Patent application number | Description | Published |
20090002663 | PROJECTION ILLUMINATION SYSTEM - A projection illumination system with a plurality of optical components ( | 01-01-2009 |
20090097000 | PROJECTION EXPOSURE SYSTEM AND USE THEREOF - A lithography method is proposed employing a projection exposure system having a catoptric imaging optics comprising a mirror formed as phase mask in the imaging beam path, wherein the mirror formed as phase mask exhibits continuous regions having dielectric layers provided thereon. Optionally, the regions of the mirror formed as phase mask are configured such that an axial extension of an image of a point (DOF) of the imaging is increased or/and a lateral extension of an image of a point of the imaging is decreased. Preferably multiple exposures of a same radiation sensitive substrate are performed in order to achieve an increase in resolution and scaling down of the manufacturing trace structures (61, 61′), respectively. | 04-16-2009 |
20090128829 | METHOD AND APPARATUS FOR DETERMINING A DEVIATION OF AN ACTUAL SHAPE FROM A DESIRED SHAPE OF AN OPTICAL SURFACE - A method of determining a deviation of an actual shape from a desired shape of an optical surface ( | 05-21-2009 |
20090231593 | Method of aligning an optical system - A method of manufacturing an optical system having plural optical elements mounted relative to each other on a mounting structure of the optical system comprises disposing the optical system in a beam path of an interferometer apparatus having an interferometer optics and a selectable hologram for shaping a beam of measuring light to be incident on surfaces of the optical elements of the optical system; selecting a first hologram of the interferometer apparatus and recording at least one first interference pattern generated by measuring light reflected from a surface of a first optical element; selecting a second hologram of the interferometer apparatus, wherein the second hologram is different from the first hologram, and recording at least one second interference pattern generated by measuring light reflected from a surface of a second optical element, which is different from the first optical element; and adjusting a position of the first optical element relative to the second optical element on the mounting structure based upon the first interference pattern and the second interference pattern. | 09-17-2009 |
20100020302 | PROJECTION EXPOSURE TOOL FOR MICROLITHOGRAPHY WITH A MEASURING APPARATUS AND METHOD FOR MEASURING AN IRRADIATION STRENGTH DISTRIBUTION - A projection exposure tool ( | 01-28-2010 |
20100177321 | OPTICAL ELEMENT AND METHOD OF CALIBRATING A MEASURING APPARATUS COMPRISING A WAVE SHAPING STRUCTURE - Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm. | 07-15-2010 |
20110013171 | PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT DEVICE - A projection exposure system ( | 01-20-2011 |
20110164232 | OPTICAL IMAGING DEVICE WITH IMAGE DEFECT DETERMINATION - An optical imaging device, in particular for microlithography, including an imaging unit adapted to image an object point on an image point and a measurement device. The imaging unit has a first optical element group having at least one first optical element. The imaging device is adapted to participate in the imaging of the object point on the image point, and the measurement unit is adapted to determine at least one image defect occurring on the image point when the object point is imaged. The measuring device includes at least one measurement light source, one second optical element group and at least one detection unit. The measurement light source transmits at least one measurement light bundle. The second optical element group includes at least one optical reference element and one second optical element, the elements adapted to direct the at least one measurement light bundle to the at least one detection unit, to produce at least one detection signal. The second optical element has a defined spatial relationship with the first optical element. The optical reference element has an at least partially reflecting first optical surface and the second optical element has an at least partially reflecting second optical surface. The measurement device is adapted to determine the at least one image defect using the at least one detection signal. The first optical surface and the second optical surface are positioned relative to one another such that a multiple reflection of the at least one measurement light bundle occurs between them. | 07-07-2011 |
20120127481 | METHOD AND APPARATUS FOR DETERMINING A DEVIATION OF AN ACTUAL SHAPE FROM A DESIRED SHAPE OF AN OPTICAL SURFACE - An optical element having an optical surface ( | 05-24-2012 |
20120140241 | OPTICAL SYSTEM, IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS - An optical system, such as a microlithographic projection exposure apparatus, includes a first optical component, a second optical component, and a measurement arrangement for determining the relative position of the first optical component and the second optical component in six degrees of freedom. The measurement arrangement is adapted to determine the relative position of the first optical component and the second optical component over six different length measurement sections. The length measurement sections extend directly between the first optical component and the second optical component. | 06-07-2012 |
20120229814 | METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE AND INTERFEROMETRIC MEASURING DEVICE - Measuring a shape of an optical surface ( | 09-13-2012 |
20120249985 | MEASUREMENT OF AN IMAGING OPTICAL SYSTEM BY SUPERPOSITION OF PATTERNS - A device for measuring an imaging optical system, including: a first grating pattern ( | 10-04-2012 |
20130105698 | APPARATUS AND METHOD FOR THE LOCALLY RESOLVED MEASUREMENT OF A RADIATION DISTRIBUTION PRODUCED USING A LITHOGRAPHY MASK | 05-02-2013 |
20130188246 | Imaging Optical System for Microlithography - An imaging optical system, in particular a projection objective, for microlithography, includes optical elements to guide electromagnetic radiation with a wavelength in a path to image an object field into an image plane. The imaging optical system includes a pupil, having coordinates (p, q), which, together with the image field, having coordinates (x, y) of the optical system, spans an extended 4-dimensional pupil space, having coordinates (x, y, p, q), as a function of which a wavefront W(x, y, p, q) of the radiation passing through the optical system is defined. The wavefront W can therefore be defined in the pupil plane as a function of an extended 4-dimensional pupil space spanned by the image field (x, y) and the pupil (p, q) as W(x, y, p, q)=W(t), with t=(x, y, p, q). | 07-25-2013 |
20130242278 | Projection objective of a microlithographic projection exposure apparatus designed forEUV and a method of optically adjusting a projection objective - The invention concerns a projection objective of a microlithographic projection exposure apparatus designed for EUV, for imaging an object plane illuminated in operation of the projection exposure apparatus into an image plane, wherein the projection objective has at least one mirror segment arrangement ( | 09-19-2013 |
20130286471 | MIRROR, PROJECTION OBJECTIVE WITH SUCH MIRROR, AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY WITH SUCH PROJECTION OBJECTIVE | 10-31-2013 |
20130334426 | APPARATUS AND METHOD FOR THE LOCALLY RESOLVED MEASUREMENT OF A RADIATION DISTRIBUTION PRODUCED USING A LITHOGRAPHY MASK - A method for locally resolved measurement of a radiation distribution ( | 12-19-2013 |
20140016108 | OPTICAL IMAGING DEVICE WITH IMAGE DEFECT DETERMINATION - An optical imaging device, including an imaging unit and a measuring device. The imaging unit includes a first optical element group having at least one first optical element, which contributes to the imaging. The measuring device determines an imaging error, which occurs during the imaging, using a capturing signal. The measuring device includes a measurement light source, a second optical element group and a capturing unit. The measurement light source emits at least one measurement light bundle, The second optical element group includes an optical reference element and a second optical element, which guide the measurement light bundle onto the capturing unit, to generate the capturing signal. Each second optical element has a defined spatial relationship with a respective one of the first optical elements, The second optical elements differ from the first optical elements. The measuring device determines the imaging error with the capturing signal. | 01-16-2014 |
20140023835 | OPTICAL DEVICE - A device including an imaging optical unit ( | 01-23-2014 |
20140078513 | METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE BASED ON COMPUTATIONALLY COMBINED SURFACE REGION MEASUREMENTS AND INTERFEROMETRIC MEASURING DEVICE - Measuring a shape of an optical surface ( | 03-20-2014 |
20140104587 | PROJECTION ARRANGEMENT - A projection arrangement for imaging lithographic structure information comprises: an optical element, which has at least partly a coating composed of an electrically conductive layer material. The coating comprises a continuous region, which has no elements that shade projection light. In this case, the layer material and/or the optical element change(s) an optical property, in particular a refractive index or an optical path length, depending on a temperature change. At least one mechanism for coupling energy into the layer material is provided, which couples in energy in such a way that the layer material converts coupled-in energy into thermal energy. The layer material may comprise graphene, chromium and/or molybdenum sulfide (MoS2). | 04-17-2014 |
20140118712 | MEASURING SYSTEM - An objective for a projection exposure apparatus includes a metrology stage arranged on the frame of the objective. The objective includes at least one optical component, an objective mount for mounting the optical component, and a positioning device for holding at least one measuring device. The positioning device is connected to the objective mount and has at least one degree of freedom of displacement for displacing the measuring device. | 05-01-2014 |
20150212431 | PROJECTION EXPOSURE SYSTEM FOR MICROLITHOGRAPHY WITH A MEASUREMENT DEVICE - A projection exposure system ( | 07-30-2015 |