Patent application number | Description | Published |
20090067172 | LIGHTING APPARATUS - A lighting apparatus comprises a housing, a light source comprising a plurality of semiconductor light emitting devices, and allocated in the housing so as that the semiconductor light emitting devices are directed downward, a first reflector, which is mounted beneath the light source and formed in a convex body gradually thinning down toward upward, comprising a plurality of segmental reflectors having on its top a installation hole for arranging the semiconductor light emitting device and on its bottom opened wider than the installation hole, and a second reflector allocated beneath the first reflector, wherein the height of the second reflector is defined to secure that a first light shielding angle specified by a straight line passing through the semiconductor light emitting device and the bottom edge of the segmental reflector of the first reflector is larger than a second light shielding angle specified by a straight line passing through the bottom edge of the segmental reflector of the first reflector and the bottom edge of the second reflector. | 03-12-2009 |
20100195327 | LIGHTING APPARATUS - A lighting apparatus comprises a housing and a first reflector. The first reflector is mounted beneath the light source and includes a plurality of segmented reflectors, each having at its top, a installation hole and at its bottom, an opening wider than the installation hole. A second reflector is positioned beneath the first reflector. The height of the second reflector causes a first light shielding angle defined by a straight line passing through the installation hole and the bottom edge of the corresponding segmented reflector to be larger than a second light shielding angle defined by a straight line passing through the bottom edge of the segmented reflector and the bottom edge of the second reflector. | 08-05-2010 |
20100195328 | LIGHTING APPARATUS - A lighting apparatus comprises a housing and a first reflector. The first reflector is mounted beneath the light source and includes a plurality of segmented reflectors, each having at its top, a installation hole and at its bottom, an opening wider than the installation hole. A second reflector is positioned beneath the first reflector. The height of the second reflector causes a first light shielding angle defined by a straight line passing through the installation hole and the bottom edge of the corresponding segmented reflector to be larger than a second light shielding angle defined by a straight line passing through the bottom edge of the segmented reflector and the bottom edge of the second reflector. | 08-05-2010 |
20100195329 | LIGHTING APPARATUS - A lighting apparatus comprises a housing and a first reflector. The first reflector is mounted beneath the light source and includes a plurality of segmented reflectors, each having at its top, a installation hole and at its bottom, an opening wider than the installation hole. A second reflector is positioned beneath the first reflector. The height of the second reflector causes a first light shielding angle defined by a straight line passing through the installation hole and the bottom edge of the corresponding segmented reflector to be larger than a second light shielding angle defined by a straight line passing through the bottom edge of the segmented reflector and the bottom edge of the second reflector. | 08-05-2010 |
Patent application number | Description | Published |
20110049601 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME - According to one embodiment, a semiconductor device includes a substrate, conductive members, an interlayer insulating film, and a plurality of contacts. The conductive members are provided in an upper portion of the substrate or above the substrate to extend in one direction. The interlayer insulating film is provided on the substrate and the conductive members. The plurality of contacts is provided in the interlayer insulating film. In a first region on the substrate, the contacts are located at some of lattice points of an imaginary first lattice. In a second region on the substrate, the contacts are located at some of lattice points of an imaginary second lattice. The second lattice is different from the first lattice. Each of the first lattice and the second lattice includes some of the lattice points located on the conductive members or on an extension region extended in the one direction of the conductive members. A position of each of the lattice points located on the conductive members and the extension region in the one direction is periodically displaced based on every n consecutively-arranged conductive members (n is a natural number). | 03-03-2011 |
20120070985 | EXPOSURE METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - According to one embodiment, an exposure method is disclosed. The method can include applying light to a photomask by an illumination. The method can include converging diffracted beams emitted from the photomask by a lens. In addition, the method can include imaging a plurality of point images on an exposure surface. On the photomask, a light transmitting region is formed at a lattice point represented by nonorthogonal unit cell vectors, and in the illumination, a light emitting region is set so that three or more of the diffracted beams pass through positions equidistant from center of a pupil of the lens. | 03-22-2012 |
20120225374 | PHOTOMASK AND METHOD FOR MANUFACTURING THE SAME - According to one embodiment, a photomask includes a substrate, a film portion, a pattern, and a plurality of detection marks. The film portion is provided on a surface of the substrate. The film portion has a light transmittance lower than light transmittance of the substrate. The pattern is provided in a surface of the film portion. The pattern is configured to be transferred to a transfer target. The plurality of detection marks is provided in the film portion, with intensity of light transmitted through the detection marks being suppressed so as to suppress transfer the detection marks to the transfer target. | 09-06-2012 |
20140252639 | INTEGRATED CIRCUIT DEVICE, METHOD FOR PRODUCING MASK LAYOUT, AND PROGRAM FOR PRODUCING MASK LAYOUT - According to one embodiment, a method for producing a mask layout of an exposure mask for forming wiring of an integrated circuit device, includes estimating shape of the wiring formed based on an edge of a pattern included in an initial layout of the exposure mask. The method includes modifying shape of the edge if the estimated shape of the wiring does not satisfy a requirement. | 09-11-2014 |
Patent application number | Description | Published |
20100104237 | WAVEGUIDE-TYPE OPTICAL INTERFEROMETER - In an optical interferometer, polarization dependence attributable to the optical path difference has conventionally been eliminated by inserting a half-wave plate at the center of the interferometer. However, light induced by polarization coupling produced in directional couplers used in the optical interferometer causes interference having different interference conditions from those of the normal light. Polarization rotators that effect any one of 90° rotation and −90° rotation of all states of polarization of incoming light are inserted in the optical interferometer, and thereby the interference conditions of light induced by polarization coupling are made the same as those of the normal light. Each of the polarization rotators is implemented by using two half-wave plates and by varying an angle of combination of these half-wave plates. Alternatively, each of the polarization rotators is implemented through a combination of one half-wave plate and a waveguide having birefringence properties. | 04-29-2010 |
20100119189 | OPTICAL DELAY LINE INTERFEROMETER - A demodulator is provided for a multilevel differential phase shift keyed signal, capable of eliminating polarization dependence due to birefringence and polarization coupling-induced light resulting from a waveguide structure, and also, polarization dependence due to dynamic birefringence produced at the time of driving a variable phase adjuster. The demodulator is configured of an optical delay line interferometer of a waveguide interference type. The S/N ratio of a demodulated signal in the demodulator formed by the optical delay line interferometer can be also improved. Further, both the polarization dependence and the temperature dependence of the optical delay line interferometer can be reduced. The disposition of a polarization converter and groves filled with a temperature compensation material makes it possible to provide a circuit configuration suitable for eliminating the polarization dependence and the temperature dependence of the optical delay line interferometer. | 05-13-2010 |
20110268447 | Optical Wavelength Multiplexing/Demultiplexing Circuit, Optical Module Using Optical Wavelength Multiplexing/Demultiplexing Circuit, and Communication System - When a conventional synchronized AWG is employed to extend a transmission passband, an increase in loss near the optical center frequency can not be avoided. Because of passband width limit, a problem has existed in that the synchronized AWG could not be applied for a large, complicated communication system wherein a signal light passes a number of points. Therefore, an optical wavelength multiplexing/demultiplexing circuit of the present invention is a synchronized AWG, which includes an optical splitter arranged in an interference circuit that is connected on the side of one slab waveguide. The splitting ratio of the optical splitter varies, depending on the optical frequency, and the value becomes minimum near the optical center frequency of the synchronized AWG. The optical splitter is operated so that the splitting ratio is comparatively great at optical frequencies distant from the optical center frequency. | 11-03-2011 |
20120082414 | OPTICAL 90-DEGREE HYBRID CIRCUIT - An optical 90-degree hybrid circuit includes: first and second optical splitters for receiving and splitting a first and second light beam into two, respectively; a first optical coupler for generating an interfering light beam by multiplexing one of the light beams split by the first optical splitter and the second optical splitter; and a second optical coupler for generating an interfering light beam by multiplexing another one of the light beams split by the first optical splitter and the second optical splitter. The first optical splitter includes an optical coupler configured to output two light beams having equal phases, and the second optical splitter includes an optical coupler configured to output two light beams having a phase difference of 90 degrees. | 04-05-2012 |
20120093457 | OPTICAL 90-DEGREE HYBRID CIRCUIT - An optical 90-degree hybrid circuit includes a first demultiplexing optical coupler having two or more first input ports and two or more first output ports, a second demultiplexing optical coupler having two or more second input ports and two or more second output ports, two first arm waveguides connected to the first output ports, two second arm waveguides connected to the second output ports, a 90-degree phase shift section installed in one of the four arm waveguides, a first optical coupler and a second optical coupler connected to the first arm waveguides and the second arm waveguides, a first optical waveguide for connecting an optical splitter and the first input ports, and a second optical waveguide for connecting the optical splitter and the second input ports, wherein an optical length of the first optical waveguide is different from that of the second optical waveguide. | 04-19-2012 |
20120141067 | OPTICAL 90-DEGREE HYBRID CIRCUIT - The present invention provides an optical 90-degree hybrid circuit for reducing wavelength dependency of an IQ phase difference. An optical 90-degree hybrid circuit according to the present invention comprises a first demultiplexing optical coupler including a first and second input port, a second demultiplexing optical coupler including a third and fourth input port, first and second arm waveguides connected to the first and second input port, each having the same length, a third and fourth arm waveguides connected to the third and fourth input port, each having the same length, a 90-degree phase shift section installed in one of the first to fourth arm waveguides, a first optical coupler connected to the first and third arm waveguide, and a second optical coupler connected to the second and fourth arm waveguide, the light is inputted into the first and fourth input port or into the second and third input port. | 06-07-2012 |