Patent application number | Description | Published |
20140176102 | MIXED MODE COMPENSATION CIRCUIT - A mixed mode compensation circuit for a power converter generate a digital signal according to a reference signal and a feedback signal which is related to the output voltage of the power converter, convert the digital signal into a first analog signal, offset the first analog signal with a variable offset value to generate a second analog signal, and filter out high-frequency components of the second analog signal to generate a third analog signal for stable output voltage of the power converter. The mixed mode compensation does not require large capacitors, and thus the circuit can be integrated into an integrated circuit. | 06-26-2014 |
20140191732 | BOOTSTRAP CIRCUIT AND METHOD FOR CONTROLLING THE SAME - A bootstrap circuit includes: a charging voltage source; a charging diode, having an anode coupled to the charging voltage source; a high-voltage transistor, having a control terminal defined as a first connecting node and a channel coupled between a cathode of the charging diode and a bootstrap capacitor; a logic control circuit, having a first and a second logic outputs, and a logic input for receiving a charging command; a high-voltage control transistor, having a control terminal defined as a second connecting node and a channel coupled between charging voltage source and the first connecting node; a cut-off resistor, coupled between the first and the second connecting nodes; a charging control transistor, having a channel coupled between the second connecting node and a ground terminal, and a control terminal coupled to the second logic output; a control capacitor, coupled between the first connecting node and the first logic output. | 07-10-2014 |
Patent application number | Description | Published |
20110187240 | Piezoelectronic device and method of fabricating the same - A piezoelectronic device and a method of fabricating the same are disclosed. The piezoelectronic device of the present invention comprises: a plurality of carbon nanotubes; at least one piezoceramic layer covering the plurality of carbon nanotubes; and a supporting material for supporting the carbon nanotubes and disposed between the carbon nanotubes, the supporting layer being coated with at least one piezoceramic layer, wherein the plurality of carbon nanotubes is arranged in a comb-shape. The piezoelectronic device of the present invention is advantageous in having excellent elasticity (durability) and excellent piezoelectronical property. The induced current obtained from the piezoelectronic device of the present invention is about 1.5 μA or above as well as induced voltage being over 1V when the size of the piezoelectronic block is 2.5 mm×1 mm×1 mm (length×width×height). | 08-04-2011 |
20110194990 | Method of fabrication visible light absorbed TiO2/CNT photocatalysts and photocatalytic filters - A method of fabricating visible light absorbed TiO | 08-11-2011 |
20110214264 | PIEZOELECTRONIC DEVICE AND METHOD OF FABRICATING THE SAME - A piezoelectronic device and a method of fabricating the same are disclosed. The piezoelectronic device of the present invention comprises: a plurality of carbon nanotubes; at least one piezoceramic layer covering the plurality of carbon nanotubes; and a supporting material for supporting the carbon nanotubes and disposed between the carbon nanotubes, the supporting layer being coated with at least one piezoceramic layer, wherein the plurality of carbon nanotubes is arranged in a comb-shape. The piezoelectronic device of the present invention is advantageous in having excellent elasticity (durability) and excellent piezoelectronical property. The induced current obtained from the piezoelectronic device of the present invention is about 1.5 μA or above as well as induced voltage being over 1V when the size of the piezoelectronic block is 2.5 mm×1 mm×1 mm (length×width×height). | 09-08-2011 |
20110236654 | METHOD OF SURFACE TREATMENT AND SURFACE TREATED ARTICLE PROVIED BY THE SAME - A method of surface treatment and surface treated article provided by the same are disclosed. The method of surface treatment of the present invention comprises: providing a substrate; and forming a ceramic layer on a surface of the substrate by atomic layer deposition (ALD), wherein the ceramic layer has a thickness of 1 nm to 1000 nm. The method of surface treatment of the present invention utilizes an atomic layer deposition (ALD) method to form a ceramic layer on a surface of the substrate, in which the formed ceramic layer has excellent uniformity and is randomly and entirely coated on the surface of the substrate. Therefore, the substrate surface treated by the method of the present invention is able to have a color the same as or different to that of the surface of the substrate and simultaneously prevent oxidation/tarnish occurring. | 09-29-2011 |
Patent application number | Description | Published |
20110047719 | Deep Dyeing Process of Polyamide and Polyolefin - In a deep dyeing process of a polyamide (PA) including Nylon 4, Nylon 6, Nylon 46, Nylon 66, Nylon 7, Nylon 8, Nylon 9, Nylon 610, Nylon 1010, Nylon 11, Nylon 12, Nylon 13, Nylon 612, Nylon 9T, Nylon 13, MC Nylon, Nylon MXD6, and all polyamide derivatives, and a polyolefin (PO) including ethylene copolymer, propylene copolymer and their derivatives, a compatibilizer precursor is used for modifying the polyamide and polyolefin of an amino, hydroxyl or epoxy group containing chemical, and then a reactive dye and/or an acid dye is used for dyeing the polyamide and polyolefin, so that the dyed polyamide and polyolefin have excellent dye fastness, light fastness, rubbing fastness, washing fastness and low-temperature dyeability to overcome the shortcomings of conventional nylon fibers including a poor dyeing effect, a non-level dyeing quality, a high dyeing temperature (100° C. to 120° C.) and a high cost. | 03-03-2011 |
Patent application number | Description | Published |
20120300419 | INTERMEDIATE STRUCTURE, METHOD AND SUBSTRATE FOR FABRICATING FLEXIBLE DISPLAY DEVICE - An intermediate structure of a flexible display device includes a substrate, an etching layer, a flexible substrate, and a display module. A trench structure is formed in a surface of the substrate. The etching layer is formed on the surface and covers the substrate. The flexible substrate is disposed on the etching layer. The flexible substrate and the substrate are spaced apart from each other by the etching layer. The display module is disposed on the flexible substrate. The flexible substrate can be peeled from the substrate without applying a mechanical force and thus the yield is improved, and the process time and the fabricating cost are also reduced. In addition, the present invention also provides a substrate for fabricating a flexible display device and a method for fabricating a flexible display device. | 11-29-2012 |
20120320446 | COLOR ELECTRONIC PAPER APPARATUS, DISPLAY AND MANUFACTURING METHOD THEREOF - A color electronic paper apparatus includes a display layer, a color resist layer, an anti-ultraviolet layer and a protective sheet. The color resist layer is disposed on the display layer. The anti-ultraviolet layer is disposed on the color resist layer. The protective sheet is disposed on the anti-ultraviolet layer. A manufacturing method of the color electronic paper apparatus and a color electronic paper display are provided herein. | 12-20-2012 |
20130043474 | ACTIVE ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - Disclosed herein is a method for manufacturing an active array substrate. The method includes the steps of: forming a first patterned metal layer on a substrate; sequentially forming a semiconductor layer, an insulating layer and a second metal layer to cover the first patterned metal layer; forming a patterned photoresist layer on the second metal layer; patterning the second metal layer, the insulating layer and the semiconductor layer to form a second patterned metal layer, a patterned insulating layer and a patterned semiconductor layer, and removing a portion of the patterned photoresist layer; heating the remained portion of the patterned photoresist layer such that the remained portion is fluidized and transformed into a protective layer; and forming a pixel electrode. | 02-21-2013 |
20130072079 | MANUFACTURING METHOD FOR FLEXIBLE DISPLAY APPARATUS - A manufacturing method for a flexible display apparatus is provided. A rigid substrate is provided. A flexible substrate having a supporting portion and a cutting portion surrounding the supporting portion is provided. A first adhesive material is formed between the rigid substrate and the cutting portion of the flexible substrate, so that the flexible substrate is adhered onto the rigid substrate by the first adhesive material. The first adhesive material does not locate on the supporting portion of the flexible substrate. At least a display unit is formed on the supporting portion of the flexible substrate. The supporting portion and the cutting portion of the flexible substrate are separated so as to separate the rigid substrate and the flexible substrate, wherein the flexible substrate and the display unit thereon form a flexible display apparatus. In the method, the flexible substrate and the rigid substrate can be easily separated. | 03-21-2013 |
20130105790 | THIN FILM TRANSISTOR SUBSTRATE AND METHOD FABRICATING THE SAME | 05-02-2013 |
20130128196 | COLOR FILTER AND DISPLAY DEVICE HAVING THE SAME - Disclosed herein is a color filter, which includes a first substrate, a patterned color, resist layer, a patterned passivation layer, an adhesive layer and a second substrate. The patterned color resist layer is disposed on the first substrate. The patterned passivation layer is stacked on the patterned color resist layer. The adhesive layer covers the patterned protective layer. The second substrate is disposed on the adhesive layer. A display device having the color filter is disclosed herein as well. | 05-23-2013 |
20130187844 | LIGHT SENSITIVE DISPLAY APPARATUS AND OPERATING METHOD THEREOF - A light sensitive display apparatus and an operating method thereof are disclosed herein. The light sensitive display apparatus includes a plurality of pixels, and the operating method of the light sensitive display apparatus includes the following steps. In a writing state, a first data voltage and a first gate voltage are provided to the pixels, and the pixels illuminated by light rays are switched to or kept in a first display state. In an erasing state, a second data voltage and a second gate voltage are provided to the pixels, and the pixels illuminated by light rays are switched to or kept in a second display state. | 07-25-2013 |
20130210201 | METHOD FOR MANUFACTURING ACTIVE ARRAY SUBSTRATE - A method for manufacturing an active array substrate is provided herein. The active array substrate can be manufactured by using only two photolithography process steps. The photolithography process step using a first photomask may be provided for forming a drain electrode, a source electrode, a data line and/or a data line connecting pad and a patterned transparent conductive layer, etc. The photolithography process step using a second photomask may be utilized for forming a gate electrode, a gate line, a gate insulating layer, a channel layer and/or a gate line connecting pad, and so forth. | 08-15-2013 |
20130215493 | ELECTROPHORETIC DISPLAY FILM AND ELECTROPHORETIC DISPLAY APPARATUS - An electrophoretic display film is provided, which includes a first protective film, a second protective film and a plurality of display media. The second protective film is opposite to the first protective film. The display media are disposed between the first protective film and the second protective film, in which each of the display media includes an electrophoretic liquid and a plurality of black charged particles and a plurality of charged particles with metallic gloss both distributed in the electrophoretic liquid. | 08-22-2013 |
20130241816 | ELECTROPHORETIC DISPLAY APPARATUS - An electrophoretic display apparatus including a substrate and an electrophoretic display film is provided. The substrate has multiple pixel units, each the pixel unit has a transparent region and a reflective region and each the pixel unit includes a pixel electrode and a reflective layer. The pixel electrode is located in the transparent region and the reflective region. The reflective layer is disposed on the pixel electrode and located in the reflective region. The electrophoretic display film is disposed on the substrate and includes a common electrode and multiple microcapsules disposed between the common electrode and the pixel units, in which each the microcapsule includes multiple black electrophoretic particles, and the arrangement of the black electrophoretic particles is controlled by a driving voltage applied between the pixel electrode of each the pixel unit and the common electrode of the electrophoretic display film. | 09-19-2013 |
20140048679 | LIGHT SENSOR AND DRIVING METHOD OF PHOTO TRANSISTOR THEREOF - A light sensor including a photo transistor is provided. A gate of the photo transistor receives a gate driving signal. The photo transistor senses a light source based on the gate driving signal to generate a light current signal. The photo transistor includes a metal-oxide active layer. The gate driving signal has a first voltage level during a trap period and has a second voltage level during a read period. The first voltage level is higher than the second voltage level. The gate driving signal of the photo transistor introduces a mechanism to rapidly eliminate excess carriers. Accordingly, the photo transistor has a rapid response while maintaining good light responsibility. Furthermore, a method for driving the foregoing photo transistor is also provided. | 02-20-2014 |
20140071588 | CAPACITOR STRUCTURE OF CAPACITIVE TOUCH PANEL - A capacitor structure of capacitive touch panel including a first electrode layer, a first material layer, a second material layer and a second electrode layer is provided. The first material layer is disposed on the first electrode layer, and the material of the first material layer is selected from one of a semiconductor material and an insulating material. The second material layer is disposed on the first material layer, and the material of the second material layer is selected from another one of the semiconductor material and the insulating material. The second electrode layer is disposed on the second material layer. | 03-13-2014 |
20140138677 | THIN FILM TRANSISTOR AND FABRICATION METHOD THEREOF - A thin film transistor and a fabrication method thereof are provided. A metal patterning layer is formed on the metal oxide semiconductor layer of a thin film transistor to shield the metal oxide semiconductor layer from the water, oxygen and light in the environment. | 05-22-2014 |