Patent application number | Description | Published |
20080213706 | Method and apparatus for thermal development having a removable support member - This invention pertains to a method and apparatus for thermally developing a photosensitive element, and particularly to a method and apparatus for supporting the photosensitive element with a removable flexible support member during thermal treatment. | 09-04-2008 |
20090199733 | Apparatus for forming a printing form having a cylindrical support - The invention pertains to an apparatus and a process for forming a printing form from a photosensitive element having a cylindrical support, and in particular, to an apparatus and a process for thermally treating the photosensitive element to form a relief pattern and particularly to form a cylindrically-shaped flexographic printing form. The apparatus and process includes supporting the cylindrical support to accommodate thermal treating of photosensitive elements with various sizes of the cylindrical support. | 08-13-2009 |
20090288569 | PROCESS AND APPARATUS HAVING AN ADJUSTABLE HEATER - This invention provides an apparatus and process for forming a printing form from a photosensitive element having an exterior surface and a composition layer capable of being partially liquefied. The apparatus includes a displaceable heater for heating the composition layer, means for removing at least a portion of the composition layer from the element, and means for displacing the displaceable heater to a predetermined distance from the exterior surface. Positioning the displaceable heater at the predetermined distance assures reproducible removal of the liquefied composition from the various types of photosensitive elements that can be thermally treated in the apparatus, resulting in the printing forms having improved relief surface uniformity. | 11-26-2009 |
20100000898 | Packaging assembly for printing plates - The invention relates to a packaging assembly for printing plates and a method for packing the printing plates including a packaging container having a base, and at least one printing plate positioned in the container adjacent the base, wherein an interface having a coefficient of friction of less than 0.30 is disposed between the plate and the base. | 01-07-2010 |
20100242761 | METHOD AND APPARATUS FOR THERMAL DEVELOPMENT HAVING A TEXTURED SUPPORT SURFACE - The invention is a method and apparatus for forming a relief structure by thermally developing a photosensitive element containing a composition layer capable of being partially liquefied. During thermal development, the photosensitive element is supported on a base member having an exterior surface that is textured. The textures for the exterior surface include a particular surface roughness and/or patterns. | 09-30-2010 |
Patent application number | Description | Published |
20090155533 | Method for producing glass or glass ceramic and in particular glass or glass ceramic article - In order to obtain glass or glass ceramic materials having increased strength, the invention provides a method for producing glass or glass ceramic articles, which comprises the steps:
| 06-18-2009 |
20120157290 | HIGH PERFORMANCE GLASS CERAMICS AND METHOD FOR PRODUCING HIGH-PERFORMANCE GLASS CERAMICS - The invention relates to a glass ceramic comprising article, wherein the integral, non-post-processed and non-reworked glass ceramic comprising article comprises at least three different types of microstructures. The microstructures differ in the number and/or size of the crystallites contained per unit volume, and/or in the composition of the crystallites, and/or in the composition of the residual glass phases. The different microstructures are characterized by different relative ion content profiles across a cross-section perpendicular to the transition areas. The relative ion content profiles are determined from intensities which are determined using secondary ion mass spectrometry, and each of the three different types of microstructures preferably has different intensity plateaus for individual ions, wherein the individual ions are components of the main crystal phases. | 06-21-2012 |
20130316142 | Method for producing glass or glass ceramic and in particular glass or glass ceramic article - In order to obtain glass or glass ceramic materials having increased strength, a method is provided for producing glass or glass ceramic articles, which comprises: producing an initial glass body, mounting the initial glass body on a gas cushion between a levitation support and the initial glass body, and at least partially ceramizing the initial glass body on the levitation support. The levitation support comprises at least one continuous surface region having at least one gas feed region where levitation gas for the gas cushion is fed out from the levitation support, and at least one gas discharge region where gas from the gas cushion is at least partially discharged into the levitation support. | 11-28-2013 |
Patent application number | Description | Published |
20080278874 | ELECTROSTATIC DISCHARGE (ESD) PROTECTION STRUCTURE AND A CIRCUIT USING THE SAME - An electrostatic discharge (ESD) protection structure is disclosed. The ESD protection structure includes an active device. The active device includes a plurality of drains. Each of the drains has a contact row and at least one body contact row. The at least one body contact row is located on the active device in a manner to reduce the amount of voltage required for triggering the ESD protection structure. | 11-13-2008 |
20080290426 | DMOS DEVICE WITH SEALED CHANNEL PROCESSING - A method of fabricating an electronic device and a resulting electronic device. The method includes forming a pad oxide layer on a substrate, forming a silicon nitride layer over the pad oxide layer, and forming a top oxide layer over the silicon nitride layer. A first dopant region is then formed in a first portion of the substrate. A first portion of the top oxide layer is removed; a remaining portion of the top oxide layer is used to align a second dopant mask and a second dopant region is formed. An annealing step drives-in the dopants but oxygen diffusion to the substrate is limited by the silicon nitride layer; the silicon nitride layer thereby assures that the uppermost surface of the silicon is substantially planar in an area proximate to the dopant regions after the annealing step. | 11-27-2008 |
20090273883 | METHOD AND SYSTEM FOR INCORPORATING HIGH VOLTAGE DEVICES IN AN EEPROM - A method and system for fabricating a stacked capacitor and a DMOS transistor are disclosed. In one aspect, the method and system include providing a bottom plate, an insulator, and an additional layer including first and second plates. The insulator covers at least a portion of the bottom plate and resides between the first and second top plates and the bottom plate. The first and second top plates are electrically coupled through the bottom plate. In another aspect, the method and system include forming a gate oxide. The method and system also include providing SV well(s) after the gate oxide is provided. A portion of the SV well(s) resides under a field oxide region of the device. Each SV well includes first, second, and third implants having a sufficient energy to provide the portion of the SV well at a desired depth under the field oxide region without significant additional thermal processing. A gate, source, and drain are also provided. | 11-05-2009 |
20110260250 | Method And Manufacturing Low Leakage Mosfets And FinFets - By aligning the primary flat of a wafer with a ( | 10-27-2011 |