Patent application number | Description | Published |
20090072276 | SEMICONDUCTOR WAFER, SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - A semiconductor substrate according to an embodiment includes: a first semiconductor wafer having a first crystal; and a second semiconductor wafer formed of a second crystal substantially same as the first crystal on the first semiconductor wafer, a crystal-axis direction of unit cell thereof being twisted at a predetermined angle around a direction vertical to a principal surface of the second semiconductor wafer from that of the first semiconductor wafer. | 03-19-2009 |
20090134472 | SEMICONDUCTOR DEVICE - A semiconductor device according to an embodiment of the invention includes: a semiconductor substrate; device regions formed on the semiconductor substrate, the device regions having a length direction in a predetermined direction; a plurality of transistors having gate electrodes, respectively, the gate electrodes extending in a direction approximately perpendicular to the predetermined direction, the plurality of transistors having a source/drain region and a channel region having a channel direction approximately parallel to the predetermined direction in the device region; a plurality of SRAM cells disposed in an array, each of the plurality of SRAM cells including the plurality of transistors; and a dummy region made of the substantially same material as that of the device regions, the dummy region being formed between the outermost device regions of the SRAM cells adjacent to each other in the direction approximately perpendicular to the predetermined direction, the dummy region having a length direction approximately parallel to the predetermined direction. | 05-28-2009 |
20100025767 | SEMICONDUCTOR DEVICE - A semiconductor device includes N fins made of semiconductor regions aligned in parallel with each other in the top view plain, a gate electrode formed on both side surfaces of each of the N fins to cross the fins, source/drain layers formed in each of the N fins by sandwiching the gate electrode, a first wiring connected to one of the source/drain layers via a first contact formed in each of M fins, and a second wiring connected to the other one of the source/drain layers via a second contact formed in each of K fins. | 02-04-2010 |
20100183958 | METHOD OF FABRICATING SEMICONDUCTOR DEVICE, AND PHOTOMASK - A method of fabricating a semiconductor device according to one embodiment includes: forming a mask material on a semiconductor substrate comprising first and second regions; forming a pattern of a core on the mask material in the first region; forming a sidewall spacer mask on a side surfaces of the core pattern and subsequently removing the core pattern; transferring a pattern of the sidewall spacer mask to the mask material in the first region after removing the core; and thereafter, carrying out trimming of the pattern of the sidewall spacer mask which is transferred to the mask material in the first region, and formation of a predetermined pattern on the mask material in the second region, simultaneously. | 07-22-2010 |
20110068401 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - A semiconductor device of an embodiment includes a substrate and a plurality of fins formed on the substrate. The plurality of fins is arranged so that a first distance and a second distance narrower than the first distance are repeated. In addition, the plurality of fins include a semiconductor region in which an impurity concentration of lower portions of side surfaces facing each other in sides forming the first distance is higher than an impurity concentration of lower portions of side surfaces facing each other in sides forming the second distance. | 03-24-2011 |
20110220778 | SOLID-STATE IMAGING DEVICE - According to one embodiments, a transparent reference electrode is provided to be sandwiched between a red-detecting photoelectric conversion film and a green-detecting photoelectric conversion film, a first transparent driving electrode is provided to face the transparent reference electrode with the green-detecting photoelectric conversion film therebetween, a second transparent driving electrode is provided to face the transparent reference electrode with the red-detecting photoelectric conversion film therebetween, and a blue-detecting photoelectric conversion film is provided below the red-detecting photoelectric conversion film and performs blue detection. | 09-15-2011 |
20120009744 | SEMICONDUCTOR WAFER, SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME - A semiconductor substrate according to an embodiment includes: a first semiconductor wafer having a first crystal; and a second semiconductor wafer formed of a second crystal substantially same as the first crystal on the first semiconductor wafer, a crystal-axis direction of unit cell thereof being twisted at a predetermined angle around a direction vertical to a principal surface of the second semiconductor wafer from that of the first semiconductor wafer. | 01-12-2012 |
20120193722 | SEMICONDUCTOR DEVICE - According to one embodiment, a semiconductor device includes N fins made of a semiconductor material aligned in parallel with each other; a first gate electrode formed on both side surfaces of each of the N fins to cross the fins; and a second gate electrode formed in parallel with the first gate electrode on both side surfaces of the N fins to cross the fins, and having a larger gate length than a gate length of the first gate electrode, wherein number of fins formed with contacts of source/drain layers of first field-effect transistors having the first gate electrode is larger than number of fins formed with contacts of source/drain layers of second field-effect transistors having the second gate electrode. | 08-02-2012 |
20120224419 | SEMICONDUCTOR STORAGE DEVICE - A semiconductor storage device according to an embodiment includes wells in a semiconductor substrate, fins formed on the wells, gate electrodes provided on one side and another opposite side of each fin via a gate insulating film to form a channel region in the fin, impurity-diffused layers that each form a potential barrier that confines holes in a body region within the channel region, and source/drain layers each formed at the fin such that the channel region is sandwiched between the source layer and the drain layer. At the time of writing of data ‘1’, a gate voltage is set to a negative potential, a well bias voltage is set to a positive potential, and a drain voltage is set to a positive potential. | 09-06-2012 |
20120224438 | SEMICONDUCTOR MEMORY DEVICE - According to one embodiment, a fin formed on a semiconductor substrate, a gate electrode provided on both sides of the fin via a gate dielectric film, a depletion layer that forms a potential barrier, which confines a hole in a body region between channel regions of the fin, in the fin, and a source/drain layer formed in the fin to sandwich the gate electrode are included. | 09-06-2012 |
Patent application number | Description | Published |
20080308848 | SEMICONDUCTOR DEVICE - A semiconductor device according to an aspect of the invention comprises an n-type FinFET which is provided on a semiconductor substrate and which includes a first fin, a first gate electrode crossing a channel region of the first fin via a gate insulating film in three dimensions, and contact regions provided at both end of the first fin, a p-type FinFET which is provided on the semiconductor substrate and which includes a second fin, a second gate electrode crossing a channel region of the second fin via a gate insulating film in three dimensions, and contact regions provided at both end of the second fin, wherein the n- and the p-type FinFET constitute an inverter circuit, and the fin width of the contact region of the p-type FinFET is greater than the fin width of the channel region of the n-type FinFET. | 12-18-2008 |
20090065869 | SEMICONDUCTOR DEVICE - A semiconductor device has a plurality of fins formed on a semiconductor substrate to be separated from each other, a first contact region which connects commonly one end side of the plurality of fins, a second contact region which connects commonly the other end side of the plurality of fins, a gate electrode arranged to be opposed to at least both side surfaces of the plurality of fins by sandwiching a gate insulating film therebetween, a source electrode including the first contact region and the plurality of fins on a side closer to the first contact region than the gate electrode, and a drain electrode including the second contact region and the plurality of fins on a side closer to the second contact than the gate electrode. The ratio Rd/Rs of a resistance Rd of each fin in the drain region to a resistance Rs of each fin in the source region is larger than 1. | 03-12-2009 |
20090152623 | FIN TRANSISTOR - A fin transistor includes: a substrate; a plurality of semiconductor fins formed on the substrate; a gate electrode covering a channel region of the semiconductor fins; and a member as a stress source for the semiconductor fins included in a region of the gate electrode and the region provided between the semiconductor fins, and the member being made of a different material from the gate electrode. | 06-18-2009 |
20100237436 | SEMICONDUCTOR DEVICE - A semiconductor device includes a circuit comprising a first transistor in a first Fin; a power supply circuit in a second Fin, the power supply circuit comprising a second transistor connected between the circuit and a power supply line; and a substrate contact electrically connected to the semiconductor substrate and configured to apply a substrate voltage to a substrate, wherein a width of the first Fin in a cross-section of the first Fin perpendicular to a channel length direction of the first transistor is equal to or smaller than a twofold of a largest depletion layer width of a depletion layer formed in a channel part of the first transistor, and a width of the second Fin in a cross-section of the second Fin perpendicular to a channel length direction of the second transistor is larger than a twofold of a largest depletion layer width of a depletion layer in a channel of the second transistor. | 09-23-2010 |
20100304555 | Semiconductor device and method of manufacturing semiconductor device - The disclosure concerns a method of manufacturing a semiconductor device including forming a plurality of fins made of a semiconductor material on an insulating layer; forming a gate insulating film on side surfaces of the plurality of fins; and forming a gate electrode on the gate insulating film in such a manner that a compressive stress is applied to a side surface of a first fin which is used in an NMOSFET among the plurality of fins in a direction perpendicular to the side surface and a tensile stress is applied to a side surface of a second fin which is used in a PMOSFET among the plurality of fins in a direction perpendicular to the side surface. | 12-02-2010 |
20110260253 | SEMICONDUCTOR DEVICE - A semiconductor device according to an aspect of the invention comprises an n-type FinFET which is provided on a semiconductor substrate and which includes a first fin, a first gate electrode crossing a channel region of the first fin via a gate insulating film in three dimensions, and contact regions provided at both end of the first fin, a p-type FinFET which is provided on the semiconductor substrate and which includes a second fin, a second gate electrode crossing a channel region of the second fin via a gate insulating film in three dimensions, and contact regions provided at both end of the second fin, wherein the n- and the p-type FinFET constitute an inverter circuit, and the fin width of the contact region of the p-type FinFET is greater than the fin width of the channel region of the n-type FinFET. | 10-27-2011 |
20120012935 | Semiconductor device and method of manufacturing semiconductor device - The disclosure concerns a method of manufacturing a semiconductor device including forming a plurality of fins made of a semiconductor material on an insulating layer; forming a gate insulating film on side surfaces of the plurality of fins; and forming a gate electrode on the gate insulating film in such a manner that a compressive stress is applied to a side surface of a first fin which is used in an NMOSFET among the plurality of fins in a direction perpendicular to the side surface and a tensile stress is applied to a side surface of a second fin which is used in a PMOSFET among the plurality of fins in a direction perpendicular to the side surface. | 01-19-2012 |
20120091537 | SEMICONDUCTOR DEVICE - In accordance with an embodiment, a semiconductor device includes an SRAM cell on a substrate. The SRAM cell includes: first and second load transistors each having an n-type source region and a p-type drain region, first and second driver transistors each having a p-type source region and an n-type drain region, and first and second transfer transistors each having an n-type source region and a n-type drain region. The n-type source regions of the first and second load transistors, the n-type drain regions of the first and second driver transistors, and the n-type source regions and the n-type drain regions of the first and second transfer transistors are located in a region other than a region present between any two of the p-type drain regions of the first and second load transistors and the p-type source regions of the first and second driver transistors. | 04-19-2012 |
20120099363 | RESISTANCE CHANGE TYPE MEMORY - According to one embodiment, a resistance change type memory includes a first bit line extending in a first direction, a first word line extending in a second direction, a first bipolar transistor which is a first drive type and has a first emitter, a first base, and a first collector, a second bipolar transistor which is a second drive type different from the first drive type and has a second emitter, a second base, and a second collector, and a first memory element which has first and second terminals and in which a change in resistance state thereof is associated with data. The first terminal is connected to the first and second emitters, the second terminal is connected to the first bit line, and the first and second bases are connected to the first word line. | 04-26-2012 |
20120319164 | SEMICONDUCTOR DEVICE - According to one embodiment, a semiconductor device that has a rectification element includes a semiconductor substrate, a first well region of a first conductivity type formed on the semiconductor substrate, a second well region of a second conductivity type formed on the semiconductor substrate, and a plurality of fins arranged over the first well region and the second well region at a first pitch in the same direction. In the semiconductor device, the rectification element includes a cathode region, an anode region, a well contact region, and a trigger region that are configured using fins. These regions are connected to each wiring portion to form a PNP-type bipolar transistor and an NPN-type bipolar transistor. | 12-20-2012 |
Patent application number | Description | Published |
20080230805 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - In one aspect of the present invention, a semiconductor device may include a Si substrate, a gate electrode provided on the semiconductor via a gate dielectric layer, a first epitaxially grown layer provided on the Si substrate, a channel region provided in the Si substrate below the gate electrode, a source/drain region provided in the first epitaxially grown layer sandwiching the channel region, and having a first conductivity type impurity, a second epitaxially grown layer provided between the channel region and the first epitaxially grown layer, and provided below the gate electrode, and having a second conductivity type impurity opposite to the first conductivity type. | 09-25-2008 |
20080253170 | SEMICONDUCTOR DEVICE - In one aspect of the present invention, a semiconductor device A semiconductor device may include a SRAM cell having a first inverter, a second inverter, a first transfer transistor and a second transistor, the first inverter having a first load transistor and a first driver transistor connected to the first load transistor, the second inverter having a second load transistor and a second driver transistor connected to the second load transistor, a voltage supplying circuit configured to supply a voltage to one of the terminals of the first driver transistor and one of the terminals of the second driver transistor, the voltage which is one of more than a GND voltage and less than a GND voltage. | 10-16-2008 |
20080308880 | SEMICONDUCTOR DEVICE - In one aspect of the present invention, a semiconductor device, may include a fin formed of a semiconductor layer protruding straight from a semiconductor substrate, the fin includes straight portion which extends in a direction in a plan view and a bent portion which extends in a direction different from the direction, the straight portion and the bent portion being continuously connected, a gate insulating film provided on side surfaces of the straight portion of the fin, a gate electrode provided on the gate insulating film, source and drain regions provided in the straight portion of the fin so as to sandwich the gate electrode, a contact region provided on the straight portion of the fin and the bent portion of the fin, the contact region being electrically connected to one of the source and drain regions, and a contact member provided on the contact region of the fin so as to in contact with both of the straight portion and the bent portion of the contact region. | 12-18-2008 |
20100073996 | SEMICONDUCTOR DEVICE - In one aspect of the present invention, a semiconductor device A semiconductor device may include a SRAM cell having a first inverter, a second inverter, a first transfer transistor and a second transistor, the first inverter having a first load transistor and a first driver transistor connected to the first load transistor, the second inverter having a second load transistor and a second driver transistor connected to the second load transistor, a voltage supplying circuit configured to supply a voltage to one of the terminals of the first driver transistor and one of the terminals of the second driver transistor, the voltage which is one of more than a GND voltage and less than a GND voltage. | 03-25-2010 |