Patent application number | Description | Published |
20090079992 | Method And System for Measuring a Surface of an Object - Methods and systems for measuring a surface of an object are provided, wherein portions of the surface of the object are interferometrically measured and data representing a shape of the surface of the object are obtained by stitching the measurement data corresponding to each portion together. For measuring the individual portions of the surface of the object a variable light shaping member is utilized preferably constructed by arranging two diffraction gratings in a beam path of measuring light and appropriately displacing the two diffraction gratings relative to each other depending on a target shape of a particular portion of the surface of the object. | 03-26-2009 |
20090237672 | Method and Apparatus for Interferometrically Measuring the Shape of a Test Object - The invention relates to a method and to an apparatus for interferometrically determining a deviation of an actual shape of an effective reflection surface ( | 09-24-2009 |
20100177320 | METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE - A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element. | 07-15-2010 |
20100177321 | OPTICAL ELEMENT AND METHOD OF CALIBRATING A MEASURING APPARATUS COMPRISING A WAVE SHAPING STRUCTURE - Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm. | 07-15-2010 |
20110141484 | METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE - A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element. | 06-16-2011 |
20120236316 | METHOD AND APPARATUS FOR DETERMINING A SHAPE OF AN OPTICAL TEST SURFACE - A method of determining a shape of an optical test surface ( | 09-20-2012 |
20120330609 | METHOD OF MEASURING A DEVIATION OF AN OPTICAL SURFACE FROM A TARGET SHAPE - A method of measuring a deviation of an optical surface from a target shape and a method of manufacturing an optical element. The method of measuring the deviation includes:—performing a first interferometric measurement using a first diffractive measurement structure, which is arranged to cover a first area of the optical surface, to provide a first interferometric measurement result,—performing a second interferometric measurement using a second diffractive measurement structure, which is arranged to cover a second area of the optical surface different from the first area, to provide a second interferometric measurement result, and—determining a deviation of the optical surface from the target shape. | 12-27-2012 |
20130188162 | Method for Operating a Projection Exposure Tool and Control Apparatus - A method for operating a projection exposure tool for microlithography is provided. The projection exposure tool includes an optical system which includes a number of optical elements which, during an imaging process, convey electromagnetic radiation. All of the surfaces of the optical elements interact with the electromagnetic radiation during the imaging process to form an overall optical surface of the optical system. The method includes: determining respective individual thermal expansion coefficients at at least two different locations of the overall optical surface; calculating a change to an optical property of the optical system brought about by heat emission of the electromagnetic radiation (during the imaging process upon the basis of the thermal expansion coefficients; and imaging mask structures into an image plane via the projection exposure tool with adaptation of the imaging characteristics of the projection exposure tool so that the calculated change to the optical property is at least partially compensated. | 07-25-2013 |
20140078513 | METHOD OF MEASURING A SHAPE OF AN OPTICAL SURFACE BASED ON COMPUTATIONALLY COMBINED SURFACE REGION MEASUREMENTS AND INTERFEROMETRIC MEASURING DEVICE - Measuring a shape of an optical surface ( | 03-20-2014 |
20140185060 | DEVICES FOR DETERMINING LAYER THICKNESS AND/OR CONTAMINATION LEVEL OF A BELT - The invention relates to an apparatus for determining a layer thickness on a tape moved along a feed direction, comprising: a movement unit for moving the tape along the feed direction, a light generating unit for generating illumination radiation, a beam shaping unit disposed downstream of the light generating unit for shaping at least one strip-shaped illumination beam for linear illumination of the tape transversely with respect to the feed direction, a detector unit for detecting illumination radiation reflected and/or transmitted at the tape, and an evaluation device for determining the layer thickness on the basis of the detected illumination radiation. The apparatus can also be used for determining a degree of contamination of a surface of the tape, the surface being contaminated by particles, by detecting illumination radiation scattered at the tape. | 07-03-2014 |