Patent application number | Description | Published |
20080233675 | METHOD OF FABRICATING NANO-WIRE ARRAY - Provided is a method of fabricating a nano-wire array, including the steps of: depositing a nano-wire solution, which contains nano-wires, on a substrate; forming a first etch region in a stripe shape on the substrate and then patterning the nano-wires; forming drain and source electrode lines parallel to each other with the patterned nano-wires interposed therebetween; forming a plurality of drain electrodes which have one end connected to the drain electrode line and contact at least one of the nano-wires, and forming a plurality of source electrodes, which have one end connected to the source electrode line and contact the nano-wires that contact the drain electrodes; forming a second etch region between pairs of the drain and source electrodes so as to prevent electrical contacts between the pairs of the drain and source electrodes; forming an insulating layer on the substrate; and forming a gate electrode between the drain and source electrodes contacting the nano-wires on the insulating layer. Accordingly, even in an unparallel structure of nano-wires to electrode lines, a large scale nano-wire array is practicable and applicable to an integrated circuit or display unit with nano-wire alignment difficulty, as well as to device applications using flexible substrates. | 09-25-2008 |
20090069059 | Mobile Communication Terminal - Provided is a mobile communication terminal including an upper plate secured to a rear surface of an upper frame and having a first coupling shaft to which one side of a driving link is secured such that the upper frame is vertically guided, a middle frame including a first guide provided at one side of a front surface thereof to guide the first coupling shaft of the upper plate, and first guide means provided at both sides of a rear surface thereof, and a main plate including a main frame secured to a rear surface thereof, sliding guide parts slidably guided along the first guide means of the middle frame at both sides thereof, a second coupling shaft provided at one side of a front surface thereof and to which the other side of the driving link is secured, and a support means for the middle frame installed at the other side of the front surface. | 03-12-2009 |
20100002213 | PHOTOLITHOGRAPHY SYSTEM USING AN OPTICAL MICROSCOPE - A photolithography system using an optical microscope is provided that can form various types of selective patterns at a low cost in small-scale research using unit-size silicon substrates which is not targeted for mass production, without requiring an expensive photomask. | 01-07-2010 |
20100274003 | ACID ADDITION SALTS OF SYNTHETIC INTERMEDIATES FOR CARBAPENEM ANTIBIOTICS AND PROCESSES FOR PREPARING THE SAME - The present invention provides a process for preparing an acid addition salt of a synthetic intermediate for carbapenem antibiotics and a novel acid addition salt of a synthetic intermediate for carbapenem antibiotics obtained from the process. The present invention also provides a process for preparing a carbapenem antibiotic using the acid addition salt. According to the process of the present invention, an acid addition salt of a synthetic intermediate for carbapenem antibiotics can be prepared in a high yield and high purity, without conducting column chromatography. Thus, the process of the present invention can be applied to mass production with an industrial scale. Furthermore, since the acid addition salts have solid forms, they are easy to handle and keep in a manufacturing site. | 10-28-2010 |
20130038186 | DISHWASHER - A dishwasher that enables a user to adjust a load of a spring depending on material and weight of a cover that is attached to a door of the dishwasher. The dishwasher includes a housing having a bottom, a rear, and side covers, a door rotatably installed on a front surface of the housing, a door hinge installed onto each lower end of the door while being rotatably coupled to the housing, a spring configured to adjust a rotation of the door, and an apparatus of adjusting the spring configured to adjust a load of the spring. The apparatus includes a movable bracket connected to the spring, an adjustment member which enables the movable bracket to move up and down, and a support bracket configured to support the adjustment member. A position verification hole is perforated through the housing such that the apparatus is checked from outside the housing. | 02-14-2013 |
20140198464 | FRAME STRUCTURE FOR PREVENTING DEFORMATION, AND ELECTRONIC DEVICE INCLUDING THE SAME - An electronic device is provided. The electronic device includes a main frame, an opening portion formed in the main frame, a recess portion formed along a frame of the opening portion lower than a surface of the main frame, and a plate having frames seated on the recess portion, wherein at least one of the frames of the plate is formed of a curved portion that is curved inwardly. Accordingly, it is possible to absorb an external impact and prevent deformation just by a simple structure change of the plate. | 07-17-2014 |
20140215619 | WEBSHELL DETECTION AND RESPONSE SYSTEM - A webshell detection and response system is provided. The webshell detection and response system may collect information from a detection target server through an information collection script inserted into a webpage home path of the detection target server without installing a separate web shell detection application compiled in the form of binary file in the detection target server, and determine whether the detection target server is infected with a webshell remotely using the collected information. | 07-31-2014 |
Patent application number | Description | Published |
20080305430 | PHOTO-SENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME - Disclosed are a photo-sensitive compound and a photoresist composition containing the same, for forming ultra-fine photoresist patterns. The photo-sensitive compound is resented by following Formula 1, | 12-11-2008 |
20090023093 | ACID-AMPLIFIER HAVING ACETAL GROUP AND PHOTORESIST COMPOSITION INCLUDING THE SAME - An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1. | 01-22-2009 |
20090068585 | DISSOLUTION PROMOTER AND PHOTORESIST COMPOSITION INCLUDING THE SAME - In the formation of a fine pattern using a photolithography process, a dissolution promoter which can increase the difference of solubility between exposed region and unexposed region, and a photoresist composition including the same are disclosed. The dissolution promoter has the structure of the following formula (wherein, R is a hydrocarbon group of 1 to 40 carbon atoms, A is an alkyl group of 1 to 10 carbon atoms, p is 0 or 1, and q is an integer of 1 to 20). | 03-12-2009 |
20090081587 | PHOTOSENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME - A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula 1. Also, the photoresist composition comprises 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to 15 weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 200 to 5000 weight parts of an organic solvent. | 03-26-2009 |
20090155714 | PHOTOSENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME - A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an organic solvent. | 06-18-2009 |
20090197198 | PHOTOSENSITIVE MOLECULAR COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME - Disclosed are a photosensitive compound containing oxime group which is directly decomposed by exposure to light, which is a molecular resist whose size is smaller than conventional polymer for photoresist, and a photoresist composition including the same. The photosensitive molecular compound has a structure represented by a following formula. | 08-06-2009 |
20140242520 | I-LINE PHOTORESIST COMPOSITION AND METHOD FOR FORMING FINE PATTERN USING SAME - An I-line photoresist composition, having excellent thermal stability at high temperature of 200-250° C., by which fine photoresist patterns form using an acid diffusion layer and a method for forming a fine pattern using the same, comprising: a polymer containing 1-99 mol % of repeating unit selected from a group consisting of 1-99 mol % of repeating unit represented by Formula 1, repeating unit represented by Formula 2, repeating unit represented by Formula 3 and mixture thereof; a photo active compound containing at least two diazonaphtoquinone (DNQ) groups; and an organic solvent. Formulas 1-3 are located in the specification. R* and R** are independently a hydrogen atom or a methyl group. R | 08-28-2014 |
20140287587 | Method for Forming Fine Patterns of Semiconductor Device Using Directed Self-Assembly Process - Provided herein is a method for forming fine patterns of semiconductor devices capable of forming patterns with 20 nm-level line width without bulk-exposure and hardening of guide patterns. Method steps include (a) forming a photoresist layer over a wafer on which an organic anti-reflection coating layer is formed; (b) exposing and developing the photoresist layer to form guide patterns; (c) forming a neutral layer over the wafer; (d) developing the guide patterns to remove them and form neutral layer patterns having an opening part; (e) coating block copolymer of directed self assembly material on the substrate and heating the substrate over a glass transition temperature (Tg) to form directed self-assembly patterns; and (f) selectively etching a part having relatively small etching resistivity (or high etching rate) among the directed self-assembly patterns by using O | 09-25-2014 |
Patent application number | Description | Published |
20140319097 | PHENOL MONOMER, POLYMER FOR FORMING A RESIST UNDERLAYER FILM INCLUDING SAME, AND COMPOSITION FOR A RESIST UNDERLAYER FILM INCLUDING SAME - A phenolic monomer used in the lithographic process for semiconductor fabrication, a polymer for preparing a resist under-layer comprising the same, and a resist under-layer composition comprising the same, are disclosed. The phenolic monomer is represented by the formula 1 of the specification, in Formula 1, R1, R2, R3, and R4 are independently a hydrogen atom, or a straight-chain, branched, monocyclic or polycyclic saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms with or without a hetero atom; A is a monocyclic or polycyclic aromatic hydrocarbon group having 4 to 20 carbon atoms; X is an oxygen atom (O) or a sulfur atom (S); and Y is a single bond, a methylene group (—CH2-), an oxygen atom (O), a sulfur atom (S), an amino group (—NH—), or two isolated hydrogen atoms, wherein A, R1, R2, R3, and R4 can be substituted with a straight-chain, branched, monocyclic or polycyclic saturated or unsaturated hydrocarbon group having 1 to 20 carbon atoms with or without a hetero atom; and either R1 and R2 or R3 and R4 are independently linked to each other to form a ring. | 10-30-2014 |