Van Haren
Adrianus Johannus Wilhelmus Van Haren, Arnhem NL
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20100266247 | FLEXIBLE CONTINUOUS TAPE FROM MULTIFILAMENT YARN AND METHOD FOR MAKING THESE - A method for making a flexible fibrous continuous tape containing 60 to 98 wt % fiber based on the weight of the tape, from multifilament yarn selected from aramid, glass, aromatic polyester, and rigid rod polymer, comprising the steps: a1) spreading the filaments of the yarn to obtain a filament layer having a cross sectional aspect ratio (w/h) of 2 to 2000; and b1) treating the spread filaments with a curable resin, or a liquid thermoplastic resin or wax; or a2) treating the yarn with the curable resin, or the liquid thermoplastic resin or wax; and b2) spreading the filaments of the yarn to obtain a filament layer having a cross sectional aspect ratio (w/h) of 2 to 2000; followed by c) fixating the filaments by curing or solidifying the resin to obtain the tape, wherein steps a1-b1, respectively a2-b2, and c are performed in-line. | 10-21-2010 |
Emily Van Haren, Fitchburg, WI US
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20150305564 | FOOD PREPARATION APPLIANCE FOR USE WITH A REMOTE COMMUNICATION DEVICE - One example food preparation appliance includes a base having a motor and an adaptor, a weight sensor coupled to the adaptor, and a communication component. The adaptor is configured to support a food preparation accessory. The weight sensor is configured to detect a weight applied to the adaptor. The communication component is configured to transmit data associated with a weight detected by the weight sensor. An example remote communication device includes a display device, a processor; and a memory coupled to the processor. The remote communication device is configured to display a first instruction on the display device, the first instruction including a first target weight of a first substance; receive a measurement from a food preparation appliance indicative of a weight applied to an adaptor of the food preparation appliance; and display a second instruction when the weight is substantially equal to the first target weight. | 10-29-2015 |
Lambertus Franciscus Wilhelmus Van Haren, Druten NL
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20130340585 | Seal for a Sawing Machine for Separating Electronic Components and Sawing Machine Provided with Such a Seal - The invention relates to a seal for a sawing machine ( | 12-26-2013 |
Laurentius Hendrikus Frans Lambertus Van Haren, 'Sgravenhage NL
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20120227422 | DEVICE AND A METHOD FOR MAKING ICE CUBES AND A METERING DEVICE FOR ICE CUBES - Device and method for making ice cubes, comprising a supplying device for supplying a liquid substance to at least one elongated mould ( | 09-13-2012 |
Richard Johanne Franciscus Van Haren, Waalre NL
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20150153656 | Method of Applying a Pattern to a Substrate, Device Manufacturing Method and Lithographic Apparatus for Use in Such Methods - A substrate is loaded onto a substrate support of a lithographic apparatus, after which the apparatus measures locations of substrate alignment marks. These measurements define first correction information allowing the apparatus to apply a pattern at one or more desired locations on the substrate. Additional second correction information is used to enhance accuracy of pattern positioning, in particular to correct higher order distortions of a nominal alignment grid. The second correction information may be based on measurements of locations of alignment marks made when applying a previous pattern to the same substrate. The second correction information may alternatively or in addition be based on measurements made on similar substrates that have been patterned prior to the current substrate. | 06-04-2015 |
Richard Johannes Franciscu Van Haren, Waalre NL
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20130230797 | Method of Applying a Pattern to a Substrate, Device Manufacturing Method and Lithographic Apparatus for Use in Such Methods - A substrate is loaded onto a substrate support of a lithographic apparatus, after which the apparatus measures locations of substrate alignment marks. These measurements define first correction information allowing the apparatus to apply a pattern at one or more desired locations on the substrate. Additional second correction information is used to enhance accuracy of pattern positioning, in particular to correct higher order distortions of a nominal alignment grid. The second correction information may be based on measurements of locations of alignment marks made when applying a previous pattern to the same substrate. The second correction information may alternatively or in addition be based on measurements made on similar substrates that have been patterned prior to the current substrate. | 09-05-2013 |
Richard Johannes Franciscus Van Haren, Veldhoven NL
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20090075452 | SUBSTRATE PROVIDED WITH AN ALIGNMENT MARK IN A SUBSTANTIALLY TRANSMISSIVE PROCESS LAYER, MASK FOR EXPOSING SAID MARK, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY - A substrate provided with an alignment mark in a substantially transmissive process layer overlying the substrate, said mark comprising high reflectance areas for reflecting radiation of an alignment beam of radiation, and low reflectance areas for reflecting less radiation of the alignment beam, wherein the high reflectance areas comprise at least one substantially linear sub-grating. In one example, a substantially linear sub-grating comprises a plurality of spaced square regions. | 03-19-2009 |
20110128520 | ALIGNMENT SYSTEMS AND METHODS FOR LITHOGRAPHIC SYSTEMS - An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively. | 06-02-2011 |