Patent application number | Description | Published |
20080206947 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A method of manufacturing the semiconductor device is provided, which provides a prevention for a “dug” of a silicon substrate caused by the etching in regions except a region for forming a film during a removal of the film with a chemical solution. A method of manufacturing a semiconductor device according to an embodiment of the present invention includes forming a first silicon oxide film on a surface of a silicon substrate or on a surface of a gate electrode when a silicon nitride film for a dummy side wall is etched off, to provide a protection for such surfaces, and then etching a portion of the silicon nitride film with a chemical solution, and then a second oxide film for supplementing a simultaneously-etched portion of the first silicon oxide film is formed, and eventually performing an etching for completely removing the silicon nitride film for the dummy side wall. | 08-28-2008 |
20080214002 | Cleaning solution and manufacturing method for semiconductor device - A method of manufacturing a semiconductor device forms an interlayer insulating film on a nickel silicide layer formed on a substrate, and forms a through hole by performing dry etching using a resist pattern, formed on the interlayer insulating film, as a mask and then removing the resist pattern by ashing. A wafer after an ashing process is cleaned using a cleaning solution comprised of aqueous solution having a content of the fluorine-containing compound of 1.0 to 5.0 mass %, a content of chelating agent of 0.2 to 5.0 mass %, and a content of the organic acid salt of 0.1 to 3.0 mass %. | 09-04-2008 |
20080248651 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - A first oxide film and a second oxide film 16 are formed in a first region | 10-09-2008 |
20090042034 | MATERIAL FOR CURABLE SOLVENT-BASED TOPCOATING MATERIAL, AND COATING MATERIAL AND COATING FILM COMPRISING OR FORMED FROM THE SAME - [Object] To provide a coating material for a curable solvent-based topcoating material, having excellent marring resistance, chipping resistance, producing no crack and excellent in performances such as weatherability, stain resistance, adhesion and the like, and a curable solvent-type topcoating material using such a material. | 02-12-2009 |
20090047532 | Material for Room Temperature Curable Solvent-Borne Overcoating Material,Coating Material Using Same and Coating Film - [Object] To provide a coating material for a room temperature curable solvent-borne overcoating material having chipping resistance and not allowing occurrence of cracks, and a room temperature curable solvent-borne overcoating material using the same, the room temperature curable solvent-borne overcoating material being excellent in abrasion resistance and in performance such as weather resistance, contamination resistance and adhesion. | 02-19-2009 |
20090131588 | MODIFIED HYDROPHILIC POLYROTAXANE AND CROSS-LINKED POLYROTAXANE - [Object] To provide a modified hydrophilic polyrotaxane which is soluble in water or a water-like solvent, a cross-linked polyrotaxane using this, and a solvent for dissolving the modified hydrophilic polyrotaxane.
| 05-21-2009 |
20090138164 | DECELERATION CONTROL APPARATUS AND METHOD FOR AUTOMOTIVE VEHICLE - In deceleration control apparatus and method for an automotive vehicle, a deceleration control is performed in accordance with a turning travel situation of the vehicle; and an engine throttle opening angle is controlled gradually in a closure direction at a preset variation degree. | 05-28-2009 |
20090215278 | SEMICONDUCTOR DEVICE MANUFACTURING METHOD - Prior to a step of providing a stress layer covering a first transistor, a second transistor and a gate structure, another silicon oxide film is formed over the second transistor to form a silicon oxide film with a predetermined thickness over the second transistor. By a step of removing the portion of the stress layer over the second transistor and the gate structure and leaving the portion of the stress layer over the first transistor, the silicon oxide film over the second transistor is prevented from becoming excessively thinner than the silicon oxide film over the first transistor. The source region and the drain region of the second transistor can be prevented from being shaved because of thinness of the silicon oxide film over the second transistor when removing silicon oxide films over the first transistor and second transistor. | 08-27-2009 |
20090281213 | HYDROPHOBIC MODIFIED POLYROTAXANE AND CROSSLINKED POLYROTAXANE - [Object] To provide a hydrophobic modified polyrotaxane soluble in an organic solvent, and a crosslinked polyrotaxane using this. | 11-12-2009 |
20100129677 | Material for Curable Aqueous Overcoating Material and Coating Material Using Same - There is provided a curable aqueous overcoating composition containing 1 to 90 mass % of hydrophilic polyrotaxane with respect to the coating film forming component, where the hydrophilic polyrotaxane has a cyclic molecule, a linear molecule included in the cyclic molecule in a skewered manner and blocking groups arranged on opposite ends of the linear molecule to prevent elimination of the cyclic molecule from the linear molecule and at least one of the linear molecule and the cyclic molecule has a hydrophilic modifying group. | 05-27-2010 |
20100159278 | MATERIAL FOR ROOM TEMPERATURE DRYING AQUEOUS OVERCOATING MATERIAL AND COATING MATERIAL USING SAME - There is provided a room-temperature drying aqueous overcoating medium containing 1 to 100 mass % of hydrophilic polyrotaxane with respect to the coating film forming component, where the hydrophilic polyrotaxane has a cyclic molecule, a linear molecule included in the cyclic molecule in a skewered manner and blocking groups arranged on opposite ends of the linear molecule to prevent elimination of the cyclic molecule from the linear molecule and at least one of the linear molecule and the cyclic molecule has a hydrophilic modifying group. | 06-24-2010 |
20110060505 | DEVICE/METHOD FOR CONTROLLING TURNING BEHAVIOR OF VEHICLE - A vehicle turning behavior control apparatus comprises a controlling section which limits a turning behavior of a vehicle caused by a steering operation, to a limit behavior corresponding to an actual steering speed, by a vehicle speed decrease. The controlling section is configured to determine a modified steering speed in accordance with the actual steering speed, and to determine the limit behavior in accordance with the modified steering speed. The controlling section is further configured to make the modified steering speed higher than the actual steering speed when the actual steering speed decreases during a turning steering for increasing a steering amount. For example, the actual steering speed is used directly as the modified steering speed while the actual steering speed during the turning steering is increasing. While the actual steering speed during the turning steering is decreasing, the modified steering speed higher than the actual steering speed is used. | 03-10-2011 |
20110215386 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SEMICONDUCTOR DEVICE - Unintended full siliciding of a polysilicon gate electrode is prevented. | 09-08-2011 |
20120069343 | MEASUREMENT DEVICE AND MEASUREMENT METHOD - A measurement device includes a light sensing element on which light from a measurement target region placing a measurement target thereon forms an image, and a plurality of light emitting elements that are disposed around the light sensing element and radiate light to the measurement target region, wherein the plurality of light emitting elements are disposed to be tilted with respect to the normal line of the measurement target region such that the central line of radiated emission from each of the light emitting elements passes through a substantial center of the measurement target region. | 03-22-2012 |
20120069584 | FLEXIBLE SUBSTRATE, MOUNTING METHOD OF FLEXIBLE SUBSTRATE, AND LIGHTING SYSTEM - A flexible substrate includes a stripe-shaped substrate main body portion; a comb-like portion composed of a plurality of protrusions that extends from one end in the direction perpendicular to the longitudinal direction of the substrate main body portion, in the direction perpendicular to the longitudinal direction; and electronic devices that are arranged on the plurality of protrusions, respectively, in which the substrate main body portion and the comb-like portion are bendable. | 03-22-2012 |
20130027295 | INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND PROGRAM - There is provided an information processing apparatus including an acquisition unit acquiring data on at least one of an acceleration or an angular velocity of a controller operated by a user, and a determination unit determining at least one of a velocity of the controller or a trajectory of the controller based on the acquired data on the at least one of the acceleration or the angular velocity. | 01-31-2013 |
20130035568 | INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, PROGRAM, AND INFORMATION PROCESSING SYSTEM - Provided is an information processing apparatus including a judgment unit for using measurement data in relation to reflectance of light obtained by irradiating a surface of a living body of a subject with light of a predetermined wavelength to judge a condition of a blood vessel and/or a condition of blood flow of the living body in accordance with a color phase corresponding to the reflectance of light. | 02-07-2013 |
20130096339 | METHOD FOR PRODUCING 1-AMINO-1-ALKOXYCARBONYL-2-VINYLCYCLOPROPANE - It is an object of the present invention to provide a novel method for producing (1R,2S)/(1S,2R)-1-amino-1-alkoxycarbonyl-2-vinylcyclopropane which is useful as a synthetic intermediate of therapeutic agents for hepatitis C and a synthetic intermediate thereof. According to the present invention, when a trans-2-butene derivative having a leaving group at each of the 1- and 4-positions is reacted with a malonic ester in the presence of a base, a specific amount of an alkali metal alkoxide or an alkali metal hydride is used as the base, and further a specific amount of a malonic ester is used to produce a cyclopropane diester, and further, chiral or achiral 1-amino-1-alkoxy-carbonyl-2-vinylcyclopropane and a salt thereof are synthesized using the cyclopropane diester. | 04-18-2013 |
20130150697 | INPUT DEVICE AND CALIBRATION METHOD - There is provided an input device including a plurality of electrodes that are arranged on a surface of a body in a direction crossing a muscular fiber group of the body at a right angle, and detect electromyogram signals generated from the muscular fiber group according to a motion performed by the body; a switch unit that switches an electrode acquiring an electromyogram signal between the plurality of electrodes; and a control unit that selects an electrode detecting an electromyogram signal for identifying the motion from among the plurality of electrodes. | 06-13-2013 |
20140303505 | MEASURING APPARATUS, MEASURING METHOD, AND PARAMETER SETTING METHOD - There is provided a measuring apparatus, including a light receiving element, provided at a position facing a measurement object region on which is placed a measurement object, which forms an image with light from the measurement object region, light emitting elements, arranged surrounding the light receiving element, which emit light for measuring the measurement object, and reflective optical elements, provided above the light emitting elements, which guide, to the measurement object region, emission light radiated from the light emitting elements. A light receiving surface of the light receiving element and light emission surfaces of the light emitting elements are positioned mutually on a same plane. The emission light radiated from the light emitting elements is reflected by the reflective optical elements, and center lines of the emission light radiated from each of the light emitting elements pass through an approximate center of the measurement object region. | 10-09-2014 |