Method and Apparatus of Providing Power to Ignite and Sustain a Plasma in a Reactive Gas Generator - Described are methods and apparatuses, including computer program products, for igniting and/or sustaining a plasma in a reactive gas generator. Power is provided from an ignition power supply to a plasma ignition circuit. A pre-ignition signal of the plasma ignition circuit is measured. The power provided to the plasma ignition circuit is adjusted based on the measured pre-ignition signal and an adjustable pre-ignition control signal. The adjustable pre-ignition control signal is adjusted after a period of time has elapsed. | 09-02-2010 |
20110005922 | Methods and Apparatus for Protecting Plasma Chamber Surfaces - A method for creating a protective layer over a surface of an object comprising aluminum and magnesium for use in a semiconductor processing system, which includes oxidizing the surface of the object using a plasma electrolytic oxidation process. The method also includes generating a halogen-comprising plasma by exciting a gas comprising a halogen. The method also includes exposing the oxidized surface to the halogen-comprising plasma or excited gas. | 01-13-2011 |
20120031876 | SYSTEMS, METHODS AND APPARATUS FOR SEPARATE PLASMA SOURCE CONTROL - A plasma source includes multiple ring plasma chambers, multiple primary windings, multiple ferrites and a control system. Each one of the primary windings is wrapped around an exterior one of the ring plasma chambers. Each one of the plurality of the ring plasma chamber passes through a respective portion of the plurality of ferrites. The control system is coupled to each of the ring plasma chambers. A system and method for generating and using a plasma are also described. | 02-09-2012 |
20120034394 | DISTRIBUTED MULTI-ZONE PLASMA SOURCE SYSTEMS, METHODS AND APPARATUS - A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described. | 02-09-2012 |
20120035766 | SYSTEMS, METHODS AND APPARATUS FOR CHOKED FLOW ELEMENT EXTRACTION - A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber, multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites and multiple plasma chamber outlets coupling the plasma chamber to a process chamber. Each one of the plasma chamber outlets having a respective plasma restriction. A system and method for generating a plasma are also described. | 02-09-2012 |
20130025788 | Distributed, Non-Concentric Multi-Zone Plasma Source Systems, Methods and Apparatus - A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described. | 01-31-2013 |
20140096908 | DISTRIBUTED MULTI-ZONE PLASMA SOURCE SYSTEMS, METHODS AND APPARATUS - A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described. | 04-10-2014 |
Patent application number | Description | Published |
20080215001 | Needle Shroud Assembly - A needle shroud assembly for a syringe holder comprises a barrel ( | 09-04-2008 |
20080269691 | Needle Shroud Assembly - A needle shroud assembly ( | 10-30-2008 |
20110092905 | INJECTOR APPARATUS - An injector apparatus comprises a housing ( | 04-21-2011 |
20130046249 | INJECTOR APPARATUS HAVING A CLUTCH TO INHIBIT FORWARD MOVEMENT OF THE PLUNGER - An injector apparatus includes a housing ( | 02-21-2013 |
20130197442 | INJECTION DEVICES - An injection device includes an elongate housing ( | 08-01-2013 |
20130218128 | AUTOINJECTORS - An autoinjector includes a housing for receiving in use in a generally longitudinal loading direction a syringe assembly including a syringe carrier and a syringe, the syringe including a syringe body having a slideable internal piston for expressing a dose contained in the body through a needle at a forward end thereof; a drive mechanism for providing drive for operation of the autoinjector and being disposed generally within the housing and including a mechanical energy source and a winder element for being rotated to charge the energy source, and an input transmission train operational between the syringe assembly and the winder element in use, whereby loading of the syringe assembly into the housing rotates the winder element to charge the energy source. | 08-22-2013 |
20130281933 | INJECTION DEVICES - An injection device includes an elongate housing ( | 10-24-2013 |
20130317447 | AUTOMATIC INJECTION DEVICE WITH PNEUMATIC DAMPING - An injection device for use with a syringe having a syringe body, a needle coupled thereto, and a plunger moveable through the body to eject medication from the syringe through the needle, includes a housing defining an inner space for holding a syringe and facilitating movement thereof from a first position in which the needle is contained fully within the housing and a second position in which the needle projects from the housing, and a drive member located within the inner space so that in use the drive member can engage the plunger of a syringe held within the housing. The device further includes a force applicator located within the inner space for providing a force to the drive member so as to move the syringe from the first to the second position and thereafter to move the plunger through the syringe body, a trigger mechanism, and a damper. | 11-28-2013 |
20130338601 | INJECTION DEVICES - An injection device includes an injection complete indicator which includes its own bias and which is latched into a retracted position as the injection device is cocked. Upon firing the injection device, the injection complete indicator is kept in its retracted position until towards the end of the forward stroke of the drive mechanism, whereupon the injection complete indicator is unlatched and shoots forwardly under the influence of the bias to impact an abutment to generate an audible/tactile indication along with a visual indication. | 12-19-2013 |
20140236076 | INJECTION DEVICES - An injection device operable to deliver a dose of medicament from a syringe or cartridge includes a temperature-sensitive arrangement for inhibiting operation thereof under predetermined temperature conditions. This may include a thermally responsive element that adopts a position in which operation of the device is inhibited when a temperature level is passed. | 08-21-2014 |