Patent application number | Description | Published |
20080214093 | CMP polishing slurry and polishing method - The present invention relates to a CMP polishing slurry, comprising cerium oxide particles, a dispersing agent, a water-soluble polymer and water, wherein the water-soluble polymer is a compound having a skeleton of any one of an N-mono-substituted product and an N,N-di-substituted product of any one selected from the group consisting of acrylamide, methacrylamide and α-substituted products thereof. The amount of the water-soluble polymer is preferably in the range of 0.01 part or more by weight and 10 parts or less by weight for 100 parts by weight of the polishing slurry. Thus it is possible to provide a polishing slurry and a polishing method which make it possible to polish a film made of silicon oxide or the like effectively and rapidly and further control the process therefor easily in CMP technique for flattening an interlayer insulating film, a BPSG film, an insulator film for shallow trench isolation, and other films. | 09-04-2008 |
20080254717 | Cmp Polishing Slurry and Method of Polishing Substrate - A CMP polishing slurry of the present invention contains cerium oxide particles, water, and a polymer of at least one of a methacrylic acid and the salt thereof, and/or a polymer of at least one of a methacrylic acid and the salt thereof and a monomer having an unsaturated double bond, preferably contains furthermore a dispersant or a polymer of monomers containing at least one of an acrylic acid and the salt thereof. The present invention provides a CMP polishing slurry and a polishing method that, after polishing, give a polished film having a smaller difference in residual film thickness due to a pattern density difference. | 10-16-2008 |
20110104992 | POLISHING SOLUTION FOR METAL FILMS AND POLISHING METHOD USING THE SAME - A polishing solution for metal films that comprises an oxidizing agent, a metal oxide solubilizer, a metal corrosion preventing agent, a water-soluble polymer and water, wherein the water-soluble polymer is a copolymer of acrylic acid and methacrylic acid, the copolymerization ratio of methacrylic acid in the copolymer being 1-20 mol % based on the total of acrylic acid and methacrylic acid. | 05-05-2011 |
20140370707 | POLISHING LIQUID FOR METAL AND POLISHING METHOD - The present invention relates to a metal polishing liquid for polishing at least a part of metal in a substrate having the metal, comprising, component A: a metal solubilizer containing amino acids, component B: compounds having the benzotriazole skeleton, and component C: an acrylic acid polymer having the weight average molecular weight of 10,000 or more, and having the mass ratio between the component B and the component C, (component B:component C), to be 1:1 to 1:5. Use of the metal polishing liquid can simultaneously yield high polishing rates and low etching rates at higher level, enabling to form an embedded pattern with higher reliability. | 12-18-2014 |
Patent application number | Description | Published |
20090124648 | Synthesis and Crystalline Forms of Npy5 Antagonist - The present invention relates to a process for producing crystalline trans-N-[1-(2-fluorophenyl)-S-pyrazoly]-3-ox-ospiro[6-azaisobenzofuran-1(3H),1′-cyclohexane]-4′-carboxamide and novel salts, hydrates and polymorphs thereof. | 05-14-2009 |
20090137587 | Phenylpyridone Derivative - A compound represented by the formula (I) is contained as an active ingredient: | 05-28-2009 |
20090264426 | Bicyclic aromatic substituted pyridone derivative - Disclosed is a compound represented by the formula (I): | 10-22-2009 |
20100216758 | Pyridone Compounds - An active ingredient is a compound represented by the general formula [I]: | 08-26-2010 |
20120029041 | 2-ARYL IMIDAZOLINE DERIVATIVES - 2-Aryl imidazoline derivatives are provided that are useful as anti-obesity agents or the like. A compound represented by Formula (I) or a pharmaceutically acceptable salt thereof: wherein R | 02-02-2012 |
20120035155 | INDOLE-2-CARBOXAMIDE DEIVATIVE - To provide an indole compound having a human QRFP receptor antagonistic activity and useful as a preventive or a remedy for various disorders. A compound of a formula (I) or a pharmaceutically-acceptable salt thereof is provided: [wherein, R | 02-09-2012 |