Patent application number | Description | Published |
20090072991 | Gateway device allowing home network appliances to be introduced and controlled over a network and a control method therefor - A gateway device includes a base processor which converts a signal input from an IP network to a signal which can be handled by the gateway device, and a home appliance control processor having a controller which converts the signal which can be handled by the gateway device to a control signal in compliance with the communications protocol of a home appliance to be controlled. The controller stores, on a table, information about the communications protocol, driver, controllable setting condition and status of respective appliances to be controlled in association with each other. The controller also includes a conversion functional block which converts information supplied to the control information of the communications protocol of the respective appliances to be controlled on the basis of the stored information. | 03-19-2009 |
20100012037 | SUBSTRATE TRANSFER APPARATUS - A substrate transfer apparatus comprising: a plurality of floating-transfer guide plates adjacent to each other with a space, each of guide plate having a plurality of floating gas ejecting holes; a gas supplying source for supplying a floating gas to the guide plates; a tray that is placed on one of the guide plates in order to mount a substrate to be transferred, and that is floated by the floating gas; and a transfer arm for transferring the floated tray to the adjacent other guide plate from the guide plate, wherein the tray includes a main body portion having both side edges parallel to a transfer direction of the tray, and an outward projecting portion that is formed so as to partially project outwardly from at least one of both side edges of the main body portion, and wherein the transfer arm is in contact and engaged with the outward projecting portion when the tray is transferred by the transfer arm. | 01-21-2010 |
20100024872 | SEMICONDUCTOR LAYER MANUFACTURING METHOD, SEMICONDUCTOR LAYER MANUFACTURING APPARATUS, AND SEMICONDUCTOR DEVICE MANUFACTURED USING SUCH METHOD AND APPARATUS - Provided are a semiconductor layer manufacturing method and a semiconductor manufacturing apparatus capable of forming a high quality semiconductor layer even by a single chamber system, with a shortened process time required for reducing a concentration of impurities that exist in a reaction chamber before forming the semiconductor layer. A semiconductor device manufactured using such a method and apparatus is also provided. The present invention relates to a semiconductor layer manufacturing method of forming a semiconductor layer inside a reaction chamber ( | 02-04-2010 |
20100034622 | SUBSTRATE TRANSFER APPARATUS - A substrate transfer apparatus comprising: a plurality of floating-transfer guide plates adjacent to each other with a space therebetween, each of the guide plates having a substrate-placing surface on which a substrate is to be placed, and a plurality of floating-gas ejecting holes for floating the substrate with use of a gas; a gas supplying source for supplying the floating gas to the respective guide plates; and an arm for transferring the floated substrate from the guide plate, from which the substrate is to be transferred, to the adjacent guide plate to which the substrate is to be transferred, wherein the substrate-placing surface of the guide plate to which the substrate is to be transferred is situated lower than the substrate-placing surface of the guide plate from which the substrate is to be transferred. | 02-11-2010 |
20100034624 | SUBSTRATE TRANSFER APPARATUS AND SUBSTRATE TRANSFER METHOD - A substrate transfer apparatus comprising: a plurality of floating-transfer guide plates adjacent to each other, each of guide plates having a plurality of floating gas ejecting holes; a gas supplying source; a tray to mount a substrate to be transferred, and that is floated by the floating gas; and a transfer arm for transferring the floated tray from the guide plate to the adjacent other guide plate, wherein the tray includes both side edges, and a contact/engagement portion formed at the respective both side edges for the transfer arm, each of the transfer arms including a base portion that can horizontally reciprocate along a rail provided so as to be parallel to the transfer direction, a guide portion provided to the base portion, that can horizontally reciprocate in a direction orthogonal to the transfer direction, and an arm portion provided to the guide portion, that can horizontally reciprocate in the direction parallel to the transfer direction. | 02-11-2010 |
20100187201 | VACUUM PROCESSING DEVICE AND VACUUM PROCESSING METHOD - While a workpiece is vacuum-processed in a first processing chamber, a workpiece to be processed next is heated at a loading unit of a second processing chamber. The vacuum-processed workpiece is unloaded to an unloading unit of the second processing chamber. The loading unit and the unloading unit move in the arrangement direction perpendicular to the direction of transport of the workpiece by a transport mechanism. The workpiece supported by the loading unit is loaded into the first processing chamber. While the workpiece is vacuum-processed, a new workpiece is supported by the loading unit. The workpiece supported by the unloading unit is removed from the second processing chamber, and the new workpiece is preheated. | 07-29-2010 |
20100193915 | PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD, AND SEMICONDUCTOR DEVICE - In a chamber of a plasma processing apparatus, a cathode electrode and an anode electrode are disposed at a distance from each other. The cathode electrode is supplied with electric power from an electric power supply portion. The anode electrode is electrically grounded and a substrate is placed thereon. The anode electrode contains a heater. In an upper wall portion of the chamber, an exhaust port is provided and connected to a vacuum pump through an exhaust pipe. In a lower wall portion of a wall surface of the chamber, a gas introduction port is provided. A gas supply portion is provided outside the chamber. | 08-05-2010 |
20100277050 | PLASMA PROCESSING APPARATUS - The invention provides a plasma processing apparatus that can uniformly supply a gas between a cathode electrode and an anode electrode, even when areas of both electrodes are increased, and that can reduce thicknesses of both electrodes. | 11-04-2010 |
20100282168 | PLASMA PROCESSING APPARATUS, HEATING DEVICE FOR PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSING METHOD - To provide a plasma processing apparatus having relatively a reduced manufacturing cost, and excellent in a heating efficiency and a cooling efficiency. | 11-11-2010 |
20100329828 | VACUUM PROCESSING DEVICE, MAINTENANCE METHOD FOR VACUUM PROCESSING DEVICE, AND VACUUM PROCESSING FACTORY - A vacuum processing device includes a first processing chamber for housing a workpiece and performing vacuum processing on the workpiece, an evacuatable second processing chamber for housing a workpiece to be vacuum-processed and a workpiece having been vacuum-processed, a gate unit provided between the first and second processing chambers in such a manner that the gate unit is attachable to and detachable from the first processing chamber, a transport device for loading the workpiece to be vacuum-processed, from a loading unit to a vacuum processing unit through the gate unit and unloading the workpiece having been vacuum-processed, from the vacuum processing unit to an unloading unit through the gate unit and a movement mechanism for separating the first and second processing chambers from each other. | 12-30-2010 |
20110088849 | PLASMA PROCESSING APPARATUS - A plasma processing apparatus, comprising:
| 04-21-2011 |
20110283623 | VACUUM DEVICE - A vacuum chamber has an opening. A door is to close the opening. A first rail extends in a first direction with a space between the first rail and the opening when viewed in a planar view. Further, the first rail supports the door to be movable in the first direction. Further, the first rail has a portion facing the opening in a second direction crossing the first direction when viewed in a planar view. Furthermore, the first rail has a first movable portion movable in the second direction. | 11-24-2011 |
20110312167 | PLASMA PROCESSING APPARATUS, AND DEPOSITION METHOD AN ETCHING METHOD USING THE PLASMA PROCESSING APPARATUS - A plasma processing apparatus, comprising:
| 12-22-2011 |
20120219390 | SUBSTRATE TRANSFER APPARATUS - A substrate transfer apparatus comprising: a plurality of floating-transfer guide plates adjacent to each other with a space therebetween, each of the guide plates having a substrate-placing surface on which a substrate is to be placed, and a plurality of floating-gas ejecting holes for floating the substrate with use of a gas; a gas supplying source for supplying the floating gas to the respective guide plates; and an arm for transferring the floated substrate from the guide plate, from which the substrate is to be transferred, to the adjacent guide plate to which the substrate is to be transferred, wherein the substrate-placing surface of the guide plate to which the substrate is to be transferred is situated lower than the substrate-placing surface of the guide plate from which the substrate is to be transferred. | 08-30-2012 |