Patent application number | Description | Published |
20090085008 | Cellulose compound composition and cellulose compound film - A cellulose compound composition, containing at least one compound of formula (1): | 04-02-2009 |
20090233009 | COMPOUND, COMPOSITION, RETARDATION PLATE, ELLIPTICALLY-POLARIZING PLATE AND LIQUID-CRYSTAL DISPLAY DEVICE - A compound useful for fabrication of retardation plates, which is represented by the formula (DI): | 09-17-2009 |
20090233189 | DEVICE AND METHOD FOR OBTAINING EXPOSURE CORRECTION INFORMATION, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - A method of obtaining exposure correction information includes adjusting intensity of light incident on a photomask so that intensity of light output from the photomask has a desired distribution, and includes obtaining the exposure correction information as a distribution of the adjusted intensity of light incident on the photomask. | 09-17-2009 |
20090233193 | PATTERN PREDICTION METHOD, PATTERN CORRECTION METHOD, METHOD OF FABRICATING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM - A pattern prediction method according to an embodiment includes: predicting a second pattern shape from a first pattern shape by using a conversion function and a conversion difference residual error amount function, wherein; the conversion function makes the connection between the first pattern formed by a first step and the second pattern formed by a second step following the first step based on contour shapes of the first pattern and the second pattern, and the conversion difference residual error amount function makes the connection between a residual error amount between a predicted shape of the second pattern obtained from the conversion function and the second pattern shape obtained by actually using the second step, and factors other than the contour shapes of the first pattern and the second pattern. | 09-17-2009 |
20090258417 | Culture Vessel and a Method of Culture - A culture vessel comprising a gas permeable film which has oxygen permeability of P | 10-15-2009 |
20090263605 | SURFACE-HYDROPHILIC STRUCTURE - A structure comprising: an adhesive layer; a plastic substrate; and a hydrophilic coating film, provided in this order, wherein the hydrophilic coating film includes a cross-linked structure produced by hydrolysis and polycondensation with an aqueous solution containing (a) a hydrophilic polymer and (b) an alkoxide of a metal selected from the group consisting of Si, Ti, Zr, and Al. | 10-22-2009 |
20090274914 | HYDROPHILIC MEMBER AND PROCESS FOR PRODUCING THE SAME - A hydrophilic member comprising a substrate and a hydrophilic coating film provided on the substrate, wherein the hydrophilic coating film is produced by coating a substrate with an aqueous solution containing (a) a hydrophilic polymer, (b) an alkoxide of a metal selected from the group consisting of Si, Ti, Zr, and Al, and (c) a metal complex catalyst, and heat-drying the solution applied. | 11-05-2009 |
20090317732 | PATTERN VERIFICATION-TEST METHOD, OPTICAL IMAGE INTENSITY DISTRIBUTION ACQUISITION METHOD, AND COMPUTER PROGRAM - A pattern verification-test method according to an embodiment of the present invention includes: deriving an illumination condition at a verification-test subject position in a photomask surface of a mask pattern as a verification or a test subject based on the verification-test subject position and illumination condition information about a distribution of an illumination condition in a photomask surface of exposure light incident on the mask pattern, performing lithography simulation on the mask pattern based on the derived illumination condition and the mask pattern, and verifying or testing the mask pattern based on a result of the lithography simulation. | 12-24-2009 |
20100008562 | LATENT IMAGE INTENSITY DISTRIBUTION EVALUATION METHOD, METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE AND LATENT IMAGE INTENSITY DISTRIBUTION EVALUATION PROGRAM - A latent image intensity distribution calculating unit calculates a latent image intensity distribution in the thickness direction of a resist film based on an exposure condition and a mask pattern. An evaluated position calculating unit calculates an evaluated position in the thickness direction of the resist film based on the latent image intensity distribution calculated by the latent image intensity distribution calculating unit. A pattern evaluating unit evaluates a characteristic of a pattern formed on the resist film based on latent image intensity at the evaluated position calculated by the evaluated position calculating unit. | 01-14-2010 |
20100035071 | BIOCHEMICAL INSTRUMENT HAVING SURFACE THAT INHIBITS NONSPECIFIC ADSORPTION - An object of the present invention is to provide a biochemical instrument having a surface that can simultaneously inhibit adsorption of a biopolymer and that of a hydrophobic low-molecular-weight compound. The present invention provides a biochemical instrument comprising a region that inhibits adsorption of a hydrophobic low-molecular-weight compound and a region that inhibits adsorption of a biopolymer on the surface of a water-insoluble material. | 02-11-2010 |
20100062530 | CELL CULTURE METHOD, CELL CULTURE SYSTEM AND CULTURE MEDIUM ADJUSTEMENT APPARATUS - In a cell culture in a sealed cell culture container, gradual deterioration of culture environment is prevented. A cell culture method in which cell culture is conducted by adding a fresh culture medium to a culture container in which cells and a culture medium are enclosed, which includes the steps of | 03-11-2010 |
20100067777 | EVALUATION PATTERN GENERATING METHOD, COMPUTER PROGRAM PRODUCT, AND PATTERN VERIFYING METHOD - An evaluation pattern generating method including dividing a peripheral area of an evaluation target pattern into a plurality of meshes; calculating an image intensity of a circuit pattern when the evaluation target pattern is transferred onto a wafer by a lithography process in a case where a mask function value is given to a predetermined mesh; calculating a mask function value of the mesh so that a cost function of the image intensity, in which an optical image characteristic amount that affects a transfer performance of the evaluation target pattern to the wafer is set to the image intensity, satisfies a predetermined reference when evaluating a lithography performance of the evaluation target pattern; and generating an evaluation pattern corresponding to the mask function value. | 03-18-2010 |
20100075406 | CELL CULTURE APPARATUS, CELL CULTURE SYSTEM AND CELL CULTURE METHOD - By maintaining the cell density during culture at an appropriate level and eliminating the procedure of transferring cells from a container to another container when a large amount of cells are cultured, damage on cells can be reduced, risk of contamination can be lowered, labor saving can be attained and automation can be attained. | 03-25-2010 |
20100081294 | PATTERN DATA CREATING METHOD, PATTERN DATA CREATING PROGRAM, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD - A pattern data creating method according to an embodiment of the present invention comprises: extracting marginal error patterns using a first result obtained by applying process simulation to mask pattern data based on an evaluation target cell pattern, applying the process simulation to mask pattern data based on an evaluation target cell pattern with peripheral environment pattern created by arranging a peripheral environment pattern in the marginal error patterns such that a second result obtained by creating mask pattern data and applying the process simulation to the mask pattern data is more deteriorated than the first result, and correcting the evaluation target cell pattern or the mask pattern data based on the evaluation target cell pattern when there is a fatal error. | 04-01-2010 |
20100082144 | METHOD OF CALCULATING PATTERN-FAILURE-OCCURRENCE-REGION, COMPUTER PROGRAM PRODUCT, PATTERN-LAYOUT EVALUATING METHOD, AND SEMICONDUCTOR-DEVICE MANUFACTURING METHOD - Method of calculating pattern-failure-occurrence-region comprising calculating a pattern failure occurrence region using relation information and a layout used for forming a convex section, the relation information being a relation between a distance from a formed pattern in a film to cover the convex section on a substrate to the convex section and a region in the film in which a shape of the formed pattern cannot satisfy a predetermined condition because of influence of the convex section. | 04-01-2010 |
20100159256 | COMPOSITION FOR FORMING HYDROPHIC FIRM, SPRAY COMPOSITION AND HYDROPHILIC MEMBER USING THE SAME - A composition for forming a hydrophilic film, comprising (A) a hydrophilic polymer having a silane coupling group at the terminal or on the side chain of the polymer, the polymer having a specific structure, and (B) a metal complex catalyst; a spray composition; and a hydrophilic member provided with the composition by spray coating. A composition for the formation of a hydrophilic film, ensuring that a hydrophilic coating excellent in durability, antifouling property, water resistance and the like can be easily formed while keeping hydrophilicity and the coating workability is excellent, and a hydrophilic member using the composition are provided. | 06-24-2010 |
20100166289 | FEATURE-QUANTITY EXTRACTING METHOD, DESIGNED-CIRCUIT-PATTERN VERIFYING METHOD, AND COMPUTER PROGRAM PRODUCT - Feature-quantity extraction parameters used by feature-quantity extraction functions for calculating feature quantities used as explanatory variables of a resist model for predicting a resist image are set. The feature-quantity extraction functions, for which the feature-quantity extraction parameters are set, are caused to act on optical images of a pattern of a photomask to calculate feature quantities from the optical images. | 07-01-2010 |
20100196724 | HYDROPHILIC FILM FORMING COMPOSITION AND HYDROPHILIC MEMBER - A hydrophilic film forming composition which is used for forming on the surface of a support of every sort a hydrophilic film provided with anti-fogging properties, abrasion resistance and antibacterial properties and having more favorable antifouling properties is provided. A hydrophilic member having an excellent anti-fogging, abrasion-resistant, antibacterial and antifouling surface provided with a hydrophilic film formed of the instant hydrophilic film forming composition on the surface of an appropriate support is provided. | 08-05-2010 |
20100200207 | HYDROPHILIC COMPOSITION - A hydrophilic composition containing a hydrophilic polymer (A) having two or more hydrolyzable silyl groups per molecule and a catalyst (B), with the surface zeta potential of a coating film obtained by coating and drying the hydrophilic composition being from −15 mV to 10 mV, is provided for the purpose of providing a hydrophilic composition capable of forming a hydrophilic coating film having excellent scratch resistance and antifouling properties without hybridizing with sol-gel. | 08-12-2010 |
20100243221 | HYDROPHILIC COATING COMPOSITION AND HYDROPHILIC MEMBER USING THE SAME - To provide a hydrophilic coating composition excellent in hydrophilicity, wear resistance, transparency, storage stability, antifogging properties, antifouling properties, visible light transmittivity, adhesion properties, chemical resistance, weather resistance, and water resistance and a hydrophilic member using the composition. The hydrophilic coating composition has (A) a ternary copolymer having a1) a repeating unit having a hydrophilic group, a2) a repeating unit having a hydroxyl group, an epoxy group, an isocyanato group, a blocked isocyanato group, a carboxylic acid anhydride group, or an amino group, and a3) a repeating unit having a hydrolyzable silyl group; and (B) a metal complex catalyst, wherein a content of the repeating unit a | 09-30-2010 |
20100261121 | PATTERN FORMING METHOD - To provide a pattern forming method comprising: laminating a resist layer on a substrate; forming a diffraction pattern having an opening opened at a predetermined pitch p for diffracting exposure light on an upper layer side of the resist layer; performing whole image exposure with respect to the diffraction pattern in which a refractive index with respect to the exposure light is n, with diffracted light acquired by irradiation of exposure light having a wavelength λ from above the diffraction pattern, which is then diffracted by the diffraction pattern; and forming a desired pattern on a lower layer side of the resist pattern by using a resist pattern formed by developing the resist layer, wherein the predetermined pitch p, the wavelength λ, and the refractive index n satisfy a condition of p>λ/n. | 10-14-2010 |
20100304279 | MANUFACTURING METHOD OF PHASE SHIFT MASK, CREATING METHOD OF MASK DATA OF PHASE SHIFT MASK, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - A phase shift mask having a plurality of mask patterns or mask data thereof is prepared, and an overlapped focus range in each of the mask patterns in a case where a result of exposure to each of the mask patterns, obtained by an exposure experiment or a lithography simulation, meets a desired dimension is obtained. A digging depth is determined at discretion based on the obtained overlapped focus range. | 12-02-2010 |
20110000658 | HYDROPHILIC MEMBER - A hydrophilic member is provided which comprises a substrate of every kind having formed thereon a surface having excellent antifouling properties, quick-drying properties of water or the like, and wear resistance and being flexible. | 01-06-2011 |
20110029937 | PATTERN EVALUATING METHOD, PATTERN GENERATING METHOD, AND COMPUTER PROGRAM PRODUCT - A pattern evaluating method includes generating a proximity pattern that affects a resolution performance of a circuit pattern around a lithography target pattern of the circuit pattern to be formed on the substrate, generating distribution information on a distribution of an influence degree to the resolution performance of the circuit pattern by using the lithography target pattern, calculating the influence degree to the resolution performance of the circuit pattern by the proximity pattern as a score by comparing the distribution information with the proximity pattern, and evaluating whether the proximity pattern is placed at an appropriate position in accordance with the circuit pattern based on the score. | 02-03-2011 |
20110065028 | PATTERN GENERATING METHOD, MANUFACTURING METHOD OF MASK, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - According to the embodiments, each of a main pattern of a mask to be transferred onto a substrate by using a lithography process, a first assist pattern that improves a resolution of an on-substrate pattern obtained by transferring the main pattern onto the substrate, and a second assist pattern that suppresses a transfer property of the first assist pattern onto the substrate is placed as a mask pattern. | 03-17-2011 |
20110122390 | EXPOSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND EXPOSURE APPARATUS - According to one embodiment, on a substrate, a resist layer is laminated on an upper side of a pattern formation layer on which a desired pattern is formed. A diffraction pattern that diffracts exposure light irradiated on the substrate is formed further on the upper side than the resist layer. Overall exposure is performed from above the diffraction pattern using a deformed light having illumination light source shape determined according to the desired pattern. Diffracted light diffracted on the resist layer. | 05-26-2011 |
20110122461 | IMAGE-FORMING APPARATUS - An image-forming apparatus includes: a memory that stores a plurality of image forming modes; a contact controller that controls a status of contact between a plurality of image-forming units and an intermediate transfer member on the basis of an image forming mode selected from among the plurality of image forming modes, so that an image-forming unit used for image forming represented in the selected image forming mode is contacted with the intermediate transfer member, and another image-forming unit is moved away from the intermediate transfer member; and an image-quality adjusting unit that adjusts, if the status of contact is changed by the contact controller, an image quality of an image that is to be transferred onto the intermediate transfer member from the image-forming unit that is in contact with the intermediate transfer member. | 05-26-2011 |
20110151361 | OPTICAL-IMAGE-INTENSITY CALCULATING METHOD, PATTERN GENERATING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE - According to the embodiment, an optical image intensity distribution to be formed in a resist arranged on a lower layer side of a diffraction pattern is calculated by performing a whole image exposure from an upper surface side of the diffraction pattern formed on a substrate. The optical image intensity distribution is calculated by using a multimode waveguide analysis model or a fractional Fourier transform with respect to the diffraction pattern. | 06-23-2011 |
20110255887 | IMAGE FORMING APPARATUS - An image forming apparatus includes a latent image holder that holds a latent image; a developing unit that contains developer including toner particles and carrier particles, develops a latent image with the toner particles, and forms a toner image; a voltage applying unit that applies a voltage to the developing unit; a toner concentration detection unit that detects a toner concentration that is a proportion of the toner particles to the developer contained in the developing unit; and a setting unit that sets a setting value of the voltage on the basis of the toner concentration detected by the toner concentration detection unit, the voltage being applied by the voltage applying unit to the developing unit, wherein a difference between an upper limit and a lower limit of the set value increases as the toner concentration increases, the set value being set by the setting unit. | 10-20-2011 |
20110260796 | BIAS CIRCUIT, POWER AMPLIFIER, AND CURRENT MIRROR CIRCUIT - There is provided a bias circuit that can operate even at low voltage and control a current reflecting a change in drain voltage. A first current mirror circuit for feeding back a drain terminal current of an FET which receives an output of an operational amplifier at a gate terminal to an input terminal of the operational amplifier and a second current mirror circuit are coupled in parallel. A variable voltage is coupled to the first current mirror circuit, and a fixed voltage is coupled to the second current mirror circuit. Even if the variable voltage becomes lower than the threshold voltage of FETs configuring the first current mirror circuit, the second current mirror circuit feeds back the current to the input terminal of the operational amplifier with reliability. | 10-27-2011 |
20110298545 | RF POWER AMPLIFIER DEVICE AND OPERATING METHOD THEREOF - An RF power amplifier device includes a driver stage amplifier, a first RF amplifier, a second RF amplifier and a DC voltage converter operated by first, second and third external power supply voltages. The output of the driver stage amplifier is supplied to the inputs of the first and second RF amplifiers. An effective device size of the first RF amplifier is set to a device size larger than that of the second RF amplifier. The third external power supply voltage is supplied to the DC voltage converter, so that the DC voltage converter generates a fourth operating power supply voltage corresponding to a low voltage and supplies it to an output terminal of the second RF amplifier. An output terminal of the first RF amplifier can be supplied with the second external power supply voltage without via the DC voltage converter. | 12-08-2011 |
20110318725 | CELL CULTURE METHOD, CELL CULTURE DEVICE, METHOD FOR COUNTING SUBSJECT MATTERS TO BE COUNTED IN CONTAINER AND DEVICE FOR COUNTING - Cell aggregate formation control and cell aggregate disintegration control are carried out with respect to cells in a culture container to increase cell proliferation efficiency. The number of the cells in the culture container is counted without disassembly of a culture system and irrespective of the density of the cells. | 12-29-2011 |
20120070767 | SET OF MASKS, METHOD OF GENERATING MASK DATA AND METHOD FOR FORMING A PATTERN - A method of generating mask data, for a set of masks used to transfer a pattern for delineating a circuit pattern of a semiconductor integrated circuit, includes preparing design data having a design pattern corresponding to the pattern to be transferred on a semiconductor substrate; generating resized data by enlarging the design data by a resizing quantity; generating first mask data by filling a space area having a space width of a space quantity or less of the resized data; and generating second mask data, to be aligned with the first mask data, having a window portion for selectively exposing an area determined by enlarging the space area by the resizing quantity. | 03-22-2012 |
20120081262 | SWITCH CIRCUIT, SEMICONDUCTOR DEVICE, AND PORTABLE WIRELESS DEVICE - A switch circuit with a unit capable of improving a margin voltage without using a negative bias generation circuit is provided. A switch comprising an N-type MOSFET is used for a switch passing a signal to an antenna and a switch comprising a P-type MOSFET is used for a shunt switch grounding a signal. A common control signal is input to the gate terminal of the MOSFET constituting each switch. The inverted signal of this control signal is coupled to a ground terminal of the switch, and thus the potential of the gate terminal of each MOSFET can be set to the ground voltage. | 04-05-2012 |
20120112085 | EXPOSURE AMOUNT EVALUATION METHOD AND PHOTOMASK - According to the exposure amount evaluation method of the embodiment, a photomask including a long-wavelength light reflective film and a mask pattern is set in an EUV exposure apparatus. The long-wavelength light reflective film reflects long-wavelength light having a wavelength longer than that of EUV light and absorbs the EUV light. The mask pattern is formed by an absorption film which is arranged on the upper side of the long-wavelength light reflective film and absorbs the EUV light and the long-wavelength light. A substrate on which resist is coated are set in the EUV exposure apparatus. Exposure light reflected by the photomask is irradiated to the substrate, and a light amount distribution of the long-wavelength light irradiated to the substrate is measured on the basis of an exposure amount of the exposure light irradiated to the substrate. | 05-10-2012 |
20120176198 | BIAS GENERATION CIRCUIT, POWER AMPLIFIER MODULE, AND SEMICONDUCTOR DEVICE - There is provided a bias circuit including a power amplifier in which influence of variation of a gate length L is reduced and variation of a gain among products is low. Two NPN- and PNP-type current mirror circuits | 07-12-2012 |
20120180697 | CELLULOSE ACYLATE FILM, RETARDATION FILM, POLARIZER AND LIQUID-CRYSTAL DISPLAY DEVICE - Provide is a cellulose acylate film, of which the environmental humidity-dependent retardation change is small and which, when stuck to a polarizer and used in high-temperature and high-humidity environments, is effective for preventing the polarizing element from being deteriorated. A cellulose acylate film, which contains a hydrogen-bonding compound satisfying the following requirements (A) to (C), and at least one hydrophobizing agent selected from a polyalcohol ester-base hydrophobizing agent, a polycondensate ester-base hydrophobizing agent and a carbohydrate derivative-base hydrophobizing agent: (A) the compound has both a hydrogen-bonding donor part and a hydrogen-bonding acceptor part in one molecule, (B) the value computed by dividing the molecular weight of the compound by the total number of the hydrogen-bonding donor number and the hydrogen-bonding acceptor number in the compound is from 30 to 65, and (C) the total number of the aromatic ring structures in the compound is from 1 to 3. | 07-19-2012 |
20120198396 | METHOD OF OPTIMIZING SEMICONDUCTOR DEVICE MANUFACTURING PROCESS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND NON-TRANSITORY COMPUTER READABLE MEDIUM - A method of optimizing a semiconductor device manufacturing process according to an embodiment is a method of optimizing a semiconductor device manufacturing process in which a pattern based on circuit design is formed. The method of optimizing a semiconductor device manufacturing process according to the embodiment includes: at the time of calculation of a statistic amount based on a distribution of differences at a plurality of sites between a pattern formed by a first exposing apparatus in a first condition and a pattern formed by a second exposing apparatus in a second condition, calculating the statistic amount after applying weighting to the differences based on information on an electrical characteristic; and repeating the calculating with the second condition being changed, and selecting an condition in which the total sum becomes a minimum or equal to or less than a standard value as an optimized condition of the second exposing apparatus. | 08-02-2012 |
20120238233 | WIRELESS COMMUNICATION SYSTEM - A wireless communication system includes: a filter; and a semiconductor chip including a signal processing integrated circuit having an amplifier, wherein a main surface of the semiconductor chip is provided with a plurality of electrode terminals along an edge portion thereof; wherein the amplifier has a transistor including a control electrode, a first electrode through which a signal is outputted, and a second electrode to which a voltage is applied; wherein the control electrode, the first electrode and the second electrode of the transistor are connected to the electrode terminals, respectively; and wherein none of wirings are arranged between the electrode terminals and placements of the control electrode, the first electrode and the second electrode, making space between the electrodes and the electrode terminals narrow. | 09-20-2012 |
20120246602 | METHOD OF PREPARING PATTERN, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND COMPUTER PROGRAM PRODUCT - An embodiment provides a method of preparing a pattern. In the pattern preparing method, when mask patterns corresponding to on-substrate patterns are prepared to form the on-substrate patterns corresponding to design patterns, the mask patterns are prepared based on a correlation which needs to be satisfied between the design patterns so that a relation which same the correlation can be satisfied between the mask patterns corresponding to the design patterns. | 09-27-2012 |
20120250011 | PATTERN VERIFICATION-TEST METHOD, OPTICAL IMAGE INTENSITY DISTRIBUTION ACQUISITION METHOD, AND COMPUTER PROGRAM - A pattern verification-test method according to an embodiment of the present invention includes: deriving an illumination condition at a verification-test subject position in a photomask surface of a mask pattern as a verification or a test subject based on the verification-test subject position and illumination condition information about a distribution of an illumination condition in a photomask surface of exposure light incident on the mask pattern, performing lithography simulation on the mask pattern based on the derived illumination condition and the mask pattern, and verifying or testing the mask pattern based on a result of the lithography simulation. | 10-04-2012 |
20120250097 | CONTROL DEVICE, IMAGE FORMING APPARATUS, AND CONTROL METHOD - A control device includes a toner-density-related value identifying unit, a supply-amount-related value identifying unit, and a correcting unit. The toner-density-related value identifying unit identifies a toner-density-related value indicating the ratio of toner in developer including toner and carrier and contained in a developing unit that contains and agitates the developer. The supply-amount-related value identifying unit identifies the supply-amount-related value of developer to the developing unit. The correcting unit corrects the toner-density-related value identified by the toner-density-related value identifying unit in accordance with the supply-amount-related value identified by the supply-amount-related value identifying unit. The supply-amount-related value identifying unit estimates the supply-amount-related value on the basis of the consumption-amount-related value of developer. | 10-04-2012 |
20130016364 | CONTROL APPARATUS, IMAGE FORMING APPARATUS, IMAGE FORMING SYSTEM, CONTROL METHOD, AND COMPUTER-READABLE MEDIUMAANM TANAKA; SatoshiAACI KanagawaAACO JPAAGP TANAKA; Satoshi Kanagawa JP - A control apparatus includes an operation section, a correction section, and a controller. The operation section performs an operation for forming an image having a predetermined density. The correction section corrects a value of the density. In a case where an image formation condition is switched from a first image formation condition to a second image formation condition, when image formation under the second image formation condition is to be performed on at least a predetermined number of recording media or to be performed for at least a predetermined period, the controller performs control so that the correction section executes a process of correcting the value. When the image formation is not to be performed on at least the predetermined number of recording media or not to be performed for at least the predetermined period, the controller performs control so that the correction section does not execute the process. | 01-17-2013 |
20130016371 | CORRECTION APPARATUS, IMAGE FORMING APPARATUS, IMAGE FORMING SYSTEM, AND COMPUTER READABLE MEDIUMAANM TANAKA; SatoshiAACI KanagawaAACO JPAAGP TANAKA; Satoshi Kanagawa JP - A correction apparatus includes an operating section that operates for forming an image having a predetermined density, a calculating section that calculates a first correction amount that is used when a value of the predetermined density is to be corrected, and a correction section that corrects the predetermined density value in such a manner that the correction is performed by using the first correction amount when first identification information corresponding to an image that has been processed by the operating section before the correction performed by the correction section and second identification information corresponding to an image that is to be processed by the operating section after the correction performed by the correction section do not satisfy a predetermined condition, whereas the correction is performed by using a second correction amount that is smaller than the first correction amount, when the first and second identification information satisfy the predetermined condition. | 01-17-2013 |
20130017495 | INTERFERENCE EXPOSURE APPARATUS, INTERFERENCE EXPOSURE METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICEAANM Kodera; KatsuyoshiAACI KanagawaAACO JPAAGP Kodera; Katsuyoshi Kanagawa JPAANM Tanaka; SatoshiAACI KanagawaAACO JPAAGP Tanaka; Satoshi Kanagawa JP - According to one embodiment, an interference exposure apparatus of the embodiment includes a light path changing section in which a changing element adapted to change a light path direction and a light path length of a plurality of light beams with respect to the plurality of light beams having coherency with respect to each other is arranged substantially axisymmetrically; and an adjusting section for adjusting one part of the light beam entering a substrate by intensity changing or phase changing one part of the light beam corresponding to a pattern shape to form on the substrate. A light beam exit from the light path changing section and the adjusting section is interfered on the substrate to carry out an interference exposure on the substrate. | 01-17-2013 |
20130159944 | FLARE MAP CALCULATING METHOD AND RECORDING MEDIUM - A flare map calculating method of an embodiment calculates an optical image intensity distribution in each division region set in a pattern region. Furthermore, an average value of the optical image intensity distribution is calculated in each division region. A pattern or plural patterns, which has a pattern density corresponding to the average value, is calculated as a corresponding density pattern in each division region. Furthermore, a density map, which represents a pattern density distribution within the pattern region, is generated based on the corresponding density pattern, and a flare map representing a flare intensity distribution within the pattern region is calculated by convolution integral of the density map and a point spread function. | 06-20-2013 |
20130164002 | CONTROL APPARATUS AND METHOD, IMAGE FORMING APPARATUS AND SYSTEM, AND COMPUTER READABLE MEDIUM - A control apparatus includes the following elements. A toner density specifying unit specifies a toner density in a developer stored in a developing device. A toner density controller performs control such that the toner density approximates a predetermined toner density target value. A first calculator calculates a first value corresponding to an image density of an image to be output after a first timing. A correction amount specifying unit specifies a correction amount for the toner density target value at the first timing. When the condition that an absolute value of a difference between the first value and a second value is greater than a predetermined threshold is satisfied, the correction amount specifying unit specifies a smaller correction amount for the toner density target value, compared with when the condition is not satisfied. A correcting unit corrects the toner density target value on the basis of the correction amount. | 06-27-2013 |
20130164010 | CONTROL APPARATUS AND METHOD, IMAGE FORMING APPARATUS AND SYSTEM, AND NON-TRANSITORY COMPUTER READABLE MEDIUM - A control apparatus includes the following elements. A page specifying unit specifies, concerning image data representing images included in plural pages, among the plural pages, plural pages including images each having a similarity which is equal to or greater than a predetermined threshold. A controller controls a transfer bias to be applied to a transfer device which transfers a toner image formed on an image carrier onto a medium. The controller performs control, for the plural pages specified by the page specifying unit, such that each of values of the transfer bias to be applied to the transfer device when toner images corresponding to the plural pages specified by the page specifying unit are transferred onto the medium is within a predetermined range. | 06-27-2013 |
20130230914 | CULTURE CONTAINER FOR ADHERENT CELLS AND METHOD FOR PRODUCING CULTURE CONTAINER FOR ADHERENT CELLS - A culture bag for culturing adherent cells is provided without requiring a highly clean production environment and a complex production step such as a masking step. An adherent cell culture vessel that is formed of a polyolefin is configured so that part or the entirety of the inner surface of the culture vessel has a static water contact angle of 95° or more, and has an advancing contact angle and a receding contact angle that satisfy the inequality “advancing contact angle−receding contact angle>25°” when water runs down along the inner surface. | 09-05-2013 |
20130249918 | METHOD OF FORMING DRAWING PATTERN, METHOD OF GENERATING DRAWING DATA, AND DRAWING DATA GENERATING DEVICE - According to a method of forming a drawing pattern of an embodiment, by setting the positions of drawing shots for a drawing pattern, drawing data is generated based on pattern data. A plurality of types of drawing data are generated based on one type of pattern data by setting the positions of the drawing shots to positions different for each piece of the drawing data when the drawing data is generated. In addition, multiple exposures are performed for the substrate by using the plurality of types of the drawing data when the drawing pattern is formed on the substrate. | 09-26-2013 |
20130251388 | IMAGE FORMING APPARATUS AND NON-TRANSITORY COMPUTER READABLE MEDIUM - An image forming apparatus includes a preliminary toner image forming unit, a detecting unit, an adjusting unit, an obtaining unit, an activation grasping unit, a determining unit, and a preparation unit. The preliminary toner image forming unit causes an inactive image forming unit to form a preliminary toner image and causes the preliminary toner image to be transferred onto a transfer body. The detecting unit detects the preliminary toner image. The adjusting unit adjusts quality of a toner image. The obtaining unit obtains information regarding an image to be output. The activation grasping unit grasps an estimated activation timing. The determining unit determines whether a time period until the estimated activation timing has become equal to an image quality adjustment period. The preparation unit causes the preliminary toner image forming unit to transfer the preliminary toner image and causes the adjusting unit to adjust the quality of the toner image. | 09-26-2013 |
20130266744 | POLYMER FILM, RETARDATION FILM, POLARIZING PLATE, LIQUID CRYSTAL DISPLAY, AND COMPOUND - Provided is a polymer film containing at least one of a compound represented by formula (1) of hydrates, solvates, or salts thereof. Y is a methine group or nitrogen atom. Q | 10-10-2013 |
20140048131 | CONDUCTIVE MEMBER, PRODUCTION METHOD OF THE SAME, TOUCH PANEL, AND SOLAR CELL - A conductive member containing a base material and a conductive layer provided on the base material, wherein the conductive layer includes (i) a metallic nanowire having an average short-axis length of 150 nm or less and (ii) a binder, the binder including a three-dimensional crosslinked structure that includes a partial structure represented by the following Formula (Ia) and a partial structure represented by the following Formula (IIa) or Formula (IIb). In the Formulae, each of M | 02-20-2014 |
20140318413 | CELLULOSE ACYLATE FILM, RETARDATION FILM, POLARIZER AND LIQUID-CRYSTAL DISPLAY DEVICE - Provide is a cellulose acylate film, of which the environmental humidity-dependent retardation change is small and which, when stuck to a polarizer and used in high-temperature and high-humidity environments, is effective for preventing the polarizing element from being deteriorated. A cellulose acylate film, which contains a hydrogen-bonding compound satisfying the following requirements (A) to (C), and at least one hydrophobizing agent selected from a polyalcohol ester-base hydrophobizing agent, a polycondensate ester-base hydrophobizing agent and a carbohydrate derivative-base hydrophobizing agent: (A) the compound has both a hydrogen-bonding donor part and a hydrogen-bonding acceptor part in one molecule, (B) the value computed by dividing the molecular weight of the compound by the total number of the hydrogen-bonding donor number and the hydrogen-bonding acceptor number in the compound is from 30 to 65, and (C) the total number of the aromatic ring structures in the compound is from 1 to 3. | 10-30-2014 |
20140335600 | CELL COLLECTION METHOD - A method for collecting cells that have been cultured by using a cell culture kit in which, at least, a culture container for cultivating cells, a cell collection container for collecting cells after cultivation and a waste liquid container for collecting a culture medium after cultivation are linked to one another through a conduit, the method including transferring a culture supernatant that has been cultured from the culture container to the waste liquid container, transferring a concentrated suspension of cells from the culture container to the cell collection container, returning part of the culture supernatant discharged in the waste liquid container to the culture container and allowing cells remaining in the culture container to be suspended in a suspension of cells, and transferring again a suspension of cells in which remaining cells are suspended from the culture container to the cell collection container. | 11-13-2014 |
20140335608 | CELL CULTURE KIT, AND METHOD OF USING CELL CULTURE KIT - A cell culture kit for cultivating cells in a closed system that comprises at least one or more of each of: a culture container for cultivating cells; a culture medium storage container for storing a culture medium or the like; a cell injection container for injecting cells; and a cell collecting container for collecting a suspension of cells after cultivation; wherein the culture medium storage container is also used as a waste liquid container for collecting a culture medium after cultivation, and the culture container, the culture medium storage container, the cell injection container and the cell collecting container are linked to one another through a conduit. Also provided is a cell culture kit including at least one or more of a sampling container that is capable of sampling part of a suspension of cells during cultivation, wherein the sampling container is linked to the culture container through a conduit. | 11-13-2014 |
20140363588 | POLYMER FILM, RETARDATION FILM, POLARIZING PLATE, LIQUID CRYSTAL DISPLAY, AND COMPOUND - Provided is a polymer film containing at least one of a compound represented by formula (1) of hydrates, solvates, or salts thereof. Y is a methine group or nitrogen atom. Q | 12-11-2014 |